• Corrosion Science and Technology
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• v.14 no.3
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• pp.127-131
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• 2015

Model alloys Fe-9Cr, Fe-20Cr and Fe-20Cr-20Ni (wt. %) with 0.1 and 0.2 % Si were exposed to $Ar-20CO_2-20H_2O$ gas at $818^{\circ}C$. The undoped alloys formed a thick iron-rich oxide scale. The additions of Si reduced scaling rates of Fe-9Cr to some extent but significantly suppressed the formation of iron oxide scales on Fe-20Cr and Fe-20Cr-20Ni. Carburisation also occurred in all undoped alloys, but not in Si-containing Fe-20Cr and Fe-20Cr-20Ni. Protection against carburisation was a result of the formation of an inner scale layer of silica.

• Journal of the Korean Ceramic Society
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• v.42 no.5 s.276
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• pp.333-337
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• 2005

In order to improve the performance of green emitting phosphors for plasma display panel, the $Zn_2SiO_4:Mn,Al$ phosphors were synthesized using sol-gel technique and studied using SEM and VUV photoluminescence spectrometer. pH values of the starting solutions (pH = 0.5$\~$2.34) were controled by HCl as the catalysis of hydrolysis and wet gels were dried at $80^{\circ}C$ and $120^{\circ}C$, respectively. We investigated the effects of pH and drying temperatures during sol-gel processes. The results indicated that the phosphor prepared at pH = 1 showed the maximum emission intensity in both drying conditions and the effect of pH of the starting solution on morphology were increased with particle size as HCl and phosphor dried at high temperature showed more spherical and smaller particles than at low.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.3
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• pp.185-191
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• 2017

Cadmium compounds with one dimension (1D) nanostructures have attracted attention for their excellent electrical and optical properties. In this study, vertically aligned CdTe-Si nanostructures with high density were synthesized by several simple chemical reactions. First, l D Te nanostructures were synthesized by silver assisted chemical Si wafer etching followed by a galvanic displacement reaction of the etched Si nanowires. Nanowire length was controlled from 1 to $25{\mu}m$ by adjusting etching time. The Si nanowire galvanic displacement reaction in $HTeO_2{^+}$ electrolyte created hybrid 1D Te-branched Si nanostructures. The sequential topochemical reaction resulted in $Ag_2Te-Si$ nanostructures, and the cation exchange reaction with the hybrid 1D Te-branched Si nanostructures resulted in CdTe-Si nanostructures. Wet chemical processes including metal assisted etching, galvanic displacement, topochemical and cation exchange reactions are proposed as simple routes to fabricate large scale, vertically aligned CdTe-Si hybrid nanostructures with high density.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.20 no.3
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• pp.234-239
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• 2007

This paper describes the TiW ohmic contact characteristics under the surface treatment of the polycrystalline 3C-SiC thin film grown on $SiO_2/Si(100)$ wafers by APCVD. The poly 3C-SiC surface was polished by using CMP(chemical mechanical polishing) process and then oxidized by wet-oxidation process, and finally removed SiC oxide layers. A TiW thin film as a metalization process was deposited on the surface treated poly 3C-SiC layer and was annealed through a RTA(rapid thermal annealing) process. TiW/poly 3C-SiC was investigated to get mechanical, physical, and electrical characteristics using SEM, XRD, XPS, AFM, optical microscope, I-V characteristic, and four-point probe, respectively. Contact resistivity of the surface treated 3C-SiC was measured as the lowest $1.2{\times}10^{-5}{\Omega}cm^2$ at $900^{\circ}C$ for 45 sec. Therefore, the surface treatments of poly 3C-SiC are necessary to get better contact resistance for extreme environment MEMS applications.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.420-420
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• 2011

