• 제목/요약/키워드: Uniformity ratios

검색결과 60건 처리시간 0.022초

A Study on Correlations for Void Ratio, Coefficient of Uniformity and Coefficient of Curvature for Determination of Relative Density for Sands

  • Im, Soyeong;Jin, Yongguo;Chun, Byungsik
    • 한국지반환경공학회 논문집
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    • 제14권3호
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    • pp.13-17
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    • 2013
  • Determination of geotechnical characteristics of soil is either to use the field samples to measure the characteristics of soil through laboratory test or measuring the characteristics directly in the field. Field test can be derived similar value by considering characteristics of site and laboratory test can be confirmed the characteristic of soil by testing with field samples. This article describes relative density as the measure of compaction for cohesionless soils and presents several simple and mathematical relationships to help engineers estimate needed parameters for relative density calculations. The main purpose of this research is to investigate possible correlations between coefficient of uniformity, coefficient of curvature, maximum and minimum void ratio, mean grain size. Results show a linear relationship between the minimum and maximum void ratios and a power function relationship between coefficient of uniformity and the limiting void ratios. Void ratio range, which is the difference between the maximum and minimum void ratios, appeared to be log normally distributed but showed no simple mathematical fit to the data. these results were shown to help engineers estimate needed parameters for relative density calculations.

500 PS SCR 반응기의 유동균일도 향상을 위한 형상 및 가이드베인 설계에 대한 수치해석적 연구 (Study on Numerical Analysis of Shape and Guidevane Design for Improving a 500 PS SCR Reactor's Flow Uniformity)

  • 성홍석;이충호;서정세
    • 설비공학논문집
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    • 제28권1호
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    • pp.35-41
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    • 2016
  • With the assumption that the performance of a catalyst is guaranteed and that the performance of an SCR reactor is influenced by the uniformity of fluid flow into the catalyst, this study carried out a numerical analysis of flow uniformity, which is an important design factor in SCR reactors. CFD was used to grasp flow uniformity and flow characteristics inside the SCR reactor. As for the flow uniformity, analysis was carried out on the velocity and direction of the fluid flowing into the front of the first SCR reactor. Numerical analysis was carried out in terms of the area ratios of the mixing evaporator to the catalyst for 500 PS SCR, 1 : 1.9, 1 : 3.1, 1 : 4.5, and 1 : 7.0. The results showed that the larger the area ratio, the smaller the flow uniformity. On the basis of these results, the flow uniformity of the modified SCR reactor is 77%. A guidevane was installed to improve flow uniformity, and attempts were made to grasp the flow uniformity based on the shape of the guide vane. The shape of the guide vane was cylindrical, and numerical analysis was carried out for cases with two cylinders and three cylinders. As a result of the numerical analysis, it was found that while there was no great difference between 82.7% with two cylinders and 81.7% with three cylinders, the effects of the installation of the guide vane on the improvement of flow uniformity were indisputable.

주약의 혼합비율이 정제의 함량균일성에 미치는 영향 (Effect of Mixing Ratios of Active Ingredient on Content Uniformity of Tablets)

  • 김길수
    • 약학회지
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    • 제31권5호
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    • pp.343-346
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    • 1987
  • The effect of mixing ratios of active ingredient on the content uniformity of tablets was studied using caffeine as active ingredient and hydroxypropyl starch as diluent. In the case that caffeine content was not more than 1%, the standard deviation of individual tablet assays was inversely proportional to caffeine content. In the case of more than 1%, the standard deviation was constant independently of caffeine content. In the case that the designed tablet weight was not more than 200mg, the standard deviation of individual tablet assays was inversley proportional to tablet weight designed. In the case of more than 200mg, it was constant and the results for weight variation against the designed weight showed same tendency.

