• 폴리머
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• 제35권2호
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• pp.141-145
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• 2011

In-mold decoration 포일의 경질 코팅 층에 사용하는 수지를 대상으로 전자빔(electron beam, EB) 경화에 관한 연구를 수행하였다. 시료에 다른 양의 EB를 조사하고 경화 반응 정도를 Fourier transform infrared(FTIR) spectroscopy를 사용하여 관찰하였다. EB 조사선량 증가에 따른 코팅 물성의 변화를 표면 경도와 내마모성을 중심으로 알아보았다. 또한 나노 입자 첨가가 코팅 물성에 미치는 영향을 조사하였다. 본 연구로부터 얻은 실험적 결과는 자외선(ultraviolet, UV) 경화 시스템과 유사한 EB 경화 시스템의 상업적 개발에 이용될 수 있을 것으로 기대된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.345-345
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• 2010

Thin film of $TiO_2$ deposited on carbon paper was fabricated by atomic layer deposition (ALD) using titanium isopropoxide (TTIP) and $H_2O$ as precursors. In this work, the photocatalytic activities of $TiO_2$ films with and without e-beam treatment were compared. The samples were treated by e-beam using e-beam energy of 1MeV and exposure range between 5 and 15kGy. The photocatalytic activity was evaluated by the photocatalytic degradation of methyleneblue (MB) under UV irradiation (365nm) at room temperature using an UV-vis spectroscopy. The surface properties were characterized by scanning electron microscope (SEM) and X-ray photoelectron spectroscopy (XPS). The sample treated by the low radiation dose has more catalytic activity than other ones. SEM images show that the high radiation dose caused the $TiO_2$ to aggregation on carbon paper. Due to the aggregation of $TiO_2$, the partially exposed carbon paper was oxidized.

• 한국정밀공학회지
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• 제21권3호
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• pp.171-179
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• 2004

Micro-stereolithography technology has made it possible to fabricate a freeform 3D microslructure. This technology is based on conventional stereolithography, in which a UV laser beam irradiates the open surface of a UV-curable liquid photopolymer, causing it to solidify. In micro-stereolithography, a laser beam of a few $\mu m$ diameter is used to solidify a very small area of the photopolymer. This is one of the key technological elements, and can be achieved by using a focusing lens. Thus, the solidification phenomena of the liquid photopolymer must be carefully investigated. In this study, the photopolymer solidification phenomena in response to variations in the scanning pitch of a focused laser beam was investigated experimentally. The effect of layer thickness on the solidification width and depth was also examined. These studies were conducted under the conditions of relatively lower laser power and relatively higher scanning speed. Moreover, the photopolymer solidification phenomena for the relatively higher laser power and lower scanning speed was investigated, too. In this case, comparing to the case of lower laser power and higher scanning speed, the photopolymer absorbed large amount of irradiation energy of the laser beam. These results were compared with those obtained from a photopolymer solidification model. From these results, a new laser-scanning scheme was proposed according to the shape of the 3D model. Samples by each method were fabricated successfully.

• 응용통계연구
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• 제27권4호
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• pp.543-552
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• 2014

최근 휴대단말기 시장에서는 블루투스, GPRS, EDGE, 3GSM, HSDPA 등과 같은 높은 대역폭의 RF를 사용하고 있다. 높은 대역폭의 RF 영역에서는 높은 면저항(Sheet resistance)을 갖는 무전도 금속박막 코팅 방법이 사용되고 있는데, 기존의 무전도 금속증착은 사출물 세정, UV 하도 코팅, 금속증착, UV 중도 코팅, 상도 코팅 등 다수의 복합 공정으로 이루어져 있다. 특히 하도공정은 금속 증착(Sputtering)과 일괄 처리가 어려워 생산성이 낮고 생산원가 상승의 원인이기도 하다. 따라서 이를 극복하기 위하여 최근 Na 등 (2014)은 무전도 금속코팅에서 Primer 대체를 위한 전자빔의 표면처리의 가능성을 가능함을 보였다. In this paper, 플라즈마 생성 전자빔 소스(Plasma generated electron beam source)를 활용하여 PC/ABS 수지 사출물의 공정을 실험계획법에 의한 전자빔 조사 조건을 탐색하여, 즉, 수지 표면처리공정 조건을 탐색하여, 그 실험 결과를 분석하여, 진공전처리공정 개발 및 양산공정라인의 처리의 최적 조건을 찾고자 한다.

