• Proceedings of the KAIS Fall Conference
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• 2010.11a
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• pp.478-481
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• 2010

Antimony doped tin oxide (ATO) nanoparticles were added as nanofillers to UV-curable polyester-acrylate (PEA) resin for coating to improve thermal, mechanical, and electrical properties. In this study, ATO nanoparticles were grafted by 3-glycidyloxypropyltrimethoxysilane and 3-methacryloxypropyltrimethoxysilane respectively to improve dispersion and interfacial adhesion. The physical properties and surface scratch hardness of the UV-curable nanocomposite coating were improved considerably by introducing the modified ATO nanoparticles.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.61 no.6
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• pp.916-921
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• 2012

Sealant paste with silica immersed in cross-linked epoxy-acrylate polymer resin was prepared by thermal and UV curing process. The curing mechanism of polymer resin resulted from 2 functional groups of epoxy and acrylic structure. The properties of microstructure, thermal conductivity and mechanical strength were investigated for its various applications. The adhesion strength is increased by increasing the thermal curing time until 15 minutes, and curing efficiency is saturated over 20 minutes. The increase rate per day of pot life and viscosity is 4.8%, indicating it has excellent storage stability. It is found that the formulation of silica pastes can be applied to heavy industries, building materials, display and various industries.

• Polymer(Korea)
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• v.38 no.6
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• pp.720-725
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• 2014

Aminopropyl terminated polydimethylsiloxane was synthesized by hydrosilylation reaction with hydride terminated polydimethlysiloxane and allyl amine. Polydimethylsiloxane modified urea with isocyanate group was prepared from cyclic trimer of hexamethyldiisocyanate with aminopropyl terminated polydimethylsiloxane. Polydimethylsiloxane modified urea/acrylate resin (PUA) was prepared from the urethane reaction of PU with isocyanate group and 2-hydroxyethylmethacrylate. PUA structure was analyzed by FTIR and NMR. Coating materials were prepared by mixing PUA, acrylic monomer, photo-initiator, and solvent and coated on PET film to obtain flexible hard coating film by UV irradiation.

• Proceedings of the Korean Fiber Society Conference
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• 1993.06b
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• pp.90-94
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• 1993

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.228-229
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• 2006

본 연구에서는 PCB에 적용하기 위한 폴리머 타입 후막저항의 하나로서, 포토공정으로 저항 패턴의 형성이 가능한 페이스트를 제조하였다. 기존의 폴리머 후막저항은 스크린 인쇄를 패터닝의 주요 방법으로 하고 있어 패턴의 정밀성이 떨어지는 단점이 있었다. 이를 개선하여 고정밀 저항 패턴의 형성이 가능하도록 Photoimageable Resin을 저항 페이스트의 개발에 도입하였다. Acrylated oligomer 및 monomer, 그리고 Novolac Epoxy를 주 기지상 재료로서 사용하였으며, acrylate와 epoxy의 함량비에 따른 저항 페이스트의 현상성 및 시트저항을 평가하였다. 전도성 Filler 재료로 카본블랙을 이용하였는데, 그 물리적 특성차와 함량이 저항 페이스트의 현상성과 저항값에 미치는 영향을 평가하였다. 실험결과 Acrylate와 epoxy의 비가 2.5:1일 때 현상성이 가장 양호하였으며, 이 조성에 XC72R 카본블랙을 2g 첨가하였을 때 시트저항의 평균값은 약 $6\;k{\Omega}\{\square}$였다.

• Polymer(Korea)
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• v.36 no.4
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• pp.536-541
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• 2012

The effects of silica content were studied on UV curing characteristics and defect formations in imprinted patterns of hundreads nanometer size for the photo-curable imprinting composites with silica particles. An increase in elasticity and a decrease in shrinkage were observed with an increase in silica content in the imprinting resin which was UV cured at room temperature. However, the patterned nano-pillars were stuck together with neighboring nano-pillars if the amount of silica is more than 7 wt%. This can be ascribed to the increased viscosity of imperfectly cured resin due to the obstruction of the photo-reaction by silica particles. Addition of silica to the imprinting resin is useful in enhancing the strength of the cured resin although it is difficult to get good imprinted patterns for the resin with more than 7 wt% of silica due to the reduction of photo-reaction conversion.

• Polymer(Korea)
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• v.34 no.2
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• pp.154-158
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• 2010

We first synthesized N-phenylcyclotrisiloxazane ($D_3^{NPh}$) through a cyclization of $\alpha$,$\omega$- dichlorohexamethyltrisiloxane with aniline and prepared poly(dimethylsiloxane-co-N-phenylsiloxazane) copolymer (PDMS-NPSOX) by a ring opening copolymerization of them with hexamethylcyclotrisiloxane $D_3$. An acrylate monomer modified with PDMS-NPSOX was synthesized by using chloroethyl methacrylate and copolymerized with methylmethacrylate (MMA) and n-butylacrylate. The composition of the copolymer was chosen to control their glass transition temperature ($T_g$) to 25 $^{\circ}C$. By changing the comonomer from PDMS to PDMS-NPSOX, $T_g$ and adhesive strength of the copolymer were increased from 20 to 25 $^{\circ}C$ and from 1.76 to 2.23 N/cm, respectively.

