• Korean Chemical Engineering Research
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• v.53 no.1
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• pp.78-82
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• 2015

Hollow silica particles were prepared using sodium silicate and organic templates. Polystyrene latex (PSL) particles produced by dispersion polymerization were used as organic templates. PSL particles ranged from $1{\mu}m$ to $3{\mu}m$ in diameter were synthesized by adjusting the amount of 2,2'-azobisisobutyronitrile (AIBN). The PSL/$SiO_2$ core-shell particles were prepared by coating of silica nanoparticles originated from sodium silicate using sol-gel method. The organic templates were removed by the organic solvent, tetrahydrofuran (THF). Morphology of hollow silica particles was investigated with respect to types of the reaction medium and pH during the process. By changing the solvent from ethanol to water, hollow silica particles were successfully formed. Hollow silica particles with the uniform shell thickness were produced at low pH as well. The reflectivity of the as-prepared silica particles was measured in the range of the wavelength of UV and visible light. Hollow silica particles showed much better reflective properties than the commercial light reflector, Insuladd.

• Journal of the Microelectronics and Packaging Society
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• v.12 no.3 s.36
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• pp.259-265
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• 2005

Characteristics of electroplated Ni films and $Ni-Al_2O_3$ composite films, such as yield strength, fracture elongation, and $Al_2O_3$ content, were evaluated as a function of electroplating current density. $Al_2O_3$ content was $11.48\~11.64\;vol\%$ for $Ni-Al_2O_3$ composite films electroplated at $5\~20\;mA/cm^2$, and decreased to $8.41\;vol\%$ at $30\;mA/cm^2$ $Ni-Al_2O_3$ possessed yield strengths higher than those of Ni films. Especially, $Ni-Al_2O_3$ fabricated at $5\;mA/cm^2$ exhibited $50\%$ improved yield strength. Fracture elongations of Ni and $Ni-Al_2O_3$ decreased with increasing the electroplating current density. $Ni-Al_2O_3$ electroplated at $5\;mA/cm^2$ exhibited more uniform dispersion of $Al_2O_3$ and higher yield strength and larger fracture elongation than the composite films processed at other current densities.

• Journal of the Microelectronics and Packaging Society
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• v.16 no.4
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• pp.33-39
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• 2009

A microlens array (MLA) was developed based on the wet-etched quartz substrate and coating of UV adhesive on the substrate for maskless lithography application. The developed MLA has the focal length of ${\sim}45\;{\mu}m$ and the spot size of ${\sim}1\;{\mu}m$. The spot size of the focused beam passing through the MLA was detected by CCD camera, and its intensity was monitored by beam profiler. Uniform spots with nearly identical intensities were observed on the focal plane when a beam passes through the fabricated MLA. The focal length was varied depending on thickness of the coated UV adhesive. The thicker the thickness of the UV adhesive was, the shorter the focal length of the MLA was. With a general mask aligner, UV beam focusing was tested onto photoresist (PR). The beams were well focused onto PR when UV passes through the MLA. Depending on the variable distances from the MLA, beam sizes onto PR were controlled. Even at high temperature for a long time, the performances of the MLA were not changed.

• Journal of the Korean Magnetics Society
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• v.15 no.3
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• pp.202-206
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• 2005

The present investigation provides an electromagnetic radiation absorptive composition which comprises silver-coated ferrite microspheres dispersed in silicon rubber matrix for the aim of thin microwave absorber in GHz frequencies. Ni-Zn ferrite spheres with $50{\mu}m$ size in average were prepared by spray-drying and sintering at $1130^{\circ}C$. Conductive silver layer was plated on ferrite spheres by electroless plating. Conductive Ni-Zn ferrite sphere with uniform silver layer were obtained in the concentration of 10 g/L $AgNO_3$ per 20 g ferrite spheres. For this powder, electrical resistance is reduced as low as $10^{-2}\~10^{-3}\;\Omega$. The most sensitive material parameters with silver plating is real and imaginary parts of complex permittivity. The conductive Ni-Zn ferrite spheres have large values of dielectric constant. Due to this high dielectric constant of microspheres, matching thickness is reduced to as low as 2 mm at the frequency of 7 GHz, which is much thinner than conventional ferrite absorbers.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.344-344
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• 2014

