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The Conditions of a Holographic Homogenizer to Optimize the Intensity Uniformity

주기적인 홀로그램을 이용한 레이저 광 세기 균일화기에서 균일도를 최적화하기 위한 홀로그램의 조건

  • Go, Chun-Soo (Division of Semiconductor and Microelectronics Technology, Wonkwang University) ;
  • Oh, Yong-Ho (Division of Semiconductor and Microelectronics Technology, Wonkwang University) ;
  • Lim, Sung-Woo (Division of Semiconductor and Microelectronics Technology, Wonkwang University)
  • 고춘수 (원광대학교 반도체.디스플레이학부) ;
  • 오용호 (원광대학교 반도체.디스플레이학부) ;
  • 임성우 (원광대학교 반도체.디스플레이학부)
  • Received : 2011.04.14
  • Accepted : 2011.06.17
  • Published : 2011.07.01

Abstract

We report on the design of a holographic homogenizer composed of a periodic hologram and a condensing lens. If the hologram is periodic, the homogenizer is free from the alignment error of the incident laser beam. Holographic homogenizer also has an advantage of the flexibility in the size of the target beam. We calculated theoretically the Fraunhofer diffracted wave function when a rectangular laser beam is incident on a periodic hologram. The diffracted wave is the sum of sinc functions at regular distance. The width of each sinc function depends on the size of the incident laser beam and the distance between the sinc functions depends on the period of the hologram. We calculated numerically the diffracted light intensity for various ratios of the size of the incident laser beam to the period of the hologram. The results show that it is possible to make the diffracted beam uniform at a certain value of the ratio. The uniformity is high at the central part of the target area and low near the edge. The more sinc functions are included in the target area, the larger portion of the area becomes uniform and the higher is the uniformity at the central part. Therefore, we can make efficient homogenizer if we design a hologram so that the maximum number of the diffracted beams may be included in the target area.

Keywords

References

  1. E. K. W. Gan, H. Y. Zheng, and G. C. Lim, Proc. 2000 IEEE Electronics Packaging Technology Conference (IEEE, Singapore, 2000) p. 321.
  2. S. Corvett, J. Strole, K. Johnston, E. J. Swenson, and Weixiong, IEEE Trans. Electron. Packag. Manuf., 28, 312 (2005). https://doi.org/10.1109/TEPM.2005.857662
  3. C. P. Chang and Y. S. Wu, Electron. Lett., 44, 1157 (2008). https://doi.org/10.1049/el:20081620
  4. S. H. Cho, I. K. Lee, Y. H. Kim, D. K. Moon, and J. I. Han, J. Korean Vac. Soc. 13, 29 (2004).
  5. M. Scaggs, N. Rizvi, A. Goater, G. Owen, and G. Haas, Proc. ICALEO 2008 Laser Material Processing Conference (Laser Institute of America, Temecula, California, 2008) p. 575.
  6. C. Kopp, L. Ravel, and P. Meyrueis, J. Opt. A. Pure Appl. Opt., 1, 398 (1999). https://doi.org/10.1088/1464-4258/1/3/310
  7. T. Hirai, K. Fuse, K. Kurisu, and K. Ebata, SEI Technical Review, 60, 17 (2005).
  8. J. W. Goodman, Introduction to Fourier Optics, 3rd ed. (Roberts & Company, Englewood, 2005) p. 105.
  9. J. D. Gaskil, Linear Systems, Fourier Transforms, and Optics (John Wiley & Sons, New York, 1978) p. 279.
  10. Y. Ho. Oh and C. S. Go, Korean J. Opt. Photon,. 16, 334 (2005). https://doi.org/10.3807/KJOP.2005.16.4.334