• Title/Summary/Keyword: Zr recovery

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Development of PZT Piezoelectric Biosensor for the Detection of Formaldehyde (Formaldehyde 측정을 위한 PZT 압전 바이오센서 개발)

  • 김병옥;곽성곤;임동준
    • KSBB Journal
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    • v.13 no.5
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    • pp.477-482
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    • 1998
  • A biosensor with PZT piezoelectric ceramic crystal was developed for the detection of formaldehyde gas. Poled PZT piezoelectric ceramic disk was made from ZrO2, TiO2 and Nb2O5, together with the addition of PbO and polyvinyl alcohol, through various processes of mixing, calcination drying, crushing, forming, sintering, polishing, ion coating and poling. Oscillator circuit of sensor was made of operational amplifier(AD811AN). Formaldehyde dehydrogenase was immobilized onto a piezoelectic ceramic crystal, together with the cofactors, reduced glutathione and nicotinamide adenine dinucleotide. The effect of flow rate on the sensitivity was determined by varing the flow rate of carrier gas from 24.7mL/min to 111.7mL/min through detector cell. The results indicated that as the flow rate was increased, the recovery rate was increased. And a significant increase in the sensitivity was observed in enhanced flow rate of carrier gas. Frequency difference(ΔF) of immobilized PZT piezoelectic disk increased proportionally to the concentration gas and reproduced to repeated exposures of formaldehyde gas(28ppm, Δ68Hz).

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Electrical Property Changes of $\textrm{NO}_X$ Sensitive $\textrm{WO}_3$ Thin Films as Applied DC Voltages on 8YSZ Substrate (8YSZ 기판에 증착한 $\textrm{WO}_3$ 박막의 DC 전압에 따른 $\textrm{NO}_X$ 감지특성)

  • 전춘배;박기철
    • Journal of the Korean Institute of Telematics and Electronics T
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    • v.36T no.1
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    • pp.8-12
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    • 1999
  • $\textrm{WO}_3$ semiconductive film, which is known to have a sensitivity on $\textrm{NO}_X$ gas was prepared on 8YSZ (8% Yttria stabilized $\textrm{ZrO}_2$) ionic conductor substrate that has oxygen ion pumping effect. Microstructure and electrical properity, especially $\textrm{NO}_X$ sensitivity as a function of DC voltage applied to 8YSZ substrate was examined. When the $\textrm{WO}_3$ film was annealed, it showed amorphous structure, while crystallization was occurred at $600^{\circ}$C revealing orthorhombic phase of $\textrm{WO}_3$. As the annealing temperature increases, (111) and (001) peaks of $\textrm{WO}_3$ film was enhanced. At $400^{\circ}C$ when DC voltage was applied, comparing with no DC bias, more stable and large response characteristics was showed, and the best sensitivity was observed at 2V. Recovery characteristics of NO gas was much better that that of $\textrm{NO}_2$ gas.

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Modification of Hydrogen Determinator for Total Hydrogen Analysis in Irradiated Zircaloy Cladding Tube (수소분석기 개조 및 조사후 지르칼로이 피복관의 총수소분석)

  • Park, Soon-Dal;Choi, Kwang-Soon;Kim, Jong-Goo;Joe, Kih-Soo;Kim, Won-Ho
    • Analytical Science and Technology
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    • v.12 no.6
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    • pp.490-497
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    • 1999
  • A hydrogen determinator was modified and installed in the glove box to analyse total hydrogen content in irradiated zircaloy tube. The analysis method of hydrogen is Inert Gas Fusion(IGF)-Thermal Conductivity Detection(TCD). The hydrogen recoveries of no tin method using Ti and Zr matrix standards, respectively, were available within $3{\mu}g$ of hydrogen. Also the smaller size of sample showed the better hydrogen recovery. It was found that the hydrogen standard of Ti matrix is avaliable to hydrogen analysis in zircaloy sample. The mean radioactivity of irradiated zircaloy sample was 10 mR/hr and hydrogen concentration was 130 ppm.

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Effect of Hydrogen on leakage current characteristics of (Pb, La) (Zr, Ti )$O_3$(PLZT) thin film capacitors with Pt or Ir-based top electrodes (Pt 또는 Ir 계열의 상부전극을 갖는 (Pb, La) (Zr, Ti)$O_3$ (PLZT) 박막의 누설전류특성에 미치는 수소 열처리의 효과)

  • Yun, Sun-Gil
    • Korean Journal of Materials Research
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    • v.11 no.2
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    • pp.151-154
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    • 2001
  • The leakage current behaviors of PLZT capacitors with top electrodes of Pt, Ir, and $IrO_2$ are investigated before and after hydrogen forming gas anneal. The P-E hysteresis and fatigue properties of Pt/PLZT/Pt capacitors are almost recovered after recovery anneal in $O_2$ ambient. The leakage current mechanisms of PLZT capacitors with Pt and $IrO_2$ top electrodes are consistent with space-charge influenced injection model showing the strong time dependence irrespective of annealing conditions. On the other hand, the leakage current behavior of Ir/PLZT/Pt capacitor shows steady state independent of time because IrPb, conducting phase, formed at interface between Ir top and PLZT is a high conduction path. Teh leakage current mechanism of Ir/PLZT/Pt capacitor is consistent with Schottky barrier model.

