• Title/Summary/Keyword: ablation, threshold

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Multi-layer Glass Cutting by Femtosecond Laser (극초단 레이저를 이용한 겹침 평판유리 절단)

  • Shin, Hyun-Myung;Lee, Young-Min;Choi, Hae-Woon
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.21 no.3
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    • pp.382-386
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    • 2012
  • A femtosecond laser with 775nm central wavelength and 150 fs of temporal pulse width was used for multi layered glass cutting applications. Ultrashort pulse was effectively used for clean glass cutting with $50{\mu}m$ depth and minimum cutting width. Laser beam was split to two stages and focused on the top surfaces of each layer. Ablation threshold of used glass was measured to be $2.59J/cm^2$. In experiments, 200mW laser power and 1mm/s scanning speed was used for preliminary experiment. Air gap was the major defect occurring parameter and laser power was less sensitive to glass cutting in the experiment. The maximum cutting speed was measured to be 60mm/min with 2kHz, however, Maximum 3m/min cutting speed can be achievable with a commercially available laser with 100kHz.

Practical application of picosecond laser micro-machining to the direct fabrication of a diffraction grating mold (피코초 레이저를 이용한 회절 격자 금형 개발)

  • No, Ji-Hwan;Lee, Je-Hun;Son, Hyeon-Gi;Seo, Jeong;Sin, Dong-Sik
    • Proceedings of the Korean Society of Laser Processing Conference
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    • 2006.06a
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    • pp.97-100
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    • 2006
  • Picosecond (ps) laser micro-machining has emerged as an attractive method of fabricating high-precision microstructures, especially in metals. In this paper, a metallic mold for diffraction gratings is fabricated with a mode-locked 12 ps $Nd:YVO_4$ laser. Laser pulses with a wavelength of 355nm are irradiated on the surface of NOK 80, a mold material, to generate line patterns. In order to minimize the line width, laser power is set just above the ablation threshold of NOK 80. Results show that the spectrum from the fabricated mold is good enough for some industrial application.

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Experimental Investigation for Ablation Characteristics of Polyimide Layer and Cu-metal Layer using High Power Nd:YAG UV Laser (고출력 Nd:YAG UV레이저를 이용한 polyimide층과 Cu-metal층의 가공상태에 대한 실험적 고찰)

  • Choi, Kyung-Jin;Lee, Young-Hyun
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.4
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    • pp.31-36
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    • 2009
  • In this paper, the laser cutting characteristics of the flexible PCB using high power Nd:YAG UV laser were investigated. A specific FPCB model was selected for the experiment. Test sheets were made, which had equal materials and layer structure to those of the outline (OL) region and the contact pad (CP) region in the FPCB. The experiment is made up of two stages. In the first stage of the experiment, the laser cutting fluence was found, which is the threshold fluence to cut the test sheets completely. The laser cutting fluence of the OL sheet is $1781.26{\sim}1970.16\;J/cm^2$ and that of the CP sheet is $2109.34{\sim}2134.34\;J/cm^2$. In the second stage, cutting performance and its qualities were analyzed by the experiment. The laser cutting performance remained almost unchanged for all laser and process parameter sets. The average cutting width (top side/bottom side) of the OL sheet was $40.45\;{\mu}m/11.52\;{\mu}m$ and that of the CP sheet was $22.14\;{\mu}m/10.93\;{\mu}m$. However, the laser cutting qualities were different according to the parameters. The adjacent region of the cutting line on the OL sheet was carbonized as the beam speed was low and the overlap coefficient was high. The surface quality around the cutting line of the CP sheet was about the same. Carbonization and debris occurred on the surface of the cutting line. As a result of the experiment, the cutting qualities were better as the overlap coefficient was made low and beam speed high. Therefore, the overlap coefficient 2 or 3 is proper for the FPCB laser cutting.

