• Journal of Korean Vacuum Science & Technology
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• v.4 no.3
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• pp.78-80
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• 2000

We reprot on the fabrication and characterization of InGaN/GaN multiple quantum well light-emitting diode (LED) with a highly transparent Pt ohmic contact as a current spreading layer. The value of light transmittance of a Pt thin film with a thickness of 8 nm on-GaN was measured to be 85% at 450 nm. The peak wavelength and the full-width at half-maximum (FWHM) of the emission spectrum of the LED at 20 mA were 453 nm and 23 nm, respectively. Pt-contacted LEDs show good electrical properties and high light-output efficiency compared to Ni/Au-contacted ones. These results suggest that a Pt thin film can be used as an effective current spreading layer with high light-transparency.

• Korean Journal of Materials Research
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• v.22 no.10
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• pp.504-507
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• 2012

Synthesis of RGO (reduced graphene oxide)-CdS composite material was performed through CBD (chemical bath deposition) method in which graphene oxide served as the support and Cadmium Sulfate Hydrate as the starting material. Graphene-based semiconductor photocatalysts have attracted extensive attention due to their usefulness for environmental and energy applications. The band gap (2.4 eV) of CdS corresponds well with the spectrum of sunlight because the crystalline phase, size, morphology, specic surface area and defects, etc., of CdS can affect its photocatalytic activity. The specific surface structure (morphology) of the photocatalyst can be effective for the suppression of recombination between photogenerated electrons and holes. Graphene (GN) has unique properties such as a high value of Young's modulus, large theoretical specific surface area, excellent thermal conductivity, high mobility of charge carriers, and good optical transmittance. These excellent properties make GN an ideal building block in nanocomposites. It can act as an excellent electron-acceptor/transport material. Therefore, the morphology, structural characterization and crystal structure were observed using various analytical tools, such as X-ray diffraction, scanning electron microscopy, transmission electron microscopy, and Raman spectroscopy. From this analysis, it is shown that CdS particles were well dispersed uniformly in the RGO sheet. Furthermore, the photocatalytic property of the resulting RGO-CdS composite is also discussed in relation to environmental applications such as the photocatalytic degradation of pollutants. It was found that the prepared RGO-CdS nanocomposites exhibited enhanced photocatalytic activity as compared with that of CdS nanoparticles. Therefore, better efficiency of photodegradation was found for water purification applications using RGO-CdS composite.

• Journal of the Korean institute of surface engineering
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• v.25 no.5
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• pp.271-281
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• 1992

Amorphous hydrogenated silicon carbide(a-Si1-xCx : H) films have been prepared by the rf sputtering using a silicon target in a gas mixture of Argon and methane with varying methane gas flow rate(fCH) in the range of 1.5 to 3.5 sccm at constant Argon flow rate of 30sccm and rf power in the range of 3 to 6 W/$\textrm{cm}^2$. The effects of methane flow rate and rf power on the structure and optical properties of a-Si1-xCx : H films have been analysed by measuring both the IR absorption spectrum and the UV transmittance for the films. With increasing the methane flow rate, the optical band gap(Eg) of a-Si1-xCx : H films increases gradually from 1.6eV to the maximum value of 2.42eV at rf power of 4 W/$\textrm{cm}^2$, which is due to an increases in C/Si ratio in the films by an significant increase in the number of C-Hn bonds. As the rf power increases, the number of Si-C and Si-Hn bonds increases rapidly with simultaneous reduction in the number of C-Hn bonds, which is associated with an increase in both degree of methane decomposition and sputtering of silicon. The effects of rf power on the Eg of films are considerably influenced by the methane flow rate. At low methane flow rate, the Eg of films decreased from 2.3eV to 1.8eV with the rf power. On the other hand, at high methane flow rate, that of films increased slowly to 2.4eV.

• The Journal of the Korea institute of electronic communication sciences
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• v.16 no.2
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• pp.233-240
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• 2021

For the production of neodymium-doped zinc sulfide thin films in various amounts, zinc sulfide and neodymium were simultaneously deposited using an RF magnetron sputtering equipment to form a thin films, and rapid thermal annealing was performed at 400℃ for 30 minutes as a post-treatment process. The structure, shape, and optical properties of ZnS thin films having various neodymium doping contents (0.35at.%, 1.31at.%, 1.82at.% and 1.90at.%) were studied. The X-ray diffraction pattern was grown to a (111) cubic structure in all thin films. The surface and structural morphology of the thin films due to the neodymium doping content was explained through SEM and AFM images. Only elements of Zn, S, and Nd that do not contain other impurities were identified through EDAX. The transmittance and band gap of the prepared thin films were confirmed using the UV-vis spectrum.

