• 한국응용과학기술학회지
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• 제11권2호
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• pp.99-103
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• 1994

A stability to the spreading solvent, which is acetonitrile, benzene, chloroform and acetonitrile-benzene(1:1, v/v) of (3-Alkyl benzimidazdium)-TCNQ(1:2) complex was investigated by UV-visible spectrometer and was confirmed stabilized on acetonitrile, acetonitrile-benzene (1:1, v/v) for five hours. Using Ultra pure water as subphase for Langmuir-Blodgett(LB) films, it was achived successively to fabricate the Y-type LB films of (3-Alkyl benzimidazolium)-TCNQ(1:2) complex. For the identification of (3-Alkyl benzimidazolium)-TCNQ(1:2) complex, UV-visible spectra was recorded on HP 8452A spectrometer.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1996년도 추계학술대회 논문집
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• pp.221-224
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• 1996

We synthesized amphiphilic material including dye skeleton, p-phenylenediamine(PD) by attaching norma-decyl group of two strands at a part of coordinating atom, for obtaining reasonable design of LB uniform films. The synthesis of this compounds was quantitatively carried out under ultra pure state. This product was identified with FT-lR spectroscopy, UV absortion spectroscopy, and $^1$H-NMR spectroscopy, respectively. When manufacturing monolayer, we confirmed molecular area from pressure-area($\pi$-A) cutie of thiscompound onto the surface of the water. The spectroscopic approach also has done by UV absortion spectroscopy. It was shown that PD-complex LBfilms were deposited well with monolayer thickness. The conductivity based on I-V characteristics of PD-complex LB films were in the range of 10$^{-10}$ S/cm at room temperture. The microscopic properties by AFM, showed the good orientation of various monolayer or multilayer molecules

• 청정기술
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• 제7권3호
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• pp.215-223
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• 2001

A present semiconductor cleaning technology is based upon RCA cleaning technology which consumes vast amounts of chemicals and ultra pure water(UPW) and is the high temperature process. Therefore, this technology gives rise to the many environmental issues, and some alternatives such as electrolyzed water(EW) are being studied. In this work, intentionally contaminated Si wafers were cleaned using the electrolyzed water. The electrolyzed water was generated by an electrolysis system which consists of three anode, cathode, and middle chambers. Oxidative water and reductive water were obtained in anode and cathode chambers, respectively. In case of NH4Cl electrolyte, the oxidation-reduction potential and pH for anode water(AW) and cathode water(CW) were measured to be +1050mV and 4.8, and -750mV and 10.0, respectively. AW and CW were deteriorated after electrolyzed, but maintained their characteristics for more than 40 minutes sufficiently enough for cleaning. Their deterioration was correlated with CO2 concentration changes dissolved from air. Contact angles of UPW, AW, and CW on DHF treated Si wafer surfaces were measured to be $65.9^{\circ}$, $66.5^{\circ}$ and $56.8^{\circ}$, respectively, which characterizes clearly the eletrolyzed water. To analyze the amount of metallic impurities on Si wafer surface, ICP-MS was introduced. It was known that AW was effective for Cu removal, while CW was more effective for Fe removal. To analyze the number of particles on Si wafer surfaces, Tencor 6220 were introduced. The particle distributions after various particle removal processes maintained the same pattern. In this work, RCA consumed about $9{\ell}$ chemicals, while EW did only $400m{\ell}$ HCl electrolyte or $600m{\ell}$ NH4Cl electrolyte. It was hence concluded that EW cleaning technology would be very effective for promoting environment, safety, and health(ESH) issues in the next generation semiconductor manufacturing.

• 한국재료학회지
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• 제11권4호
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• pp.251-257
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• 2001

반도체 소자의 고집적화에 따른 세정공정 수는 점점 증가하고 있는 추세에 있다 현재 사용되는 세정은 다량의 화학약품 및 초순수를 소비하며, 고온에서 행하여지고 있는 RCA세정을 근간으로 하고 있다. 세정공정수의 증가는 바로 화학약품의 사용량 증가를 초래하게 되며, 이에 따른 환경문제가 심각하게 대두되고 있는 실정에 이르렀다. 따라서 이러한 화학약품 및 초순수 사용을 절감하고, 저온에서 세정공정이 이뤄지는 기술이 향후 요구되어 지고 있다. 이번 연구는 이러한 관점에서 화학약품 및 초순수 사용량을 줄이며, 상온 공정이 이뤄지는 전리수를 이용하여 실리콘 웨이퍼 세정을 하였다. 제조된 전리수는 산화성 성질을 지닌 양극수와 환원성 성질인 음극수로 이루어지고, 각각 pH 및 ORP는 4.7/+1050mV, 9.8/-750mV를 30분 이상 유지하고 있었다 전리수의 양극수에 의한 금속제거 효과가 음극수의 효과보다 우수함을 확인할 수 있었으며, 다양한 입자제거 실험에도 불구하고, 동일한 분포도를 나타내고 있었다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제52권5호
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• pp.201-205
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• 2003

