The Vacuum Pressure Effects on Electrochromic Properties of Tungsten Oxide Thin Films by Electron Beam Evaporation

전자비임에 의해 제작된 WO$_3$ 박막의 전기적착색 특성에 대한 진공도의 효과

The electrochromic WO$_3$ thin films were prepared by using an electron - beam evaporation technique. The influence of the electron - beam evaporation conditions. especially the vacuum pressure, and resistance of ITO substrate on the structural and electrochromic properties of the investigated film was presented. This films showed electrochromic behavior in an aqueous electrolyte of 1 M H$_2$SO$_4$. Among these WO$_3$ thin films, films prepared at a vacuum pressure of 10$^{-4}$ mbar were found to be most stable in terms of cycling durability. The chemical stability of film against dissolution in the aqueous solution was also shown to depend on the quantity of water in the film.