• Title/Summary/Keyword: UV Process

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UV molding of Microlens Array on the Simulated Optoelectronic Device (모사 광전자 소자 상에 적용한 마이크로렌즈 어레이의 UV 성형)

  • 구승완;김석민;강신일;손현주
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2003.10a
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    • pp.377-380
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    • 2003
  • Recently, demand of digital products with optoelectronic device is increasing rapidly. A microlens array is applied to improve optical efficiency on optoelectronic device, and it is usually fabricated by photolithography and reflow process after planarization layer coating process. UV molding process is more suitable for mass production of high quality microlens array than photolithography and reflow process. In the present study, microlens array was fabricated on the simulated optoelectronic device with planarization layer by aligned UV molding process. The shape of replicated microlens was measured, and the section image of molded part was examined.

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Fabrication of Metallic Nano-filter Using UV-Imprinting Process (UV 임프린팅 공정을 이용한 금속막 필터제작)

  • Noh Cheol Yong;Lee Namseok;Lim Jiseok;Kim Seok-min;Kang Shinill
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.05a
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    • pp.237-240
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    • 2005
  • The demand of micro electrical mechanical system (MEMS) bio/chemical sensor is rapidly increasing. To prevent the contamination of sensing area, a filtration system is required in on-chip total analyzing MEMS bio/chemical sensor. A nano-filter was mainly applied in some application detecting submicron feature size bio/chemical products such as bacteria, fungi and so on. We suggested a simple nano-filter fabrication process based on replication process. The mother pattern was fabricated by holographic lithography and reactive ion etching process, and the replication process was carried out using polymer mold and UV-imprinting process. Finally the nano-filter is obtained after removing the replicated part of metal deposited replica. In this study, as a practical example of the suggested process, a nano-dot array was replicated to fabricate nano-filter fur bacteria sensor application.

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Comparison of Bacterial Biomass and Community of Granular Activated Carbon with or without UV Pre-treatment Process (UV 전처리 유무에 따른 입상활성탄의 세균 생체량 및 군집 구조 비교)

  • Lim, Jaewon;Kim, Seoyong;Kim, Jeongyong;Kim, Tae Ue
    • The Journal of the Korea Contents Association
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    • v.17 no.12
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    • pp.64-76
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    • 2017
  • Biolgical activated carbon (BAC) processes are known to effectively remove organic pollutants in raw water, and biomass and attached bacterial species play an important role in removing process. In the present study, changes of bacterial biomass in granular activated carbon (GAC) process according to the depth and operating period were investigated. In addition, changes of bacterial biomass were also confirmed after UV exposure prior to the GAC process. Results from this this study showed that the bacterial biomass was decreased dependently according to the depth of GAC process. In case of UV pre-treatment, the bacterial biomass was declined significantly over the period of operation. However, changes in bacterial community were not shown during operation period without UV pre-treatment process. In conclusion, findings from this study may provide the useful information about the management of BAC process.

Characteristics of Disinfection and Removal of 2-MIB Using Pulse UV Lamp (펄스 UV 램프를 이용한 미생물 소독 및 2-MIB 제거 특성)

