• Title/Summary/Keyword: Vertical Channel

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Electrical Characteristics of Enhancement-Mode n-Channel Vertical GaN MOSFETs and the Effects of Sidewall Slope

  • Kim, Sung Yoon;Seo, Jae Hwa;Yoon, Young Jun;Kim, Jin Su;Cho, Seongjae;Lee, Jung-Hee;Kang, In Man
    • Journal of Electrical Engineering and Technology
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    • v.10 no.3
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    • pp.1131-1137
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    • 2015
  • Gallium nitride (GaN) is a promising material for next-generation high-power applications due to its wide bandgap, high breakdown field, high electron mobility, and good thermal conductivity. From a structure point of view, the vertical device is more suitable to high-power applications than planar devices because of its area effectiveness. However, it is challenging to obtain a completely upright vertical structure due to inevitable sidewall slope in anisotropic etching of GaN. In this letter, we design and analyze the enhancement-mode n-channel vertical GaN MOSFET with variation of sidewall gate angle by two-dimensional (2D) technology computer-aided design (TCAD) simulations. As the sidewall slope gets closer to right angle, the device performances are improved since a gradual slope provides a leakage current path through the bulk region.

Device Design of Vertical Nanowire MOSFET to Reduce Short Channel Effect (단채널 현상을 줄이기 위한 수직형 나노와이어 MOSFET 소자설계)

  • Kim, Hui-jin;Choi, Eun-ji;Shin, Kang-hyun;Park, Jong-tae
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2015.10a
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    • pp.879-882
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    • 2015
  • In this work, we have analyzed the characteristics of vertical nanowire GAA MOSFET according to channel width and the type of channel doping through the simulation. First, we compared and analyzed the characteristics of designed structures which have tilted shapes that ends of drains are fixed as 20nm and ends of sources are 30nm, 50nm, 80nm and 110nm. Second, we designed the rectangular structure which has uniform width of drain, channel and source as 50nm. We used it as a standard and designed trapezoidal structure which is tilted so that the end of drain became 20nm and reverse trapezoidal structure which is tilted so that the end of source became 20nm. We compared and analyzed the characteristic of above three structures. For the last, we used the rectangular structure, divided its channel as five parts and changed the type of the five parts of doping concentration variously. In the first simulation, when the channel width is the shortest, in the second, when the structure is trapezoid, in the third, when the center of channel is high doped show the best characteristics.

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Weighted error diffusion in PDP (PDP에서 가중치 오차확산 보정)

  • Jung, Han-Yung;Lee, Dong-Ho
    • Proceedings of the KIEE Conference
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    • 2005.05a
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    • pp.179-181
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    • 2005
  • There is asymmetric in horizontal and vertical side of PDP cell. Every vertical line has BM(Black Mask) to improve luminance contrast. When error diffusion is processed in PDP system, these problems make an error bigger. In 4 inch PDP system, every red, green, blue color of test pattern is presented and each luminance is measured. That is called horizontal(H), diagonal right(R), diagonal left(L) and vertical(V). In red channel, high luminance descending order is V-H-R-L. In green channel, V-H-L-R. In blue channel, V-M-R=L. After average luminance of each direction is calculated. new weighted error diffusion(Weighted ED) is proposed. In digital image signal processing, the error in weighted ED is differ from ED's. The image of weighted ED is more less error compare to conventional ED and close to original image. As the gray level linearity and big size panel is adopted, weighted ED could produce good image.

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High Quality Vertical Silicon Channel by Laser-Induced Epitaxial Growth for Nanoscale Memory Integration

  • Son, Yong-Hoon;Baik, Seung Jae;Kang, Myounggon;Hwang, Kihyun;Yoon, Euijoon
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.14 no.2
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    • pp.169-174
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    • 2014
  • As a versatile processing method for nanoscale memory integration, laser-induced epitaxial growth is proposed for the fabrication of vertical Si channel (VSC) transistor. The fabricated VSC transistor with 80 nm gate length and 130 nm pillar diameter exhibited field effect mobility of $300cm^2/Vs$, which guarantees "device quality". In addition, we have shown that this VSC transistor provides memory operations with a memory window of 700 mV, and moreover, the memory window further increases by employing charge trap dielectrics in our VSC transistor. Our proposed processing method and device structure would provide a promising route for the further scaling of state-of-the-art memory technology.

Development of Heat Transfer and Evaporation Correlations for the Turbulent Natural Convection in the Vertical Channel by Using Numerical Analysis

  • Kang, Han-Ok;Lee, Un-Chul
    • Nuclear Engineering and Technology
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    • v.28 no.6
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    • pp.532-541
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    • 1996
  • Theoretical and numerical study on heat transfer and evaporation in the vertical channel has been carried out and basic correlations have been derived for the heat transfer evaluation of PCCS. Analysis program was developed with low-Reynolds-number k-$\varepsilon$ model and surface transfer rates were calculated for the turbulent natural convection in the vertical channel. In relation to dry cooling by buoyancy-driven air, first, the system parameters which govern overall heat transfer rate are determined through the adequate nondimensionalization procedure. After comparison with existing experimental data, numerical results are used to derive heat transfer correlation by sensitivity calculations. In relation to wet cooling by falling water film, numerical analysis are carried out for evaporation process with real film surface conditions and evaporation correlation is derived through analogy concept and correction factors.