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Femtosecond laser induced photo-expansion of organic thin films

  • Chae, Sang-Min;Lee, Myeong-Su;Choe, Ji-Yeon;Lee, Hyeon-Hwi;Kim, Hyo-Jeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.120.2-120.2
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    • 2015
  • We propose a novel direct writing technique with a femtosecond laser enabling selective modification of not only the morphology of conducting polymer thin films but also the orientation and alignment of the polymer crystal. Surface relief gratings resulting from photoexpansion on P3HT:PCBM and PEDOT:PSS thin films were fabricated by femtosecond laser direct writing. The photoexpansion was induced at laser fluence below the ablation threshold of the thin film. The morphology (size and shape) of photoexpansion could be quantitatively controlled by laser writing parameters such as focused beam size, writing speed, and laser fluence. GIWAX results showed that face-on P3HT crystals were largely increased in the photoexpansion in comparison with pristine region of the thin film. In addition, the face-on P3HTs in the photoexpansion were aligned with their orientation along the polarization of the laser. The micro-RAMAN spectra confirmed that neither chemical composition change nor the polymer chain breaking was observable after femtosecond laser irradiation. We believe that this laser direct writing technique opens a new door to the fabrication of more efficient OPVs via non-contact, toxic-free approach.

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A Comparative Study of ITO Glass Ablation Using Femtosecond and Nanosecond Lasers (펨토초 레이저와 나노초 레이저를 이용한 ITO Glass의 어블레이션 비교 연구)

  • Jeon, Jin-Woo;Shin, Young-Gwan;Kim, Hoon-Young;Choi, Wonsuk;Ji, Seok-Young;Kang, Hee-Shin;Ahn, Sanghoon;Chang, Won Seok;Cho, Sung-Hak
    • Korean Journal of Optics and Photonics
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    • v.28 no.6
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    • pp.356-360
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    • 2017
  • Indium tin oxide (ITO) provides high electrical conductivity and transparency at visible and near-IR wavelengths. ITO is widely used as a transparent electrode for the fabrication of LCDs, OLEDs, and many kinds of optical applications. It is widely employed for electrodes in various electric and display sectors because of its transparency in the visible range and high conductivity. Therefore, one issue is removing a specific area of a layer of material such as ITO or metallic film on a substrate, without affecting the properties of the substrate. ITO-on-glass removal using a laser is friendlier to the environment than traditional methods. In this study, ablation of ITO film on glass using a femtosecond-laser micromachining system (wavelength 1026 nm, pulse duration 150 fs) and a nanosecond-laser micromachining system (wavelength 1027 nm, pulse duration 5 ns) are described, compared, and analyzed.

Diagnostic value of Thyroglobulin Measurement with Fine-needle Aspiration Biopsy for Lymph Node Metastases in Patients with a History of Differentiated Thyroid Cancer

  • Zhang, Hai-Shan;Wang, Ren-Jie;Fu, Qing-Feng;Gao, Shi;Sun, Bu-Tong;Sun, Hui;Ma, Qing-Jie
    • Asian Pacific Journal of Cancer Prevention
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    • v.15 no.24
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    • pp.10905-10909
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    • 2015
  • Purpose: The aim of this study was to evaluate the diagnostic value of FNA-Tg for detecting lymph node metastases in patients with a history of differentiated thyroid cancer (DTC). Materials and Methods: A total of 58 patients with DTC diagnosis and evidence of single or multiple suspicious cervical lymph nodes were assessed. All underwent total or near-total thyroidectomy with (35 cases) or without (23 cases) radioiodine (RAI) ablation, followed by thyroid stimulating hormone (TSH) suppression therapy. A total of 68 lymph nodes were examined by ultrasound-guided fine needle aspiration (US-FNA) for both cytological examination and FNA-Tg measurement. Serum Tg and anti-thyroglobulin antibody (TgAb) levels were also measured. Diagnostic performance including sensitivity, specificity, accuracy, positive (PPV) and negative predictive value (NPV) of FNAC and FNA-Tg were calculated and compared. The Spearman's rank correlation coefficient was used to estimate the relationship between FNA-Tg and serum TgAb. Results: The FNA-Tg levels were significantly higher with DTC metastatic lymph nodes (median 927.7 ng/mL, interquartile range 602.9 ng/mL) than non-metastatic lymph nodes (median 0.1 ng/mL, interquartile range 0.4 ng/mL) (p<0.01). Considering 1.0 ng/mL as a threshold value for FNA-Tg, the sensitivity, specificity, accuracy, PPV and NPV of FNA-Tg were 95.7%, 95.5%, 95.6%, 97.8% and 91.3%, respectively. The sensitivity and accuracy of the combination of FNAC and FNA-Tg were significantly higher than that of FNAC alone (p<0.05). The diagnostic performance of FNA-Tg was not significantly different between cases with or without RAI ablation, and the serum TgAb levels did not interfere with FNA-Tg measurements. Conclusions: Measurement of FNA-Tg is useful. The combination of FNAC and FNA-Tg is more sensitive and accurate for detecting lymph node metastases in patients with a history of DTC than FNAC alone. Serum TgAbs appear to be irrelevant for measurement of FNA-Tg.

