통합 검색 | Korea Science

고국원;조수용;김민영
- 제어로봇시스템학회논문지
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- 제14권6호
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- pp.519-522
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- 2008
As industry of a semiconductor and LCD industry have been rapidly growing, precision technologies of machining such as etching and 3D measurement are required. Stylus has been important measuring method in traditional manufacturing process. However, its disadvantages are low measuring speed and damage possibility at contacting point. To overcome mentioned disadvantage, non-contacting measurement method is needed such as PMP(Phase Measuring Profilometry), WSI(white scanning interferometer) and Confocal Profilometry. Among above 3 well-known methods, WSI started to be applied to FPD(flat panel display) manufacturing process. Even though it overcomes 21t ambiguity of PMP method and can measure objects which has specular surface, the measuring speed and vibration coming from manufacturing machine are one of main issue to apply full automatic total inspection. In this study, We develop high speed WSI system and algorithm to reduce unknown noise. The developing WSI and algorithm are implemented to measure 3D surface of wafer. Experimental results revealed that the proposed system and algorithm are able to measure 3D surface profile of wafer with a good precision and high speed.
https://doi.org/10.5302/J.ICROS.2008.14.6.519 인용 PDF KSCI

김승우;진종한;강민구
- 한국정밀공학회:학술대회논문집
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- 한국정밀공학회 2002년도 춘계학술대회 논문집
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- pp.195-198
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- 2002
Demand for high precision measurement of large area is increasing in many industrial fields. White-light Scanning Interferometer(WSI) is a well-known method for 3D profile measurement. However WSI has some limitations in a measurement range because of the sensing mechanism. Therefore, in this paper we use a heterodyne laser interferometer to get over the limitations of a short measurement range in WSI, We suggest a new WSI system combined with heterodyne laser interferometer. This system is aimed at eliminating Abbe error with measuring the focus point directly. With the use of triggering functionality of WSI, we can use this system as a probe of a precision stage such as a probe of CMM. The suggested system gives a repeatability of 87 nm in the absolute distance measurement test under the laboratory environment.
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