• Journal of the Korean Applied Science and Technology
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• v.38 no.2
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• pp.476-487
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• 2021

To prepare acrylic resin coatings containing 70% of solids, we used n-butyl methacrylate(BMA), methyl methacrylate(MMA), 2-hydroxyethyl methacrylate(2-HEMA), and acetoacetoxyethyl acrylate(AAEA), caprolactone acrylate(CLA) as raw materials, the glass transition temperature(T_g) of acrylic copolymer was adjusted around 50 ℃. The viscosity and molecular weight of the acrylic resins was increased with increasing OH values. Di-tert-amyl peroxide was found to be the suitable initiator to get high-solids acrylic resins. The optimum reaction conditions found in the study are 5 wt% of initiator, 4 wt% of chain transfer agent, 4 hrs of dropping time, and 140 ℃ of reaction temperature. The structure of the synthesized resins were characterized by FT-IR and ¹H-NMR spectroscopy. Number average molecular weight of 1900~2600 and molecular wight distribution of 1.4~2.1 were obtained. Crosslinked acrylic urethane clear coatings were obtained by curing reaction between the synthesized acrylic resins and hexamethylene diisocyanate trimer(Desmodur N-3300), the equivalent ratio of NCO/OH was 1.2/1.0. The physical properties from the following studies were carried out: viscosity(Zahn cup #2), adhesion, drying time, pot-life, pensil hardness, and 60° specular gloss. Various properties of the acrylic urethane clear coatings were also evaluated on the coating specimens. Adhesion property to a substrate, drying time, pot-life, pencil hardness, and 60° specular gloss of prepared paint showed quite good properties. Futhermore, prepared paint containing 10% of CLA showed quite good properties for adhesion, low viscosity and high hardness.

• Journal of the Korean Applied Science and Technology
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• v.31 no.3
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• pp.500-508
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• 2014

For this research, synthesis acrylic resin by ethyl acrylate monomer(EAM) and prepared samples which set by difference amount of monoammonium phosphate solution in waterborne acrylic resin. Use these resins, analyzed mechanical properties and thermal stability by films and leather surface coated. The test of DSC experiment sample WAC-APS3 was $410^{\circ}C$ Tm values which means the highest content of monoammonium phosphate had highest thermal stability in acrylic resin. According to measure data for solvent resistance, all samples showed good property. As known in the results, increase of ammonium phosphate constant did not influence to big change of resin properties. In abrasion test WAC-APS3 was good abrasion properties(68.729 mg.loss). Test of tensile strength, as increase as monoammonium phosphate resin analyzed low properties $1.505kgf/mm^2$ to $1.275kgf/mm^2$. In elongation case, same as strength test result 425 % to 384 % by increase to monoammonium phosphate amount in acrylic resin.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.421-421
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• 2008

Generally, the polymer thick-film resistors for embedded organic or hybrid substrate are patterned by screen printing so that the accuracy of resistor pattern is not good and the tolerance of resistance is too high(${\pm}$20~30%). To reform these demerits, a method using Fodel$^{(R)}$ technology, which is the patterning method using a photosensitive resin to be developable by aqueous alkali-solution as a base polymer for thick-film pastes, was recently incorporated for the patterning of thermosetting thick-film resistor paste. Alkali-solution developable photosensitive resin system has a merit that the precise patterns can be obtained by UV exposure and aqueous development, so the essential point is to get the composition similar to PSR(photo solder resist) used for PCB process. In present research, we made the photopatternable resistor pastes using 8 kinds of epoxy acrylates and a conductive carbonblack (CDX-7055 Ultra), evaluated their developing performance, and then measured the resistance after final curing. To become developable by alkali-solution, epoxy acrylate oligomers with carboxyl group were prepared. Test coupons were fabricated by patterning copper foil on FR-4 CCL board, plating Ni/Au on the patterned copper electrode, applying the resistor paste on the board, exposing the applied paste to UV through Cr mask with resistor patterns, developing the exposed paste with aqueous alkali-solution (1wt% $Na_2CO_3$), drying the patterned paste at $80^{\circ}C$ oven, and then curing it at $200^{\circ}C$ during 1 hour. As a result, some test compositions couldn't be developed according to the kind of oligomer and, in the developed compositions, the measured resistance showed different results depending on the paste compositions though they had the same amount of carbonblack.