• 제목/요약/키워드: ambient RF

검색결과 149건 처리시간 0.01초

원격 RF 수동 센서 시스템의 실현 및 그 응용에 관한 연구 (Implementation of Remote Passive RF Sensor System and Its Applications)

  • 이준탁;김경엽
    • 한국항해항만학회:학술대회논문집
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    • 한국항해항만학회 2009년도 공동학술대회
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    • pp.496-497
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    • 2009
  • This paper describes about the realization of a remote RF sensor system and its applications. RF Sensor System was designed and realized on DSP over the range of high frequency such as about 200[KHz]. It should be "wireless", "implantable" and "batteryless". Futhermore, the system should be consist of passive components such as R, Land C. The measurement was given using the inductive coupling principle between primary source part and secondary sensor part. This newly developed parameter estimation system can be easily applied to the Ambient Intelligent System including the ubiquitous computing and the sensitive environmental changes.

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Fabrication of IZO thin films for flexible organic light emitting diodes by RF magnetron sputtering

  • Jun, D.G.;Cho, H.H.;Jo, D.B.;Lee, K.M.
    • Journal of Ceramic Processing Research
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    • 제13권spc2호
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    • pp.260-264
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    • 2012
  • We have investigated the effect of ambient gases on the structural, electrical, and optical characteristics of IZO thin films intended for use as anode contacts in the organic light emitting diodes (OLED) devices. These IZO thin films were deposited on the PES film by radio frequency (RF) magnetron sputtering under different ambient gases (Ar, Ar + O2, and Ar + H2) at room temperature. In order to investigate the influences of the ambient gases, the flow rate of oxygen and hydrogen in argon has been changed from 0.1 sccm to 0.5 sccm, respectively. All the IZO thin film has an (222) preferential orientation regardless of ambient gases. The electrical resistivity of the IZO film increased with increasing O2 flow rate, whereas the electrical resistivity decreased sharply under an Ar + H2 atmosphere and was nearly similar regardless of the H2 flow rate. The change of electrical resistivity with changes in the ambient gas composition was mainly interpreted in terms of the charge carrier concentration rather than the charge carrier mobility. All the films showed the average transmittance over 85% in the visible range. The OLED device was fabricated with different IZO substrates made with the configuration of IZO/α-NPD/DPVB/Alq3/LiF/Al in order to elucidate the performance of the IZO substrate. The current density and the luminance of OLED devices with IZO thin films deposited in 0.5 sccm H2 ambient gas are the highest amongst all other films.

아르곤 가스만을 이용하여 PES 기판 상에 성장시킨 플렉시블 유기발광소자용 비정질 IZO 애노드 박막의 특성 (Characteristics of Amorphous IZO Anode Films Grown on Passivated PES Substrates in Oxygen Free Ambient for Flexible OLEDs)

  • 배정혁;문종민;정순욱;강재욱;김한기
    • 한국전기전자재료학회논문지
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    • 제19권12호
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    • pp.1134-1139
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    • 2006
  • Electrical, optical, and structural properties of indium zinc oxide (IZO) anode films grown by a RF magnetron sputtering were investigated as functions of RF power and working pressure in pure Ar ambient. To investigate electrical, optical and structural properties of IZO anode films, 4-point probe and UV/VIS spectrometry, and X-ray diffraction (XRD) were performed, respectively. A sheet resistance of $15.2{\Omega}/{\square}$, average transmittance above 80 % in visible range, expecially above 85 % in 550 nm, and root mean square roughness of 1.13 nm were obtained from optimized IZO anode films grown in oxygen free ambient. All samples show amorphous structure regardless of RF power and working pressure due to low substrate temperature. In addition, XPS depth profile obtained from IZO/PES exhibits that there is no obvious evidence of interfacial reaction between IZO and PES substrate. Furthermore, current-voltage-luminance of the flexible phosphorescent flexible OLEDs fabricated on IZO anode shows dependence on sheet resistance of the IZO anode. These results indicate that the IZO anode is a promising candidate to substitute conventional ITO anode for high-quality flexible displays.

