• Journal of Environmental Health Sciences
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• v.28 no.5
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• pp.59-64
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• 2002

The photocatalytic decolorization of the Rhodamine B (RhB) was studied using a UV/TiO$_2$ reactor. Yakuri titanium dioxide(anatase) was used as the suspended photocatalyst and proved to be effective for decolorization irradiated with UV light (254 mm). The photocatalyzed dioxide concentrations, light intensity and air flow rates. In 0.01 mM RhB, color could be completely photodegraded after 3 hours. Absorption spectrum of an aqueous solution containing RhB showed a continued diminution of the RhB concentration in the solution bulk : concomitantly, no new absorption peaks appeared. This confirmed the decolorization of RhB, i.e., the break up of the chromopore. The optimum loaded titanium dioxide for the decolorization was 0.75 g/(equation omitted). The light intensity showed exponential decay with distance. The decay of light intensity of RhB solution showed different tendency from TiO$_2$. These results suggested that the photocatalytic decolorization of dyes may be available method for decolorizing in wastewater.

• Journal of Environmental Science International
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• v.6 no.4
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• pp.369-378
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• 1997

The effects of various intensity of W-B on barley seeding were investigated by PS I and II activities and chlorophyll fluorescence. The Inhibitory effect of UV-B radiation on electron transport activity was Increased as the intensity of UV-B Irradiation was increased. Especially, PS I is more sensitive to UV-B radiation than PS I is. By the addition of uncle electron donor, DPC, to the chloroplasts of the barley seedlings treated with UV-B, the photoreduction of DCPIP was recovered by only 1 IBI on electron transport activity. However, the activity of PS II was Inhibited by 45% by the treatment with UV-B, but recovered it only 11% by the addition of DPC. These suggest that other sites besides the oxidation site of PS II may be affected more by UV-B Irradiation. As the intensify of UV-B was Increased, Fo was Increased while Fv was decreased, and thus Fv/Fm was decreased. This means that photochemical efficiency was reduced. With this parameters, it might be that UV-B radiation affected adversely to around PS II.

• Korean Journal of Food Science and Technology
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• v.40 no.2
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• pp.228-233
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• 2008

Ultraviolet sterilizers (UVS) are widely used in restaurants, cafeterias and catering businesses in Korea. The proper application of UVS, however, is still questionable since no studies have clearly identified their efficacy and safety, while regulations and regulatory management systems are yet to be established. In the present study, the efficacy of UVS were investigated by measuring spatial UV intensity inside five commercially operated UVS. The operating safety parameters were also checked by measuring leaked UV intensity. The UV intensities were inversely proportional to distance from the UV lamp within 25 cm, and to the square of the distance exceeding 25 cm. The UV intensities in commercial UVS varied with the distance from UV lamp and the incident angle, highlighting efficacy and stability concerns. Notable leakage was detected through the door gaps of a studied UVS, which also brought about safety concerns. Allowable working distances for the UV leaking UVS were suggested based on international standards.

• Journal of Korean Society on Water Environment
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• v.25 no.1
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• pp.96-101
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• 2009

The aim of this research was to apply experimental design methodology to optimizetion the photolytic degradation of N-nitrosodimethylamine (NDMA). Reactions were mathematically described as a function of parameters such as pH, initial NDMA concentration, and UV intensity using the Box-Behnken method. The results showed that the responses of NDMA removal (%) in photolysis were significantly affected by the synergistic effect of linear term of pH, initial NDMA concentration and UV intensity. The application of Response Surfase Methodology (RSM) using the Box-Behnken method yielded the following regression equation, which is an empirical relationship between the removal (%) of NDMA and test variables in coded unit: Y = 50.929 + 16.073(UV) - 7.909(NDMA) - 27.432(pH) - 11.385(UV)(NDMA) - 7.363(UV)(pH) +13.811(NDMA)(pH). The model predictions agreed well with the experimentally observed result ($R_2(ad.)=89%$).

