• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1995.11a
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• pp.74-76
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• 1995

ZnO varistor with composition of ZnO(90wt%)-Bi$_2$O$_3$(3wt%)-Sb$_2$O$_3$(3.6wt%)-CO$_2$O$_3$(1.16wt%)-NiO(0.88wt%)-MnO$_2$(0.71wt%)-Cr$_2$O$_3$(0.93wt%) according to Al$_2$O$_3$addtive was fabricated by sintering methods. The effects of Al$_2$O$_3$dopant on the I-V characteristics of ZnO varistors were investigated. These changes of electric properties were found to be caused by the variation of grains and grain boundary related to Al$_2$O$_3$dopting. And the conductive mechanism of ZnO varistor in prebreakdown region were investigated with defect model.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.953-956
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• 2003

Transparent conductive ZnO:Ga thin films were deposited on glass substrates using rf magnetron sputtering method for flat panel display. The ZnO:Ga films were preferentially oriented to c-axis (002) of on substrates. The surface morphology was smooth and had not porous whatever substrate temperature was. The electrical conductivity of the thin films were in the range of $1.6{\times}10^2{\sim}6.7{\times}10^3\;{\Omega}^{-1}cm^{-1}$ at the growth temperature from 50 to $400^{\circ}C$, whereas has a maximum at around $250^{\circ}C$. By combining of XRD and EXAFS, the crystallinity and grain size decreased with increasing substrate temperature corresponding to the reduction of the grain-boundary scattering. The optical transmittance of sputtered ZnO:Ga thin films had an improved about 86% in the UV-visible region.

• Journal of Advanced Marine Engineering and Technology
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• v.37 no.1
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• pp.72-77
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• 2013

The effect of sputtering condition on the structural properties of ZnO thin films grown by RF magnetron sputtering system was investigated for TFT driver circuit. ZnO thin films were grown with ZnO target varying RF power and working pressure. Structural properties were investigated by X-ray diffraction (XRD) and atomic force microscope (AFM). The ZnO thin films have sufficient crystallinity on the 100W RF power. But, the surface roughness of ZnO films was increased as increased RF power. As increased working pressure from 5 mTorr to 15 mTorr, a full width at half maximum (FWHM) of ZnO (002) peak was increased.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.247-247
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• 2011

플라즈마 분자선 에피택시(plasma-assisted molecular beam epitaxy)법을 이용하여 다공질 실리콘(porous silicon)에 ZnO 박막을 성장하였다. 성장 후, 아르곤 분위기에서 10분 간 다양한 온도(500~700$^{\circ}C$)로 열처리하였다. 다공질 실리콘 및 열처리 온도가 ZnO 박막의 특성에 미치는 영향을 scanning electron microscopy (SEM), X-ray diffraction (XRD), photoluminescence (PL)을 이용하여 분석하였다. 실리콘 기판에 성장된 ZnO 박막은 일반적은 섬구조(island structure)로 성장된 반면, 다공질 실리콘에 성장된 ZnO 박막은 산맥과 같은 구조(mountain range-like structure)로 성장되었다. 열처리 온도가 증가함에 따라 ZnO 박막의 grain size는 증가하였다. 실리콘 기판 위에 성장된 ZnO 박막은 wurtzite 구조를 나타내는 여러 개의 회절 피크가 관찰된 반면, 다공질 실리콘에 성장된 ZnO 박막은 c-축 배향성(c-axis preferred orientation)을 나타내는 ZnO (002) 회절 피크만이 나타났다. 다공질 실리콘에 성장된 ZnO 박막의 구조적 및 광학적 특성이 실리콘 기판에 성장된 ZnO 박막의 특성보다 우수하게 나타났다. 뿐만 아니라, 열처리 온도가 증가함에 따라 다공질 실리콘에 성장된 ZnO 박막의 PL 강도비(intensity ratio)가 실리콘 기판에 성장된 ZnO 박막의 강도비보다 월등하게 증가하였다.

• Proceedings of the KIEE Conference
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• 1996.07c
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• pp.1679-1681
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• 1996

ZnO varistor with composition of 89wt%-ZnO, 3.0wt%-$Bi_{2}O_{3}$, 3.6wt%-$Sb_{2}O_{3}$, 1.16wt%-CoO, 0.88wt%-NiO, 0.71wt%-$MnO_2$, 0.93wt%-$Cr_{2}O_{3}$, 0.013wt%-$Al_{2}O_{3}$ was fabricated by sintering methods. The effects of annealing on the J-E characteristics of ZnO varistors were investigated. These changes of electric properties were found to be caused by the variation of grains and grain boundary related to annealing. And the conductive mechanism and micostructure of ZnO varistor were researched using I-V meter, SEM and XRD.

