• Proceedings of the Korean Society of Precision Engineering Conference
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• 2000.11a
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• pp.453-456
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• 2000

This paper presents experimental results on selecting optimal process parameters for UV-Vaccum casting. The UV-Vacuum casting is a relatively new process that allows very rapid mold preparation and part duplication via UV curing. Effect of various process variables such as pressure and temperature on mold strength and part accuracy was evaluated by using Taguchi method.

• Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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• 1999.11a
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• pp.80-84
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• 1999

Sunlight Collector System is a new way to make sunlight available to living things. It transmits sunlight through fiber optics to wherever is needs. It applies the artificial lighting, underground lighting, intelligent building, museum lighting, restoration-room to health etc. Cutting out most of the ultra-violet and intra-red radiation. In this paper, we measured the spectrum analysis of sunlight and Sunlight collector System's light. Also, we found out the distance to get visible light.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.586-589
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• 2002

The Ultra Violet(UV) emission characteristics of Neon + Nitrogen gas-mixture discharge was investigated in AC plasma display panel. The firing voltage of Ne+$N_2$ gas-mixture discharge increased with increasing nitrogen concentration. The UV intensity emitted from the gas discharge also increased with increasing nitrogen concentration. The UV efficiency increase with increasing $N_2$ partial pressure at low $N_2$ concentration, and then UV efficiency is saturated at high $N_2$ concentration.

• Bulletin of the Korean Space Science Society
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• 2001.04a
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• pp.49-49
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• 2001

• Proceedings of the Membrane Society of Korea Conference
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• 2005.05a
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• pp.63-66
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• 2005

• Proceedings of the KIEE Conference
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• 1997.07e
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• pp.1666-1668
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• 1997

This paper reports the optimal gas mixing ratio for color plasma display panel to improve luminous efficiency using gas dischage simulation which contains energy equation. We verified a simulation by measuring vacuum ultraviolet. The luminous efficiency has improved considerably(about 30%) by adding Ar (0.5%), compared with Ne-Xe(4%) mixing gas.

• Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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• 1995.10a
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• pp.13-18
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• 1995

To evaluate the color change of the dyed materials by ultraviolet and visible rays in the museum, a system that accelerates dye fading was developed. Radiation energy from a Xenon lamp is irradiated on the samples through the filters of defferent cut-on wavelengths. As a result, the color change as a function of the wavelength and irradiation is calculated.

• 유체기계공업학회:학술대회논문집
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• 2005.12a
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• pp.126-132
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• 2005

UV disinfection system allows the disinfection of municipal and industrial water and wastewater without the use of expensive chlorination and dechlorination techniques, labor intensive equipments In traditional ultraviolet systems the UV lamps are seperated from water by quartz sleeves. quartz is one of. the few materials that is virtually transparent to UV light, the UV lamp is placed inside the Quartz sleeve. UV light from the lamp is passed through the quartz and into the water, thereby providing disinfection. In fluoropolymer tube-used non-contact UV systems, the water flows through fluoropolymer plastic tubes. banks of UV lamps surround these tubes such that each tube gets exposed to ultra violet light from all sides. in non-contact design the lamps operates at almost constant temperature. this design is extremly efficient in the utilization of UV energy and superior to conventional contact- systems.

• Journal of the Korean Ceramic Society
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• v.37 no.1
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• pp.82-89
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• 2000

In lithium silicate photosensitive glass-ceramics, the relationship between lithography time and crystallization, and the effect of addition of mineral acid in etching rate and pattern shape were investigated. Irradiation times for micropatterning were less than 5 minutes in which Ce3+ ions in glass were changed rapidly to Ce4+ with ultra violet light. Overexposure to ultra brought about blot of pattern by diffiraction of light. Addition of mineral acid to HF enhanced etching rate as compared with HF solution only. The addition of H2SO4 especially increased the etching rate by 70%. But the mixed solution also increased the etching rate of the noncrystallized portion of the glass and this resulted in heavy etching. Etching with ultrasonic wave showed higher etching rate than that with the static or fluid method.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.132-132
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• 2010

In the nano-scale Si processing, patterning processes based on multilevel resist structures becoming more critical due to continuously decreasing resist thickness and feature size. In particular, highly selective etching of the first dielectric layer with resist patterns are great importance. In this work, process window for the infinitely high etch selectivity of silicon oxynitride (SiON) layers and silicon nitride (Si3N4) with EUV resist was investigated during etching of SiON/EUV resist and Si3N4/EUV resist in a CH2F2/N2/Ar dual-frequency superimposed capacitive coupled plasma (DFS-CCP) by varying the process parameters, such as the CH2F2 and N2 flow ratio and low-frequency source power (PLF). It was found that the CH2F2/N2 flow ratio was found to play a critical role in determining the process window for ultra high etch selectivity, due to the differences in change of the degree of polymerization on SiON, Si3N4, and EUV resist. Control of N2 flow ratio gave the possibility of obtaining the ultra high etch selectivity by keeping the steady-state hydrofluorocarbon layer thickness thin on the SiON and Si3N4 surface due to effective formation of HCN etch by-products and, in turn, in continuous SiON and Si3N4 etching, while the hydrofluorocarbon layer is deposited on the EUV resist surface.