• Progress in Superconductivity and Cryogenics
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• v.8 no.1
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• pp.15-18
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• 2006

A new precursor solution wilt low fluorine content was synthesized for MOD processing of coated conductors. In this study, the precursor solution for MOD processing was synthesized using F-free yttrium and copper precursor. It was shown that crack-free and uniform precursor films were formed after calcination in humidified oxygen atmosphere. Less than 2 hours were required to finish the calcination process. The relatively gradual weight loss during the calcination process is attributed to the feasibility of fast calcination profile. The calcined precursor film was converted to a YBCO film without any secondary phases after annealing in wet $Ar/O_2$ atmosphere. Fully converted film shows uniform microstructure and high critical current density. $(Jc=2.7MA/cm^2) $.

• Journal of Electrochemical Science and Technology
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• v.14 no.4
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• pp.326-332
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• 2023

The high cost of Si-based solar cells remains a substantial challenge to their widespread adoption. To address this issue, it is essential to reduce the production cost of solar-grade Si, which is used as raw material. One approach to achieve this is Si electrodeposition in molten salts containing Si sources, such as SiO₂. In this study, we present the pulse electrodeposition of Si in molten CaCl₂ containing SiO₂ nanoparticles. Theoretically, SiO₂ nanoparticles with a diameter of less than 20 nm in molten CaCl₂ at 850℃ have a comparable diffusion coefficient with that of ions in aqueous solutions at room temperature. However, we observed a slower-than-expected diffusion of the SiO₂ nanoparticles, probably because of their tendency to aggregate in the molten CaCl₂. This led to the formation of a non-uniform Si film with low current efficiency during direct current electrodeposition. We overcome this issue using pulse electrodeposition, which enabled the facile supplementation of SiO₂ nanoparticles to the substrate. This approach produced a uniform and thick electrodeposited Si film. Our results demonstrate an efficient method for Si electrodeposition in molten CaCl₂ containing SiO₂ nanoparticles, which can contribute to a reduction in production cost of solar-grade Si.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.37 no.1
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• pp.26-35
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• 2024

Aluminum-induced crystallization (AIC) as a route to reduce the fabrication cost and to obtain polycrystalline Si (p-Si) thin-film of large grain size is a promising alternative of single-crystalline (s-Si) substrate or p-Si thin-film obtained by conventional methods such as solid phase crystallization (SPC) and laser-induced crystallization (LIC). As the AIC process occurs at the interface between a-Si and Al thin-films, there are various process and interface parameters. Also, it directly means that there is a certain parametric window to obtain p-Si of large grain size having uniform crystal orientation. In this article, we investigate the effect of the various process and interface parameters to obtain p-Si of large grain size and uniform crystal orientation from the literature review. We also suggest the potential use of the p-Si as a virtual substrate for the growth of various compound semiconductors in a form of low-dimension as well as thin-film as a way for their monolithic integration on Si.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.281.1-281.1
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• 2016

Transition metal dichalcogenides (TMDCs) are promising layered structure materials for next-generation nano electronic devices. Many investigation on the FET device using TMDCs channel material have been performed with some integrated approach. To use TMDCs for channel material of top-gate thin film transistor(TFT), the study on high-k dielectrics on TMDCs is necessary. However, uniform growth of atomic-layer-deposited high-k dielectric film on TMDCs is difficult, owing to the lack of dangling bonds and functional groups on TMDC's basal plane. We demonstrate the effect of remote oxygen plasma pretreatment of large area synthesized few-layer MoSe2 on the growth behavior of Al2O3, which were formed by atomic layer deposition (ALD) using tri-methylaluminum (TMA) metal precursors with water oxidant. We investigated uniformity of Al2O3 by Atomic force microscopy (AFM) and Scanning electron microscopy (SEM). Raman features of MoSe2 with remote plasma pretreatment time were obtained to confirm physical plasma damage. In addition, X-ray photoelectron spectroscopy (XPS) was measured to investigate the reaction between MoSe2 and oxygen atom after the remote O2 plasma pretreatment. Finally, we have uniform Al2O3 thin film on the MoSe2 by remote O2 plasma pretreatment before ALD. This study can provide interfacial engineering process to decrease the leakage current and to improve mobility of top-gate TFT much higher.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.24 no.6
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• pp.870-879
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• 2000

