• Title/Summary/Keyword: UV 레진

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Fracture Behavior of Glass/Resin/Glass Sandwich Structures with Different Resin Thicknesses (서로 다른 레진 두께를 갖는 유리/레진/유리샌드위치 구조의 파괴거동)

  • Park, Jae-Hong;Lee, Eu-Gene;Kim, Tae-Woo;Yim, Hong-Jae;Lee, Kee-Sung
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.34 no.12
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    • pp.1849-1856
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    • 2010
  • Glass/resin/glass laminate structures are used in the automobile, biological, and display industries. The sandwich structures are used in the micro/nanoimprint process to fabricate a variety of functional components and devices in fields such as display, optics, MEMS, and bioindustry. In the process, micrometer- or nanometer-scale patterns are transferred onto the substrate using UV curing resins. The demodling process has an important impact on productivity. In this study, we investigated the fracture behavior of glass/resin/glass laminates fabricated via UV curing. We performed measurements of the adhesion force and the interfacial energy between the mold and resin materials using the four-point flexural test. The bending-test measurements and the load-displacement curves of the laminates indicate that the fracture behavior is influenced by the interfacial energy between the mold and resin and the resin thickness.

Study on the Formation of Residual Layer Thickness by Changing Magnitude and Period of UV Imprinting Pressure (UV임프린트 공정에서 임프린팅 가압력 및 가압시간에 따른 레진 잔막 두께형성에 대한 실험연구)

  • Shin, Dong-Hyuk;Jang, Si-Youl
    • Tribology and Lubricants
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    • v.26 no.5
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    • pp.297-302
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    • 2010
  • This study is focused on the resin layer formation of UV imprinting process by changing imprinting pressure and period. The mold shape is made for the process of window open over the pattern transfer area and the imprinting period is assigned as the time just before the UV light curing. The residual layer is measured by changing the imprinting period and pressure magnitude, and the measured data of residual layer provides useful information for the design of the process conditions of imprinting processes.

Fabrication and Characterization of UV-curable Conductive Transparent Film with Polyaniline Nanofibers (폴리아닐린 나노섬유를 이용한 광경화형 전도성 투명필름의 제조 및 특성)

  • Kim, Sung-Hyun;Song, Ki-Gook
    • Polymer(Korea)
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    • v.36 no.4
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    • pp.531-535
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    • 2012
  • Conductive polyaniline (PANI) nanofibers in UV-curable resin were used for a transparent conductive film. The emeraldine-salt PANI (ES-PANI) nanofibers were prepared by chemical oxidation polymerization of aniline, which could be changed into emeraldine-base PANI by dedoping. EB-PANI nanofibers as a precursor for conductive fillers were thereby transformed into re-dpoed PANI (rES-PANI) by dodecylbenzenesulfonic acid in the UV-curable resin solution. rES-PANI nanofibers have high conductivity and long-term stability in the solution without a defect of nanostructure. The resulting conductive resin solution was proved to be highly stable where no precipitation of rES-PANI fillers was observed over a period of 3 months. The transparent film was spin-casted on a poly(methyl methacrylate) sheet of thickness ca. $5{\mu}m$. A surface resistance of $6.5{\times}10^8{\Omega}/sq$ and transmittance at 550 nm of 91.1% were obtained for the film prepared with a concentration of 1.4 wt% rES-PANI nanofibers in the solution. This transformation process of rES-PANI from ES-PANI by dedoping-redoping can be an alternative method for the preparation of an antistatic protection film with controllable surface resistance and optical transparencies with the PANI concentration in UV-curable solution.

Experiment and Numerical Study on Thermal Characteristics of UV-NIL Process Considering the Cure Kinetics of Photo-polymer (레진의 경화 반응을 고려한 UV-NIL공정의 열특성에 관한 실험 및 수치해석 연구)

  • Kim, Woo-Song;Park, Gyeong-Seo;Nam, Jin-Hyun;Yim, Hong-Jae;Jang, Si-Yeol;Lee, Kee-Sung;Jeong, Jay;Lim, Si-Hyeong;Shin, Dong-Hoon
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1847-1850
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    • 2008
  • The process conditions during ultraviolet nanoimprint lithography (UV-NIL) process such as temperature, stamping pressure, UV irradiation, etc. are effective factors for successful imprinting of complex and fine patterns. In this study, the effects of aluminum mold on the thermal characteristics of UV-NIL process were investigated through imprinting experiments and numerical simulations. The temperature of polymer resin on mold was measured to study thermal characteristics during UV curing. From the experimental and numerical results, the importance of curing reaction control for UV-NIL process was discussed for deformation characteristics.

