• Title/Summary/Keyword: Two-Photon polymerization

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Establishment and Application of a Femtosecond-laser Two-photon-polymerization Additive-manufacturing System

  • Li, Shanggeng;Zhang, Shuai;Xie, Mengmeng;Li, Jing;Li, Ning;Yin, Qiang;He, Zhibing;Zhang, Lin
    • Current Optics and Photonics
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    • v.6 no.4
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    • pp.381-391
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    • 2022
  • Two-photon-polymerization additive-manufacturing systems feature high resolution and precision. However, there are few reports on specific methods and possible problems concerning the use of small lasers to independently build such platforms. In this paper, a femtosecond-laser two-photon-polymerization additive-manufacturing system containing an optical unit, control unit, monitoring unit, and testing unit is built using a miniature femtosecond laser, with a detailed building process and corresponding control software that is developed independently. This system has integrated functions of light-spot detection, interface searching, micro-/nanomanufacturing, and performance testing. In addition, possible problems in the processes of platform establishment, resin preparation, and actual polymerization for two-photon-polymerization additive manufacturing are explained specifically, and the causes of these problems analyzed. Moreover, the impacts of different power levels and scanning speeds on the degree of polymerization are compared, and the influence of the magnification of the object lens on the linewidth is analyzed in detail. A qualitative analysis model is established, and the concepts of the threshold broadening and focus narrowing effects are proposed, with their influences and cooperative relation discussed. Besides, a linear structure with micrometer accuracy is manufactured at the millimeter scale.

Fabrication of Sub-100 nm Embossing Patterns using Weakly-Polymerized Region via Long-Exposure Technique (LET) in Two-Photon Polymerization (긴 레이저 조사방식에 의한 저밀도 이광자 광중합 영역을 이용한 Sub-100nm 정밀도의 엠보싱 패턴제작)

  • Park, Sang-Hu;Lim, Tae-Woo;Yang, Dong-Yol
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.1 s.190
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    • pp.64-70
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    • 2007
  • A long-exposing technique (LET) has been conducted to create nanoscale patterns applicable to diverse micro-devices using two-photon polymerization (TPP). By the weakly-polymerized region via the LET, double-layered embossing patterns can be fabricated simply in a single step. The LET makes possible a voxel and its surrounding to be fully grown into more than 500 nm in lateral size and weakly-polymerized region (WPR), respectively. In the WPR. interconnecting ribs between voxels are generated, and they lead to the creation of double-layered dot patterns. Moreover, by controlling the distance between voxels, various shapes of interconnecting rib can be fabricated when the LET is applied. Various embossing patterns were fabricated to evaluate the usefulness of the proposed technique as a novel nanopatterning technique in TPP.

Fabrication of sub-30 nm nanofibers using weakly two-photon induced photopolymerized region (저밀도 이광자 광중합 영역을 이용한 30 nm 이하의 패턴제작)

  • Park, Sang-Hu;Lim, Tae-Woo;Yang, Dong-Yol
    • Proceedings of the KSME Conference
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    • 2007.05a
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    • pp.1249-1253
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    • 2007
  • Experimental studies on the fabrication of sub-30 nm nanofibers using weakly two-photon induced photopolymerized region have been carried out. For the generation of nanofibers inside or outside microstructures, an over-polymerizing method involving a long exposure technique (LET) was proposed. Such nanofibers can find meaningful applications as bio-filters, mixers, and many other uses in diverse research field. A multitude of nanofibers with a notably high resolution (about 22 nm) in two-photon polymerization was achieved using the LET. Furthermore, it was demonstrated that the LET can be employed for the direct fabrication of various embossing patterns by controlling the exposure duration and the interval between voxels. Thin interconnecting networks are formed regularly in the boundary of the over-polymerized region, which allows for the creation of various pattern shapes. Overall of this work, some patterns including nanofibers are fabricated by the LET.

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Fabrication of Three-Dimensional Micro-Shell Structures Using Two-Photon Polymerization (이광자 흡수 광중합에 의한 3차원 마이크로 쉘 구조물 제작)

  • Park Sang Hu;Lim Tae Woo;Yang Dong-Yol
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.29 no.7 s.238
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    • pp.998-1004
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    • 2005
  • A nano-stereolithography (NSL) process has been developed for fabrication of 3D shell structures which can be applied to various nano/micro-fluidic devices. By the process, a complicated 3D shell structure on a scale of several microns can be fabricated using lamination of layers with a resolution of 150 nm in size, so it does not require the use of my sacrificial layer or any supporting structure. A layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) induced using a femtosecond laser processing. When the polymerization process is finished, unsolidified liquid state resins can be removed easily by dropping several droplets of ethanol fur developing the fabricated structure. Through this work, some 3D shell structures, which can be applied to various applications such as nano/micro-fluidic devices and MEMS system, were fabricated using the developed process.

