• 제목/요약/키워드: Vacuum leakage

검색결과 235건 처리시간 0.028초

In-situ spectroscopic studies of SOFC cathode materials

  • 주종훈
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2012년도 춘계학술발표대회
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    • pp.70.1-70.1
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    • 2012
  • In-situ X-ray photoelectron spectroscopy (XPS) and infrared (IR) spectroscopy studies of SOFC cathode materials will be discussed in this presentation. The mixed conducting perovskites (ABO3) containing rare and alkaline earth metals on the A-site and a transition metal on the B-site are commonly used as cathodes for solid oxide fuel cells (SOFC). However, the details of the oxygen reduction reaction are still not clearly understood. The information about the type of adsorbed oxygen species and their concentration is important for a mechanistic understanding of the oxygen incorporation into these cathode materials. XPS has been widely used for the analysis of adsorbed species and surface structure. However, the conventional XPS experiments have the severe drawback to operate at room temperature and with the sample under ultrahigh vacuum (UHV) conditions, which is far from the relevant conditions of SOFC operation. The disadvantages of conventional XPS can be overcome to a large extent with a "high pressure" XPS setup installed at the BESSY II synchrotron. It allows sample depth profiling over 2 nm without sputtering by variation of the excitation energy, and most importantly measurements under a residual gas pressure in the mbar range. It is also well known that the catalytic activity for the oxygen reduction is very sensitive to their electrical conductivity and oxygen nonstoichiometry. Although the electrical conductivity of perovskite oxides has been intensively studied as a function of temperature or oxygen partial pressure (Po2), in-situ measurements of the conductivity of these materials in contact with the electrolyte as a SOFC configuration have little been reported. In order to measure the in-plane conductivity of an electrode film on the electrolyte, a substrate with high resistance is required for excluding the leakage current of the substrate. It is also hardly possible to measure the conductivity of cracked thin film by electrical methods. In this study, we report the electrical conductivity of perovskite $La_{0.6}Sr_{0.4}CoO_{3-{\delta}}$ (LSC) thin films on yttria-stabilized zirconia (YSZ) electrolyte quantitatively obtained by in-situ IR spectroscopy. This method enables a reliable measurement of the electronic conductivity of the electrodes as part of the SOFC configuration regardless of leakage current to the substrate and cracks in the film.

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순티타늄판의 Nd:YAG 레이저 용접성에 관한 연구(III) - 에지 용접 특성 - (A Study of Weldability for Pure Titanium by Nd:YAG Laser(III) - Weld Properties of Edge Welding -)

  • 김종도;길병래;곽명섭;송무근
    • Journal of Welding and Joining
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    • 제27권6호
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    • pp.74-79
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    • 2009
  • Titanium and titanium alloy can be reproduced immediately even if oxide films($TiO_2$) break apart in sea water. Therefore, since titanium demonstrates large specific strength and outstanding resistance to stress corrosion cracking, crevice corrosion, pitting and microbiologically influenced corrosion in sea water environment, it has been widely applied to heat exchanger for ships. In particular, with excellent elongation, pure titanium may be deemed as optimal material for production of heat exchanger plate which is used with wrinkles formed for efficient heat exchange. Conventional plate type heat exchanger prevented leakage of liquid through insertion of gasket between plates and mechanical tightening by bolts and nuts, but in high temperature and high pressure environment, gasket deterioration and leakage occur, so heat exchanger for LPG re-liquefaction device etc do not use gasket but weld heat exchanger plate for use. On the other hand, since welded plate cannot be separated, it is important to obtain high quality reliable welds. In addition, for better workability and production performance, lasers that can obtain weldment with large aspect ratio and demonstrate fast welding speed even in atmospheric condition not in vacuum condition are used in producing products. So far, 1st report and 2nd report compared and analyzed embrittlement degrees by bead colors of weldment through quantitative analysis of oxygen and nitrogen and measurement of hardness as fundamental experiment for the evaluation of titanium laser welding, and evaluated the welding performance and mechanical properties of butt welding. This study welded specimens in various conditions by using laser and GTA welding machine to apply edge welding to heat exchanger, and evaluated the mechanical strength through tensile stress test. As a result of tensile test, laser weldment demonstrated tensile strength 4 times higher than GTA welds, and porosity could be controlled by increasing and decreasing slope of laser power at overlap area.