We synthesized dendrimers containing light switchable units, azobenzene group. And the dendrimer containing 48 pyridinepropanol functional end group, which could form a complex structure with metal ions was synthesized. To apply to the molecular level devices or data storage system using Langmuir-Blodgett(LB) film, we firstly investigated the monolayer behavior using the surface pressure-area($\pi$-A) isotherms at air-water interface. And then the surface pressure shift of monolayer by light irradiation was also measured to the dendrimer with azobezene group. As a result, the monolayer of dendrimer with azobenzene group showed the reversible photo-switching behavior by the isomerization of azobenzene group in their periphery. The samples for electrical measurement were fabricated to two types which were pure dendrimer with pyridinepropanol group and its complexes with $Pt^4+$ ions by LB method. We have studied the electrical properties of the ultra thin dendrimer LB films investigated by the current-voltage(I-V) characteristics of Metal/Dendrimer LB films/Metal(MIM) structure. And we have investigated different results in the surface activity at the air-water interface as well as the electrical properties for the monolayers of pure dendrimer with pyridinevopanol group and its complex with $Pt^4+$ ions. In conclusion, it is demonstrated that the metal ion around dendrimer with pyri야nepropanol group can contribute to make formation of network structure among dendrimers and it result from the change of electrical properties. This results suggest that the dendrimers with azobenzene group and pvridinedropanol group can be applied to high efficient nano-device of molecular level.

• 대한전기학회논문지:시스템및제어부문D
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• 제52권5호
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• pp.201-201
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• 2003

We synthesized dendrimers containing light switchable units, azobenzene group. And the dendrimer containing 48 pyridinepropanol functional end group, which could form a complex structure with metal ions was synthesized. To apply to the molecular level devices or data storage system using Langmuir-Blodgett(LB) film, we firstly investigated the monolayer behavior using the surface pressure-area($\pi$-A) isotherms at air-water interface. And then the surface pressure shift of monolayer by light irradiation was also measured to the dendrimer with azobezene group. As a result, the monolayer of dendrimer with azobenzene group showed the reversible photo-switching behavior by the isomerization of azobenzene group in their periphery. The samples for electrical measurement were fabricated to two types which were pure dendrimer with pyridinepropanol group and its complexes with $Pt^4+$ ions by LB method. We have studied the electrical properties of the ultra thin dendrimer LB films investigated by the current-voltage(I-V) characteristics of Metal/Dendrimer LB films/Metal(MIM) structure. And we have investigated different results in the surface activity at the air-water interface as well as the electrical properties for the monolayers of pure dendrimer with pyridinevopanol group and its complex with $Pt^4+$ ions. In conclusion, it is demonstrated that the metal ion around dendrimer with pyri야nepropanol group can contribute to make formation of network structure among dendrimers and it result from the change of electrical properties. This results suggest that the dendrimers with azobenzene group and pvridinedropanol group can be applied to high efficient nano-device of molecular level.

• 한국산학기술학회논문지
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• 제3권2호
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• pp.74-79
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• 2002

80년대 반도체 산업의 급격한 성장으로 오늘날 반도체 산업은 반도체소자의 초고집접화, 웨이퍼의 대구경화로 발전이 거듭났으며, 소자의 성능과 생산 수율의 향상을 위하여 실리콘 웨이퍼의 세정하는 기술 및 연구를 계속 진행하고 있다. 기존의 반도체 세정은 과다한 화학약품의 사용으로 비 환경친화적이며, 이에 본 연구에서는 기존의 세정방법을 대체하기 위한 방법으로 환경친화적인 전리수를 이용한 반도체 세정법을 하였다. 이때 실리콘 웨이퍼 표면의 원자적 상태의 변화가 발생하여 다양한 방법으로 확인할 수 있다. 본 연구에 서는 이러한 분석을 하기 위하여 기존세정의 화학약품과 전리수로 세정한 웨이퍼의 표면을 비교하였으며, 또한 온도 및 시간별 표면상태변화를 분석하였다. 특히 접촉각 변하에 중점을 두어 변화를 관찰하였으며, 음극수의 경우 17.28°, 양극수의 경우 34.1°의 낮은 접촉각을 얻을 수 있었다.