주변 후방산란 통신에서의 채널 추정기법 (Method for Channel Estimation in Ambient Backscatter Communication)

  • 김수현;이동구;선영규;심이삭;황유민;신요안;김동인;김진영
    • 한국인터넷방송통신학회논문지
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    • 제19권4호
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    • pp.7-12
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    • 2019
  • 주변 후방산란 통신은 송신 전력효율 문제로 기존 RF통신에서 채널 추정방법인 파일럿(pilot) 신호를 통한 채널 추정기법이 제한된다. 제한된 송신 전력 환경에서 기존 주변 후방산란통신의 연구는 채널 상태로 인한 신호 변동을 고려하지 않은 이상적인 채널로 가정을 하고 연구되어 왔다. 본 논문은 주변 후방산란 통신 시스템에서 정규분포를 따르는 채널 상태인 주변 후방산란 통신 시스템에서 채널 추정 방법으로 블라인드 채널 추정기법 중 하나인 기댓값-최대화 알고리즘을 제안한다. 모의실험은 제안한 시스템 모델에서 기댓값-최대화 알고리즘과 추정값의 최소 분산을 나타내는 Bayesian Cramer-Rao 하한 경계를 이용하여 평균 제곱 오차(Mean Square Error, MSE)값이 하한 경계와 근접해 가는 것을 확인하고, 주변 후방산란 통신 시스템에서 채널 파라미터의 추정이 가능함을 증명한다.

적외선 센서를 위해 흡수층으로서 rf Magnetron Sputtering에 의해 제조된 NiCr 박막의 특성 (Characteristics of NiCr Thin Films Prepared by rf Magnetron Sputtering as Absorption Layer for Infrared Sensors)

  • 허성기;최은석;윤순길
    • 한국재료학회지
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    • 제13권10호
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    • pp.640-644
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    • 2003
  • NiCr thin films were fabricated by rf magnetron sputtering for applying to both the top electrode and absorption layer on Pb(Zr, Ti)O$_3$(PZT) thin films for infrared sensors. The rms roughness and resistivity of NiCr films prepared with Ni power of 80 W and Cr power of 50 W showed the most stable oxidation resistance after annealing at $600^{\circ}C$ for 5 min in oxygen ambient. The rms roughness and resistivity of NiCr films annealed at $V^{\circ}C$ in oxygen ambient were about 2$0\AA$ and $70 \mu$Ω-cm, respectively. As-deposited Ni/PZT/Pt and NiCr (Ni 80 W, Cr 50 W)/PZT/Pt structures showed well saturated hysteresis loops. However, in case of the samples annealed at $500^{\circ}C$ in oxygen ambient, only NiCr/PZT/Pt showed saturated loops having a remanent polarization of 20$\mu$C/$\textrm{cm}^2$. Ultra-thin NiCr films showed a possibility as a top electrode for infrared sensors.

수소 분위기에서 후열처리한 상온증착 ZnO:Al 박막의 전기적 특성 분석 (Analysis of Electrical Property of Room Temperature-grown ZnO:Al Thin films Annealed in Hydrogen Ambient)

  • 정윤환;진호;김호걸;박춘배
    • 한국전기전자재료학회논문지
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    • 제22권4호
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    • pp.318-322
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    • 2009
  • In this paper, to establish growth technology of ZnO:Al thin films at low temperature applied to photoelectronic devices, ZnO:Al were prepared by RF magnetron sputtering on glass substrate at room temperature using different RF power with subsequent annealing process at different temperature in $H_2$ ambient. The resistivity of hydrogen-annealed ZnO:Al thin film at temperature of $300^{\circ}C$ was reduced to $8.32{\times}10^{-4}{\Omega}cm$ from $9.44{\times}10^{-4}{\Omega}cm$ which was optimal value for as-grown films. X-ray photoelectron spectroscopy(XPS) revealed that improved electrical properties are ascribed to desorption of the negatively charged oxygen species from the grain boundary surfaces by the hydrogen annealing process.

The Annealing Effect of Diamond-like Carbon Films for RF MEMS Switch

  • 황현석;최원석;차재상
    • 한국통신학회논문지
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    • 제35권11A호
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    • pp.1091-1096
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    • 2010
  • Stiction in microelectromechanical systems (MEMS) has been a major failure mechanism. Especially, in RF MEMS switches, moving parts often suffered in-use and release related stiction problems. Some materials and methods have been used to prevent this problem. Diamond-like carbon (DLC) has not only been used as a protective material owing to its good mechanical properties but also has been used as a hydrophobic material. Its properties could be controlled by post annealing treatment in various conditions. We synthesized DLC films using a radio frequency plasma enhanced chemical vapor deposition (RF PECVD) method on silicon substrates using methane ($CH_4$) and hydrogen ($H_2$) gas. Then, the change of the hydrophobic property of the films was investigated undervarious annealing temperatures in nitrogen and in oxygen ambient. The films, that were annealed above $700^{\circ}C$ in nitrogen ambient, showed a high contact angle of water (> $90^{\circ}$) even though their mechanical property was sacrificed to some degree. The structural variation and the changes of the hydrophobic and mechanical properties of the DLC films were analyzed by Raman spectrum, contact angle measurement, surface profiler, and a nanoindentation test.

