• 제목/요약/키워드: Tungsten Oxide

검색결과 206건 처리시간 0.031초

$WO_3$ 박막의 일렉트로크로믹 특성 (The Electrochromic Properties of Tungsten Oxide Thin Films)

  • 박승희;정주영;조봉희;김영호
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 1992년도 추계학술발표강연 및 논문개요집
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    • pp.54-54
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    • 1992
  • ITO투명전극/WO$_3$박막/LiClO$_4$-PC/백금 대향전극 구조를 갖는 일렉트로 크로믹 소자를 구성하여 WO$_3$박막의 일렉트로크로믹 특성을 조사하였다. WO$_3$박막의 coloration의 LiClO$_4$-PC 유기전해질과 ITO 투명전극으로부터 Li$^{+}$이온과 전자들의 이중주입에 의하여 청색으로 나타났으며, 전기화학전인 산화반응에 의하여 bleaching 현상이 가역적으로 일어났다. Coloration 과 bleaching 현상, 광학밀도, 구동전압 및 응담속도등의 일렉트로크로믹 특성은 WO$_3$ 박막의 성장 조건, WO$_3$박막 두께, ITO 투명전극의 sheet resistance, 대향전극 및 인가전압에 크게 의존하는 것으로 밝혀졌다.

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Impact of gate protection silicon nitride film on the sub-quarter micron transistor performances in dynamic random access memory devices

  • Choy, J.-H.
    • 한국결정성장학회지
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    • 제14권2호
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    • pp.47-49
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    • 2004
  • Gate protection $SiN_x$ as an alternative to a conventional re-oxidation process in Dynamic Random Access Memory devices is investigated. This process can not only protect the gate electrode tungsten against oxidation, but also save the thermal budget due to the re-oxidation. The protection $SiN_x$ process is applied to the poly-Si gate, and its device performance is measured and compared with the re-oxidation processed poly-Si gate. The results on the gate dielectric integrity show that etch damage-curing capability of protection $SiN_x$ is comparable to the re-oxidation process. In addition, the hot carrier immunity of the $SiN_x$ deposited gate is superior to that of re-oxidation processed gate.

감이온 전양효과 트랜지스트 (Ion Sensitive Field Effect Transistor)

  • 손병기
    • 대한전자공학회논문지
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    • 제18권5호
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    • pp.22-29
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    • 1981
  • 게이트절연층을 위한 HCI 열처리법 텅그스텐 metallization 및 fumed silica epoxy를 쓴 다중층 encapsulation 기술을 감이온 전장효과 트랜지스터(ISFET) 제조에 활용하고 이의 동작특성을 조사하였다. 또 ISFET를 위한 이론적 모형을 제시하고 이 것이 실험사실과 잘 일치함을 보였다. 제조된 ISFET는 빠른 반응, 긴 수명 및 작은 이압특성을 나타내었는데, 특히 안정부는 크게 개선되었다.

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다바이스 웨이퍼의 평탄화와 종점 전후의 평탄화 특성에 관한 연구 (A study on the global planarization characteristics in end point stage for device wafers)

  • 정해도;김호윤
    • 전자공학회논문지D
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    • 제34D권12호
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    • pp.76-82
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    • 1997
  • Chemical mechanical polishing (CMP) has become widely accepted for the planarization of multi-interconnect structures in semiconductor manufacturing. However, perfect planarization is not so easily ahieved because it depends on the pattern sensitivity, the large number of controllable process parameters, and the absence of a reliable process model, etc. In this paper, we realized the planarization of deposited oxide layers followed by metal (W) polishing as a replacement for tungsten etch-back process for via formation. Atomic force microscope (AFM) is used for the evaluation of pattern topography during CMP. As a result, AFM evaluation is very attractive compared to conventional methods for the measurment of planarity. mOreover, it will contribute to analyze planarization characteristics and establish CMP model.

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전자비임에 의해 제작된 WO$_3$ 박막의 전기적착색 특성에 대한 진공도의 효과 (The Vacuum Pressure Effects on Electrochromic Properties of Tungsten Oxide Thin Films by Electron Beam Evaporation)

  • 이길동
    • 한국에너지공학회:학술대회논문집
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    • 한국에너지공학회 1995년도 춘계학술발표회 초록집
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    • pp.41-44
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    • 1995
  • The electrochromic WO$_3$ thin films were prepared by using an electron - beam evaporation technique. The influence of the electron - beam evaporation conditions. especially the vacuum pressure, and resistance of ITO substrate on the structural and electrochromic properties of the investigated film was presented. This films showed electrochromic behavior in an aqueous electrolyte of 1 M H$_2$SO$_4$. Among these WO$_3$ thin films, films prepared at a vacuum pressure of 10$^{-4}$ mbar were found to be most stable in terms of cycling durability. The chemical stability of film against dissolution in the aqueous solution was also shown to depend on the quantity of water in the film.