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Determination of Fission Products in Simulated Nuclear Spent Fuels by Cation.Anion Exchange Chromatography and Inductively Coupled Plasma Atomic Emission Spectrometry (양.음이온교환 크로마토그래피와 유도결합플라스마 원자방출분광법을 이용한 모의 사용후핵연료 중 핵분열생성물 분석)

  • Choi, Kwang Soon;Sohn, Se Chul;Pyo, Hyung Yeol;Suh, Moo Yul;Kim, Do Yang;Park, Yang Soon;Jee, Kwang Yong
    • Analytical Science and Technology
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    • v.13 no.4
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    • pp.446-452
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    • 2000
  • The simulated nuclear spent fuel (SIMFUEL) containing the platinum group elements which will not be dissolved in a nitric acid was completely dissolved with a acid digestion bomb. The metallic elements separated in the SIMFUEL were measured by inductively coupled plasma atomic emission spectrometry (ICP-AES). Because the peaks of metallic elements were spectrally interfered by uranium spectrum, uranium and metallic elements were separated by cation exchange resin for Mo, Pd, Rh and Ru and by anion exchange resin for Ba, Ce, La, Nd, Rh, Sr, Y and Zr, respectively. The recovery of Mo, Pd, Rh and Ru after separation by cation exchange chromatography found to be 99-103% and anion exchange separation showed 96.5-107% of recovery except Y with the simulated solution whose concentration was similar to the spent nuclear fuel. The relative standard deviation of this method showed 1.3-6.7% in the SIMFUEL whose concentrations of metallic elements were between several $10^2-10^3$ppm.

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A Study on the Properties of Transition Metal Nitride Coating Materials for the Recovery of Tungsten and Rare Metals (텅스텐 및 희유금속 회수를 위한 초경합금 전이금속질화물 코팅소재 특성연구)

  • Kim, Jiwoo;Kim, Myungjae;Kim, Hyokyeong;Park, Sohyun;Seo, Minkyeong;Kim, Jiwoong
    • Resources Recycling
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    • v.31 no.1
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    • pp.46-55
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    • 2022
  • The recycling of coated cemented carbide scraps is becoming increasingly significant for the recovery of rare metals. However, coatings consisting of Group IV and V transition metal nitrides are one of the challenging factors in obtaining high-purity materials. We investigated the structural, elastic, and mechanical properties of Group IV and V transition-metal nitrides (TiN, VN, ZrN, NbN, HfN, and TaN) using first-principle calculations. Convergence tests were performed to obtain reliable calculated results. The equilibrium structures of the nitrides were in good agreement with those of a previous study, indicating the reliability of the data. Group IV transition metal nitrides show a higher covalent bonding nature. Thus, they exhibit a higher degree of brittleness than that of Group V transition metal nitrides. In contrast, Group V transition metal nitrides show weaker resistance to shear loading and more ductile behavior than Group IV transition metal nitrides because of the metallic bonds characterized by valence electron concentration. The results of the crystal orbital Hamilton population analysis showed good agreement with the shear resistance tendencies of all transition metal nitrides.

Reactivity of SO2 Catalytic Reduction over Sn-Zr Based Catalyst under High Pressure Condition (고압조건에서 Sn-Zr계 촉매상에서 SO2 촉매환원 반응특성)

  • Park, Jung Yun;Park, No-Kuk;Lee, Tae Jin;Baek, Jeom-In;Ryu, Chong Kul
    • Korean Chemical Engineering Research
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    • v.48 no.3
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    • pp.316-321
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    • 2010
  • The $SO_2$ catalytic reduction was carried out under the condition of high pressure in this study. Sn-Zr based oxide and CO were used as the catalyst and reducing agent for the reduction of $SO_2$ to element sulfur, respectively. In order to compare the reactivity with the pressure on the catalytic process, the reactivity tests were performed under the conditions of atmospheric pressure and 20 atm. $SO_2$ conversion, the element sulfur yield and COS selectivity were also compared with changing the reaction temperature, $CO/SO_2$ mole ratio and the space velocity(GHSV). $SO_2$ conversion increased with increasing temperature and $CO/SO_2$ mole ratio under the condition of atmospheric pressure and element sulfur yield decreased due to the production of COS by the series reaction of CO and the produced sulfur. However, high $SO_2$ conversion and high element sulfur were obtained under the condition of 20 atm. It was concluded that COS decreased due to the condensation of the produced element sulfur under the condition of high pressure. Therefore, the high sulfur yield for $SO_2$ catalytic reduction could be profitably obtained under the condition of high pressure.