Fabrication of Microchannels Having Sub-30 nm Nanofibers Inside of Them via Overlapping Weakly Two-Photon Polymerized Region (저밀도 이광자 광중합 영역의 중첩방법을 이용한 기능성 마이크로 채널 제작에 관한 연구)

  • Park, Sang-Hu;Lim, Tae-Woo;Yang, Dong-Yol
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.31 no.12
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    • pp.1144-1149
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    • 2007
  • Experimental studies on the fabrication of sub-30 nm nanofibers using weakly two-photon induced photopolymerized region have been carried out. For the generation of nanofibers inside or outside microstructures, an over-polymerizing method involving a long exposure technique (LET) was proposed. Such nanofibers can find meaningful applications as bio-filters, mixers, and many other uses in diverse research field. A multitude of nanofibers with a notably high resolution (about 22 nm) in two-photon polymerization was achieved using the LET. Furthermore, it was demonstrated that the LET can be employed for the direct fabrication of various embossing patterns by controlling the exposure duration and the interval between yokels. Thin interconnecting networks are formed regularly in the boundary of the over-polymerized region, which allows for the creation of various pattern shapes. Overall of this work, some patterns including nanofibers are fabricated by the LET.

Lithographic Microfabrication for Nano/Micro-Objects by using Two-Photon Polymerization Technique

  • Lee, Kwang-Sup;Kang, Seung-Wan;Kim, Ran-Hee;Kim, Ju-Yeon;Kim, Won-Jin;Park, Sang-Hu;Lim, Tae-Woo;Yang, Dong-Yol;Sun, Hong-Bo;Kawata, Satoshi
    • Proceedings of the Polymer Society of Korea Conference
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    • 2006.10a
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    • pp.15-16
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    • 2006
  • Since two-photon polymerization (TPP) emerged as a new technology over a decade ago, a large variety of micro-objects including 3-D micro-optical components, micromechanical devices, and 3-D photonic crystals have been fabricated using TPP with a high spatial resolution of approximately submicron scale to 100 nm. Recent efforts have been made to improve the fabrication efficiency and precision of micro-objects obtained with TPP; in particular, many studies have been carried out with the aim of developing efficient two-photon absorbing chromophores. In this presentation, we will discuss our efforts to develop highly efficient two-photon absorbing materials and also describe recent attempts to enhance the resolution and to improve the fabrication efficiency of nanofabrications based on TPP.

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Recent Progress in the Nanoscale Additive Layer Manufacturing Process Using Two-Photon Polymerization for Fabrication of 3D Polymeric, Ceramic, and Metallic Structures (이광자 광중합 공정을 이용한 3차원 미세구조물 제작기술 동향)

  • Ha, Cheol-Woo;Lim, Tae-Woo;Son, Yong;Park, Suk-Hee;Park, Sang-Hu;Yang, Dong-Yol
    • Journal of the Korean Society for Precision Engineering
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    • v.33 no.4
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    • pp.265-270
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    • 2016
  • Recently, many studies have been conducted on the nano-scale fabrication technology using twophoton- absorbed polymerization induced by a femtosecond laser. The nano-stereolithography process has many advantages as a technique for direct fabrication of true three-dimensional shapes in the range over several microns with sub-100 nm resolution, which might be difficult to obtain by using general nano/microscale fabrication technologies. Therefore, two-photon induced nano-stereolithography has been recently recognized as a promising candidate technology to fabricate arbitrary 3D structures with sub-100 nm resolution. Many research works for fabricating novel 3D nano/micro devices using the two-photon nano-stereolithography process, which can be utilized in the NT/BT/IT fields, are rapidly advancing.

Fabrication of Precise Patterns using a Laser Beam Expanding Technique in Nano-Replication Printing (nRP) Process (레이저 빔 단면확대를 이용한 나노 복화(複畵)공정의 패턴 정밀도 향상에 관한 연구)

  • Park Sang Hu;Lim Tae Woo;Yang Dong-Yol;Yi Shin Wook;Kong Hong Jin
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.1
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    • pp.175-182
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    • 2005
  • A laser beam expanding technique is employed to fabricate precise nano-patterns in a nano-replication printing (nRP) process. In the nRP process, some patterns can be fabricated in the range of several microns inside on a polymerizable resin by using a volume-pixel (voxel) matrix that is transformed from a two-tone bitmap figure file. The liquid monomers are polymerized by means of a two-photon-absorption (TPA) phenomenon that is induced by a femtosecond (fs)-pulse laser. The yokels are generated consecutively to merge into adjoining yokels in the process of fabricating a pattern. The resolution of a fabricated pattern can be obtained under the diffraction limit of a laser beam by the two-photon absorbed polymerization (TPP). In this work, a beam-expanding technique has been applied to enlarge a working area and to fabricate precise patterns. Through this work, a working area is expanded by the technique as much as 2.5 times compared with a case of without a beam expanding technique, and precision of outside patterns is improved.