A Novel Patterning Method for Silver Nanowire-based Transparent Electrode using UV-Curable Adhesive Tape (광경화 점착 테이프를 이용한 은 나노와이어 기반 투명전극 패터닝 공법)

  • Ju, Yun Hee;Shin, Yoo Bin;Kim, Jong-Woong
    • Journal of the Microelectronics and Packaging Society
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    • v.27 no.3
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    • pp.73-76
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    • 2020
  • Silver nanowires (AgNWs) intrinsically possess high conductivity, ductility, and network structure percolated in a low density, which have led to many advanced applications of transparent and flexible electronics. Most of these applications require patterning of AgNWs, for which photolithographic and printing-based techniques have been widely used. However, several drawbacks such as high cost and complexity of the process disturb its practical application with patterning AgNWs. Herein, we propose a novel method for the patterning of AgNWs by employing UV-curable adhesive tape with a structure of liner/adhesive layer/polyolefin (PO) film and UV irradiation to simplify the process. First, the UV-curable adhesive tape was attached to AgNWs/polyurethane (PU), and then selectively exposed to UV irradiation by using a photomask. Subsequently, the UV-curable adhesive tape was peeled off and consequently AgNWs were patterned on PU substrate. This facile method is expected to be applicable to the fabrication of a variety of low-cost, shape-deformable transparent and wearable devices.

High-Performance Amorphous Multilayered ZnO-SnO2 Heterostructure Thin-Film Transistors: Fabrication and Characteristics

  • Lee, Su-Jae;Hwang, Chi-Sun;Pi, Jae-Eun;Yang, Jong-Heon;Byun, Chun-Won;Chu, Hye Yong;Cho, Kyoung-Ik;Cho, Sung Haeng
    • ETRI Journal
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    • v.37 no.6
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    • pp.1135-1142
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    • 2015
  • Multilayered ZnO-$SnO_2$ heterostructure thin films consisting of ZnO and $SnO_2$ layers are produced by alternating the pulsed laser ablation of ZnO and $SnO_2$ targets, and their structural and field-effect electronic transport properties are investigated as a function of the thickness of the ZnO and $SnO_2$ layers. The performance parameters of amorphous multilayered ZnO-$SnO_2$ heterostructure thin-film transistors (TFTs) are highly dependent on the thickness of the ZnO and $SnO_2$ layers. A highest electron mobility of $43cm^2/V{\cdot}s$, a low subthreshold swing of a 0.22 V/dec, a threshold voltage of 1 V, and a high drain current on-to-off ratio of $10^{10}$ are obtained for the amorphous multilayered ZnO(1.5nm)-$SnO_2$(1.5 nm) heterostructure TFTs, which is adequate for the operation of next-generation microelectronic devices. These results are presumed to be due to the unique electronic structure of amorphous multilayered ZnO-$SnO_2$ heterostructure film consisting of ZnO, $SnO_2$, and ZnO-$SnO_2$ interface layers.