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Maxwell nanofluid flow through a heated vertical channel with peristalsis and magnetic field

  • Gharsseldien, Z.M.;Awaad, A.S.
    • Advances in nano research
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    • v.13 no.1
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    • pp.77-86
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    • 2022
  • This paper studied the peristaltic transport of upper convected Maxwell nanofluid through a porous medium in a heated (isothermal) symmetric vertical channel. The nanofluid is assumed to be electrically conducting in the presence of a uniform magnetic field. These phenomena are modeled mathematically by a differential equations system by taking low Reynolds number and long-wavelength approximation, the yield differential equations have solved analytically. A suggested new technique to display and discuss the trapping phenomenon is presented. We discussed and analyzed the pumping characteristics, heat function, flow velocity and trapping phenomena which were illustrated graphically through a set of figures for various values of parameters of the problem. The numerical results show that, there are remarkable effects on the vertical velocity, pressure gradient and trapping phenomena with the thermal change of the walls.

Atomic Layer Deposition-incorporated Catalyst Deposition for the Vertical Integration of Carbon Nanotubes

  • Jung, Sung-Hwan
    • Journal of Electrical Engineering and Technology
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    • v.6 no.5
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    • pp.688-692
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    • 2011
  • Carbon nanotubes (CNTs) are vertically grown inside high-aspect-ratio vertical pores of anodized aluminum oxide. A CNT catalyst layer is introduced by atomic layer deposition to the bottom of the pores, after which the CNTs are successfully grown from the layer using chemical vapor deposition. The CNTs formed a complete vertical conductive path. The conductivity of the CNT-vertical path is also measured and discussed. The present atomic layer deposition-incorporated catalyst deposition is predicted to enable the integration of CNTs with various challenging configurations, including high-aspect-ratio vertical channels or vertical interconnects.

Flow Resistance of Vertical Rib Sidewall in Open Channel (개수로 측벽 세로돌출줄눈의 흐름저항)

  • Park, Sang Deog;Ji, Min Gyu;Nam, A Reum;Woo, Tae Young;Shin, Seung Sook
    • Journal of Korea Water Resources Association
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    • v.46 no.9
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    • pp.947-956
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    • 2013
  • Most of flood protection walls built on the impingement in mountain rivers have been made of concrete. It may cause flood disasters because the smooth wall surface could increase flow velocity. In this study the hydraulic experiments was carried out to evaluate the effect of one side wall with rectangular vertical ribs on flow resistance in open channel. The ratio of the pitch between vertical ribs to its depth, ${\lambda}_{nv}$, was designed so that it include the so-called d type and k type roughness. The range of Froude number, $F_r$, based on hydraulic radius is 0.81~1.12. Flow resistance in the open channel with a rib sidewall depends on the interval length of each ribs and the flow discharge. Maximum flow resistance occurred when ${\lambda}_{nv}$ is 9. In the d type roughness which ${\lambda}_{nv}$ is less than 3, the flow resistance decreases with increase of flow discharge. In the k type roughness which ${\lambda}_{nv}$ is greater than 3, the flow resistance increases with increase of flow discharge. The increments of flow resistance are especially great when ${\lambda}_{nv}$ are 9 and 12. The resistance due to vertical rib is mostly by the shape resistance and the vertical rib on one sidewall of open channel affects on the flow resistance so that the equivalent roughness heights of vertical rib may occur in scale of flow depth. Therefore the vertical ribs may be used to reduce the flow velocity and to move the location of maximum flow velocity from the rib sidewall to the centerward in a cross section of channels.

An Experimental study on heat transfer of a falling liquid film in air channel flow (채널내 공기유동이 있는 유하액막의 열전달특성에 관한 실험적 연구)

  • Oh, Dong-Eun;Kang, Byung-Ha;Kim, Suk-Hyun
    • Proceedings of the KSME Conference
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    • 2007.05b
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    • pp.2291-2296
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    • 2007
  • Thermal transport from vertical heated surface to falling liquid film in a channel has been investigated experimentally. Air-flow is introduced into channel to make a counter flow against falling liquid film. This problem is of particular interest in the design of direct contact heat exchange system, such as cooling tower, evaporative cooling system, absorption cooling system, and distillation system. The effects of channel width and air flow rate on the heat transfer to falling liquid film are studied in detail. The results obtained indicate that heat transfer rate is gradually decreased with an increase in the channel width without air flow as well as with air flow in a channel. It is also found that heat transfer rate of air-flow is increased while heat transfer rate of falling liquid film is decreased with an increase in the air flow rate at a given channel width. However, total heat transfer rate form the heated surface is increased as the air flow rate is increased.

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An Experimental Study on Heat Transfer of a Falling Liquid Film in Air Channel Flow (채널내 공기유동이 있는 유하액막의 열전달특성에 관한 실험적 연구)

  • Oh, Dong-Eun;Kang, Byung-Ha;Kim, Suk-Hyun;Lee, Dae-Young
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.32 no.5
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    • pp.335-341
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    • 2008
  • Thermal transport from vertical heated surface to falling liquid film in a channel has been investigated experimentally. Air-flow is introduced into channel to make a counter flow against falling liquid film. This problem is of particular interest in the design of direct contact heat exchange system, such as cooling tower, evaporative cooling system, absorption cooling system, and distillation system. The effects of channel width and air flow rate on the heat transfer to falling liquid film are studied in detail. The results obtained indicate that heat transfer rate is gradually decreased with an increase in the channel width without air flow as well as with air flow in a channel. It is also found that heat transfer rate of air-flow is increased while heat transfer rate of falling liquid film is decreased with an increase in the air flow rate at a given channel width. However, total heat transfer rate from the heated surface is increased as the air flow rate is increased.