• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.316-316
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• 2014

Two different transparent conducting oxide (TCO) layers of Al-doped ZnO (AZO) and $WO_3$ were prepared by a rf sputtering process. Working pressure, deposition time, and target-to-substrate distance were varied for the sputtering process to improve electrical properties of the resulting layer. Thickness of the TCO layers was measured by a profile meter of ${\alpha}$-step. To evaluate the electrical conductivity, surface resistivity of the TCO layers was measured by a four-point probe technique. Decrease of the working pressure resulted in increase of deposition rate and decrease of surface resistivity of the resulting layer. Increase of the layer thickness due to increased deposition time resulted in decrease of surface resistivity of the resulting layer. The shorter the target-to-substrate distance was, the lower was the surface resistivity of the resulting layer.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1996년도 춘계학술대회 논문집
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• pp.295-298
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• 1996

In this study, we have fabricated all solid state electrochromic devices using WO$_3$ film as the working electrode, V$_2$O$\_$5/ film as the counter electrode and PEO-LiClO$_4$-PC film as the solid electrolyte. The WO$_3$ thin films for working electrode and V$_2$O$\_$5/ thin films for counter electrode were deposited onto ITO glass by vacuum evaporation and were shown good electrochromic and state properties after 1x10$\^$5/ cycles. PEO-LiClO$_4$-PC polymer electrolyte can easily be formed into thin films, do not absorb in the visible region of the light. Therefore, such electrolyte have electrochromic properties suitable for large-scale all solid-state electrochromic devices. All solid-staeelectrochromic devices fabricated in this polymer electrolyte have optical modulation of 20%∼30% at 1.5 V.

• 반도체디스플레이기술학회지
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• 제3권2호
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• pp.17-21
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• 2004

Aluminum nitride(AlN) thin films were deposited on silicon substrate by reactive RF magnetron sputtering without substrate heating. We investigated the dependence of some properties for AlN thin film on sputtering conditions such as working pressure, $N_2$ concentration and RF power. XRD, Ellipsometer and AES has been measured to find out structural properties and preferred orientation of AlN thin films. Deposition rate of AlN thin film was increased with an increase of RF power and decreased with an increase of $N_2$ concentration. AES in-depth measurements showed that stoichiometry of Aluminium and Nitrogen elements were not affected by $N_2$ concentration. It has shown that low working pressure, low $N_2$ concentration and high RF power should be maintained to deposit AlN thin film with a high degree of (0002) preferred orientation.

• 한국콘크리트학회:학술대회논문집
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• 한국콘크리트학회 1996년도 가을 학술발표회 논문집
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• pp.253-259
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• 1996

The purpose of this study is to investigate the fundamental properties of polyurethan concrete. Polyurethane must be expanded by means of a blowing agent during polymerization. Chemical blowing is caused by the reaction water with isocyanate. Binder system for polyurethane concrete is based on polyol and isocyanate with catalyst, surfactant, and methyl chloride. Polyurethane concretes are prepared with various grading of aggregate, and tested for compressive, flexural strengths, flow test, foaming multiple proportion, working life, condition of surface, distirbution of aggregate. From the test results, the foaming of polyurethane concretes are affceted by amount and grading of aggregate. Workability increases with raising amount of methy chloride and working life reduced according to amount of catalyst. The mix proportion of B with methyl chloride of 1% and catalyst of 0.1g for polyurethane concrete is recommended in consideration of strengths, condition of surface and balance between cost and performance.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2003년도 하계학술대회 논문집 C
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• pp.1430-1432
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• 2003

Al doped Zinc Oxide(ZnO:Al) films, which is widely used as a transparent conductor in optoelectronic devices such as solar cell, plasma display panel, thermal heater, and other sensors, were prepared by using the capacitively coupled DC magnetron sputtering method. The influence of the substrate temperature, working gas pressure and deposition time on the electrical, optical and morphological properties were investigated experimentally. ZnO:Al films with the optimum growth conditions of working gas pressure and substrate temperature showed resistivity of $9.64{\times}10^{-4}\;{\Omega}$-cm and transmittance of 90.02% for a film 860nm thick in the wavelength range of the visible spectrum.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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• pp.176-179
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• 2003

ITO films on PET substrate were prepared by DC magnetron sputtering method using powdery target with different deposition conditions. In addition, the electrical and optical properties were investigated. As the sputtering power and working pressure were higher, the resistvity of ITO films increased. The optical transmittance deteriorated with increasing sputtering power and thickness. As the working pressure increased, however, the optical transmittance improved at visible region of light. From these results, we could deposited ITO films with $8{\times}10^{-3}\;{\Omega}-cm$ of resistivity and 80% of transmittance at optimal conditions.

