• The Transactions of The Korean Institute of Electrical Engineers
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• v.65 no.11
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• pp.1835-1839
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• 2016

In this study, ZnO nanorods were grown by a hydrothermal method. $SiO_2/Si$ wafers and glass were used as substrates. ~20 nm-thick ZnO thin films were rf magnetron sputtered for seed layers. The precursor was prepared by mixing zinc nitrate hexahydrate and hexamethylenetetramine (hexamine) in DI water. The concentration of zinc nitrate hexahydrate was fixed at 0.05 mol, and that of hexamine was varied between 0 mol to 0.1 mol. The reactor containing substrates and precursor was put in an oven maintained at $90^{\circ}C$ for 1 h. X-ray diffraction was carried out to analyze the crystallinity of ZnO nanorods, and a field emission scanning electron microscope was employed to observe the morphology of nanorods. Transmittance and absorbance were measured by a UV-Vis spectrophotometer. Photoluminescence measurements were conducted using 266 nm light.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.05a
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• pp.103-104
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• 2015

정확한 두께와 조성 제어, 훌륭한 재현성의 박막을 형성할 수 있는 Atomic layer deposition 방법으로 증착시킨 ZnO 박막은 여러 분야에 적용될 수 있기 때문에 최근 많은 주목을 받고 있다. ALD-ZnO 박막을 형성하기 위하여 가장 흔히 사용되는 전구체 (precursor)와 반응체 (reactant)는 DEZ(DiethylZinc)와 $H_2O$이다. 그러나 DEZ 전구체를 사용한 ALD-ZnO 박막은 낮은 열적 안정성이 문제로 지적되어져 왔으며, 또한 여러 분야의 적용 및 산업화를 위해서는 높은 증착률, 큰 범위의 전기적 저항, 높은 투과도가 필요로 한다. 본 연구에서는 atomic layer deposition 기법을 통해 열적 안정성을 가진 새로운 전구체인 DEZDMEA ($Et_2Zn:NEtMe_2$)을 사용하여 ZnO 박막을 증착하였다. DEZDMEA ($Et_2Zn:NEtMe_2$) 및 $H_2O$ 주입 시간에 따른 증착률와 전기적 성질, 투과도를 조사하였다.

• Journal of Powder Materials
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• v.12 no.4 s.51
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• pp.284-290
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• 2005

ZnO nanostructures with various shapes were synthesized under ambient pressure condition by a wet chemical reaction method. Nanorods of ZnO with hexagonal cross-section and their aggregates with radiate shape were synthesized. Precursor concentration affected considerably the shape evolution of ZnO nanorods. Low precursor concentration was proved to be more preferable to the growth of ZnO nanorods, which is attributed to the intrinsic characteristics of chemical reaction in the synthesis of ZnO from zinc compounds.

• Journal of the Microelectronics and Packaging Society
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• v.20 no.1
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• pp.33-37
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• 2013

In this research, we investigated the effect of mole concentration of precursor on morphological, structural and optical properties of ZnO nanorods. ZnO nanorods were hydrothermally grown on c-plane sapphire substrates in aqueous solution which contains zinc nitrate hexahydrate and hexamethylenetetramine at 90oC in the precursor range of 0.01 M to 0.025 M. With the increase of mole concentration, length and diameter of ZnO nanorods increased. In all the conditions, the growth direction of rods was longitudinally c-axis direction. From the strong emission peak at 380 nm of PL spectra at room temperature, we could confirm that the crystal quality of ZnO nanorods is good to emit radiative recombination spectra.

• Transactions of the Korean hydrogen and new energy society
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• v.26 no.5
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• pp.423-430
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• 2015

$Cu/ZnO/Al_2O_3$ catalysts for water gas shift (WGS) reaction were synthesized by co-precipitation method with the fixed molar ratio of Cu/Zn/Al precursors as 45/45/10. Copper and zinc precursor were added into sodium carbonate solution for precipitation and aged for 24h. During the aging period, aluminum precursor was added into the aging solution with different time gap from the precipitation starting point: 6h, 12h, and 18h. The resulting catalysts were characterized with SEM, XRD, BET surface measurement, $N_2O$ chemisorption, TPR, and $NH_3$-TPD analysis. The catalytic activity tests were carried out at a GHSV of $27,986h^{-1}$ and a temperature range of 200 to $400^{\circ}C$. The catalyst morphology and crystalline structures were not affected by aluminum precursor addition time. The Cu dispersion degree, surface area, and pore diameter depended on the aging time of Cu-Zn precipitate without the presence of $Al_2O_3$ precursor. Also, the interaction between the active substance and $Al_2O_3$ became more stronger as aging duration, with Al precursor presented in the solution, increased. Therefore, it was confirmed that aluminum precursor addition time affected the catalytic characteristics and their catalytic activities.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.106-106
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• 2014

Atomic layer deposition 방법으로 증착시킨 ZnO 박막은 다양한 종류의 태양전지에서 TCO, Buffer Layer 등 다양한 층에 활용될 수 있어 최근 많은 주목을 받고 있다. 각 적용분야에 필요한 요구조건에 따라 ZnO의 다양한 물리/화학적 특성은 이에 맞도록 조절될 필요가 있으며, 이는 ALD 공정을 통해 ZnO를 증착할 때도 마찬가지이다. 본 발표에서는 ALD를 이용한 ZnO 공정에서 이러한 물리/화학적 특성을 조절하기 위하여 시도되고 있는 precursor/reactant의 선정, 공정조건의 조절, 새로운 precursor의 적용 예를 들고, 특히 전기적 특성에 초점을 맞추어 이들이 증착된 ZnO 박막 특성에 미치는 영향을 조사하였다.

