• 한국진공학회지
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• 제1권1호
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• pp.100-105
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• 1992

Au/V, Au/Ti의 이중구조 박막을 대기 중에서 $500^{\circ}C$에서 열처리한 후 Auger electron spectroscopy(AES)와 X-ray photoelectron spectroscepy(XPS)를 이용하여 분석 하였다. 열처리 과정에서 Au와 SiO2 기판 사이의 V-와 Ti- 하층박막은 Au 표면 위에 산화 물을 형성하였다. 산화물의 화학조성은 Au/V, Au/Ti 박막에서 V2O5와 TiO2로 각각 판명되었다.

• 센서학회지
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• 제5권1호
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• pp.51-56
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• 1996

Structural properties of rf sputtered boron nitride films were studied as a function of deposition parameters such as nitrogen pressure, substrate temperature and substrate bias using X-ray photoelectron spectroscopy and Auger electron spectroscopy. Composition and information on chemical bonding of resultant films was determined by XPS. XPS core level spectra showed that ratio of boron to nitrogen varied from 3.11 to 1.45 with respect to partial nitrogen pressure. Curve fitting of XPS spectra revealed three kinds of bonding mechanism of boron in the films. XPS peak positions of both B 1s and N 1s shifted to higher energy with higher nitrogen pressure as well as increase in substrate bias voltage. AES was used to see possible contamination of films by carbon or oxygen as well.

• 한국결정성장학회지
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• 제22권2호
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• pp.84-91
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• 2012

Single and few-layer graphene nanosheets (GNs) have successfully synthesized by a modified Hummer's method followed by chemical reduction of exfoliated graphene oxide (GO) in the presence of hydrazine monohydrate. GO and GNs were characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR), X-ray diffractions (XRD), Raman spectroscopy, Transmission electron microscopy (TEM), Atomic force microscopy (AFM), Optical microscopy (OM) and by electrical conductivity measurements. The result showed that electrical conductivity of GNs was significantly improved, from $4.2{\times}10^{-4}$ S/m for GO to 12 S/m for GNs, possibly due to the removal of oxygen-containing functional group during chemical reduction. In addition, the $NO_2$ gas sensing characteristics of GNs are also discussed.

• 한국전기전자재료학회논문지
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• 제15권5호
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• pp.455-459
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• 2002

I have investigated the effects of annealing on a polymeric $\alpha-C_3N_{4.2}$ at high pressure and temperature in the presence of seeds of crystalline carbon nitride films prepared by a high voltage discharge plasma. The samples were evaluated by x-ray photoelectron spectroscopy (XPS), infrared spectroscopy, Auger electron spectroscopy and x-ray diffraction(XRD). Notably, XPS studies of the film composition before and after annealing demonstrate that the nitrogen composition in $\alpha-C_3N_{4.2}$ material initially containing more than 58% nitrogen decreases during the annealing process and reaches a common, stable composition of ~43%. XPS analysis also shows that the nitrogen composition in the annealed films without polymeric $\alpha-C_3N_{4.2}$ was reduced from 35% to 17%. Furthermore the concentration of the sp$^3$bonded phase increased with the increment of the annealing temperature.

• 한국자기학회지
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• 제8권4호
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• pp.203-209
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• 1998

Single phase garmet Y3-xBixFe5O12(x=0.0, 0.25, 0.5, 0.75, 1.0)을 ethylene glycol을 용매로 하여 sol-gel 법으로 합성후 x-ray diffraction, Mossbauer 분광기, vibrating sample magnetometer (VSM)를 이용하여 결정학적 및 자기적 특성을 연구하였다. Y과 Fe의 수화 반응을 통하여 얻은 Y3Fe5O12의 x-ray 회절 분석 결과는 결정구조가 cubic임을 알 수 있었고 Y에 Bi를 치환한 경우 또한 cubic 구조이었으며 Bi의 치환 량이 증가할수록 격자 상수가 선형적으로 증가함을 알수 있었다. Bi를 첨가한 Y3-xBixFe5O12 (x=0.0, 0.25, 0.5, 0.75, 1.0)의 단일상의 garnet이 형성되기 시작하는 온도는 80$0^{\circ}C$이고 secound phase (BiFeO3)가 생성되기 시작하는 온도는 x=0.75는 100$0^{\circ}C$이며 x-1.0은 95$0^{\circ}C$였다. Mossbauer 분광 실험과 VSM측정 결과 Birk 치환 될수록 포화 자화 값과 coercivity값이 감소하는 경향을 보였으며 Curic 온도는 Bi의 치환 양이 증가할수록 약간 증가하는 경향을 보임을 알 수 있었다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2011년도 춘계학술대회 및 Fine pattern PCB 표면 처리 기술 워크샵
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• pp.171-171
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• 2011

Atmospheric pressure- plasma enhanced chemical vapor deposition(AP-PECVD)Processes are recognized as promising and cost effective methods for wide-area coating on sheets of steel, glass, polymeric web, etc. In this study, $SiO_xC_y$ thin films were deposited by using AP-PECVD with a dielectric barrier discharge(DBD). The characteristic of $SiO_xC_y$ thin films were investigated as afunction of the HMDSO/O2/He flow rate. And the moisture permeability of $SiO_xC_y$ thin films was studied. The $SiO_xC_y$ thin films were characterized by the Fourier-transformed Infrared(FT-IR) spectroscopy and also investigated by X-ray photo electron spectroscopy(XPS), Auger Electron Spectroscopy(AES). The moisture permeability of $SiO_xC_y$ thin films was investigated by $H_2O$ permeability tester Detailed experimental results will be demonstrated through th present work.