Endoscopic Intervention for Anastomotic Leakage After Gastrectomy

  • Ji Yoon Kim;Hyunsoo Chung
    • Journal of Gastric Cancer
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    • 제24권1호
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    • pp.108-121
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    • 2024
  • Anastomotic leaks and fistulas are significant complications of gastric surgery that potentially lead to increased postoperative morbidity and mortality. Surgical intervention is reserved for cases with severe symptoms or hemodynamic instability; however, surgery carries a higher risk of complications. With advancements in endoscopic treatment options, endoscopic approaches have emerged as the primary choice for managing these complications. Endoscopic clipping is a traditional method comprising 2 main categories: through-the-scope clips and over-the-scope clips. Through-the-scope clips are user friendly and adaptable to various clinical scenarios, whereas over-the-scope clips can close larger defects. Another promising approach is endoscopic stent insertion, which has shown a high success rate for leak closure, although vigilant monitoring is required to monitor stent migration. Infection control is essential in post-surgical leakage cases, and endoscopic internal drainage provides a relatively safe and noninvasive means to manage fluids, contributing to infection control and wound healing promotion. Endoscopic suturing offers full-thickness wound closure, but requires additional training and endoscopic versatility. As a promising tool, endoscopic vacuum therapy potentially surpasses stent therapy by draining inflammatory materials and closing defects. Furthermore, the use of tissue sealants, such as fibrin glue and cyanoacrylate, has been reported to be effective in selected situations. The choice of endoscopic device should be tailored to individual cases and specific patient conditions, with careful consideration of the nature of the defect. Further extensive studies involving larger patient populations are required to provide more robust evidence on the efficacy of endoscopic approach in managing post-gastric anastomotic leaks.

KSTAR 전류전송계통 진공배기계 구축 및 시운전 (Construction and Tests of the Vacuum Pumping System for KSTAR Current Feeder System)

  • 우인식;송낙형;이영주;곽상우;방은남;이근수;김정수;장용복;박현택;홍재식;박영민;김양수;최창호
    • 한국진공학회지
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    • 제16권6호
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    • pp.483-488
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    • 2007
  • KSTAR (Korea Superconducting Tokamak Advanced Research) 전류전송계 (Current Feeder System)는 4.5 K의 저온에서 운전되는 초전도자석과 300 K의 실온에서 운전되는 전원장치 (Magnet Power Supply)를 전기적으로 연결하는 장치이다. 전류전송계는 최대 35 kA의 DC 전류가 인가되는 TF 자석용 및 350초간 20$\sim$26 ㎄의펄스 전류가 인가되는 PF 자석용으로 분리되어 있으며 리드박스 내부는 전류인입선, 초전도버스라인, 열차폐체 및 냉각라인 등이 설치되어 있다. 리드박스와 초전도버스라인 진공덕트는 KSTAR 주장치와는 별도로 진공배기 시스템이 구축되어있으며, 전체적으로 아령 형상을 하고 있는 진공공간을 효율적으로 진공배기하기 위하여 버스라인 덕트와 주장치 저온용기 사이에 진공 분리막 (Vacuum Separator)이 설치되어 있다. 진공배기를 위한 초벌배기계는 로터리펌프 및 부스터펌프 (Mechanical Booster Pump)로 구축되었으며 고진공 배기계는 4대의 크라이오펌프 (Cryo-pump)로 구축되었다. 진공장치 운전을 위해 PLC 기반의 로컬 제어시스템을 구축하였고 장치 안전을 위한 자체 인터록과 중앙인터록 시스템 및 중앙제어연계시스템이 함께 구축되어 있다. 전류전송계 설치완료 후 진공배기 시운전을 통해 배기시스템의 자가진단 및 리드박스 내부에 설치되어 있는 헬륨배관의 진공누설검사를 완료하였으며, 액체질소를 사용하여 전류인입선 냉각시험을 완료하였다.

