• Title/Summary/Keyword: UV-나노임프린팅

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Nano-patterning technology using an UV-NIL method (UV-NIL(Ultraviolet-Nano-Imprinting-Lithography) 방법을 이용한 나노 패터닝기술)

  • 심영석;정준호;손현기;신영재;이응숙;최성욱;김재호
    • Journal of the Korean Vacuum Society
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    • v.13 no.1
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    • pp.39-45
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    • 2004
  • Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. A 5${\times}$5${\times}$0.09 in. quartz stamp is fabricated using the etch process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. FAS(Fluoroalkanesilane) is used as a material for anti-adhesion surface treatment on the stamp and a thin organic film to improve adhesion on a wafer is formed by spin-coating. The low viscosity resin droplets with a nanometer scale volume are dispensed on the whole area of the coated wafer. The UV-NIL experiments have been performed using the EVG620-NIL. 370 nm - 1 m features on the stamp have been transferred to the thin resin layer on the wafer using the multi-dispensing method and UV-NIL process. We have measured the imprinted patterns and residual layer using SEM and AFM to evaluate the potential of the process.

Development of a Compact Desktop-sized Roll-to-roll Nanoimprinting System for Continuous Nanopatterning (데스크탑 규모의 간결한 롤투롤 나노임프린팅 기반 나노패턴 연속가공 시스템 개발)

  • Lee, Jeongsoo;Lee, Jihun;Nam, Seungbum;Cho, Sungil;Jo, Yongsu;Go, Minseok;Lee, Seungjo;Oh, Dong Kyo;Kim, Jeong Dae;Lee, Jae Hyuk;Ok, Jong G.
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.16 no.1
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    • pp.96-101
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    • 2017
  • We have developed a compact desktop-sized nanopatterning system driven by the Roll-to-Roll (R2R) nanoimprinting (NIL) principle. The system realizes the continuous and high-speed stamping of various nanoscale patterns on a large-area flexible substrate without resorting to ponderous and complicated instruments. We first lay out the process principle based on continuous NIL on a UV-curable resin layer using a flexible nanopatterned mold. We then create conceptual and specific designs for the system by focusing on two key processes, imprinting and UV curing, which are performed in a continuous R2R fashion. We build a system with essential components and optimized modules for imprinting, UV curing, and R2R conveying to enable simple but effective nanopatterning within the desktop volume. Finally, we demonstrate several nanopatterning results such as nanolines and nanodots, which are obtained by operating the built desktop R2R NIL system on transparent and flexible substrates. Our system may be further utilized in the scalable fabrication of diverse flexible nanopatterns for many functional applications in optics, photonics, sensors, and energy harvesters.