The Variation of Thermal Cycle on the Transformation Temperature and Mechanical Properties of CuZnAi Shape Memory Alloy (CuZnAI형상기억합금의 변태온도에 미치는 열사이클 및 기계적성질 변화)

  • Yang, Gwon-Seung;Park, Jin-Seong;Gang, Jo-Won
    • Korean Journal of Materials Research
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    • v.4 no.5
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    • pp.524-534
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    • 1994
  • The effects of transformation temperature and mechanical properties by thermal cycle of CuZnAl shape memory alloy with a small of misch metal and Zr contents were investigated. The addition of misch metal and Zr was very effective for reducing the grain size. After solution treatment, the specimens were post-quench aged or step quenched at $100^{\circ}C$ to $350^{\circ}C$ for variation of Rockwell hardness value. It was found that the Rockwell hareness value was very increased at $200^{\circ}C$ and $250^{\circ}C$. The fracture strength and ductility have been significantly increased with the increase of misch metal conten when tensile tested below $M_f$ temperature. Also, the fracture strength has been more increased in the case of post quench aging treatment than that of the as-quenching treatment. Aging of the $\beta$-phase decreases the $M_s$ temperature, but that of the martensite phase increases the $A_s$ temperature. The change in $A_s$ temperature with post-quench aging can be attributed to recovery of order in the $\beta$phase. The hystersis of transformation temperature ($A_s-M_s$) has an increasing tendency by thermal cycles.

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Reduce of Etching Damage of PZT Thin Films in $Cl_2/CF_4$ Plasma with addition of Ar and $O_2$ ($Cl_2/CF_4$ 플라즈마 Ar, $O_2$ 첨가에 따른 PZT 막막의 식각 손상 효과)

  • Kang, Myoung-Gu;Kim, Kyoung-Tae;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.21-25
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    • 2001
  • In this study, recovery of plasma etching· damage in PZT thin film with additive gas and re-annealing after etching have been investigated. The PZT thin films were etched as a function of $Cl_2/CF_4$ with addition of Ar and $O_2$ with inductively induced plasma. The etch rates of PZT thin films were 1450 $\AA$/min at 30% additive Ar into $(Cl_2(80%)+CF_4 (20%))$ and 1100 $\AA$/min at 10% additive $O_2$ into $C(Cl_2(80%)+CF_4(20%))$. In order to recovery properties of PZT thin films after etching, the etched PZT thin films were re-annealed at various temperatures in at $O_2$ atmosphere. From the hysteresis curves, ferroelectrical properties are improved by $O_2$ re-annealing process. The improvement of ferroelectric behavior at annealed sample is consistent with the increase of the (100) and (200) PZT peaks revealed by x-ray diffraction (XRD). From x-ray photoelectron spectroscopy (XPS) analysis, intensity of Pb-O, Zr-O and Ti-O peak are increased and the chemical residue peak is reduced by $O_2$ re-annealing. The ferroelectric behavior consistent with the dielectric nature of $Ti_xO_y$ is recovered by $O_2$ recombination during rapid thermal annealing process.

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Reduce of Etching Damage of PZT Thiin Films in $Cl_{2}/CF_{4}$ Plasma with addition of Ar and $O_2$ ($Cl_{2}/CF_{4}$ 플라즈마에 Ar,$O_2$첨가에 따른 PZT 박막의 식각 손상 효과)

  • 강명구;김경태;김창일
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.21-25
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    • 2001
  • In this study, recovery of plasma etching damage in PZT thin film with additive gas and re-annealing after etching have been investigated. The PZT thin films were etched as a function of Cl$_2$/CF$_4$ with addition of Ar and $O_2$ with inductively induced plasma. The etch rates of PZT thin films were 1450$\AA$/min at 30% additive Ar into (Cl$_2$(80%)+CF$_4$ (20%)) and 1100$\AA$/min at 10% additive $O_2$ into C(Cl$_2$(80%)+CF$_4$ (20%)). In order to recovery properties of PZT thin films after etching, the etched PZT thin films were re-annealed at various temperatures in at $O_2$ atmosphere. From the hysteresis curves, ferroelectrical properties are improved by $O_2$ re-annealing process. The improvement of ferroelectric behavior at annealed sample is consistent with the increase of the (100) and (200) PZT peaks revealed by x-ray diffraction (XRD). From x-ray photoelectron spectroscopy (XPS) analysis, intensity of Pb-O, Zr-O and Ti-O peak are increased and the chemical residue peak is reduced by $O_2$ re-annealing. The ferroelectric behavior consistent with the dielectric nature of Ti$_{x}$O$_{y}$ is recovered by $O_2$ recombination during rapid thermal annealing process.s.s.

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