삼극형 CNT 전자원에 대한 신뢰성 평가 (The Reliability Evaluation about the Triode-Type CNT Emission Source)

  • 강준태;김대준;정진우;김동일;김지선;이형락;송윤호
    • 한국진공학회지
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    • 제18권2호
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    • pp.79-84
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    • 2009
  • 삼극형(triode type) 전자 방출원을 프린팅된 CNT(Carbon Nanotube) 에미터를 이용하여 제작하였다. 후면노광(Back Exposure)방법으로 CNT 에미터의 높이를 균일하게 하고, 나노 Ag를 첨가하여 CNT와 전극 사이의 접착력 및 전기전도성을 높임으로써 고전압, 고전류 구동 시 신뢰성을 확보하였다. 게이트 높이가 에미터 길이에 비해 비교적 높은 매크로 게이트 구조를 사용하여 누설 전류가 적고 안정적인 구동이 가능하였다. 제작된 삼극형 전자 방출원은 DC 전압이 인가된 상태에서 일정시간동안 전계방출 전류를 측정하여 신뢰성을 평가하였다. 가열 배기 에이징(Aging) 과정을 거친 경우 약 12 시간동안 안정적인 전계방출 특성을 보였다. 이 때 게이트 누설전류는 약 10 % 미만이었다.

결정질 실리콘 태양전지에 적용하기 위한 후면전극 형성에 관한 연구 (An Analysis on rear contact for crystalline silicon solar cell)

  • 권혁용;이재두;김민정;이수홍
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.91.1-91.1
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    • 2010
  • There are some methods for increasing efficiency of crystalline silicon solar cells. Among them, It is important to reduce the recombination loss of surface for high efficiency. In order to reduce recombination loss is a way to use the BSF(Back Surface Field). The BSF on the back of the p-type wafer forms a p+layer. so, it is prevented to act electrons of the p-area for the rear recombination. As a result, the leakage current is reduced and the rear-contact has a good Ohmic contact. therefore, open-circuit-voltage and Fill factor(FF) of solar cells are increased. This paper investigates the formation of rear contact process comparing Aluminum-paste(Al-paste) with Aluminum-Metal(99.9%). It is shown that the Aluminum-Metal provides high conductivity and low contact resistance of $21.35m{\Omega}cm$ using the Vacuum evaporation process but, it is difficult to apply the standard industrial process because high Vacuum is needed and it costs a tremendous amount more than Al-paste. On the other hand, using the Al-paste process by screen printing is simple for formation of metal contact and it is possible to produce the standard industrial process. however, it is lower than Aluminum-Metal(99.9) of conductivity because of including mass glass frit. In this study, contact resistances were measured by 4-point prove. each of contact resistances is $21.35m{\Omega}cm$ of Aluminum-Metal and $0.69m{\Omega}cm$ of Al-paste. and then rear contact have been analyzed by Scanning Electron Microscopy(SEM).

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Effects of transition layer in SiO2/SiC by the plasma-assisted oxidation

  • 김대경;강유선;강항규;백민;오승훈;조상완;조만호
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.193.2-193.2
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    • 2016
  • We evaluate the change in defects in the oxidized SiO2 grown on 4H-SiC (0001) by plasma assisted oxidation, by comparing with that of conventional thermal oxide. In order to investigate the changes in the electronic structure and electrical characteristics of the interfacial reaction between the thin SiO2 and SiC, x-ray photoelectron spectroscopy (XPS), X-ray absorption spectroscopy (XAS), DFT calculation and electrical measurements were carried out. We observed that the direct plasma oxide grown at the room temperature and rapid processing time (300 s) has enhanced electrical characteristics (frequency dispersion, hysteresis and interface trap density) than conventional thermal oxide and suppressed interfacial defect state. The decrease in defect state in conduction band edge and stress-induced leakage current (SILC) clearly indicate that plasma oxidation process improves SiO2 quality due to the reduced transition layer and energetically most stable interfacial state between SiO2/SiC controlled by the interstitial C.