• 한국세라믹학회지
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• 제34권2호
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• pp.209-215
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• 1997

Reactive Single Ion Beam Sputtering 방법을 이용하여 AIN박막을 증착하고 물성을 분석하였다. 반응성 가스로 질소 가스 또는 암모니아 가스를 이용하였다. 증착된 AIN박막의 구조적, 화학적, 광학적 물성을 분석하기 위해 XRD, GAXRD, TEM, SEM, XPS, UV/VIS spectrophotometer, FT-IR등을 이용하였다. XRD, GAXRD분석결과에 의하면 증착된 모든 AIN박막은 비정질이었으나 TEM분석결과에서는 비정질 속에 육방정의 AIN미세결정들이 분포해 있었다. 그리고 FT-IR과 XPS분석을 통하여 Al-N결합을 확인하였으며, 화학양론적인 조성이 됨에 따라 UV-VIS spectrophotometery 분석에서 투광성이 증가하며 광학적 밴드갭은 6.2eV까지 증가함을 확인하였다. 또한 단면과 표면 형상관찰에서는, 반응성 가스로 질소 가스나 암모니아 가스에 관계없이, 결정입계가 전혀 관찰되지 않는 아주 평활한 현상이었으며 굴절율은 1.6~1.7의 값을 갖는다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 추계학술대회 논문집
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• pp.885-887
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• 2005

Recently, many three-dimensional micros-structures were fabricated using micro-stereolithography technology. However, for most conventional micro-stereolithography apparatus. an expensive laser was used as light source and complex optical systems were used. In this research. new type of micro-stereolithography apparatus which has UV lamp as light source and optical fiber as beam delivery system was developed. This apparatus is cheaper and simpler then conventional micro-stereolithography apparatus.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 춘계학술대회 논문집 디스플레이 광소자 분야
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• pp.62-65
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• 2005

We studied the nematic liquid crystal (NLC) alignment capability by the Ultraviolet (UV) alignment method on a-C:H thin-films, and investigated electro-optical performances of the UV aligned twisted nematic (TN)-liquid crystal display (LCD) with the UV exposure on a-C:H thin film surface. A good LC alignment by UV irradiation on a-C:H thin-film surfaces was achieved. Monodomain alignment of the UV aligned TN-LCD can be observed. The good electro-optical (EO) characteristics of the UV aligned TN-LCD was observed with oblique UV exposure on the a-C:H thin film surface for 1min.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2004년도 춘계학술대회
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• pp.978-982
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• 2004

We present high aspect ratio 100nm-scale nickel stamper using e-beam lithography process and Cr/Qz mask for the injection molding process of nano grating patterns. Conventional photolithography blank mask (CrON/Cr/Qz) consists of quartz substrate, Cr layer of UV protection and CrON of anti-reflection layer. We have used Cr/Qz blank mask without anti-reflection layer of CrON which is non-conductive material and ebeam lithography process in order to simplify the nickel electroplating process. In nickel electroplating process, we have used Cr layer of UV protection as seed layer of nickel electroplating. Fabrication conditions of photolithography mask using e-beam lithography are optimized with respect to CrON/Cr/Qz blank mask. In this paper, we have optimized e-beam lithography process using Cr/Qz blank mask and fabricated nickel stamper using Cr seed layer. CrON/Cr/Qz blank mask and Cr/Qz blank mask require optimal e-beam dosage of $10.0{\mu}C/cm^2$ and $8.5{\mu}C/cm^2$, respectively. Finally, we have fabricated $116nm{\pm}6nm-width$ and $240nm{\pm}20nm-height$ nickel grating stamper for the injection molding pattern.

• 한국기계가공학회지
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• 제9권3호
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• pp.56-61
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• 2010

Recently, UV pulse laser is widely used in micro machining of the research, development and industry field of IT, NT and BT products because the laser short wavelength provides not only micro drilling, micro cutting and micro grooving which has a very fine line width, but also high absorption coefficient which allows a lot of type of materials to be machined more easily. To analyze the dynamic deformation during a very short processing time, which is nearly about several tens nanoseconds, the commercial Finite Element Analysis (FEA) code, LS-DYNA 3D, was employed for the computitional simulation of the UV laser micro machining behavior for thin copper material in this paper. A finite element model considering high strain rate effect is especially suggested to investigate the micro phenomena which are only dominated by mechanically pressure impact in disregard of thermally heat transfer. From these computational results, some of dynamic deformation behaviors such as dent deformation shapes, strains and stresses distributions were observed and compared with previous experimental works. These will help us to understand micro interaction between UV laser beam and material.

• Current Optics and Photonics
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• 제4권6호
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• pp.477-482
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• 2020

Recently, one of the authors has been reported an optically tunable fiber Bragg grating (FBG) with a photomechanical polymer. It was based on a typical FBG with a downsized diameter of 60 ㎛, coated with azobenzene-containing polymer material. Azobenzene is a well-known reversibly photomechanical stretchable material under ultraviolet (UV) light. The small part of the functional-coating region on the FBG absorbed UV light, which pulled the UV-exposed part of the grating. It was selectable as tunable FBG or tunable chirped FBG, by adjusting the position of UV exposure on the grating. As proof of concept for the tunable FBG device, the characteristics just including UV-induced center-wavelength shift and spectral-width changes of the device were reported. In this paper, we report for the first time that the microactuator makes it possible to control the spectral shape of the FBG reflection, according to the specifications (shape and intensity) of the UV beam that reaches the FBG coated with the azobenzene polymer. In addition, we provide the group-delay profiles for the chirped FBG, so that the sign of its dispersion (normal or anomalous) can be tailored by simply selecting the moving direction of the UV light's displacement in the experiment.