• 제목/요약/키워드: Uniformity of temperature

검색결과 669건 처리시간 0.033초

소형 화기용 TEC-less 열상 처리 기법 (TEC-less Thermal Image Processing Method for Small Arms)

  • 곽동민;윤주홍;양동원;이용헌;서용석
    • 한국군사과학기술학회지
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    • 제22권2호
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    • pp.162-169
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    • 2019
  • This paper describes a thermal image processing algorithm for uncooled type TEC-less IR detector which is applicable to fire control system of small arms. We implemented a real-time gain and offset compensation algorithm based on polynomial approximation from the raw dataset which is acquired by two reference temperature of blackbody from various FPA(Focal Plane Array) temperature. Through the experiment, we analyzed the output characteristics of detector's raw-data and compared IR image quality to traditional non-uniformity correction method. It shows that the proposed method works well in all FPA temperature range with low residual non-uniformity.

TFT LCD 제조용 대면적 Magnetron Sputtering 장치 설계와 Al 성장막 특성 조사 (Design of a Large Magnetron Sputtering System for TFT LCD and Investigation of Sputtered AI Film Properties)

  • 유운종
    • 한국진공학회지
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    • 제2권4호
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    • pp.480-485
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    • 1993
  • Factros considered building the magnetron sputtering system for TFT LCD (thin film transistor liquid crystal display0 metallization were thin film thichnes uniformity, temperature uniformity and the pressure gradient of sputtering gas flow in vacuum chamber, base pressure, and the stability fo the carrier moving . The system was consisted of a deposition chamber, a pre-heating chamber, a RF-precleaning chamber and a load/unload lock chamber. The system was designed to handle a substrate with dimension of 400$\times$400mm. The temperautre uniformity of a heater table developed showed $250 ^{\circ}C\pm$5% accuracyon the substrate glass. A base pressure of 1.8 $\times$10-7 torr was obtained after 24 hours pumping with a cryo pump. After an aluminum target was installed in a sputtering source and the film wa sdeposited on the glass, the uniformity, reflectivity and sheet resistance of the deposited film were measured.

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초임계 CO2 접촉량이 염색 균염성에 미치는 영향에 대한 연구 (The Influence of the Contact Amount of Supercritical CO2 on Dyeing Uniformity)

  • 박신;최현석;김태영;송태현
    • 한국염색가공학회지
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    • 제31권1호
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    • pp.25-32
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    • 2019
  • The influence of the contact amount of carbon dioxide per unit mass of dyestuff(${\alpha}$) on dyeing uniformity in supercritical fluid dyeing is analyzed in this study. The experiments using a 5L class Pilot Scale dyeing machine is carried out for this study purpose. For a fixed temperature and pressure, the amount of sample and the dyeing leveling time were considered as process variables. The results show that the increase in the amount of the sample causes a higher color difference than the reference sample, and it also increases the amount of residual dye. On the other hand, the color difference tended to decrease with the increase in dyeing time. Based on these results, the correlation between ${\alpha}$ value and dyeing uniformity in supercritical fluid dyeing is obtained.

PECVD로 증착된 $SiO_2$의 non-uniformity 특성 연구 (The study on the $SiO_2$ film non-uniformity by Plasma Enhanced Chemical Vapor Deposition)

  • 함용현;권광호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.73-73
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    • 2008
  • In this work, the study on the $SiO_2$ film non-uniformity by PECVD (Plasma Enhanced Chemical Vapor Deposition) was performed. Plasma diagnostics was analyzed by a DLP(Double Langmuir Probe) and a probe-type QMS(Quadrupole Mass Spectrometer) in order to investigate the spatial distribution of the plasma species in the chamber. The relationship between the plasma species and the depositing rate of the films was examined. On the basis of this work, it was confirmed that O radical density mainly contributed to the increase in the depositing rate of the $SiO_2$ films and the electron temperature in the plasma had a main effect on the formation of the oxygen radicals.

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LSI급 소자 제작을 위한 3인치 GaAs MBE 에피택셜 기판의 균일도 특성 연구 (A Study on Characteristics of Si doped 3 inch GaAs Epitaxial Layer Grown by MBE for LSI Application)

  • 이재진;이해권;맹성재;김보우;박형무;박신종
    • 전자공학회논문지A
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    • 제31A권7호
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    • pp.76-84
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    • 1994
  • The characteristics of 3 inch wafer scale GaAs epitaxial wafer grown by molecular beam epitaxy for LSI process application were studied. The thickness and doping uniformity are characterized and discussed. The growth temperature and growth rate were $600^{\circ}C$ by pyrometer, and 1 $\mu$m/h, respectively. It was found that thickness and doping uniformity were 3.97% and 4.74% respectively across the full 3 inch diameter GaAs epitaxial layer. Also, ungated MESFETs have been fabricated and saturation current measurement showed 4.5% uniformity on 3 inch, epitaxial layer, but uniformity of threshold voltage increase up to 9.2% after recess process for MESFET device.