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Nanoimprinting Pattern Formation Using Photo-Curable Acrylate Composites (광경화성 아크릴레이트 복합체를 이용한 나노 임프린트 패턴 형성)

  • Kim, Sung-Hyun;Park, Sun-Hee;Moon, Sung-Nam;Lee, Woo-Il;Song, Ki-Gook
    • Polymer(Korea)
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    • v.36 no.4
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    • pp.536-541
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    • 2012
  • The effects of silica content were studied on UV curing characteristics and defect formations in imprinted patterns of hundreads nanometer size for the photo-curable imprinting composites with silica particles. An increase in elasticity and a decrease in shrinkage were observed with an increase in silica content in the imprinting resin which was UV cured at room temperature. However, the patterned nano-pillars were stuck together with neighboring nano-pillars if the amount of silica is more than 7 wt%. This can be ascribed to the increased viscosity of imperfectly cured resin due to the obstruction of the photo-reaction by silica particles. Addition of silica to the imprinting resin is useful in enhancing the strength of the cured resin although it is difficult to get good imprinted patterns for the resin with more than 7 wt% of silica due to the reduction of photo-reaction conversion.

UV Nanoimprint Lithography using an Elementwise Patterned Stamp and Pressurized Air (Elementwise Patterned Stamp와 부가압력을 이용한 UV 나노임프린트 리소그래피)

  • Sohn H.;Jeong J.H.;Sim Y.S.;Kim K.D.;Lee E.S.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.672-675
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    • 2005
  • To imprint 70-nm wide line-patterns, we used a newly developed ultraviolet nanoimprint lithography (UV-NIL) process in which an elementwise patterned stamp (EPS), a large-area stamp, and pressurized air are used to imprint a wafer in a single step. For a single-step UV-NIL of a 4' wafer, we fabricated two identical $5'\times5'\times0.09'(W{\times}L{\times}H)$ quartz EPSs, except that one is with nanopatterns and the other without nanopatterns. Both of them consist of 16 small-area stamps, called elements, each of which is $10\;mm\;\times\;10\;mm$. UV-curable low-viscosity resin droplets were dispensed directly on each element of the EPSs. The volume and viscosity of each droplet are 3.7 nl and 7 cps. Droplets were dispensed in such a way that no air entrapment between elements and wafer occurs. When the droplets were fully pressed between ESP and wafer, some incompletely filled elements were observed because of the topology mismatch between EPS and wafer. To complete those incomplete fillings, pressurized air of 2 bar was applied to the bottom of the wafer for 2 min. Experimental results have shown that nanopatterns of the EPS were successfully transferred to the resin layer on the wafer.

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Comparative analysis of strain according to two wavelengths of light source and constant temperature bath deposition in ultraviolet-curing resin for dental three-dimensional printing (치과 3D 프린팅용 자외선 경화 레진에 광원의 두 가지 파장에 따른 경화 및 항온수조 침적에 따른 변형률의 비교 분석)