• Bulletin of the Korean Chemical Society
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• 제11권5호
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• pp.379-383
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• 1990

$YBa_2Cu_{3-x}Ni_xO_{7-{\delta}}$, with x = 0.05, 0.2, 0.4, 0.7 and 1.0 had been prepared by the thermal decomposition of corresponding nitrates. Among them, the sample with x = 0.05 shows above-liquid-$N_2$ temperature superconductivity with $T_c$ of 88.7K. According to the X-ray diffraction analysis, its crystal symmetry was estimated as orthorhombic with the lattice parameters of a = 3.866${\AA}$, b = 3.893${\AA}$, c = 11.715${\AA}$. The chemical composition of the sample was determined by electron probe microanalysis and the chemical composition around its grain boundaries was carefully studied by the X-ray line scanning technique. From the observed binding energy of Ni-$2p_{3/2}$ orbital electron (B.E. = 853 eV) measured by X-ray photoelectron spectroscopy, the valency state of nickel stabilized in $YBa_2Cu_{2.95}Ni_{0.05}O_{7-{\delta}}$ oxide lattice could be determined to be Ni(II).

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.222-222
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• 2011

Titanium dioxide (TiO2) has a number of applications in optics and electronics due to its superior properties, such as physical and chemical stability, high refractive index, good transmission in vis and NIR regions, and high dielectric constant. Atomic layer deposition (ALD), also called atomic layer epitaxy, can be regarded as a special modification of the chemical vapor deposition method. ALD is a pulsed method in which the reactant vapors are alternately supplied onto the substrate. During each pulse, the precursors chemisorb or react with the surface groups. When the process conditions are suitably chosen, the film growth proceeds by alternate saturative surface reactions and is thus self-limiting. This makes it possible to cover even complex shaped objects with a uniform film. It is also possible to control the film thickness accurately simply by controlling the number of pulsing cycles repeated. We have investigated the ALD of TiO2 at 100$^{\circ}C$ using precursors titanium tetra-isopropoxide (TTIP) and H2O on -O, -OH terminated Si surface by in situ X-ray photoemission spectroscopy. ALD reactions with TTIP were performed on the H2O-dosed Si substrate at 100$^{\circ}C$, where one cycle was completed. The number of ALD cycles was increased by repeated deposition of H2O and TTIP at 100$^{\circ}C$. After precursor exposure, the samples were transferred under vacuum from the reaction chamber to the UHV chamber at room temperature for in situ XPS analysis. The XPS instrument included a hemispherical analyzer (ALPHA 110) and a monochromatic X-ray source generated by exciting Al K${\alpha}$ radiation (h${\nu}$=1486.6 eV).

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.456-456
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• 2013

We report the modifications in the electronic structureof ZnO thin films induced by swift heavy ion (SHI) irradiated ZnO thin films by using near edge X-ray absorption fine structure (NEXAFS) spectroscopy at O K-edge was performed at BL10D XAS-KIST beamline at Pohang Accelerator Lab (PAL). ZnO films of 250 nm thickness oriented in [200] plane deposited by RF magnetron sputtering using equal $Ar:O_2$ atmosphere and air annealed at $500^{\circ}C$ for 6 hours for stability were irradiated with 120 MeV Au and 100 MeV O beams separately with different doses ranging from $1{\times}10^{11}$ to $5{\times}10^{12}$ ions/$cm^2$. High Resolution X-ray diffraction and NEXAFS analysis indicates significant changes in the electronic structure and the SHI effect is different for Ag and O-beams. The NEXAFS measurements provide direct evidence of O 2p and Zn 3d orbital hybridization. The NEXAFS results will be presented in detail.

• 한국진공학회지
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• 제18권4호
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• pp.281-287
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• 2009

본 연구에서는 고진공 조건에서 열기화 증착 방법으로 산화막으로 덮인 Mg 리본(MgO/Mg) 위에 Pd을 증착하였다. 고진공 속에서 만든 시료의 전자구조를 in-situ X-선 광전자 분광법 (XPS)을 통하여 분석하였고, 분석 후, FE-SEM을 통해 증착량의 증가에 따른 표면구조의 변화를 확인하였다. Pd 증착량이 1 나노미터 (nm) 이하인 경우에는 증착량 증가에 따른 Pd 나노입자 크기의 증가를 확인하였으며, Pd을 1 nm 이상의 두께로 증착시킨 경우에는 Pd 입자들의 뭉침에 의해 얇은 필름이 형성됨을 관찰하였다. Pd과 기판사이의 전하이동에 의하여 산화물/금속 계면의 Pd 원자들은 부분적으로 양전하를 띔을 확인하였다.