• 한국진공학회지
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• 제16권3호
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• pp.205-209
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• 2007

Atomic layer deposition(ALD)를 이용하여 Si와 soda lime glass 기판 위에 ZnO 박막을 증착하였다. 기판의 온도는 비교적 저온인 $130^{\circ}C{\sim}150^{\circ}C$를 채택하였다. 증착결과 단위 cycle 당 $2.72{\AA}$이 증착되어 균일한 박막이 증착되었음이 확인되었다. 증착된 박막의 결정성을 X-ray diffraction(XRD)으로 조사해본 결과 비교적 저온에서도 (100)과 (101)방향의 성장이 우세하였다. 또 Auger electron spectroscopy(AES)로 분석해본 결과 불순물이 없는 순도 높은 박막이 성장되었음을 알 수 있었다.

• Transactions on Electrical and Electronic Materials
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• 제9권2호
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• pp.67-72
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• 2008

Al-doped p-type ZnO thin films were fabricated by RF magnetron sputtering on n-Si (100) and homo-buffer layers in pure oxygen ambient. ZnO ceramic mixed with 2 wt% $Al_2O_3$ was selected as a sputtering target. XRD spectra show that the Al-doped ZnO thin films have ZnO crystal structure. Hall Effect experiments with Van der Pauw configuration show that p-type carrier concentrations are arranged from $1.66{\times}10^{16}$ to $4.04{\times}10^{18}\;cm^{-2}$, mobilities from 0.194 to $198\;cm^2V{-1}s^{-1}$ and resistivities from 0.0963 to $18.4\;{\Omega}cm$. FESEM cross section images of different parts of a p-type ZnO:Al thin film annealed at $800^{\circ}C$ show a compact structure. Measurement for same sample shows that density is $5.40\;cm^{-3}$ which is smaller than theoretically calculated value of $5.67\;cm^{-3}$. Photoluminescence (PL) spectra at 10 K show a shoulder peak of p-type ZnO film at about 3.117 eV which is ascribed to electron transition from donor level to acceptor level (DAP).

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.1002-1004
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• 2009

Solution-processed indium-gallium-zinc-oxide thin-film transistors were fabricated by sol-gel method. By a combinatorial study of InGaZnO multi-component system, optimum molar ratio of In, Ga, and Zn has been selected. By adjusting the In:Ga:Zn molar ratio, TFTs with field-effect mobility of 0.5 ~ 1.5 $cm^2$/V-s, threshold voltage of -5 ~ 5 V, and subthreshold slope of 1.5 ~ 2.5 V/decade were achieved.

• Current Photovoltaic Research
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• 제3권3호
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• pp.75-79
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• 2015

Recently, $Cu_2ZnSn(S_xSe_{1-x})_4$ (CZTSSe) has been received a tremendous attraction as light absorber material in thin film solar cells (TFSCs), because of its earth abundance, inexpensive and non-toxic constituents and versatile material characteristics. Kesterite CZTSSe thin films were synthesized by sulfo-selenization of sputtered Cu/Sn/Zn stacked metallic precursors. The sulfo-selenization of Cu/Sn/Zn stacked metallic precursor thin films has been carried out in a graphite box using rapid thermal annealing (RTA) technique. Annealing process was done under sulfur and selenium vapor pressure using Ar gas at $520^{\circ}C$ for 10 min. The effect of tuning Se/(S+Se) precursor composition ratio on the properties of CZTSSe films has been investigated. The XRD, Raman, FE-SEM and XRF results indicate that the properties of sulfo-selenized CZTSSe thin films strongly depends on the Se/(S+Se) composition ratio. In particular, the CZTSSe TFSCs with Se/(S+Se) = 0.37 exhibits the best power conversion efficiency of 4.83% with $V_{oc}$ of 467 mV, $J_{sc}$ of $18.962mA/cm^2$ and FF of 54%. The systematic changes observed with increasing Se/(S+Se) ratio have been discussed in detail.

• 대한전기학회논문지
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• 제43권6호
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• pp.965-970
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• 1994

ZnO transparent conducting oxide thin films have been prepared by Pyrosol deposition method and the effects of the different experimental variables on the electrical resistivity and optical transmittance of the prepared films have been investigated in details. The best film with a resistivity of about 8 X 10S0-2TΩcm and transmittance about 80% has been obtained at the substrate temperature of 4$25^{\circ}C$ by using HS12T+CHS13TOH(1:3) solvent and NS12T carrier gas after annealing at 20$0^{\circ}C$ for 40 minutes in vacuum. Furthermore, We have also found the effect of substrate temperature on crystallographic orientation and surface morphology. Annealing of the as-deposited film in vacuum leads to a substantial reduction in resistivity without affecting the optical transmittance and crystallographic orientation.

• 한국전기전자재료학회논문지
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• 제24권9호
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• pp.760-765
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• 2011

Znic sulfide (ZnS) thin films were deposited on glass substrates by radio frequency magnetron sputtering. The substrate temperature varied from room temperature (RT) to $500^{\circ}C$. The structural and optical properties of ZnS films were studied by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), energy dispersive analysis of X-ray (EDAX) and UV-visible transmission spectra. The XRD analyses reveal that ZnS films have cubic structures with (111) preferential orientation, whereas the diffraction patterns sharpen with the increase in substrate temperatures. The FESEM images indicate that ZnS films deposited at $400^{\circ}C$ have nano-sized grains with a grain size of ~ 67 nm. Then films exhibit relatively high transmittance of 80% in the visible region, with an energy band gap of 3.71 eV. One obvious result is that the energy band gap of the film increases with increasing the substrate temperatures.

