Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지
DOI QR코드

DOI QR Code

Analysis of Electrical Property of Room Temperature-grown ZnO:Al Thin films Annealed in Hydrogen Ambient

수소 분위기에서 후열처리한 상온증착 ZnO:Al 박막의 전기적 특성 분석

  • 정윤환 (원광대학교 전기전자및정보공학부, WRISS) ;
  • 진호 (원광대학교 전기전자및정보공학부, WRISS) ;
  • 김호걸 (원광대학교 전기전자및정보공학부, WRISS) ;
  • 박춘배 (원광대학교 전기전자및정보공학부, WRISS)
  • Published : 2009.04.01
Download PDF
⟨ Previous Next ⟩

Abstract

In this paper, to establish growth technology of ZnO:Al thin films at low temperature applied to photoelectronic devices, ZnO:Al were prepared by RF magnetron sputtering on glass substrate at room temperature using different RF power with subsequent annealing process at different temperature in $H_2$ ambient. The resistivity of hydrogen-annealed ZnO:Al thin film at temperature of $300^{\circ}C$ was reduced to $8.32{\times}10^{-4}{\Omega}cm$ from $9.44{\times}10^{-4}{\Omega}cm$ which was optimal value for as-grown films. X-ray photoelectron spectroscopy(XPS) revealed that improved electrical properties are ascribed to desorption of the negatively charged oxygen species from the grain boundary surfaces by the hydrogen annealing process.

Keywords

References

  1. T. minami and T. Miyata, 'Present status and future prospects for development of non-or reduced-indium transparent conducting oxide thin films', Thin Solid Films, Vol. 517, No. 4, p. 1474, 2008 https://doi.org/10.1016/j.tsf.2008.09.059
  2. 김경민, 진은미, 박춘배, 'LED 효율 향상을 위 한 Texture구조 AZO 박막의 제조와 광학적 특성분석', 전기전자재료학회논문지, 19권, 10호, p. 901, 2006
  3. G. J. Fang, D. Li, and B. L. Yao, 'Influence of post-deposition annealing on the properties of transparent conductive nanocrystalline ZAO thin films prepared by RF magnetron sputtering with highly conductive ceramic target', Thin Solid Films, Vol. 418, No. 2, p. 156, 2002 https://doi.org/10.1016/S0040-6090(02)00733-2
  4. D. Song, 'Effects of rf power on surface- morphological, structural and electrical properties of aluminium-doped zinc oxide films by magnetron sputtering', Applied Surface Science, Vol. 254, No. 1, p. 4171, 2008 https://doi.org/10.1016/j.apsusc.2007.12.061
  5. D. J. Kwak, M. W. Park, and Y. M. Sung, 'Discharge power dependence of structural and electrical properties of Al-doped ZnO conducting film by magnetron sputtering(for PDP)', Vacuum, Vol. 83, No. 1, p. 113, 2008 https://doi.org/10.1016/j.vacuum.2008.03.099
  6. 정윤환, 김호걸, 박춘배, 'Aluminium-doped zinc oxide 투명전도막을 적용한 photodiode의 수광효율 향상', 전기전자재료학회논문지, 21권, 9호, p. 863, 2008
  7. Z. G. Wang, X. T. Zu, X. Zhu, and L. M. Wang, 'Green luminescence orginates from surface defects in ZnO nanoparticles', Physica E, Vol. 35, No. 1, p. 199, 2006 https://doi.org/10.1016/j.physe.2006.07.022
  8. H. J. Jin, Y. H. Jeong, and C. B. Park, 'Realization and analysis of p-type ZnO:Al thin film by RF magnetron sputtering', Trans. EEM, Vol. 9, No. 2, p. 67, 2008 https://doi.org/10.4313/TEEM.2008.9.2.067

Cited by

  1. Electrical and Optical Properties of SiO2-doped ZnO Films Prepared by Rf-magnetron Sputtering System vol.22, pp.11, 2009, https://doi.org/10.4313/JKEM.2009.22.11.969