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아파트의 전면발코니 개조여부에 따른 겨울철 실내환경 측정비교 (Indoor Environmental Condition by Existing Front Balcony in Apartment House during Winter)

  • 최윤정
    • 한국실내디자인학회:학술대회논문집
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    • 한국실내디자인학회 2005년도 춘계학술발표대회 논문집
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    • pp.267-270
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    • 2005
  • The purpose of this study was to make clear the indoor environmental efficiency of front balcony 'in apartment houses during winter. The field measurements of indoor environmental elements were carried out at an ordinary house with an existing front balcony and a house renovated the front balcony into the living room. The measurements in two-subject houses were taken on simultaneously the 20$^{th}$ ${\sim}$ 21$^{th}$ of January 2003. As results, the averages indoor temperature in the ordinary house and the renovated house were same as 23.6${\circ}$C, and the averages globe temperature in two houses were same as 23.7${\circ}$C. But, estimated heating time of the renovated house was longer than that of the ordinary house. The daily ranges of indoor temperature and globe temperature in the renovated house were wider than the ordinary house. The daily ranges of indoor temperature and globe temperature in the renovated house was longer than that of the ordinary house. The uniformity ratio range of daylight in the ordinary house were calculated at 1/3.4${\sim}$1/6.2, but those of the renovated house were 1/6${\sim}$1/16.2. Therefore. it was found that indoor temperature, globe temperature and uniformity ratio of daylight in the ordinary house maintained more constant than the renovated house by green house effect and earning effect of front balcony.

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웨이퍼 프로버 척의 저온 온도균일도 향상에 관한 연구 (A Study of Improvement of Low Temperature Uniformity of Wafer Prober Chuck)

  • 주영철;신휘철;강명구
    • 한국산학기술학회논문지
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    • 제10권10호
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    • pp.2572-2576
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    • 2009
  • 반도체 양산공정에 사용되는 웨이퍼 프로버의 척은 고온이건 저온이건 항상 일정한 온도균일도가 요구된다. 저온으로 운전 시에 온도분포를 써모커플을 이용하여 측정한 결과 온도균일도를 향상할 필요가 있음을 발견하였다. FLUENT를 이용한 전산해석을 하여 온도분포를 해석하였으며, 이 결과를 이용하여 냉각수 회로 배치의 변경과 국부적인 회로 폭의 확대 등 개선안을 제시하였다. 제시된 개선안과 현재 척의 온도분포를 비교한 결과 온도균일도가 향상되었음을 확인하였다.

Mixer design for improving the injection uniformity of the reduction agent in SCR system

  • Hwang, Woohyeon;Lee, Kyungok
    • 한국컴퓨터정보학회논문지
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    • 제22권1호
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    • pp.63-69
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    • 2017
  • In this paper, we propose a method to optimize the geometry and installation position of the mixer in the selective catalytic reduction (SCR) system by computational fluid dynamic(CFD). Using the commercial CFD software of CFD-ACE+, the flow dynamics of the flue gas was numerically analyzed for improving the injection uniformity of the reduction agent. Numerical analysis of the mixed gas heat flow into the upstream side of the primary SCR catalyst layer was performed when the denitrification facility was operated. The characteristics such as the flow rate, temperature, pressure loss and ammonia concentration of the mixed gas consisting of the flue gas and the ammonia reducing gas were examined at the upstream of the catalyst layer of SCR. The temperature difference on the surface of the catalyst layer is very small compared to the flow rate of the exhaust gas, and the temperature difference caused by the reducing gas hardly occurs because the flow rate of the reducing gas is very small. When the mixed gas is introduced into the SCR reactor, there is a slight tendency toward one wall. When the gas passes through the catalyst layer having a large pressure loss, the flow angle of the exhaust gas changes because the direction of the exhaust gas changes toward a smaller flow. Based on the uniformity of the flow rate of the mixed gas calculated at the SCR, it is judged that the position of the test port reflected in the design is proper.

매니폴드 크기에 따른 1 kWe급 내부 매니폴드형 고체산화물 연료전지 스택 유량 분배에 관한 수치 해석 (Numerical Analysis on the Flow Distribution in a 1 kWe SOFC Stack of Internal Manifolds According to the Variation of Manifold Sizes)

  • 김영진;윤호원;김현진;윤경식;유지행
    • 한국수소및신에너지학회논문집
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    • 제33권1호
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    • pp.47-54
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    • 2022
  • In this study, we performed numerical analysis for 1 kWe SOFC stack of internal manifold types according to the different manifold sizes to verify the influence of the flow uniformity into each cell. To simulate the flow phenomena in the stack, the continuity and momentum conservation equations including the standard k-𝜺 turbulent model for the steady-state conditions were applied. From the calculation results, we verified that the pressure drop from inlet pipes to outlet pipes decreased to a log scale as the manifold size increased in the internal manifold types. Also, we found that the flow uniformity increased on an exponential scale as the manifold size increased. In addition, the calculation results showed that the flow uniformity gradually improved as the fuel and oxygen utilization increased.

2.3 kW급 전기자동차 배터리팩용 냉각 장치의 열전달 특성에 관한 해석적 연구 (Numerical Analysis of Heat Transfer Characteristics of Cooling System for 2.3 kW EV Battery Pack)

  • 성동민;박용석;성홍석;서정세
    • 한국기계가공학회지
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    • 제21권6호
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    • pp.44-49
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    • 2022
  • The improvement in the battery performance and life using a battery thermal management system directly affects the improvement in the performance, life, and energy efficiency of electric vehicles. Therefore, this study numerically analyzed the heat exchange processes between the coolant inside the cooling plate channel and the heat generated by the battery. The cooling performance was analyzed based on the average temperature, temperature uniformity, and the maximum and minimum temperature differences of the battery. A performance difference existed depending on the coolant inlet temperature but showed the same tendency of cooling performance according to the shape of each plate's channel. Type 1 showed the best results in terms of battery temperature uniformity, which is the most important measure of battery performance; Type 2 showed the best results in terms of the average temperature of the battery; and Type 3 showed the best results in terms of the maximum and minimum temperature differences of the battery compared with that of the other cooling plates.