• Proceedings of the Materials Research Society of Korea Conference
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• 2012.05a
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• pp.110.1-110.1
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• 2012

Recently, advances in ZnO based oxide semiconductor materials have accelerated the development of thin-film transistors (TFTs), which are the building blocks for active matrix flat-panel displays including liquid crystal displays (LCD) and organic light-emitting diodes (OLED). However, the electrical performances of oxide semiconductors are significantly affected by interactions with the ambient atmosphere. Jeong et al. reported that the channel of the IGZO-TFT is very sensitive to water vapor adsorption. Thus, water vapor passivation layers are necessary for long-term current stability in the operation of the oxide-based TFTs. In the present work, $Al_2O_3$ and $TiO_2$ thin films were deposited on poly ether sulfon (PES) and $SnO_x$-based TFTs by electron cyclotron resonance atomic layer deposition (ECR-ALD). And enhancing the WVTR (water vapor transmission rate) characteristics, barrier layer structure was modified to $Al_2O_3/TiO_2$ layered structure. For example, $Al_2O_3$, $TiO_2$ single layer, $Al_2O_3/TiO_2$ double layer and $Al_2O_3/TiO_2/Al_2O_3/TiO_2$ multilayer were studied for enhancement of water vapor barrier properties. After thin film water vapor barrier deposited on PES substrate and $SnO_x$-based TFT, thin film permeation characteristics were three orders of magnitude smaller than that without water vapor barrier layer of PES substrate, stability of $SnO_x$-based TFT devices were significantly improved. Therefore, the results indicate that $Al_2O_3/TiO_2$ water vapor barrier layers are highly proper for use as a passivation layer in $SnO_x$-based TFT devices.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.30 no.6 s.249
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• pp.546-552
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• 2006

In this paper we report fluid flow characteristics of $Al_2O_3$ nanoparicles suspended in water. Especially, the effects of volume fraction with the range of 0.01% to 0.3% and tube diameter with $310{\mu}m$ to 1.735mm on the pressure drop and the effective viscosity of $Al_2O_3$ nanoparicles suspended in water are experimentally investigated. It is shown that the effective viscosity of water-based $Al_2O_3$ nanofluids with 0.1 Vol.% through a circular tube of 1.024mm diameter is increased to about 6%. The effective viscosity from experimental results is compared with that from Einstein model. With the comparison, we show that Einstein model for determining the effective viscosity of nanofluids is not applicable to water-based $Al_2O_3$ nanofluids.

• Journal of Electrochemical Science and Technology
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• v.12 no.2
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• pp.230-236
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• 2021

Ionic conduction mechanism of Mg-Al layered double hydroxides (LDHs) intercalated with CO₃^2- (Mg-Al CO₃^2- LDH) was studied. The electromotive force for the water vapor concentration cell using Mg-Al CO₃^2- LDH as electrolyte showed water vapor partial pressure dependence and obeyed the Nernst equation, indicating that the hydroxide ion transport number of Mg-Al CO₃^2- LDH is almost unity. The ionic conductivity of Mg(OH)₂, MgCO₃ and Al₂(CO₃)₃ was also examined. Only Al₂(CO₃)₃ showed high hydroxide ion conductivity of the order of 10^-4 S cm^-1 under 80% relative humidity, suggesting that Al₂(CO₃)₃ is an ion conducting material and related to the generation of carrier by interaction with water. To discuss the ionic conduction mechanism, Mg-Al CO₃^2- LDH having deuterium water as interlayer water (Mg-Al CO₃^2- LDH(D₂O)) was prepared. After the adsorbed water molecules on the surface of Mg-Al CO₃^2- LDH(D₂O) were removed by drying, DC polarization test for dried Mg-Al CO₃^2- LDH(D₂O) was examined. The absorbance attributed to O-D-stretching band for Mg-Al CO₃^2- LDH(D₂O) powder at around the positively charged electrode is larger than that before polarization, indicating that the interlayer in Mg-Al CO₃^2- LDH is a hydroxide ion conduction channel.

• Journal of the Korean Ceramic Society
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• v.20 no.1
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• pp.25-30
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• 1983

This experiment was studied in the system of (1-x) CaO MgO $2SiO-Al_2O_3$ to investigate forming of solid solution. The technique empolyed was the well known water-quenching method. Differential thermal analysis of the each glass water quenched indicated that under 30 mole% $Al_2O_3$ was lowered with increasing of the amount of $Al_2O_3$ It was supposed by X-ray diffraction patterns of each specimen sintered at various temperature that only solid solution was formed under the 30mole % $Al_2O_3$ compositions solid solution and anorthite were formed at the 20mole% $Al_2O_3$ composition anorthite solid solution and spinel$(MgAl_2O_4)$ were formed over the 40mole% $Al_2O_3$ compositions. The maximum density and thermal expanison coefficient was 2.89g/cm 7.74x106./C$^{\circ}$ respectively in the composi-tion of 10 mole% $Al_2O_3$ . All the specimens showed linear thermal expansion behavior. Microhardness was as high as 850kg/nm2 in the composition of 5, 10, 20 mole % $Al_2O_3$ and dielectric constant was 7.3-6.9.