• 한국식품영양과학회지
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• 제44권12호
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• pp.1771-1778
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• 2015

본 연구에서는 고지방식이로 비만 유도된 쥐를 대상으로 10주간 옻식초를 급여하였을 때 비만에 미치는 영향을 알아보고자 하였다. 옻식초는 무독화된 옻을 이용하여 알코올 발효 후 아세트산 발효를 거쳐 제조하였으며, 흰쥐를 일반식이(normal chow diet)와 고지방식이(fat 60 %kcal) 섭취군으로 나누어 12주 동안 비만 유도를 한 후 총 5군으로 나누었다. 일반식이와 정제수를 음용한 CON군, 고지방식이와 정제수를 음용한 OB-DW군, 고지방식이와 1% 아세트산을 음용한 OB-AA군, 고지방식이와 1% 옻식초를 음용한 OBRV군, 고지방식이와 0.1% 카페인 용액을 음용한 OB-CF군으로 나누어 총 10주 동안 해당 식이와 실험시료를 공급하였으며, 연구 종료 후 체중, 지방 무게, 지방구 크기 및 개수, 혈액과 간 조직의 지질 profile, 지방조직의 glycerol-3-phosphate dehydrogenase와 lipoprotein lipase(LPL) 효소 활성을 분석하였다. 그 결과 OB-DW군과 비교하여 OBRV군에서 체중 증가량과 식이효율이 유의적으로 감소하였고, 혈중 총 콜레스테롤과 중성지방 함량, 심장동맥경화지수(CRI), LPL 활성이 유의적으로 감소하였으며, 또한 혈중 유리지방산과 분변 중성지방의 함량이 유의성 있게 증가하였다(P<0.05). 항비만 효과를 살펴보기 위해 비만 흰쥐에게 옻식초를 음용시켰을 때 혈청이나 간의 지질 함량을 개선시키고 지질 배설을 증가시켜 부작용 없이 식품소재로서 비만을 일부 개선시키는 효과를 규명하였다.

• 청정기술
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• 제7권3호
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• pp.179-185
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• 2001

각종 전처리 필터로 사용되는 정밀여과막은 국내의 경우 대부분 수입에 의존하고 있다. 몇몇 회사에서 개발을 시도하고 있지만, 막에 대한 특성 파악이나 공극제어등과 같은 문제를 해결하는데 많은 어려움이 있다. 따라서 본 연구에서는 A 사에서 개발한 정밀여과막을 이용하여 한강원수와 시수에 대하여 RO 유입전 전처리 필터로서의 적합성을 판단하고자 본 연구를 수행하였다. 한강원수는 총 2회에 걸쳐서 실험을 실시하였다. 적정 공급수 압력은 0.2~0.4 기압이며 여과수의 탁도는 0.4 NTU를 나타냈다. 플럭스는 $6,000{\sim}9,000L/m^2/hr$ 였다. 시수의 경우 회수율을 90%로 운전시 안정된 플럭스와 탁도를 나타내었다. 화학세정 후 TMP의 증가율은 감소를 하였으며, 탁도는 0.4 NTU에서 0.1 NTU로 개선되었다.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2001년도 The 6th International Symposium of East Asian Resources Recycling Technology
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• pp.415-420
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• 2001

Water usage in the semiconductor industries is dramatically increased by not only using bigger wafer from 8 inches to 12 inches but also by adapting new process such as Chemical Mechanical Planarization (CMP) process invented by IBM in late '80. However, The document published by International Semiconductor Association suggests the decreasing ultra pure water (UPW) use from 22 gallon/in$^2$in 1997 to 5 gallon/in$^2$ in 2012. The criteria will possibly used as exporting obstacle in the future. Generally, Solid content of CMP slurry is about 15wt%. The slurry is diluted with UPW before fed to a CMP process. When the slurry is discharged from the process as waste, it contains 0.1~0.6wt% of solid content and 9~10 at pH. The CMP waste slurry is discharged to stream with minimum treatment. In this study, to find optimum condition of coagulation for water recovery from the waste CMP slurry various condition of coagulation were examined. After coagulation far 0.1 wt% solid content of waste CMP slurry, the sludge volume was 10~15% after 30 min of sedimentation time. For the 0.5 wt%, sludge volume was 50~55% after one hour of sedimentation time. For more than 80% of water recycling, the solid content should be in the range of 0.1 to 0.2wr%. Based on the result of the turbidity removal, the Zeta Potential and the analysis of heavy metals, the optimum condition for 0.1 wr% of waste CMP slurry was with 20 mg/L of PACI at 4 to 5 of pH. The result showed that the optimum conditions fer the 0.1 wt% waste CMP slurry were 100mg/L of Alum at 4~5 of pH, 100 mg/L of MgCI$_2$at pH 10 to 11 and 100 mg/L of Ca(OH)$_2$at pH 9 to 11, respectively.