The electronic states and transition state of Zr and Hf oxide as a phase shift maske for DUV lithography (DUV lithography 위상 변위 마스크용 Zr, Hf Oxide의 전자상태 및 천이 상태 연구)
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- Proceedings of the Materials Research Society of Korea Conference
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- 2003.11a
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- pp.215-215
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- 2003