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소형 직접 메탄올 연료전지를 위한 나노 합금 전극 (Nanostructured Alloy Electrode for use in Small-Sized Direct Methanol Fuel Cells)

  • 박경원;최종호;박인수;남우현;성영은
    • 한국전기화학회:학술대회논문집
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    • 한국전기화학회 2003년도 연료전지심포지움 2003논문집
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    • pp.83-88
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    • 2003
  • PtRu alloy and $PtRu-WO_3$ nanocomposite thin-film electrodes for methanol electrooxidation were fabricated by means of a sputtering method. The structural and electrochemical properties of well-defined PtRu alloy thin-film electrodes were characterized using X-ray diffraction, Rutherford backscattering spectroscopy. X-ray photoelectron spectroscopy, and electrochemical measurements. The alloy thin-film electrodes were classified as follows: Pt-based and Ru-based alloy structure. Based on structural and electrochemical understanding of the PtRu alloy thin-film electrodes, the well-controlled physical and (electro)chemical properties of $PtRu-WO_3$, showed superior specific current to that of a nanosized PtRu alloy catalyst, The homogeneous dispersion of alloy catalyst and well-formed nanophase structure would lead to an excellent catalytic electrode reaction for high-performance fuel cells. In addition, the enhanced catalytic activity in nanocomposite electrode was found to be closely related to proton transfer in tungsten oxide using in-situ electrochemical transmittance measurement.

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전기적착색 $WO_3$ 박막의 투과율과 내구성 (Transmission and Durability of Electrochromic WO3 Thin Films)

  • 이길동
    • 태양에너지
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    • 제19권1호
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    • pp.1-8
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    • 1999
  • Electrochromic $WO_3$ thin films were prepared by electron beam deposition. The transmission and durability of films were investigated. Coloring and bleaching experiments were repeated in an electrolyte of propylene carbonate with 0.6M of $LiClO_4$ by cyclic voltammetry. Spectrophotometer was used to measure the transmission in the degraded films. The 5000 ${\AA}$ thick film was found to be the stable after repeated cycles. The durability of the annealed film also showed improvements over unannealed samples. Tungsten oxide films with titanium content of about $10{\sim}15$ mol% was found to be most stable, undergoing the least degradation during the repeated cycles.

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Tungsten/Copper Functionally Graded Materials : Possible Applications and Processing through the Powder Metallurgy Route

  • Ozer, O.;Missiaen, J.M.;Pascal, C.;Lay, S.;Chaix, J.M.;Mitteau, R.
    • 한국분말야금학회:학술대회논문집
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    • 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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    • pp.83-84
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    • 2006
  • Processing of W-Cu graded materials from attritor-milled W-CuO mixtures is described. The powder reduction steps are investigated by TG and XRD analyses and by microstructural observations (SEM, TEM). Sintering of reduced powder with different compositions is analysed by dilatometry. Sintering behaviour of the graded component processed by co-compaction of a 10/20/30wt%Cu multi-layer material is briefly discussed. Liquid Cu migration is observed and smooths the composition gradient. Perspectives to control this migration are discussed.

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니켈의 미세 전해 가공 시 전극 전위의 선정 (Determination of Electrode Potential in Micro Electrochemical Machining of Nickel)

  • 남호성;박병진;김보쳔;주종남
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 추계학술대회 논문집
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    • pp.585-588
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    • 2005
  • The dissolution characteristic of metal shows the different tendency according to the applied electrical potential, the kind of electrolyte and pH value, etc. In the micro electrochemical machining (ECM), unfavorable oxide/passive layer formation and overall corrosion of electrodes must be prevented. The anodic polarization curve of nickel has distinct three dissolution regions, i.e. two active regions and the transpassive dissolution region. In this paper, the stable electrode potentials of workpiece and tool were determined in sulfuric acid and hydrochloric acid solution, respectively. In each solution, different machining property was shown and possible electrochemical reactions were discussed. On the basis of this experiment, the methodology to obtain the proper electrode potential was suggested.

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Inconel 600에 있어서 Al抗散浸透 被覆層의 微細組織과 耐反復酸化性 (Microstructures and Cyclic Oxidation Resistance of Aluminide Coatings for Inconel 600)

  • 정린상;변창석
    • 한국표면공학회지
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    • 제20권2호
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    • pp.60-73
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    • 1987
  • For the purpose of improving the cyclic oxidation resistance of Ni-base superalloy, Inconel 600, aluminide coating methods are studied. The formation rate of aluminide coating layers is measured as a function of time and pack composition to find out the optimum coating condition. The evaluation of cyclic oxidation is established by the change in weight, the microphotography and EPMA of cross sectional area during $200^{\circ}C\;{\leftrightarrow}\;950^{\circ}C\;and\;200^{\circ}C\;{\leftrightarrow}\;1100^{\circ}C$, respectively. The thickness of coating layer and weight gains are parabolic behavior in propotion to time and Al contents. In pack of low aluminum contents, 2 wt%, however, weight gain is decreased when activator, $NH_4Cl$ is higher than 2 wt%. The cyclic oxidation resistance of the coating carried out at 1100$^{\circ}C$ are superior to those of the coating diffusion-treated after pack cementation at 800$^{\circ}C$. Aluminide oxide, which is formed in external scale, is barrier to the cyclic oxidation.

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