• 치위생과학회지
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• 제10권6호
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• pp.459-464
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• 2010

본 연구는 실리콘 고무인상재의 보관온도에 따른 작업 시간과 압축 시 변형율, 탄성회복율, 점조도에 관한 물리적 특성에 대해서 평가하였으며, 다음과 같은 결과를 얻었다. 1. 작업시간은 저온의 온도유지장치에서 보관한 인상재가 실온이나 고온에서 보관한 인 상재보다 유의하게 크게 나타났고(P<0.05), 실온과 고온에서 보관한 인상재는 유의차 가 없었다. 2. 압축변형율은 저온 온도유지장치에서 보관한 인상재가 실온이나 고온에서 보관한 인 상재보다 유의하게 컸으며(P<0.05), 실온과 고온에서 보관한 인상재는 유의차가 없 었다. 3. 탄성회복율은 인상재를 보관한 각 저장온도에 따라 유의한 차이가 있는 것으로 나타 났으며(P<0.05), 온도가 높아짐에 따라 증가하였다. 4. 점조도는 인상재를 보관한 각 저장온도에 따라 유의한 차이가 있는 것으로 나타났으 며(P<0.05), 온도가 높아짐에 따라 감소하였다.

• 한국정보통신학회논문지
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• 제17권8호
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• pp.1873-1878
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• 2013

본 연구에서는 RF magnetron sputtering 법으로 상온에서 공정압력 (1~7 mTorr) 을 변화시켜가며 유리기판(Eagle 2000) 위에 ITZO ($In_2O_3$ : $SnO_2$ : ZnO = 90wt.%: 5wt.%: 5wt.%) 박막을 제작하여, 구조적 특성과 광학적 및 전기적 특성을 조사하였다. XRD 와 FESEM 측정을 통해, 공정압력에 무관하게 모든 ITZO 박막이 부드러운 표면의 비정질 구조를 가지고 있음을 확인할 수 있었다. 공정압력 3mTorr 에서 증착한 ITZO 박막이 비저항 $3.08{\times}10^{-4}{\Omega}{\cdot}cm$, 가시광 영역에서 평균 투과도 81 % 와 재료평가지수 $10.52{\times}10^{-3}{\Omega}^{-1}$ 의 가장 우수한 전기적 및 광학적 특성을 나타내었다.

• 대한화학회지
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• 제44권3호
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• pp.237-242
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• 2000

새로운 품질의 수용성 윤활유를 얻기 위해 시중에서 쉽게 구입할 수 있는 지방산인 대두유와 고분자 알콜로부터 에스테르 화합물을 합성하고 그 물성을 실험하였다. 아울러 대두유에 의한 에스데르 화합물의 합성과 그 물성을 보다 정량적으로 분석하기 위해 대두유주된 구성 지방산인 올레익산에 대해 동일 실험을 수행하여 그 물성을 비교하였다. 에스테르 합성반응에 사용된 고분자 알콜은 프로필렌 옥사이드와 에틸렌 옥사이드의 공중합 화합물(PE)로서 분자량에 따라 PE-61(평균분자량:2000), PE-62(평균분자량:2500), 그리고 PE-64(평균분자량:3200) 세 가지 화합물을 사용하였다. 합성된 에스테르 화합물의 물성은 물과 혼합한 이후 수용액 상태의 여러 농도에서 pH,비중,표면장력,유동점도를 측정하여 비교하였다.

• 한국전기전자재료학회논문지
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• 제20권8호
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• pp.666-670
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• 2007

Aluminuim doped zinc oxide(ZnO:AL)Films have been prepared on Polyimide(PI) and Coming 7059 glass substrates by r.f. magnetron sputtering method. The structural of the ZnO:Al films were studied in accordance with various deposition R.F power and working pressure by XRD, SEM. And The electrical and optical properties of ZnO:Al films were characterized by Hall effect and UN visible spectrophotometer measurements, ZnO:Al films had were hexagonal wurtzite structure and dominant c-axis orientation. The R.f power and working pressure for optimum condition to fabricate the transparent conductive films using a PI substrate were 2 mTorr and 100W, respectively. The resistivity of the ZnO:Al films prepared under this condition were $9.6{\times}10^{-4}{\Omega}cm$. The optical transmittance of 400nm thick films at 550nm is ${\sim}85 %$.