• Journal of Korean Society of Water and Wastewater
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• v.30 no.2
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• pp.139-145
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• 2016

Disinfection of microorganisms using UV light is widely used in the field of water supply and wastewater treatment plant, In spite of high germicidal effect and relatively clean by-product, UV disinfection has fundamental defeat that is accumulation of fouling materials at the interface of water and lamp sleeve. Non-contact type of UV photoreactor which can avoid this fouling generation was developed and the experimental performance evaluation of the system was carried out in this study. Log inactivation rate of E. coli was selected as a disinfection index. The concentration of E. coli of second clarifier effluent was $8.2{\times}10^1-8.2{\times}10^3$ colony per mL and was well inactivated by the non-contact type of UV photoreactor. Under the UV intensity condition of $2.1-2.5mW/cm^2$, E. coli removal rate was observed in the range of 54 - 95% when the HRT was increased from 10 to 52 seconds. Experimental results showed that log inactivation of E. coli was proportional to UV dosage and $200mJ/cm^2$ of UV dose is expected for the 2.0 log inactivation of E. coli from the second clarifier effluent. Between the two parameters of UV intensity and contact time which are consist of UV dose, UV intensity was 4 times more effective than contact time.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.28 no.3
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• pp.78-83
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• 2014

To minimize the financial loss due to power facility malfunction, on-line diagnostic techniques are required to grasp any abnormal state of facilities in the live line as well as devices to diagnose abnormal states of power facility in an easy and prompt manner. This study aims to develop a portable UV detecting system by means of UV sensors for easier and efficient inspection of the degradation state of power facility in a long distance. Accordingly, it includes a simulation of corona discharges that may occur due to degradation of power facility and detection of ultraviolet pulse generation depending on the corona discharge intensity and measuring distance in application of UV sensors. Additionally, the optimal algorithm is determined for its application to the system's degradation diagnosis program based on the measured experiment data.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11b
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• pp.108-111
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• 2001

ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition(PLD) technique for light emitting device applications. We have controlled the emission intensity of UV and visible light, depending on film thickness and various post-annealing time. UV emission became strong as the thickness of ZnO thin films increased. The intensity of visible light was strong as post-annealing temperature increased. The optical properties of the ZnO thin films were characterized by PL(photoluminescence) and the structural properties of the ZnO were characterized by XRD for the application of ZnO light emission device.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11a
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• pp.108-111
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• 2001

ZnO thin films on (001) sapphire substrates knave been deposited by pulsed laser deposition(PLD) technique for light emitting device applications. We have controlled the emission intensity of UV and visible light, depending on film thickness and various post-annealing time. UV emission became strong as the thickness of ZnO thin films increased. The intensity of visible light was strong as post-annealing temperature increased. The optical properties of the ZnO thin films were characterized by PL(photoluminescence) and the structural properties of the ZnO were characterized by XRD for the application of ZnO light emission device.

• Journal of Korean Society of Water and Wastewater
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• v.26 no.5
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• pp.685-692
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• 2012

UV technology is widely used in water and wastewater treatment. Many researches have been conducted on microbial disinfection and micro pollutant reduction with UV treatment. However, the study on NOM with UV has limited because low/medium pressure UV lamp is not sufficient to affect refractory organics such as NOM. Pulsed UV treatment using UV flash lamp can be operated in the pulsed mode with much greater peak intensity. The pulse duration is typically in microseconds, whereas the interval between pulses is in the order of milliseconds. The high intensity of pulsed UV would mineralize NOM itself as well as change the characteristics of NOM. Chlorine demand and DBPs formation is affected on the changed amounts and properties of NOM. The objective of this study is to investigate the effect on NOM, chlorine residual, and chlorinated DBPs formation with pulsed UV treatment.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.185-187
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• 2004

The electron concentration of ZnO thin film fabricated by pulsed laser deposition was controlled by varying oxygen gas pressure. The electron concentration of ZnO was increased from $10^{17}\;to\;10^{19}/cm^3$ as oxygen gas pressure increased from 20 mTorr to 350 mTorr. Ultraviolet(UV) intensity of photoluminescence of ZnO was controlled, too. UV intensity of ZnO was increased as oxygen gas pressure increased from 20 mTorr to 350 mTorr. The relation between electron concentration and UV intensity was investigated.