Transparent amorphous oxide semiconductors such as a In-Ga-Zn-O (a-IGZO) have advantages for large area electronic devices; e.g., uniform deposition at a large area, optical transparency, a smooth surface, and large electron mobility >10 cm2/Vs, which is more than an order of magnitude larger than that of hydrogen amorphous silicon (a-Si;H).1) Thin film transistors (TFTs) that employ amorphous oxide semiconductors such as ZnO, In-Ga-Zn-O, or Hf-In-Zn-O (HIZO) are currently subject of intensive study owing to their high potential for application in flat panel displays. The device fabrication process involves a series of thin film deposition and photolithographic patterning steps. In order to minimize contamination, the substrates usually undergo a cleaning procedure using deionized water, before and after the growth of thin films by sputtering methods. The devices structure were fabricated top-contact gate TFTs using the a-IGZO films on the plastic substrates. The channel width and length were 80 and 20 um, respectively. The source and drain electrode regions were defined by photolithography and wet etching process. The electrodes consisting of Ti(15 nm)/Al(120 nm)/Ti(15nm) trilayers were deposited by direct current sputtering. The 30 nm thickness active IGZO layer deposited by rf magnetron sputtering at room temperature. The deposition condition is as follows: a rf power 200 W, a pressure of 5 mtorr, 10% of oxygen [O2/(O2+Ar)=0.1], and room temperature. A 9-nm-thick Al2O3 layer was formed as a first, third gate insulator by ALD deposition. A 290-nm-thick SS6908 organic dielectrics formed as second gate insulator by spin-coating. The schematic structure of the IGZO TFT is top gate contact geometry device structure for typical TFTs fabricated in this study. Drain current (IDS) versus drain-source voltage (VDS) output characteristics curve of a IGZO TFTs fabricated using the 3-layer gate insulator on a plastic substrate and log(IDS)-gate voltage (VG) characteristics for typical IGZO TFTs. The TFTs device has a channel width (W) of $80{\mu}m$ and a channel length (L) of $20{\mu}m$. The IDS-VDS curves showed well-defined transistor characteristics with saturation effects at VG>-10 V and VDS>-20 V for the inkjet printing IGZO device. The carrier charge mobility was determined to be 15.18 cm^2 V-1s-1 with FET threshold voltage of -3 V and on/off current ratio 10^9.

• Journal of Korean Society of Environmental Engineers
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• v.36 no.1
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• pp.7-12
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• 2014

The adsorption characteristics of Pb(II) and Cu(II) by the manganese oxide-coated activated carbon (MOAC) were investigated by series of batch experiments. MOAC was prepared by three types of manufacturing methods such as chemical precipitation method (CP), hydrothermal method (HT) and supercritical method (SC). Pseudo-second-order and Langmuir models adequately described kinetics and isotherm of Pb(II) and Cu(II) adsorption on the experimented adsorbents. These results indicated that heavy metal ions were chemically adsorbed onto uniform monolayered adsorption sites. The coating of manganese oxide enhanced the adsorption capacities of AC. And adsorption capacities of Pb(II) and Cu(II) were significantly affected by the manufacturing method of MOAC. The highest adsorption performance was obtained by using SC, followed by HT and CP, which is caused from high uniformity and amount of manganese oxide coated onto AC induced by high temperature and pressure. These results show that MOAC can be used as an effective adsorbent to remediate heavy metal contaminated environment.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.17 no.4
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• pp.100-105
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• 2016

The use of 3D scanners has increased gradually according to increasing 3D printer applications. The precision inspection of car parts or electronic components is an important issue not only in the field of mass production, but also in small-scale production. Recently, 3D scanner equipment efficiency and recognition technology has been improved continuously. On the other hand, the spraying time to prepare 3D scanning is time-consuming and has environmental problems. Therefore, an automatic spray system has been in demand by the manufacturing industry. Automatic spray equipment was newly developed for the preparation of a 3D scanner. In this research, the automatic spray system guarantees uniform spray operation. To determine the optimal spray parameters, various spraying methods, solutions and conditions were tested and compared with the experiments. The preparation time for 3D scanning was reduced to 1/10 compared to the manual spraying time, and indicates the optimal spraying conditions through a comparison of various spray coating conditions.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2018.06a
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• pp.75-75
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• 2018

