• Journal of the Korean Society of Manufacturing Process Engineers
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• v.12 no.5
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• pp.16-22
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• 2013

A two-dimensional photonic crystal structure was investigated using a roll-to-roll nanoreplication and physical vapor deposition processes for the inexpensive enhanced fluorescence substrate which is not sensitive to the polarization directions of excitation light source. An 8 inch silicon master having nano dot array with a diameter of 200 nm, a height of 100 nm and a pitch of 400 nm was prepared by KrF laser scanning lithography and reactive ion etching processes. A flexible polymer mold was fabricated by flat type UV replication process and a deposition of 10 nm nickel layer as an anti-adhesion layer. A roll mold was prepared by warping the flexible polymer mold on an aluminum roll base and a roll-to-roll UV replication process was carried out using the roll mold. After the deposition of ~ 100 nm $TiO_2$ layer on the replicated nano dot array, a 2 dimensional photonic crystal structure was realized with a resonance wavelength of 635 nm for both p- and s-polarized light sources.

• Transactions of the Society of Information Storage Systems
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• v.2 no.2
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• pp.91-95
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• 2006

High-density image sensors rave microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using UV transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

• 정보저장시스템학회:학술대회논문집
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• 2005.10a
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• pp.17-21
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• 2005

High-density image sensors have microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using W transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

• The Korean Journal of Zoology
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• v.23 no.4
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• pp.203-218
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• 1980

Unscheduled DNA synthesis, chromosome aberrations, sister chromatid exchanges and DNA replication inhibition induced by the combined treatments with ara-C and UV-light or MMS in $HF_1$, CHO and $HelaS_3$ cells were studied, and the results obtained were as follows: (1) Ara-C was found to inhibit UV-or MMS-induced unscheduled DNA synthesis and the inhibitory effect of ara-C was more remarkable in its post-treatment. (2) Ara-C enhanced the rate of chromosome aberrations induced by MMS or UV-light. Post-treatment with ara-C exhibited the synergistic effect on MMS-induced chromosome aberrations mainly by increases of chromatid deletions. (3) Contrarily, ara-C did not increase the rate of sister chromatid exchanges, particularly in the pre-treatment with MMS, although it was found to induce sister chromatid exchanges. (4) The rate of DNA synthesis was declined immediately after are-C treatment and then recovered. The combined treatments with ara-C and UV-light or MMS showed that the initial response on replication inhibition was similar to that of ara-C, but later responses were similar to that of UV-light or MMS treated group.

• The Korean Journal of Zoology
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• v.25 no.2
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• pp.55-62
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• 1982

DNA synthesis, unscheduled DNA synthesis, excision of pyrimidine dimers and phtoreactivation were determined in UV-irradiated differentiating muscle cells at various times of primary culture of 12 day chick embryos and results obtained were as follows. The rates of UV-induced unscheduled DNA synthesis were increased as increase of UV dose. And the rates were gradually decreased as the increase of time after culture, but at higher doses the decreasing tendency was remarkable. The patterns of DNA replication were changed drastically as a function of time so that in the seven day cultures the rate of $^3$H-thymidine incorporation was found to be 0.2% of the original activity. The pattern of inhibition of DNA replication by UV damage demonstrated that in cells of earlier stages there were no remarkable changes, but in cells of later stages there was significant fluctuation. Photoreactivation and the excision of pyrimidine dimer in the one day cultures showed that photoreactivation occurred immediately after UV-irradiation, but excision of pyrimidine dimer was gradually and slowly occurred. These results indicate that the differentiation of embryonic muscle cells accompanies the gradual reduction of DNA replication and unscheduled DNA synthesis, and that the photoreactivation is rapid process compared to excision repair.

• The Journal of Natural Sciences
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• v.9 no.1
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• pp.45-52
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• 1997

We have examined the effects of low concentrations of MNNG, alkylating agent, in survival and mutagenesis in Aspergillus nidulans. Pretreatments of cells with nontoxic and submutagenic doses of MNNG did not reduce the cytotoxic and mutagenic effects of exposure to a high concentration of drug. The results imply that adaptive responses on survival and mutagenesis for MNNG treatments do not occur in Aspergillus nidulans. In the first mitotic cell cycle during germination, the sensitivity to MNNG has been investigated at hourly time interval, and compared with that for UV irradiation. In both UV and MNNG treatments, the sensitivity increased till S cell stage, and decreased while DNA replication continued. Different from that show for UV irradiation, lethality to MNNG reached to the maximum at G2 cell stage.

• Proceedings of the Materials Research Society of Korea Conference
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• 2007.05a
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• pp.38.1-38.1
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• 2007

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2005.10a
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• pp.79-82
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• 2005

Fresnel lens has number of applications in the optical systems because of its advantages. It is nearly flat lens that has small weight. It is conventionally used in lighthouse beacons, condensing unit of overhead projector and etc. Recently, demands of small size optical systems such as display units, information storage systems, optical detecting units had increased. Conventional manufacturing process of high quality Fresnel lens is direct machining. But it is not suitable for mass production because of high cost and long cycle time. Replication process is more suitable for mass production. But the Fresnel lens has number of sharp blade shape prism. In the replication process, this blade shape causes defects that can affect optical efficiency. In this study, replication process of blade shape pattern that has maximum height of $280{\mu}m$, aspect ratio 1.4 for Fresnel lens application.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1493-1496
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• 2005

In this paper, we describe a simple, precise and low cost method of fabricating PDMS stamp for UV embossing. It is important to improve the replication quality of stamp because the accuracy of fabricated structure is related to that of the stamp in UV embossing. The PDMS stamp has been fabricated by the replica molding technology with ultrasonic vibration to eliminate micro-air bubbles during the fabrication process of PDMS stamp. Also, this fabrication to use ultrasonic vibration promotes PDMS solution to fill into micro channel and edge parts. We report the fabrication of an optical core using UV embossing with fabricated PDMS stamp. This fabricated core is $7\;\mu{m}\;at\;depth,\;6\;\mu{m}\;at\;width.\;This\;measured\;value\;has\;the\;difference\;below\;1\;\mu{m}$compared to the original stamp. The surface roughness of core is about 14 nm root mean square. This is satisfactory value to use low-loss optical waveguide. Our successful demonstration of precise replica technology presents an alternative approach for the stamp of UV embossing.

• Transactions of the Society of Information Storage Systems
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• v.6 no.1
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• pp.37-40
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• 2010

Fresnel lens is a kind of refractive optical lens with various advantages. It has nearly flat shaped optical lens that has small mass. Fresnel lens has number of applications in the compact optical systems. Recently, demands of high quality Fresnel lens for small size optical systems such as illumination units, compact imaging systems, display units, information storage systems, optical detecting units had increased rapidly. Conventional manufacturing process of high quality Fresnel lens is direct machining. However, it is not suitable for mass production because of high cost and long cycle time. Replication method can provide cost effective mass production process. However, there are various issues about replication of Fresnel lens. Fresnel lens has number of sharp blade shape prism. In the replication process, this blade shape causes defects that can affect optical efficiency. In this study, replication processes; injection molding process and UV imprinting process, were developed and evaluated using Fresnel lens that has maximum pattern height of $250\;{\mu}m$ and aspect ratio of 1.5.