무선 에너지 하비스팅 인지 무선 네트워크에서 최적화 제어 정책을 이용한 선택적 스펙트럼 접근 (Opportunistic Spectrum Access Using Optimal Control Policy in RF Energy Harvesting Cognitive Radio Networks)

  • 정준희;황유민;차경현;김진영
    • 한국위성정보통신학회논문지
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    • 제10권3호
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    • pp.6-10
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    • 2015
  • 무선 에너지 하비스팅 기술은 주로 무선 통신 네트워크에서 전력소모가 적은 무선 통신 장치들을 동작시키기 위해 주변 환경으로부터 RF 신호를 수집, 에너지로 변환하는 기술로 최근 각광을 받고 있다. 이와 같은 기술과 기존의 인지무선(Cognitive Radio) 네트워크 모델을 기반으로, 본 논문에서는 적은 파워 소비를 하는 2차 유저(Secondary User)가 근처에서 동작 중인 1차 유저(Primary User)의 특정 거리 안에 존재할 때 1차 유저가 전송한 통신 신호로부터 무선에너지 하비스팅을 하고 특정 거리 밖에 존재할 때 우선 사용자에게 할당되어 있는 허가대역을 주기적으로 센싱, 선택적으로 접근하는 무선에너지 하비스팅 인지무선 네트워크 모델을 제시한다. 이 때 1차 유저와 2차 유저는 Poisson pont process로 분포되어있고 통신을 하고 있는 수신자들과 일정한 거리로 떨어져있다. 위와 같은 네트워크 모델에서 주어진 여러 가지 조건하에 2차 유저 네트워크 처리량을 최대화할 수 있는 최적의 프레임 주기, 전송파워, 2차 유저 밀도 제안하고 앞으로의 연구방향을 제시한다.

$YMnO_3$/Si(100) 구조의 RF Power 의존성 (RF Power dependence in $YMnO_3$/Si(100) Structures)

  • 김진규;정순원;김용성;이남열;정상현;김광호;유병곤;이원재;유인규
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.755-758
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    • 2000
  • YMnO$_3$films have been deposited with different Rf powers of 60W, 80W, 100W, and 120W. The structural properties of YMnO$_3$films on Si(100) were analysed by XRD(X-ray diffraction). The c-axis oriented peaks of YMnO$_3$were observed deposited in YMnO$_3$/Si(100) structure of RF power at 87$0^{\circ}C$ in oxygen ambient, and the peaks were enlarged by increasing The RF powers. The dielectric constant of the film deposited at 100W and 120W of RF power were about 19, 20 respectively.

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Reactive sputtering 법으로 증착된 AZO 박막의 전기적 및 구조적 특성 (Electrical and structural characteristics of AZO thin films deposited by reactive sputtering)

  • 허주희;이유림;이규만
    • 반도체디스플레이기술학회지
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    • 제8권1호
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    • pp.33-38
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    • 2009
  • We have investigated the effect of the ambient gases on the characteristics of AZO thin films for the OLED (organic light emitting diodes) devices. These AZO thin films are deposited by rf-magnetron sputtering under different ambient gases (Ar, Ar+$O_2$, and Ar+$H_2$) at 300. In order to investigate the influences of the oxygen and hydrogen, the flow rate of oxygen and hydrogen in argon mixing gas has been changed from 0.2sccm to 1sccm and from 0.5sccm to 5sccm, respectively. The AZO thin films were preferred oriented to (002) direction regardless of ambient gases. The electrical resistivity of AZO film increased with increasing flow rate of $O_2$ under Ar+$O_2$ while under Ar+$H_2$ atmosphere the electrical resistivity showed minimum value near 1sccm of $H_2$. All the films showed the average transmittance over 80% in the visible range. The OLED device was fabricated with different AZO substrates made by configuration of AZO/$\acute{a}$-NPD/DPVB/$Alq_3$/LiF/Al to elucidate the performance of AZO substrate.

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