• Journal of the Korean institute of surface engineering
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• v.34 no.5
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• pp.503-509
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• 2001

Thin films of hydrogenated amorphous silicon (a-Si : H) and hydrogenated amorphous silicon carbide (a-SiC:H) of different compositions were deposited on Si(100) wafer and glass by RF plasma-enhanced chemical vapor deposition (RF-PECVD). In the present work, we have investigated the effects of the RF power on the properties, such as optical band gap, transmittance and crystallinity. The Raman data show that the a-Si:H material consists of an amorphous and crystalline phase for the co-presence of two peaks centered at 480 and $520 cm^{-1}$ . The UV-VIS data suggested that the optical energy band gap ($E_{g}$ ) is not changed effectively with RF power and the obtained $E_{g}$(1.80eV) of the $\mu$c-Si:H thin film has almost the same value of a-Si:H thin film (1.75eV), indicating that the crystallity of hydrogenated amorphous silicon thin film can mainly not affected to their optical properties. However, the experimental results have shown that$ E_{g}$ of the a-SiC:H thin films changed little on the annealing temperature while $E_{g}$ increased with the RF power. The Raman spectrum of the a-SiC:H thin films annealed at high temperatures showed that graphitization of carbon clusters and microcrystalline silicon occurs.

• Membrane Journal
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• v.33 no.5
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• pp.248-256
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• 2023

Indium tin oxide (ITO) transparent electrode film has been widely adopted for the various applications such as display and electric vehicle. In this paper, we studied how to enhance the thermoforming stability of ITO film by applying the highly conductive Poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) thin layer. Based on the change of sheet resistance value, the influence of the additional solvent with different boiling point was investigated for the PEDOT:PSS coating solution. In addition, by analyzing optical transmittance and Raman spectrum, we confirmed the key mechanism which determine the final electrical conductivity of the PEDOT:PSS on ITO film using an ethylene glycol solvent. The final ITO transparent electrode coated with PEDOT:PSS performed the outstanding endurance of electrical conduction even in 126% stretching condition.

• Korean Journal of Materials Research
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• v.33 no.10
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• pp.414-421
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• 2023

Infrared radiation (IR) refers to the region of the electromagnetic radiation spectrum where wavelengths range from about 700 nm to 1 mm. Any object with a temperature above absolute zero (0 K) radiates in the infrared region, and a material that transmits radiant energy in the range of 0.74 to 1.4 um is referred to as a near-infrared optical material. Germanate-based glass is attracting attention as a glass material for infrared optical lenses because of its simple manufacturing process. With the recent development of the glass molding press (GMP) process, thermal imaging cameras using oxide-based infrared lenses can be easily mass-produced, expanding their uses. To improve the mechanical and optical properties of commercial materials consisting of ternary systems, germanate-based heavy metal oxide glasses were prepared using a melt-cooling method. The fabricated samples were evaluated for thermal, structural, and optical properties using DSC, XRD, and XRF, respectively. To derive a composition with high glass stability for lens applications, ZnO and Sb₂O₃ were substituted at 0, 1, 2, 3, and 4 mol%. The glass with 1 mol% added Sb₂O₃ was confirmed to have the optimal conditions, with an optical transmittance of 80 % or more, a glass transition temperature of 660 ℃, a refractive index of 1.810, and a Vickers hardness of 558. The possibility of its application as an alternative infrared lens material to existing commercial materials capable of GMP processing was confirmed.

• Progress in Medical Physics
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• v.21 no.2
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• pp.232-237
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• 2010

The shielding materials designed for replacement of lead equivalent materials for lighter apron than that of lead in diagnostic photon beams. The absorption characteristics of elements were applied to investigate the lead free material for design the shielding materials through the 50 kVp to 110 kVp x-ray energy in interval of 20 kVp respectively. The idea focused to the effect of K-edge absorption of variable elements excluding the lead material for weight reduction. The designed shielding materials composited of Tin 34.1%, Antimon 33.8% and Iodine 26.8% and Polyisoprene 5.3% gram weight account for 84 percent of weight of lead equivalent of 0.5 mm thickness. The size of lead-free shielder was $200{\times}200{\times}1.5\;mm^3$ and $3.2\;g/cm^3$ of density which is equivalent to 0.42 mm of Pb. The lead equivalent of 0.5 mm thickness generally used for shielding apron of diagnostic X rays which is transmitted 0.1% for 50 kVp, 0.9% for 70 kVp and 3.2% for 90 kVp and 4.8% for 110 kVp in experimental measurements. The experiment of transmittance for lead-free shielder has showed 0.3% for 50 kVp, 0.6% for 70 kVp, 2.0% for 90 kVp and 4.2% for 110 kVp within ${\pm}0.1%$. respectively. Using the attenuation coefficient of experiments for 0.5 mm Pb equivalent of lead-free materials showed 0.1%. 0.3%, 1.0% and 2.4%, respectively. Furthermore, the transmittance of lead-free shielder for scatter rays has showed the 2.4% in operation energy of 50 kVp and 5.9% in energy of 110 kVp against 2.4% and 5.1% for standard lead thickness within ${\pm}0.2%$ discrepancy, respectively. In this experiment shows the designed lead-free shielder is very effective for reduction the apron weight in diagnostic radiation fields.

