• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.12
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• pp.62-67
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• 1997

The optical lithography wit an ArF excimer laser as a light source is expected to be used in the mass production of giga-bit DRAMs which require less than 0.2.mu.m minimum feature size. In this case, the distortion of a patterned image becomes very severe, since the lithography porcess is performed at the resolution limit. Traditionally, the photomask pattern was designed and revised with trial-and-error methods, such as repeated execution of process simulators or actual process experiments which require time and effort. Ths paper describes a program which automatically finds an optimal mask pattern. The program divides the mask plane into cells with same sizes, chooses a cell randomly, changes the transparent/opaque property of the cell, and eventually genrates a mask pattern which produces required image pattern. The program was applied to real DRAM cell patterns to produce mask patterns which genertes image patterns closer to object images than original mask patterns.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.29 no.4
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• pp.277-284
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• 2018

This paper reports the transparent electrode, which would be applied to transparent displays and smart glasses. Herein, a squared metal mesh with the most widely used copper wire in microwaves is studied for the alternating thin-film-type transparent and conducting indium tin oxide(ITO), with a low conductivity(sheet resistance > $5{\Omega}/sq.$). The electromagnetic performance of a patch antenna with metal mesh is analyzed. This paper presents the results of the optical(OT, optical transparent) and electrical(sheet resistance) characteristics of a squared metal mesh, which is a basic design. To improve the OT, copper wire(w=0.2 mm) is used in fabricating the squared metal mesh and the relationship between the OT and the antenna performance(radiation gain, radiation pattern) was analyzed according to the mesh size(l=1, 2 mm). The measurement results show that the antenna performance and the optical characteristic are in inverse proportion to each other. In real applications, the optical and electrical characteristics, and the costs of production are to be considered.

• Journal of the Korea Institute of Military Science and Technology
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• v.19 no.3
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• pp.294-301
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• 2016

In this paper, we designed the transparent circuit analog radar absorbing structure using printed metal grid mesh for enhanced optical transmittance. To obtain wideband electromagnetic absorption and enhanced optical transparency at X-band, we proposed the resistive FSS(Frequency Selective Surface) using printed metal mesh pattern on transparent glass with PEC(Perfect Electric Conductor) plane using ITO(Indium Thin Oxide) coating. We then fabricated the proposed structure to verify the simulation results obtained from commercial EM simulator. The comparisons between the simulation and measured results show good agreements. The results also show that the proposed radar absorbing structure can provide wideband reflection as well as better optical transparency. We can apply this proposed structure to the canopy of stealth aircraft and other stealth and security applications for visible transparency.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.32 no.4
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• pp.287-295
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• 2019

Privacy films are typically manufactured by combining black resin and transparent louver-shaped patterns. The use of black resin results in excellent light-shielding. However, black resin can reduce the transmittance of privacy films at the front viewing angle. In this study, we applied $SiO_2/SiON$ multi-layer thin films on a privacy film to maintain transmittance at the front viewing angle and improve light-shielding at the side viewing angle. We determined the optimum combination of thicknesses of the $SiO_2/SiON$ multi-layer stacks to increase the overall transmittance; the light shielding could be maximized at the side viewing angle.

• Journal of the Semiconductor & Display Technology
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• v.23 no.2
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• pp.82-86
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• 2024

With the growing field and growing interest in transparent organic light-emitting diodes (TOLED) in the industry, various attempts are being made to improve the transmittance and performance of TOLED. TOLEDs are expected to be used in next-generation displays such as mixture reality (MR) displays, displayable windows, televisions, etc. This study presents a mesh TOLED with better transmittance and luminescence characteristics than existing TOLEDs through an in-situ vacuum deposition method that does not require additional processes such as photolithography and etching. In this study the mesh TOLED's cathode consists of Mg: Ag 1:9 electrode. Mesh patterns are interconnected with a 6 nm layer of interlayer. We approached transmittance improvement up to 30% at 555 nm at the cathode electrode with similar current injection character, also we improved lumination characteristics up to 23% at 7 V driving condition.

• Journal of the Korean Society for Precision Engineering
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• v.31 no.11
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• pp.969-974
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• 2014

Previously fabricated electronic devices were used for vacuum manufacturing processes such as conventional semiconductor manufacturing. However, they are difficult to apply to continuous processes such as roll-to-roll printing, which results in very high device manufacturing and processing costs. Therefore, many developers have been interested in applying continuous processes to contact printing or noncontact printing technologies and they proposed various continuous printing techniques instead of conventional batch coating. In this paper, we proposed improved gravure offset printing process as one of the contact printing technique. We used etching pattern geometry with soft core blanket roll for printing of ultra fine line below the 10um.Using this technique we obtained flexible metal grid mesh film as transparent conductive film.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.313-313
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• 2016

Transparent conductive oxide (TCO) films have many disadvantages, such as rarity, possible exhaustion, process temperature limitations, and brittleness on a flexible substrate. In particular, as display technology moves toward flexible displays, TCO will become completely unsuitable due to its brittleness. To address theses issue, many researchers have been studying TCO substitutes. In recent efforts, metal nanowires, conducting polymers, carbon nanotube networks, graphene films, hybrid thin films, and metal meshes/grids have been evaluated as candidates to replace TCO electrodes. In this study, we fabricated the TCO film with Ag meshes shape using polystyrene (PS) beads monolayer on the substrate. The PS beads were used as a template to create the mesh pattern. We fabricated the monolayer on the flexible substrate (PES) with the well-aligned PS beads. Electrodes with Ag mesh shape were formed using this patterned monolayer. We could fabricated the Ag mesh electrode with the sheet resistance with $8ohm{\Omega}/{\Box}$.

• 한국신재생에너지학회:학술대회논문집
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• 2009.06a
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• pp.374-377
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• 2009

The operating temperature of Proton Exchange Membrane Fuel Cell (PEMFC) usually has to be limited under $100^{\circ}C$ to maintain the proper ionic conductivity. Therefore, the only product from reaction, water, is in the liquid phase. Two-phase flow makes the flow phenomenon in the channel difficult to understand and predict. Water blocking in the PEMFC channel or the pore of Gas Diffusion Layer (GDL), called flooding, is known as the main effect of PEMFC degradation. To analyze two-phase flow, the PEMFC with transparent acrylic plate was used. Two-phase flow patterns were observed by varying the current density. When the PEMFC is mounted horizontally, water in the cathode is mainly transported on the interface between the channel and GDL.

• 정보저장시스템학회:학술대회논문집
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• 2005.10a
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• pp.17-21
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• 2005

High-density image sensors have microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using W transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

• Transactions of the Society of Information Storage Systems
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• v.2 no.2
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• pp.91-95
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• 2006

High-density image sensors rave microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using UV transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.