X-ray Photoelectron Spectroscopic Study of $Ge_{2}Sb_{2}Te_{5}$ and Its Etch Characteristics in Fluorine Based Plasmas
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- 한국표면공학회:학술대회논문집
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- 한국표면공학회 2009년도 춘계학술대회 논문집
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- pp.110-110
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- 2009