• Proceedings of the KSME Conference
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• 2007.05b
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• pp.2177-2181
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• 2007

In this paper, effective thermal conductivities of water-based $Al_2O_3$-nanofluids with low concentration from 0.01 vol. % to 0.3 vol. % are experimentally obtained by transient hot wire method (THWM). The water-based $Al_2O_3$-nanofluids are manufactured by two-step method which is widely used. To examine suspension and dispersion characteristics of the water-based $Al_2O_3$-nanofluids, Zeta potential as well as transmission electron micrograph (TEM) is observed. We confirm the manufactured $Al_2O_3$-nanofluids have good suspension and dispersion. The effective thermal conductivities of the water-based $Al_2O_3$-nanofluids with low concentration are enhanced up to 1.64% compared with that of DI water at $21^{\circ}C$. In addition, experimental results are compared with theoretical results from Jang and Choi model.

• Journal of the Semiconductor & Display Technology
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• v.16 no.1
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• pp.1-5
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• 2017

Encapsulation of organic based devices is essential issue due to easy deterioration of organic material by water vapor. Thin layer of encapsulation film is required to preserve transparency yet protecting materials in it. Atomic layer deposition(ALD) is a promising solution because of its low temperature deposition and quality of the deposited film. $Al_2O_3$ or $Al_2O_3/TiO_2/Al_2O_3$ multilayer film has shown excellent environmental protection characteristics despite of thin thicknesses of the films. $Al_2O_3/TiO_2/Al_2O_3$ multilayer and 1.5 dyad layer of $Al_2O_3/polymer/Al_2O_3$ deposited by ALD was measured to have water vapor transmittance rate(WVTR) well below the detection limit($5.0{\times}10^{-5}g/m^2day$) of MOCON Aquatran 2 equipment.

• Bulletin of the Korean Chemical Society
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• v.21 no.12
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• pp.1233-1238
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• 2000

$Mo/{\gamma}-Al_2O_3catalysts$ modified with Fe, Co, and Ni were prepared by impregnation method and catalytic activity for water gas shift reaction was examined. The optimum amount of Mo loaded for the reaction was 10 wt% $MoO_3$ to ${\gamma}-Al_2O_3.$ The catalytic activity of $MoO_3/{\gamma}-Al_2O_3was$ increased by modifying with Fe, Co, and Ni in the order of Co${\thickapprox}$ Ni > Fe. The optimum amounts of Co and Ni added were 3 wt% based on CoO and NiO to 10 wt% $MoO_3/{\gamma}-Al_2O_3$, restectively. The TPR (temperature-programmed reduction) analysis revealed that the addition of Co and Ni enganced the reducibility of the catalysts. The results of both catalytic activity and TPR experiments strongly suggest that the redox property of the catalyst is an important factor in water gas shift reaction on the sulfided Mo catalysts, which could be an evidence of oxy-sulfide redox mechanism.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.31 no.1 s.256
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• pp.16-20
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• 2007

In this paper, convective heat transfer and flow characteristics of $Al_2O_3$ nanoparticles suspended in water flowing through uniformly heated tubes are experimentally investigated under laminar flow regime. The heat transfer coefficient and the pressure drop of nanoparticles suspended in water are experimentally presented according to the pumping power. In addition, the heat transfer coefficient and the pressure drop of $Al_2O_3$ nanoparticles suspended in water are compared with those of pure water under the fixed pumping power. It is shown that the heat transfer coefficient of $Al_2O_3$ nanofluids with 0.1% volume fraction is enhanced by about 12% although the increment of the pressure drop of those is 4% compared with those of pure water.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.420-423
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• 2008

The characteristics of $Al_2O_3/Ag/Al_2O_3$ multilayer passivaton prepared by twin target sputtering (TTS) system for organic light emitting diodes. The $Al_2O_3/Ag/Al_2O_3$ multilayer thin film passivation on a PET substrate had a high transmittance of 86.44 % and low water vapor transmission rate (WVTR) of $0.011\;g/m^2$-day due to the surface plasmon resonance (SPR) effect of Ag interlayer and effective multilayer structure for preventing the intrusion of water vapor. Using synchrotron x-ray scattering and field emission scanning electron microscope (FESEM) examinations, we investigated the growth behavior of Ag layer on the $Al_2O_3$ layer to explain the SPR effect of the Ag layer. This indicates that an $Al_2O_3/Ag/Al_2O_3$ multilayer passivation is a promising thin film passivation scheme for organic based flexible optoelectronics.

• Journal of the Semiconductor & Display Technology
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• v.21 no.2
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• pp.11-14
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• 2022

In this work, we evaluated the Al₂O₃ film, which was deposited by atomic layer deposition, degraded by exposure to harsh environments. The Al₂O₃ films deposited by atomic layer deposition have long been used as a gas diffusion barrier that satisfies barrier requirements for device reliability. To investigate the barrier and mechanical performance of the Al₂O₃ film with increasing temperature and relative humidity, the properties of the degraded Al₂O₃ film exposed to the harsh environment were evaluated using electrical calcium test and tensile test. As a result, the water vapor transmission rate of Al₂O₃ films stored in harsh environments has fallen to a level that is difficult to utilize as a barrier film. Through water vapor transmission rate measurements, it can be seen that the water vapor transmission rate changes can be significant, and the environment-induced degradation is fatal to the Al₂O₃ thin films. In addition, the surface roughness and porosity of the degraded Al₂O₃ are significantly increased as the environment becomes severer. the degradation of elongation is caused by the stress concentration at valleys of rough surface and pores generated by the harsh environment. Becaused the harsh envronment-induced degradation convert amorphous Al₂O₃ to crystalline structure, these encapsulation properties of the Al₂O₃ film was easily degraded.