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경도 기준편의 경도 균일성 향상을 위한 열처리 (Heat Treatment for Improvement of Hardness Uniformity of Standard Hardness Blocks)

  • 한준희;황농문;김종집;문한규
    • 열처리공학회지
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    • 제2권2호
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    • pp.33-37
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    • 1989
  • In order to improve hardness uniformity of standard-hardness blocks. experimental procedure was designed using Taguchi Method. For this purpose the following factors were studied: austenitizing temperature, tempering condition, grinding condition, subzero treatment, lapping time, $15{\mu}m$ polishing time, final polishing time. These factors were processed and then ten hardness values were measured on each specimen. SN (signal to noise) ratio for each condition was calculated with standard variations of these values. Finally, from the calculated value of ANOVA on SN ratios, the lapping time was found to be the main factor Better uniformity with longer lapping time implies that residual stress that was formed after quenching is a dominent parameter that affects on the uniformity of hardness. Therefore, step-quenching method was adapted to minimize the residual stress. By this modification of quenching procedure, the hardness uniformity was improved remarkably and the yield ratio was increased from 55% to 88%.

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대면적 플라즈마 소스에서의 ITO 식각균일도 향상 (Improvement of ITO etching uniformity in a large area plasma source)

  • 김진우;조수범;김봉주;박세근;오범환;이종근
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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    • pp.145-148
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    • 2001
  • A large area plasma source using parallel $2{\times}2$ ICP antennas showed improved etching uniformity by the E-ICP operation. ITO etching process with $CH_4$ gas chemistry is optimized with the DOE (Design of Experiment) based on Taguchi method. Various methane ratios in methane and argon mixture are compared to confirm the effect of polymerization. The analysis shows that the effect of bias power is the largeset. We obtained higher ITO etching rate and better uniformity on $350{\times}300mm$ substrate at the 50Hz magnetization frequency of the E-ICP operation technique,

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대면적 플라즈마 소스에서의 ITO 식각균일도 향상 (Improvement of 170 etching uniformity in a large area plasma source)

  • 김진우;조수범;김봉주;박세근;오범환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.145-148
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    • 2001
  • A large area plasma source using parallel 2x2 ICP antennas showed improved etching uniformity by the E-ICP operation. ITO etching process with CH$_4$ gas chemistry is optimized with the DOE(Design of Experiment) based on Taguchi method. Various methane ratios in methane and argon mixture are compared to confirm the effect of polymerization. The analysis shows that the effect of bias power is the largeset. We obtained higher ITO etching rate and better uniformity on 350x300mm substrate at the 50Hz magnetization frequency of the E-ICP operation technique.

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교실에서의 일반형과 루버형 차양장치의 채광성능 비교 분석 (Comparative Daylighting Performance of a Classroom with Traditional and Louver type Shading Devices)

  • 김윤정;김정태
    • KIEAE Journal
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    • 제13권4호
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    • pp.21-26
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    • 2013
  • Shading devices have become an integral part of the daylighting strategy for sustainable classroom design. The louver type is newly designed shading devices which provide more view to the outside and protect from outside condition such as snow or rain. The purpose of this study is to compare the daylight performance of traditional and louver type overhang and lightshelf. The room dimension was $7.5m{\times}9.0m{\times}3.0m$. The length of shading devices was calculated by Palmero's study. The length of the traditional and louver type overhang was 455mm, 1210mm and lightshelf was 350/810mm, 625/555mm respectively. For the study, the Radiance 2.0 was used to evaluate the illuminance and uniformity ratios. And scale model were used to evaluate sunpatch area on the floor in model was calculated. The results showed that the louver type lightshelf was suitable for spring and summer, and louver type overhang was suitable for winter.