• Journal of the Korean Magnetics Society
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• v.13 no.3
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• pp.109-114
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• 2003

The purpose of this study Is to investigate the effect of $V_2$O$_{5}$ addition on the microstructures and magnetic properties of 7.7${\times}$4.5${\times}$1.0 mm sized multi-layer chip inductors prepared by the screen printing method using 0∼0.5 wt％ $V_2O_{5}$-doped NiCuZn ferrite pastes. With increasing the $V_2O_{5}$ content, the exaggerated grain growth of ferrite layers was developed due to the promotion of Ag diffusion and Cu segregation into the grain boundaries oi ferrites, which affected significantly the magnetic properties of the chip inductors. After sintering at $900^{\circ}C$, the inductance at 10 MHZ of the 0.5 wt％ $V_2O_{5}$-doped chip inductor was 3.7 ${\mu}$H less than 4.2 ${\mu}$H of the 0.3 wt% $V_2O_{5}$-doped one, which was thought to be caused by the residual stress at the ferrite layers increased with the promotion of Ag diffusion and Cu segregation. The quality factor of the 0.5 wt% $V_2O_{5}$-doped chip inductor decreased with increasing the sintering temperature, which was considered to be caused by the electrical resistivity of the ferrite layer decreased with the promotion of Ag/cu segregation at the grain boundaries and the growth of the mean grain size of ferrite due to exaggerated grain growth of ferrite layers.

• Journal of the Korean Ceramic Society
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• v.17 no.3
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• pp.129-132
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• 1980

The effect of the additive on the dielectric property of TiO2 containing 0-2.5 wt. % ZnO was investigated as a function of frequency $5$\times$10^4$ to $6.3$\times$10^7$ cps and temperature from 25 to 375$^{\circ}C$. The dielectric constant decreased due to increasing density and grain size effect with increasing ZnO concentration.

• Korean Journal of Materials Research
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• v.13 no.6
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• pp.365-368
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• 2003

Small amounts of additives such as mol % 0.13 NiO and mol % 0.01 $CaCO_3$were added to Cu-Zn-Mg ferrites. Basic composition of the Cu-Zn-Mg ferrites was $Cu_{Cu}$X/$Fe_{0.054}$ /$Zn_{0.486}$$Mg_{0.407}$ $Fe_{1.946}$ $O_4$(group A) and $Cu_{0.263}$$Fe_{0.027}$ $Zn_{0.503}$ $Mg_{0.262}$ $Fe_{1.973}$ $O_4$(group B). Specimens were sintered at different temperatures (1010, 1030, $1050^{\circ}C$) for 2 hours in air followed by an air cooling. Then, effects of various composition and sintering temperatures on the microstructure and the magnetic properties such as inductions, coercive forces, and initial permeabilities of the Cu-Zn-Mg ferrites were investigated. The average grain size increased with the increase of sintering temperature. The magnetic properties obtained from the aforementioned Cu-Zn-Mg ferrite specimens were 1,724 gauss for the maximum induction, 1.0 oersted for the coercive force, and 802 for the initial permeability. These magnetic properties indicated that the specimens could be utilized as the core of IFT (intermediate frequency transformer) and antenna in the amplitude modulation.

• Journal of Sensor Science and Technology
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• v.16 no.4
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• pp.307-312
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• 2007

The films of Er-doped ZnO (ZnO:Er) were prepared onto MgO wafers by ultrasonic spray pyrolysis at $550^{\circ}C$. The concentration of Er in the deposition source varied from 0.5 wt% to 3.0 wt%. The crystallographic properties and surface morphologies of the films were investigated by X-ray diffraction (XRD) and scanning electron microscope (SEM), respectively. The properties of photoluminescence (PL) for the films were investigated by dependence of PL spectra on the Er concentration in the films. The films were grown as polycrystalline with a dominant direction of [002]. The grain size of the films were reduced by Er-doping. Er-doping enhanced the ultraviolet emission of ZnO:Er films. The ZnO:Er films prepared with the deposition source of 2.0 wt% Er showed the strongest ultraviolet light emission peak among the films in this study.

• Journal of the Korean Ceramic Society
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• v.35 no.1
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• pp.17-22
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• 1998

B-doped ZnO thin films on glass substrates were prepared by sputtering the ceramic targets which had been prepared by sintering disks consisting of ZnO and various amounts of B2O3 While pure ZnO films show-ed a c-axis oriented growth the B-doping retarded the prefered orientation and grain growth of the film. Electron concentrations for undoped and B-doped ZnO films were on the order of 7.8${\times}$1018 cm-3 and 5${\times}${{{{ {10 }^{20 } }} c{{{{ {m }^{-3 } }} respectively. The electron mobility however decreased with the B-doping concentration. Optical meas-urements on the films showed that the average transmittance in the visible range was higher than 85% The measurements also indicated a blueshift of the absorption edge with doping.