  • Ahn, Young-Seog;Yang, Dong-Jin;Chae, Seon-Ha;Lim, Jae-Lim;Lee, Kyung-Hyuk
    • Journal of Korean Society of Water and Wastewater
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    • v.23 no.1
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    • pp.69-75
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    • 2009
  • The characteristics of disinfection and organic removal were investigated with pulse UV lamp in this study. The intensity and emission wavelength of pulse UV Lamp were compared with low pressure UV lamp. The emission spectrum range of pulse UV lamp was between 200 and 400 nm while the emission spectrum of low pressure UV lamp was only single wavelength of 254nm. 3 Log inactivation rate of B. subtilis spore by pulse UV and low pressure UV irradiation was determined as $44.71mJ/cm^2$ and $57.7mJ/cm^2$, respectively. This results implied that wide range of emission spectrum is more effective compared to single wavelength emission at 254nm. 500ng/L of initial 2-MIB concentration was investigated on the removal efficiency by UV only and $UV/H_2O_2$ process. The removal efficiency of UV only process achieved approximately 80% at $8,600mJ/cm^2$ dose. 2-MIB removal rate of $UV/H_2O_2$ (5 mg/L $H_2O_2$) process was 25 times increased compared to UV only process. DOC removal efficiency for the water treatment plant effluent was examined. The removal efficiency of DOC by UV and $UV/H_2O_2$ was no more than 20%. Removal efficiency of THMFP(Trihalomethane Formation Potential), one of the chlorination disinfection by-products, is determined on the UV irradiation and $UV/H_2O_2$ process. Maximum removal efficiency of THMFP was approximately 23%. This result indicates that more stable chemical structures of NOM(Natural Organic Matter) than low molecule compounds such as 2-MIB, hydrogen peroxide and other pollutants affect low removal efficiency for UV photolysis. Consequently, pulse UV lamp is more efficient compared to low pressure lamp in terms of disinfection due to it's broad wavelength emission of UV. Additional effect of pulse UV is to take place the reactions of both direct photolysis to remove micro organics and disinfection simultaneously. It is also expected that hydrogen peroxide enable to enhance the oxidation efficiency on the pulse UV irradiation due to formation of OH radical.

Evaluation of Disinfection Characteristics of Ozone, UV Processes for Bacillus Subtilis Spores Inactivation (Bacillus Subtilis Spores 불활성화 실험을 통한 오존, UV 공정의 소독 특성 평가)

  • Jung, Yeon Jung;Oh, Byung Soo;Kang, Joon-Wun
    • Journal of Korean Society on Water Environment
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    • v.22 no.4
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    • pp.672-677
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    • 2006
  • Ozone/UV combined process is an effective technique to enhance generation of OH radical which is non-selective and powerful oxidant. The objective of this study is to evaluate the inactivation rates of B. subtilis spores by three candidate processes (ozone alone, UV alone, ozone/UV combined processes) at 4 and $20^{\circ}$ and to investigate the effects of OH radical on inactivation of B. subtilis spores. On the UV alone process, required UV dosages for lag phase and 3-log inactivation of B. subtilis spores were determined as $8.9mJ/cm^2$ and $47mJ/cm^2$. However, the inactivation of B. subtilis spores didn't occured beyond 4.5-log inactivation despite increasing UV dose. The inactivation of B. subtilis spores by ozone alone and ozone/UV combined process was investigated with ozone CT (Concentration of disinfectant ${\times}$ Contact time) concept. As a result, inactivation of B. subtilis spores by ozone/UV combined process was faster than by ozone alone, and especially $CT_{lag}$ value B. subtilis spores in the presence and absence of t-BuOH, OH radical scavenger, was investigated to evaluate effects of OH radical formed during ozone/UV combined process. We found that OH radical plays important roles on inactivation of B. subtilis spores.

Organic Removal Efficiency and Toxicity Evaluation of Persistent Microorganism from Dye Wastewater Treatment using a Photooxidation system (광산화시스템을 이용한 염색폐수의 유기물 처리효율 및 잔류미생물의 독성 평가)

  • Jung, Ho Jun;Rhee, Dong Seok
    • Journal of Industrial Technology
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    • v.29 no.A
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    • pp.83-88
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    • 2009
  • The removal efficiency of organic compounds and the toxicity evaluation of microorganism have been studied in dye wastewater treatment using $UV/TiO_2$ and $UV/H_2O_2$ photooxidation system. Sample waters tested in this work were raw dye wastewater and dye wastewater treated in $UV/TiO_2$ and $UV/H_2O_2$ photooxidation system respectively. Total organic carbon(TOC) removal rate was 50% in $UV/TiO_2$ process and 80% in $UV/H_2O_2$ process. It has been investigated with colony counting agar method and paper disk method whether the type of treatment process has affected the microorganism growth. In the raw wastewater, more than four types of microorganisms have survived. But, little of microorganisms were alive at TOC removal rate of 50% in $UV/TiO_2$ system. In contrast to that, two types of microorganisms were found at TOC removal rate of 80% in $UV/H_2O_2$ system.

