Structural evolution and electrical property of RF sputter-deposited ZnO:Al film by rapid thermal annealing process (RF sputter로 증착된 ZnO:Al 박막의 Rapid Thermal Annealing 처리에 따른 구조개선 및 전기적 특성)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2005.07a
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- pp.466-467
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- 2005