An experimental investigation is conducted to improve a slot film cooling system which can be used for the cooling of gas turbine combustor liner. The tangential slots are constructed of discrete holes with different injection types which are the parallel, vertical, and combined to the slot lip. The investigation is focused on the coolant supply systems of normal-, parallel-, and counter-flow paths to the mainstream direction. A naphthalene sublimation technique has been employed to measure the local heat/mass transfer coefficients in a slot with various injection types and coolant feeding directions. The velocity distributions at the exit of slot lip for the parallel and vertical injection types are fairly uniform with mild periodical patterns with respect to the hole positions. However, the combined injection type increases the nonuniformity of flow distribution with the period equaling twice that of hole-to-hole pitch due to splitting and merging of the ejected flows. The secondary flow at the lip exit has uniform velocity distributions for the parallel and vertical injection types, which are similar to the results of a two-dimensional slot injection. In the results of local heat/mass transfer coefficient, the best cooling performance inside the slot is obtained with the vertical injection type among the three different injection types due to the effect of jet impingement. The lateral distributions of Sh with the parallel- and counter-flow paths are more uniform than the normal flow path. The averaged Sh with the injection holes are $2{\sim}5$ times higher than that of a smooth two-dimensional slot path.

• Transactions on Electrical and Electronic Materials
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• v.9 no.6
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• pp.247-250
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• 2008

Hafnium dioxide ($HfO_2$) thin film as a gate dielectric for organic thin film transistors is prepared by plasma enhanced atomic layer deposition (PEALD). Mostly crystalline of $HfO_2$ film can be obtained with oxygen plasma and with water at relatively low temperature of $200^{\circ}C$. $HfO_2$ was deposited as a uniform rate of $1.2\;A^{\circ}$/cycle. The pentacene TFT was prepared by thermal evaporation method with hafnium dioxide as a gate dielectric. The electrical properties of the OTFT were characterized.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1997.04a
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• pp.188-193
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• 1997

ZnO thin film had been deposited on the glass 7r sputtering method, and investigated by electrical and structural properties. When the rf power was 188W and sputtering pressure was 1$\times$10$^{-3}$ Torr at room temperature, Al-doped ZnO thin film had the lowest resistivity(1$\times$10$^{-4}$ $\Omega$.cm), and then carrier concentration and Hall mobility were 6.27$\times$10$^{20}$ cm$^{-3}$ and 22.04$\textrm{cm}^2$/V.s, respectively. And undoped ZnO thin film had about 10$^{14}$ $\Omega$.cm resistivity when oxygen content was 10% or more at room temperature. The surface morphology of ZnO thin film observed by SEM was overall uniform when oxygen content was 50% below and sputtering pressure was 1.0$\times$10$^{-1}$ Torr.

• Proceedings of the SAREK Conference
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• 2009.06a
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• pp.1326-1331
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• 2009

Drying process in the cylindrical thin film layer of sludge with the thickness less than a few millimeters has been investigated. Thin film drying is specially designed and used to dry the viscous materials like sewage sludge. The thin film layer of sludge is dried on the metallic cylindrical surface through which thermal energy is supplied to the layer during drying. The wall temperature is assumed to be constant during drying in the present study for the simplification. In order to solve the equations, the mass transfer rate on the drying surface should be determined. The mass flux of evaporated water vapor on the surface is estimated with the formulation given in the literature. The effect of some physical parameters on drying has been examined to figure out the drying characteristics of the sludge layer.

• Corrosion Science and Technology
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• v.9 no.4
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• pp.171-174
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• 2010

MAO (micro-arc oxidation) is an eco-friendly convenient and effective technology to deposit high-quality oxide coatings on the surfaces of Ti, Al, Mg and their alloys. The roles of the electrolyte concentration and relative cathode electrode area sizes in the grown oxide film during titanium MAO were investigated. The higher the concentration of the electrolyte, the lower the $R_{total}A$ value. The oxide film produced by the lower concentration of the electrolyte is thinner and less uniform than the film by the higher concentration, which is thick and porous. The cathode area size must be bigger than the anode area size in order to minimize the voltage drop across the cathode. The ratio of the cathode area size to the anode area size must be bigger than 8. Otherwise, the cathode will be another source for voltage drop, which is detrimental to and slows down the oxide growth.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.264.2-264.2
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• 2013

Molecular layer deposition (MLD) is sequential, self-limiting surface reaction to form conformal and ultrathin polymer film. This technique generally uses bifunctional precursors for stepwise sequential surface reaction and entirely organic polymer films. Also, in comparison with solution-based technique, because MLD is vapor-phase deposition based on ALD, it allows epitaxial growth of molecular layer on substrate and is especially good for surface reaction or coating of nanostructure such as nanopore, nanochannel, nanwire array and so on. In this study, polyurea film that consisted of phenylenediisocyanate and phenylenediamine was formed by MLD technique. In situ Fourier Transform Infrared (FTIR) measurement on high surface area SiO2 substrate was used to monitor the growth of polyurethane and polyurea film. Also, to investigate orientation of chemical bonding formed polymer film, plan-polarized grazing angle FTIR spectroscopy was used and it showed epitaxial growth and uniform orientation of chemical bones of polyurea films.