  • Kim, Dong-Yeon;Lee, Gwang-Young;Kang, Hoo-Won;Yang, Cheon-Seung
    • Journal of Technologic Dentistry
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    • v.42 no.3
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    • pp.208-212
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    • 2020
  • Purpose: This study aimed to analyze the shrinkage and expansion strain of ultraviolet (UV)-cured resin according to the wavelength of the light source and compare the shrinkage and expansion. Methods: We prepared the mold with according to the ISO 4049 specimen. The size of the circle in the mold was prepared with a height of 6.02 mm and a diameter of 4 mm. UV-curable resin for three-dimensional (3D) printing was injected into the circular mold. The control group was irradiated with a wavelength of 400~405 nm using UV-curing equipment (400 group), and the experimental group was irradiated with a wavelength of 460~465 nm (460 group). Both groups were produced ten specimens. The produced specimen was first measured with a digital micrometer. After the first measurement, the specimen was immersed in a constant temperature water bath for 15 days, after which the second measurement was performed, and the third measurement was taken after 30 days. The measured values were analyzed using the independent sample t-test (α=0.05). Results: In the non-immersion water tank, the contraction was 0.9% in the 400 group and 1.3% in the 460 group. In the constant temperature bath, the expansion was high at -0.4% in the 400 group for 15 days, and the smallest expansion was -0.03% for the 400 group for 30 days. There were significant differences between the two groups (p<0.05). Conclusion: The 400 group had a lower UV resin specimen strain than the 460 group. Therefore, it is recommended to use the wavelength required by the UV-curing resin.

Moth-eye 패턴이 형성된 고 투과성 전도성 폴리머 필름 제작

  • Min, Byeong-Hak;Jo, Jung-Yeon;Lee, Seong-Hwan;Han, Gang-Su;Lee, -Heon
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.63.1-63.1
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    • 2011
  • 현재 상용 중인 터치패널의 전도성 필름으로는 ITO가 주로 사용된다. 하지만, 디스플레이 기기의 수요 증가와 Indium의 고갈로 인한 ITO의 수요 공급 불균형으로 인한 원가 문제가 대두되고 있다. 이 때문에, Carbon nanotube (CNT), Graphene 등의 대체 투명 전도성 물질들이 연구 중에 있지만 투과율 및 저항 문제 등이 문제가 되고 있다. 본 연구에서는 투명 전도성 필름의 광 투과도 향상을 위하여, 자외선 경화 레진을 이용하여, 전도성 필름 상에 모스 아이 레진 패턴을 형성하는 실험을 진행하였다. 패턴이 형성된 이후에는 Scanning Electro Microscope를 통하여 패턴의 형성 유무를 관찰하였고, UV-vis와 4-point probe를 이용하여 투과도 및 저항을 측정하였다. 실험 결과 모스아이패턴을 필름에 패터닝 함으로써, 전체적으로 투과도가 증가된다는 것을 확인 할 수 있었으며, 투과도의 증가폭은 단면 패터닝보다는 양면 패터닝을 한 경우가 높았다. 그리고 저항 변화에 있어서는 패턴이 있는 부분의 경우 표면 잔여층으로 인하여 급격하게 증가하였지만, 전도면 반대편에 패터닝을 진행한 경우 거의 변화하지 않았다는 것을 확인할 수 있었다. 결과적으로, 본 연구를 통해 나노 임프린트 리소그래피를 통해 전도성 폴리머 필름 상부에 모스아이나노 구조물을 제작하였고, 이를 통해 기존의 전도성 폴리머 필름의 낮은 투과율을 향상시킬 수 있었다.

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Development of Thin, Transparent Oxo-Biodegradable Film with Antibacterial and Freshness Agent (항균, 신선도 기능을 부여한 투명 산화생분해 필름 개발)

  • Choi, Sung-Wook;Lee, Kun-Woo;Yu, Ji-Ye;You, Young-Sun
    • KOREAN JOURNAL OF PACKAGING SCIENCE & TECHNOLOGY
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    • v.23 no.3
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    • pp.133-141
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    • 2017
  • This article described the development of transparent antimicrobial oxo-biodegradable (AOB) film with the function of enhanced freshness of food by employing oxo-biodegradable masterbatch (MB) and antimicrobial MB together with organic metal salt, organic acid, or unsaturated fatty acid. Antibacterial test of the AOB film with the different contents of the antimicrobial MB resulted in the significant freshness extension of plum. Tensile strength and elongation rate of the AOB films before UV treatment were similar to those of polyethylene films used as control. The reduced mechanical properties of AOB film after UV treatment (340 nm) suggested that the AOB film could be degraded by oxo biodegradation. The developed AOB films can effectively prevent decomposition of food by providing antibacterial function and preserving freshness.