결정질 태양전지에서 고효율 달성을 위한 LBC(Local Back Contact) 구조의 중요성이 강조되고 있다. LBC 구조에서 후면 passivation 형성을 위한 SiNX layer를 PECVD로 형성 시, 실리콘 bulk 내로 H+ 원자가 침투하여 Boron과 결합하게 되면 Boron이 bulk 내에서 dopant로 작용을 하지 못하게 되어, 후면에서 p-층을 형성하고, 이는 VOC의 저하를 야기 시킨다. 본 연구에서는 LBC 구조에서 후면 passivation 시 bluk 내 B-H결합으로 인한 태양전지 특성 저하 문제를 해결하기 위해, SiNX를 증착하기 전에 얇은 산화막 barrier를 성장시켜 Bulk 내에 H+ 침투를 최소화 하였다. PECVD를 이용한 N2O 플라즈마 처리, HNO3 Wet Chemical Oxidation의 방법을 통해 substrate와 SiNX 사이에 얇은 oxide 층을 형성하였으며, 각각의 조건에 대해 lifetime 측정을 실시하였다. 그 결과 SiON/SiNx를 이용한 막의 lifetime이 $94.5{\mu}s$로 가장 우수하였고, Reference에 비해 25.4% 증가함을 확인할 수 있었다. 그러나 HNO3/SiNx에서는 30.6%, SiON에서는 84.3% 감소함을 확인하였다. Voc 측정 결과 또한 SiON/SiNx를 이용한 막이 670mV로 가장 우수함을 확인할 수 있었다. 본 연구를 통해 LBC구조에서 후면에 얇게 SiON/SiNx막을 형성함으로서 H+이온의 침투를 저지하여 후면 B-H결합을 막아 태양전지 특성 저하를 감소시키는 것을 확인할 수 있었다.

• Korean Journal of Materials Research
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• v.14 no.2
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• pp.90-93
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• 2004

Silicon dioxide thin films were deposited on p-type Si (100) substrates by atomic layer deposition (ALD) method using alternating exposures of $SiH_2$$Cl_2$ and $O_3$ at $300^{\circ}C$. $O_3$ was generated by corona discharge inside the delivery line of $O_2$. The oxide film was deposited mainly from $O_3$ not from $O_2$, because the deposited film was not observed without corona discharge under the same process conditions. The growth rate of the deposited films increased linearly with increasing the exposures of $SiH_2$$Cl_2$ and $O_3$ simultaneously, and was saturated at approximately 0.35 nm/cycle with the reactant exposures over $3.6 ${\times}$ 10^{9}$ /L. At a fixed $SiH_2$$Cl_2$ exposure of $1.2 ${\times}$ 10^{9}$L, growth rate increased with $O_3$ exposure and was saturated at approximately 0.28 nm/cycle with $O_3$ exposures over$ 2.4 ${\times}$ 10^{9}$ L. The composition of the deposited film also varied with the exposure of $O_3$. The [O]/[Si] ratio gradually increased up to 2 with increasing the exposure of $O_3$. Finally, the characteristics of ALD films were compared with those of the silicon oxide films deposited by conventional chemical vapor deposition (CVD) methods. The silicon oxide film prepared by ALD at $300^{\circ}C$ showed better stoichiometry and wet etch rate than those of the silicon oxide films deposited by low-pressure CVD (LPCVD) and atmospheric-pressure CVD (APCVD) at the deposition temperatures ranging from 400 to $800^{\circ}C$.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.126-126
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• 2003

유기트랜지스터에 관한 연구는 1980년 이후부터 시작되었으나 근래에 들어 전 세계적으로 본격적인 연구가 진행되고 있다. 제작공정이 간단하고 비용이 저렴하며 충격에 의해 깨지지 않고 구부리거나 접을 수 있는 전자 회로 기판이 미래의 산업에 필수적인 요소가 될 것으로 예상되고 있으며 이러한 요구를 충족시킬 수 있는 유기트랜지스터의 개발은 아주 중요한 연구분야로 대두되고 있다. 본 연구에서는 표면처리에 따른 contact angle, I-V 특성곡선, 표면 morphology 등의 결과로부터 dry cleaning 한 것이 wet cleaning한 것보다 왜 좋은지를 논하고자 한다. 먼저 N-type SiO$_2$ 기판을 이용하여 back면의 oxide층을 제거한 후, back gate용으로 사용하기 위하여 sputtering장치로 Au/Cr을 증차하였다. 그리고 기판에 앞면을 photolithography 공정을 이용하여 Au/Cr를 1000$\AA$ 증착 하여 source-, drain-eldctrode를 제조하였다. 그리고 SiO$_2$ 기판의 표면처리를 달리하여 그 위에 유기박막을 증착하여 특성을 비교하였다.

• Transactions of the Korean Society of Mechanical Engineers
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• v.17 no.12
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• pp.3083-3093
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• 1993

Friction and wear at ceramic coated surfaces of aluminum alloy were experimentally studied using a Ring-on-Block wear test machine. Ceramic materials coated on aluminum alloy surfaces were WC, CrC, $Al_{2}O_{3}$ by a plasma spray; and $Al_{2}O_{3}$,$Al_{2}SiO_{5}$, $Na_{2}B_{4}O_{7}$,$Na_{4}P_{2}O_{7}$, and $Al_{2}O_{3}-ZrO_{2}$ composite coating by an Anodic Spark Depositon. They were tested under the sliding wet contact and compared with aluminum alloys and steels. Test results showed that ceramic coated surfaces, in general, have better anti-wear property than those of aluminum alloys due to increase in the surface hardness ; however, they also showed higher coefficients of friction and changes in wear mechanisms, resulting in brittle fractures.