• Korean Journal of Materials Research
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• v.22 no.2
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• pp.103-109
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• 2012

Red-emitting $Eu^{3+}$-activated $(Y_{0.95-x}Al_x)VO_4$ (0 < x $\leq$ 0.12) nanophosphors with the particle size of ~30 nm and the high crystallinity have been successfully synthesized by a hydrothermal reaction. In the synthetic process, deionized water as a solvent and ethylene glycol as a capping agent were used. The crystalline phase, particle morphology, and the photoluminescence properties of the excitation spectrum, emission intensity, color coordinates and decay time, of the prepared $(Y_{0.95-x}Al_x)VO_4:Eu^{3+}$ nanophosphors were compared with those of the $YVO_4:Eu^{3+}$. Under 147 nm excitation, $(Y_{0.95-x}Al_x)VO_4$ nanophosphors showed strong red luminescence due to the $^5D_0-^7F_2$ transition of $Eu^{3+}$ at 619 nm. The luminescence intensity of $YVO_4:Eu^{3+}$ enhanced with partial substitution of $Al^{3+}$ for $Y^{3+}$ and the maximum emission intensity was accomplished at the $Al^{3+}$ content of 10 mol%. By the addition of $Al^{3+}$, decay time of the $(Y,Al)VO_4:Eu^{3+}$ nanophosphor was decreased in comparison with that of the $YVO_4:Eu^{3+}$ nanophosphor. Also, the substitution of $Al^{3+}$ for $Y^{3+}$ invited the improvement of color coordinates due to the increase of R/O ratio in emission intensity. For the formation of transparent layer, the red nanophosphors were fabricated to the paste with ethyl celluloses, anhydrous terpineol, ethanol and deionized water. By screen printing method, a transparent red phosphor layer was formed onto a glass substrate from the paste. The transparent red phosphor layer exhibited the red emission at 619 nm under 147 nm excitation and the transmittance of ~80% at 600 nm.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.397-397
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• 2013

The electrical, electronic, optical properties and the local structure of Nickel Oxide (NiO) thin film have been investigated by X-ray photoelectron spectroscopy (XPS), Reflection Electron Energy Loss Spectroscopy (REELS), UV-spectrometer,Hall Effect measurement and X-ray absorption spectroscopy (XAS). The XPS results show that the Ni 2p spectra for all films consist of $Ni2p_{3/2}$ at around 854.5 eV which indicate the presence of Ni-O bond from NiO phase and for the annealed film at temperature above $200^{\circ}C$ shows the coexist Ni oxide and Ni metal phase. The REELS spectra showed that the band gaps of the NiO thin films were abruptly decreased with increasing temperature. The values of the band gaps are consistent with the optical band gaps estimated by UV-Spectrometer. The optical transmittance spectra shows that the transparency of NiO thin films in the visible light region was deteriorated with higher temperature due to existence of $Ni^0$. Hall Effect measurement suggest that the NiO thin films prepared at relatively low temperatures (RT and $100^{\circ}C$) are suitable for fabricating p-type semiconductor which showed that the best properties was achieved at $100^{\circ}C$, such as a low resistivity of $7.49{\Omega}.cm$. It can be concluded that the annealing process plays a crucial role in converting from p type to n type semiconductor which leads to reducing electrical resistivity of NiO thin films. Furthermore, the extended X-ray absorption fine structure (EXAFS) spectrum at the Ni K-edge was used to address the local structure of NiO thin films. It was found that the thermal treatments increase the order in the vicinity of Ni atom and lead the NiO thin films to bunsenite crystal structure. Moreover, EXAFS spectra show in increasing of coordination number for the first Ni-O shell and the bond distance of Ni-O with the increase of substrate temperature.