주기적인 홀로그램을 이용한 레이저 광 세기 균일화기에서 균일도를 최적화하기 위한 홀로그램의 조건 (The Conditions of a Holographic Homogenizer to Optimize the Intensity Uniformity)

  • 고춘수;오용호;임성우
    • 한국전기전자재료학회논문지
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    • 제24권7호
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    • pp.578-583
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    • 2011
  • We report on the design of a holographic homogenizer composed of a periodic hologram and a condensing lens. If the hologram is periodic, the homogenizer is free from the alignment error of the incident laser beam. Holographic homogenizer also has an advantage of the flexibility in the size of the target beam. We calculated theoretically the Fraunhofer diffracted wave function when a rectangular laser beam is incident on a periodic hologram. The diffracted wave is the sum of sinc functions at regular distance. The width of each sinc function depends on the size of the incident laser beam and the distance between the sinc functions depends on the period of the hologram. We calculated numerically the diffracted light intensity for various ratios of the size of the incident laser beam to the period of the hologram. The results show that it is possible to make the diffracted beam uniform at a certain value of the ratio. The uniformity is high at the central part of the target area and low near the edge. The more sinc functions are included in the target area, the larger portion of the area becomes uniform and the higher is the uniformity at the central part. Therefore, we can make efficient homogenizer if we design a hologram so that the maximum number of the diffracted beams may be included in the target area.

RFI ionized magnetron sputtering에서 radial uniformity 문제 (Radial uniformity problem in RFI ionized magnetron sputtering)

  • 주정훈
    • 한국진공학회지
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    • 제6권1호
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    • pp.85-90
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    • 1997
  • 32cm직경의 $AlCu_x$(x=0.5%)음극 타겟과 회전 자석을 이용한 상용 마그네트론 스퍼 터링 장치에서 부가적인 플라즈마 여기 방법으로 스퍼터링된 입자들을 이온화시킨후, 수십 볼트의 직류 기판 바이어스로 이온의 방향성과 에너지를 조절하여 작은 트렌치나 via를 채 울 수 있는 공정을 개발하였다. 여기에서, 반경방향의 이온 플럭스비의 균일도 문제를 개선 하기 위하여, 입자들의 가시광선 영역의 방출선을 이용한 플라즈마 진단과, 패터닝된 웨이 퍼에 대한 직접 채우기로 플라즈마 내의 입자 분포와의 상관 관계를 찾고, RF 코일 설계의 개선을 도모하였다. 가시광 방출 분광에서 $Ar^{\circ},\;Ar^+;Al^+,\;Al^{\circ}$ 입자들의 방출선 세기는 1$\mu\textrm{m}$이 하의 크기를 갖는 트렌치와 via의 바닥과 top 두께비와 밀접한 관련이 있었다. RF코일의 직 경을 29cm에서 32cm로 증가 시키고, RF 입력부에 의한 비대칭을 개선하여 이온 플럭스비 의 척도가 되는 via 채우기의 바닥과 top의 두께비에서 7.5%에서 1.5%로의 균일도 향상을 얻었다.

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두 개의 셔터 구멍이 적용된 원심식 비료 살포기의 살포패턴 분석 (Spray Pattern Analysis for a Centrifugal Fertilizer Distributor with Two Shutter Holes)

  • 황석준;박정현;이주연;김기덕;신범수;남주석
    • 한국기계가공학회지
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    • 제18권10호
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    • pp.8-19
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    • 2019
  • In this study, the spray pattern of a centrifugal fertilizer distributor with two shutter holes was analyzed and an effective driving width that satisfies proper spray uniformity was derived. The centrifugal fertilizer distributor was mounted on a tractor with a rated power of 23.7 kW and static and dynamic spray pattern tests were performed according to the standard procedure proposed by the American Society of Agricultural and Biological Engineers Standard ASAE S341.5. The height of the fertilizer distributor was 80 cm from the ground and the PTO (power take-off) shaft speed of the tractor was fixed at 540 rpm. The fertilizer scattered in space was collected using 275 evenly spaced collectors at shutter opening ratios of 25%, 50%, 75%, and 100%. The spray pattern was analyzed via the amount of sprayed fertilizer at each collector location and the coefficient of variation was used as an indicator of spray uniformity. Using the analyzed spray pattern, the effective driving width that satisfied less than 15% of the coefficient of variation was derived for different tractor driving patterns (race track mode, back and forth mode). From the results, spray uniformity increased as the shutter opening ratio decreased. The largest effective driving width was 8 m at a shutter opening ratio of 25% for both driving patterns.