• Journal of the Korean Recycled Construction Resources Institute
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• v.6 no.1
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• pp.111-119
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• 2011

Recently, urban redevelopment programs and expansion of social infrastructure have caused massive amounts of construction waste in construction fields, and the mounds of it keep increasing every year. The disposal of construction waste is emerging as a national and social issue and the recycled powder generated by the treatment process of waste concrete is all being abolished or buried. Therefore, the purpose of this study is to utilize waste sludge generated by the wet-type treatment process of waste concrete as materials(binder, filler) for cement composite. This study evaluates physical and mechanical properties of mortar using recycled powder according to heating temperature, contents and applications. As a result of the chemical analysis, recycled powder is composed mainly of CaO and $SiO_2$, and that it is even lower in the content of CaO than OPC. The charateristics of mortar using recycled powder, according to drying and heating temperature, shows that as the heating temperature increases, flow decreases. Also, compressive strength and porosity of mortar using recycled powder was superior when heating temperature was $600^{\circ}C$. Thus, it is revealed that an effective development of recycled powder is possible since the binder by cement composite recovers a hydraulic property during heating at $600^{\circ}C$.

• Air Cleaning Technology
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• v.17 no.4 s.67
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• pp.39-57
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• 2004

첨단산업으로 불리는 반도체, LCD, PDP, 유기EL(OLED) 등의 생산 공정은 고도의 청정상태를 요구하며, 때문에 이들의 생산공정 중 대부분이 클린룸 내에서 이루어진다. 클린룸 내에서의 주요공정은 크게 박막형성(Layering), 노광(Photo Lithography), 식각(Etching) 등 3가지 공정으로 나눌 수 있으며, 반도체 제조공정의 경우 특별히 도핑(Doping) 공정이 추가된다. 오염물질을 함유하는 클린룸 배기는 일반적으로 산, 알칼리, Toxic(PFCs, Flammable), VOC 등으로 분류하며, 각각의 배기는 각 배기특성에 맞는 오염제어 장치를 통해, 정화된 후, 대기로 방출된다. 산, 알칼리 배기는 일반적으로 최종 단계에서 중앙집중식 습식스크러버에 의해 흡수, 중화 처리되며, VOC의 경우 농축기(Concentrator) & 축열식 열 산화장치(RTO) 설비에 의해 연소 처리된다. 하지만 CVD공정으로부터의 배기가 주를 이루는 Toxic배기의 경우, 다량의 PFCs(과불소화합물) 가스를 함유하고 있는 이유로, 대부분 클린룸 내부에 P.O.U(Point of use) 처리장치가 설치되며, P.O.U에 의해 1차 처리된 후 최종적으로 중앙집중식 습식스크러버를 거쳐 대기로 방출된다. 알칼리배기의 주성분으로는 암모니아($NH_3$), HMDS (Hexa Methyl DiSilazane), TMAH (Tetra Methyl Ammonium Hydroxide), LGL, CD 등이며 흡수액에 황산(Sulfuric Acid)용액을 공급, 중화처리하고 있다. 탄소성분을 먹이로 하는 미생물의 번식에 의한 막힘 문제를 제외하고는 큰 문제가 없다. 하지만 Toxic배기 및 산배기의 경우 처리효율이, 가스흡수 이론에 의한 계산결과와 비교할 때, 매우 저조하게 나타나는 효율부족 현상을 겪고 있으며, 이는 잔여 PFCs 가스성분 및 반응에어로졸, 응축에어로졸 등의 영향으로 추정하고 있다. 최근 Toxic 배기의 경우, P.O.U 설비를 Burn & Wet type으로 변경하여, 배기 중 PFCs 및 반응에 에어로졸($SiO_2$)의 농도를 원천적으로 감소시키는 노력이 진행 중이다. 산배기의 경우, 산결로 현상에 의한, 응축에어로졸이 문제가 되고 있으나 내식열교환기(Anti-Corrosive Heat Exchanger), 하전액적스크러버 시스템(Charged Droplets Scrubber System), Wet ESP(Wet Electrostatic Procipitator) 등의 도입을 통해 문제해결을 위한 노력을 경주하고 있다.