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Rapid Manufacturing of 3D Micro Products by UV Laser Ablation and Phase Change Filling (UV 레이저 어블레이션과 상변화 충진을 이용한 3차원 마이크로 부품의 쾌속 제작)

  • 신보성;김재구;장원석;황경현
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.26-29
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    • 2003
  • UV laser micromachining are generally used to create microstructures for micro product through a sequence of lithography-based photopatterning steps. However, the micromachining process is not suitable for the rapid realization of complex microscale 3D product because it depends on worker experiences, excessive cost and time to make many masks. In this paper, the more effective micro rapid manufacturing process, which is developed upon the base of laser micromachining. is proposed to fabricate micro products directly using UV laser ablation and phase change filling. The filling process is useful to hold the micro product during the next ablation step. The proposed micro rapid manufacturing process is also proven experimentally that enables to fabricate the 3D microscale products of UV sensitive polymer from 3D CAD data to functional micro parts.

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Rapid Manufacturing of 3D Micro Products by UV Laser Ablation and Phase Change Filling (UV 레이저 어블레이션과 상변화 충진을 이용한 3차원 마이크로 부품의 쾌속 제작)

  • Shin B. S.;Kim J. G.;Chang W. S.;Whang K. H.
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.11 s.176
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    • pp.196-201
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    • 2005
  • UV laser micromachining are generally used to create microstructures for micro product through a sequence of lithography-based photopatterning steps. However, the micromachining process is not suitable for the rapid realization of complex 3D micro product because it depends on worker experiences, excessive cost and time to make many masks. In this paper, the more effective micro rapid manufacturing process, which is developed upon the base of laser micromachining, is proposed to fabricate micro products directly using UV laser ablation and phase change filling. The filling process is useful to hold the micro product during the next ablation step. The proposed micro rapid manufacturing process is also proven experimentally that enables to fabricate the 3D micro products of UV sensitive polymer from 3D CAD data to functional micro parts.

Effect of Process Parameters of UV Enhanced Gas Phase Cleaning on the Removal of PMMA (Polymethylmethacrylate) from a Si Substrate

  • Kwon, Sung Ku;Kim, Do Hyun
    • Transactions on Electrical and Electronic Materials
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    • v.17 no.4
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    • pp.204-207
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    • 2016
  • Experimental study of UV-irradiated O2/H2 gas phase cleaning for PMMA (Polymethylmethacrylate) removal is carried out in a load-locked reactor equipped with a UV lamp and PBN heater. UV enhanced O2/H2 gas phase cleaning removes polymethylmethacrylate (PMMA) better at lower process pressure with higher content of H2. O2 gas compete for UV (184.9 nm) absorption with PMMA producing O3, O(1D) and lower dissociation of PMMA. In our experimental conditions, etching reaction of PMMA at the substrate temperature between 75℃ and 125℃ had activation energy of about 5.86 kcal/mol indicating etching was controlled by surface reaction. Above the 180℃, PMMA removal was governed by a supply of reaction gas rather than by substrate temperature.

A Comparison of Single Disinfection Process for Inactivation of E. coli (E. coli 불활성화를 위한 단일 소독 공정의 비교)

  • Kim, Dong-Seog;Song, Seung-Koo;Park, Young-Seek
    • KSBB Journal
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    • v.25 no.1
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    • pp.25-32
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    • 2010
  • This study was carried out to evaluate the performance of three kinds of single process (electrolysis, UV and ultrasonic process) for the purpose of disinfection of Escherichia coli in water. Among the five kinds of electrode material, disinfection performance of Ir electrode was higher than that of the other electrodes. The order of disinfection performance for E. coli in single process lies in: electrolysis > UV $\gg$ ultrasonic process. Performance of the three single processes was increased with the increase of the electric power. Disinfection efficiency of the three processes was increased with the decrease of the pH. Disinfection of the UV process were decreased by the increase of NaCl dosage and air flow rate. However, ultrasonic process was not affected above two parameters. OH radical was not produced in UV and ultrasonic process. E. coli disinfection of the electrolysis process was well agreed with RNO degradation tendency, except pH.