• Applied Science and Convergence Technology
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• 제23권6호
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• pp.376-386
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• 2014

Zinc oxysulfide nanocrystals (ZnOS NCs) were synthesized by forming ZnS phase on a ZnO matrix. ZnO nanocrystals (NCs) with a diameter of 10 nm were synthesized by forced hydrolysis in an organic solvent. As-synthesized ZnO NCs aggregated with each other due to the high surface energy. As acetic acid (AA) was added into the milky suspension of the aggregated ZnO NCs, transparent solution of well dispersed ZnO NCs formed. Finally ZnOS NCs were formed by adding thioacetic acid (TAA) to the transparent solution. The effect of recrystallization on the structural, optical and electrical properties of the ZnOS NCs were studied. The results of UV-vis absorption confirmed the band gap tunability caused by increasing the curing temperature of ZnOS thin films. This may have originated from the larger effective size due to the recrystallization of zinc sulfide (ZnS). From XRD result we identified that ZnOS thin films have a zinc blende crystal structure of ZnS without wurtzite ZnO structure. This is probably due to the small amount of ZnO phases. These assertions were verified through EDS of FE-SEM, XPS and EDS mapping of HR-TEM results; we clearly proved that ZnOS were comprised of ZnS and ZnO phases.

• 한국결정성장학회지
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• 제22권3호
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• pp.127-133
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• 2012

박막 태양전지의 저가 고효율화를 실현하기 위해 넓은 면적의 기판 위에 코팅이 가능하며 진공의 유지가 필요가 없고 장치가 간단하며 고순도의 균질한 박막을 얻을 수 있고 박막의 조성을 쉽게 조절할 수 있는 Sol-Gel법을 이용하였다. Se보다 저가이며 독성이 없고 풍부한 원료인 S로 치환하여 사용하며 Zn/Sn비 값을 조절하고 kesterite 구조를 갖는 $Cu_2ZnSnS_4$의열처리 온도에 따른 박막의 구조적, 광학적 특성에 미치는 변수들의 영향을 알아보았다. XRD pattern을 관찰한 결과 Zn/Sn비가 0.8/1.2일 때 $2{\theta}=28.5^{\circ}$에서 주피크가 가장 강하게 나타났으며 (112) 방향의 배향성을 가진 kesterite 상임을 확인 할 수 있었다. 열처리 온도가 증가할수록 (112) 면의 강도가 커지며 $550^{\circ}C$에서 열처리를 한 $Cu_2ZnSnS_4$ 박막은 kesterite 구조의 화학량론적 $Cu_2ZnSnS_4$ 특징을 나타내고 본 실험의 샘플의 격자상수를 측정한 값이 a = 5.5047 and $c=11.014{\AA}$이며 JCPDS(Joint Committee on Powder Standards)에 보고된 데이터 a = 5.427 and $c=10.848{\AA}$과 거의 일치 하였다. 광학적 특성을 알아보기 위해 측정한 광투과율은 가시광선 영역(380~770 nm)에서 전체적으로 65 % 이하로 나타났다.

• Korean Chemical Engineering Research
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• 제48권2호
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• pp.218-223
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• 2010

본 연구에서는 반도체식 가스센서 재료로서 활용 가능한 ZnO 박막을 Continuous Flow Reaction(CFR) 방법으로 실리콘 기판 위에 성장시켰다. 또한 전구물질로 사용한 zinc acetate의 농도에 따른 산화아연 박막의 성장특성과 이들의 전기적 특성이 조사되었다. 산화아연 박막 제조는 0.005~0.02 M의 zinc acetate 농도에서 수행되었다. 산화아연 박막을 구성하고 있는 ZnO의 입자크기는 농도가 증가할수록 증가되었으며, 박막의 두께도 함께 증가되었다. CFR 법에 의한 산화아연 박막의 성장속도는 전구물질의 농도에 비례적으로 의존되는 것을 확인하였으며, 균일한 박막을 제조하기 위한 전구물질의 최적 농도는 0.01 M이였다. 한편, 전구물질의 농도를 달리하여 제조된 산화아연 박막의 전압에 대한 전류를 I-V 측정기로 측정한 결과, 박막의 두께가 증가될수록 높은 전류가 흘렀다. 그러므로 산화아연 박막의 전류를 전구물질의 농도변화로 조절할 수 있다. 또한 산화아연 박막을 $300^{\circ}C$에서 5 min 동안 $500ppmv\;H_2S$에 노출시킨 결과, 전압에 대한 전류값이 낮아졌다. 이와 같이 산화아연의 전기적 특성은 가스센서로 응용할 수 있는 가능성을 확인시켜 주는 결과라 할 수 있다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.252-252
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• 2009

In this work, the nanocrystalline ZnO/polycrystalline (poly) aluminum nitride (AlN)/Si structure was fabricated for humidity sensor applications based on surface acoustic wave (SAW). In this structure, the ZnO film was used as sensing material layer. These ZnO and AlN(0002) were deposited by so-gel process and a pulse reactive magnetron sputtering, respectively. These experimental results showed that the obtained SAW velocity on AlN film was about 5128 m/s at $h/\lambda$=0.0125 (h and $\lambda$ is thickness and wavelength, respectively). For ZnO sensing layers coated on AlN, films have hexagonal wurtzite structure and nanometer particle size. The crystalline size of ZnO films annealed at 400, 500, and 600 $^{\circ}C$ is 10.2, 29.1, and 38 nm, respectively. Surface of the film exhibits spongy which can adsorb steam in the air. The best quality of the ZnO film was obtained with annealing temperature at 500 $^{\circ}Cis$. The change in frequency response (127.9~127.85 MHz) of the SAW humidity sensor based on ZnO/AlN structure was measured along the change in humidity (41~69%). The structural properties of thin films wereinvestigated by XRD and SEM.