Commercially pure titanium (CP-Ti) and Ti-6Al-4V alloys have been widely used in implant materials such as dental and orthopedic implants due to their corrosion resistance, biocompatibility, and good mechanical properties. However, surface modification of titanium and titanium alloys is necessary to improve osseointegration between implant surface and bone. Especially, when titanium oxide nanotubes are formed on the surface of titanium alloy, cell adhesion is greatly improved. In addition, plasma electrolytic oxide (PEO) coatings have a good safety for osseointegration and can easily and quickly form coatings of uniform thickness with various pore sizes. Recently, the effects of bone element such as magnesium, zinc, strontium, silicon, and manganese for bone regeneration are researching in dental implant field. The purpose of this study was researched on the surface morphology of PEO-treated Ti-6Al-4V alloy after anodic titanium oxide treatmentusing various instruments. Ti-6Al-4V ELI disks were used as specimens for nanotube formation and PEO-treatment. The solution for the nanotube formation experiment was 1 M $H_3PO_4$ + 0.8 wt. % NaF electrolyte was used. The applied potential was 30V for 1 hours. The PEO treatment was performed after removing the nanotubes by ultrasonics for 10 minutes. The PEO treatment after removal of the nanotubes was carried out in the $Ca(CH_3)_2{\cdot}H_2O+(CH_3COO)_2Mg{\cdot}4H_2O+Mn(CH_3COO)_2{\cdot}4H_2O+Zn(CH_3CO_2)_2Zn{\cdot}2H_2O+Sr(CH_2COO)_2{\cdot}0.5H_2O+C_3H_7CaO_6P$ and $Na_2SiO_3{\cdot}9H_2O$ electrolytes. And the PEO-treatment time and potential were 3 minutes at 280V. The morphology changes of the coatings on Ti-6Al-4V alloy surface were observed using FE-SEM, EDS, XRD, AFM, and scratch tester. The morphology of PEO-treated surface in 5 ion coating solution after nanotube removal showed formation or nano-sized mesh and micro-sized pores.

• Polymer(Korea)
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• v.33 no.4
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• pp.347-352
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• 2009

Charged organic-inorganic composite particles were prepared for the application to electrophoretic display technology such as electronic paper. $TiO_2$ and $Co_3O_4$ particles were used for core particles and were coated with poly(methyl methacrylate) by dispersion polymerization. Composite particles were endowed with charge moiety for electrophoresis; positive charge for $TiO_2$ and negative charge for $Co_3O_4$ composite particles. Scanning electron microscopic results revealed that the charged composite particles have spherical shape. Densities of the composite particles were controlled to be that of medium of electrophoresis. Density of $TiO_2$ particle changed from 4.02 to 1.44 g/$cm^3$ after the polymer coating, and that of $Co_3O_4$ particles changed from 6.11 to 1.49 g/$cm^3$. Urea, melamine, and formaldehyde were used as wall materials for capsule, and microcapsule containing black or white particles inside were prepared by in-situ polymerization. Microcapsule showed the inspection by a video microscope demonstrated the formation of uniform transparent capsules.

• Journal of the Korean Vacuum Society
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• v.20 no.3
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• pp.225-232
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• 2011

Reactive ion etching (RIE) technique for maskless surface texturing of mc-silicon solar wafers has been applied and succeed in fabricating a grass-like black-silicon with an average reflectance of $4{\pm}1%$ in a wavelength range of 300~1,200 nm. In order to investigate the optimized texturing conditions for mass production of high quantum efficiency solar cell Surface characteristics such as the spatial distribution of average reflectance, micrscopic surface morphology and minority carrier lifetime were monitored for samples from saw-damaged $15.6{\times}15.6\;cm^2$ bare wafer to key-processed wafers as well as the mc-Si solar cells. We observed that RIE textured wafers reveal lower average reflectance along from center to edges by 1% and referred the origin to the non-uniform surface structures with a depth of 2 times deeper and half-maximum width of 3 times. Samples with anti-reflection coating after forming emitter layer also revealed longer minority carrier lifetime by 40% for the edge compared to wafer center due to size effects. As results, mc-Si solar cells with RIE-textured surface also revealed higher efficiency by 2% and better external quantum efficiency by 15% for edge positions with higher height.