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Remote O2 plasma functionalization for integration of uniform high-k dielectrics on large area synthesized few-layer MoSe2

  • Jeong, Jaehun;Choi, Yoon Ho;Park, Dambi;Cho, Leo;Lim, Dong-Hyeok;An, Youngseo;Yi, Sum-Gyun;Kim, Hyoungsub;Yoo, Kyung-Hwa;Cho, Mann?Ho
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.281.1-281.1
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    • 2016
  • Transition metal dichalcogenides (TMDCs) are promising layered structure materials for next-generation nano electronic devices. Many investigation on the FET device using TMDCs channel material have been performed with some integrated approach. To use TMDCs for channel material of top-gate thin film transistor(TFT), the study on high-k dielectrics on TMDCs is necessary. However, uniform growth of atomic-layer-deposited high-k dielectric film on TMDCs is difficult, owing to the lack of dangling bonds and functional groups on TMDC's basal plane. We demonstrate the effect of remote oxygen plasma pretreatment of large area synthesized few-layer MoSe2 on the growth behavior of Al2O3, which were formed by atomic layer deposition (ALD) using tri-methylaluminum (TMA) metal precursors with water oxidant. We investigated uniformity of Al2O3 by Atomic force microscopy (AFM) and Scanning electron microscopy (SEM). Raman features of MoSe2 with remote plasma pretreatment time were obtained to confirm physical plasma damage. In addition, X-ray photoelectron spectroscopy (XPS) was measured to investigate the reaction between MoSe2 and oxygen atom after the remote O2 plasma pretreatment. Finally, we have uniform Al2O3 thin film on the MoSe2 by remote O2 plasma pretreatment before ALD. This study can provide interfacial engineering process to decrease the leakage current and to improve mobility of top-gate TFT much higher.

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Characteristics of HfO2-Al2O3 Gate insulator films for thin Film Transistors by Pulsed Laser Deposition

  • Hwang, Jae Won;Song, Sang Woo;Jo, Mansik;Han, Kwang-hee;Kim, Dong woo;Moon, Byung Moo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.304.2-304.2
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    • 2016
  • Hafnium oxide-aluminum oxide (HfO2-Al2O3) dielectric films have been fabricated by Pulsed Laser Deposition (PLD), and their properties are studied in comparison with HfO2 films. As a gate dielectric of the TFT, in spite of its high dielectric constant, HfO2 has a small energy band gap and microcrystalline structure with rough surface characteristics. When fabricated by the device, it has the drawback of generating a high leakage current. In this study, the HfAlO films was obtained by Pulsed Laser Deposition with HfO2-Al2O3 target(chemical composition of (HfO2)86wt%(Al2O3)14wt%). The characteristics of the thin Film have been investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and spectroscopic ellipsometer (SE) analyses. The X-ray diffraction studies confirmed that the HfAlO has amorphous structure. The RMS value can be compared to the surface roughness via AFM analysis, it showed HfAlO thin Film has more lower properties than HfO2. The energy band gap (Eg) deduced by spectroscopic ellipsometer was increased. HfAlO films was expected to improved the interface quality between channel and gate insulator. Apply to an oxide thin Film Transistors, HfAlO may help improve the properties of device.

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Effect of Ni dopant on the multiferroicity of BiFeO3 ceramic

  • Hwang, J.S.;Yoo, Y.J.;Kang, J.H.;Lee, K.H.;Lee, B.W.;Park, S.Y.;Lee, Y.P.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.139.1-139.1
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    • 2016
  • Multiferroic materials are of great interest because of its potential applications in the design of devices combining magnetic, electronic and optical functionalities. Among various multiferroic materials, $BiFeO_3$(BFO) is known to be one of the intensively focused mainly due to the possibility of multiferroism at device working temperature (> $200^{\circ}C$). However, leakage current and weak polarization resulting from oxygen deficiency and crystalline defect should be resolved. Furthermore the magnetic ordering of pure BFO mainly prefers to have antiferromagnetic coupling. Up to now many attempts have been performed to improve the ferromagnetic and the ferroelectric properties of BFO by doping. In this work, we investigated the effects of Ni substitution on the multiferroism of bulk BFO. Four BFO samples (a pure BFO and three Ni-doped BFO's; $BiFe_{0.99}Ni_{0.01}O_3$, $BiFe_{0.98}Ni_{0.02}O_3$ and $BiFe_{0.97}Ni_{0.03}O_3$) were synthesized by the standard solid-state reaction and rapid sintering technique. The XRD results reveal that Ni atoms are substituted into Fe-sites and give rise to phase transition of cubic to rhombohedal. By using vibrating sample magnetometer and standard ferroelectric tester, the multiferroic properties at room temperature were characterized. We found that the magnetic moment of Ni-doped BFO turned out to be maximized for 3% of Ni dopant.

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