The Effect of Dielectric Firing Process in PDP on the Properties of ITO Prepared by Reactive RF Sputtering (반응성 스퍼트링에 의한 ITO의 형성과 유전체 소성공정중의 특성변화에 관한 연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 1997.11a
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- pp.510-514
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- 1997