• Current Photovoltaic Research
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• v.1 no.2
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• pp.115-121
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• 2013

ZnO film has been used for CIGS solar cells as a buffer layer as itself or by doping Mg and Sn; ZnO film also has been used as a transparent conducting layer by doping Al or B for solar cells. Since ZnO itself is a host material for many applications it is necessary to understand the electrical and optical properties of ZnO film itself with various preparation conditions. We prepared ZnO films by converting ZnS precursor into ZnO film by thermal annealing. ZnO film was formed at low temperature as low as $500^{\circ}C$ by annealing a ZnS precursor layer in air. In the air annealing, the electrical resistivity decreased monotonically with increasing annealing temperature; the intensity of the green photoluminescence at 505 nm increased up to $750^{\circ}C$ annealing. The electrical resistivity further decreased and the intensity of green emission also increased in reducing atmospheres. The results suggest that deep-level defects originated by oxygen vacancy enhanced green emission, which reduce light transmittance and enhance the recombination of electrons in conduction band and holes in valence. More oxidizing environment is necessary to obtain defect-free ZnO film for higher transparency.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.421.1-421.1
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• 2016

We studied indium-doped zinc oxide (IZO) film grown by atomic layer deposition (ALD) as transparent conductive oxide (TCO). A variety of TCO layer, such as ZnO:Al (AZO), InSnO2(ITO), Zn (O,S) etc, has been grown by various method, such as ALD, chemical vapor deposition (CVD), sputtering, laser ablation, sol-gel technique, etc. Among many deposition methods, ALD has various advantages such as uniformity of film thickness, film composition, conformality, and low temperature deposition, as compared with other techniques. In this study, we deposited indium-doped zinc oxide thin films using diethyl[bis(trimethylsilyl)amido]indium [Et2InN(TMS)2] as indium precursor, DEZn as zinc precursor and H2O as oxidant for ALD and investigated the optical and electrical properties of IZO films. As an alternative, this liquid In precursor would has several advantages in indium oxide thin-film processes by ALD, especially for low resistance indium oxide thin film and high deposition rate as compared to InCp, InCl3, TMIn precursors etc. We found out that Indium oxide films grown by Et2InN(TMS)2 and H2O precursor show ALD growth mode and ALD growth window. We also found out the different growth rate of Indium oxide as the substrate and investigated the effect of the substrate on Indium oxide growth.

• Journal of the Korean Vacuum Society
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• v.19 no.3
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• pp.236-241
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• 2010

ZnO nanorods were grown on ZnO seed layer by hydrothermal method. The ZnO seed layer was coated by sol-gel method, and then the ZnO nanorods on ZnO seed layer were grown with different precursor concentrations ranging from 0.01 M to 0.3 M. FE-SEM (field-emission scanning electron microscopy), XRD (X-ray diffraction), and PL (photoluminescence) were employed to investigate the structural and optical properties of the ZnO nanorods. The diameter and length of ZnO nanorods are increased and also the optical properties are enhanced as the precursor concentrations are increased.

• Transactions on Electrical and Electronic Materials
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• v.18 no.3
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• pp.155-158
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• 2017

In this paper, ZnO Thin Film Transistors (TFTs) were fabricated by a sol-gel method using a low-temperature process, and their physical and electrical characteristics were analyzed. To lower the process temperature to $200^{\circ}C$, we used a zinc nitrate hydrate ($Zn(NO_3)_2{\cdot}xH_2O$) precursor. Thermo Gravimetric Analyzer (TGA) analysis showed that the zinc nitrate hydrate precursor solution had 1.5% residual organics, much less than the 6.5% of zinc acetate dihydrate at $200^{\circ}C$. In the sol-gel method, organic materials in the precursor disrupt formation of a high-quality film, and high-temperature annealing is needed to remove the organic residuals, which implies that, by using zinc nitrate hydrate, ZnO devices can be fabricated at a much lower temperature. Using an X-Ray Diffractometer (XRD) and an X-ray Photoelectron Spectrometer (XPS), $200^{\circ}C$ annealed ZnO film with zinc nitrate hydrate (ZnO (N)) was found to have an amorphous phase and much more oxygen vacancy ($V_o$) than Zn-O bonds. Despite no crystallinity, the ZnO (N) had conductance comparable to that of ZnO with zinc acetate dihydrate (ZnO (A)) annealed at $500^{\circ}C$ as in TFTs. These results show that sol-gel could be made a potent process for low-cost and flexible device applications by optimizing the precursors.