• Corrosion Science and Technology
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• 제6권6호
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• pp.286-290
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• 2007

Biocompatible Hydroxy apatite (HAp) coatings on metallic substrate by plasma spray techniques have been developed. Long-term credibility of plasma spray HAp coatings has been evaluated in physiological saline by electrochemical measurements. It was found that the corrosion resisitance of SUS316L based HAp/Ti conbined coatings was excellent even after more than 10 weeks long-term immersion. It was shown that postal heat treatment improved both the crystallinity and corrosion resistance of HAp. By lowering cooling rate during heat treatment process, less cracks produced in HAp coating layer, which lead to higher credibility of HAp during immersion in physiological saline. The ICP results showed that the dissolution level of substrate metallic ions was low and HAp coatings produced in this research can be acceptable as biocompatible materials. Also, the concentration of dissolved ions from HAp coatings with postal heat treatment was lower compared to those from samples without postal heat treatment. The adherence of HAp coatings with Ti substrate and other mechanical properties were also assessed by three-point bending test. The poor adhesion of HAp coating to titanium substrate can be improved by introducing a plasma spray titanium intermediate layer.

• 한국전기전자재료학회논문지
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• 제16권9호
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• pp.753-758
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• 2003

Ti films were deposited onto 100${\times}$100 mm alumina substrates using dc magnetron sputtering under the following conditions; substrate temperature of R.T～400 $^{\circ}C$, annealing temperature of 100～400 $^{\circ}C$, and sputtering gas pressure of 4${\times}$10$^{-3}$ Torr～4${\times}$10$^{-2}$ Torr. And the films were examined by X-ray diffraction analysis (XRD), scanning electron microscopy(SEM) and 4-point measurement system. The best electrical and structural properties was obtained by substrate temperature of ～200 $^{\circ}C$, target-substrate distance of ～14 cm and sputtering pressure of ～1${\times}$10$^{-2}$ Torr. Also at that condition the most excellent adhesion was observed.

• Bulletin of the Korean Chemical Society
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• 제18권6호
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• pp.640-643
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• 1997

Pure titanium dioxide $(TiO_2)$ films were prepared by pulsed laser deposition on a single crystal Si(100) substrate. We have investigated the growth of crystalline titanium dioxide films with respect to substrate temperature and ambient oxygen pressure. The structural properties of the films were analyzed by X-ray diffraction. We found that the anatase as well as the rutile phases could be formed from the original rutile phase of the target $TiO_2$. At 0.75 torr of ambient oxygen pressure, the structure of $TiO_2$ film was amorphous at room temperature, anatase between 300 and 600 ℃, a mixture of anatase and rutile between 700 and 800 ℃, and only rutile at 900 ℃ and above. However, at a low ambient oxygen pressure, the rutile phase became dominant; the only rutile phase was obtained at the ambient oxygen pressure of 0.01 torr and the substrate temperature of 800 ℃. Therefore, the film structures were largely influenced by substrate temperature and ambient oxygen pressure.

• 열처리공학회지
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• 제5권1호
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• pp.1-12
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• 1992

In order to improve adhesive force of TiN film, we sputtered titanium as interlayer before TiN deposition by Plasma Enhanced Chemical Vapour Deposition. We observed changes of hardness and adhesion at a various thickness of titanium interlayer and also examined analysis. At the critical thickness of the titanium interlayer(about $0.2{\mu}$), adhesive force of TiN films were promoted mostly. But over the critical thickness, a marked reduction of adhesive force was showed, because of the internal stress of titanium interlayer. From AES analysis, the adhesion improvement of TiN films was mainly caused by nitrogen diffusion into titanium interlayer during TiN deposition process which relieved stress concentration at TiN coating-substrate interface.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1733-1736
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• 2006

Nanosilver has intrinsic problem to adhesion on the surface of silica. To improve interfacial properties between nanosilver and silica substrate, a thin titanium film is introduced in this study. The titaniumcoated silica substrates are prepared by sputter technique. The commercial silver nanopaste with size around 3-7nm is used in this study. The results indicate thin layer of titanium can improve the bonding properties of nanosilver and expect to be used in fabrication of TFT display panel.

• 한국재료학회지
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• 제29권11호
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• pp.709-714
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• 2019

In order to observe the microstructure and morphology of porous titanium -oxide thin film, deposition is performed under a higher Ar gas pressure than is used in the general titanium thin film production method. Black titanium thin film is deposited on stainless steel wire and Cu thin plate at a pressure of about 12 Pa, but lustrous thin film is deposited at lower pressure. The black titanium thin film has a larger apparent thickness than that of the glossy thin film. As a result of scanning electron microscope observation, it is seen that the black thin film has an extremely porous structure and consists of a separated column with periodic step differences on the sides. In this configuration, due to the shadowing effect, the nuclei formed on the substrate periodically grow to form a step. The surface area of the black thin film on the Cu thin plate changes with the bias potential. It has been found that the bias of the small negative is effective in increasing the surface area of the black titanium thin film. These results suggest that porous titanium-oxide thin film can be fabricated by applying the appropriate oxidation process to black titanium thin film composed of separated columns.

• 한국결정성장학회지
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• 제14권1호
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• pp.6-11
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• 2004

Bias 인가된 hot filament CVD 방법을 이용해 티타늄을 RF sputtering 법으로 고속도강에 피복하여 중간 층으로 한 후 다이아몬드 박막을 피복할 때 bias 전압의 영향과 계면 층의 특성을 조사하였다. 다이아몬드 증착 시 bias가 인가될 경우 필라멘트에서 전자 방출이 촉진되어 다이아몬드 핵생성과 성장을 촉진시켰으며 본 실험에서의 최적 증착 조건은 증착 압력 20 torr, bias 인가전압 200V, 기판온도 $700^{\circ}C$로 나타났다. 강에의 다이아몬드 박막 형성 시 중간 층으로서의 티타늄은 Fe 및 C에 대한 확산도가 높고 탄화물 형성 원소이므로 다이아몬드 핵생성 및 성장에 적합한 원소로 나타났다.

• 한국주조공학회지
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• 제17권4호
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• pp.393-401
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• 1997

Commercial flake graphite cast iron substrate was coated with titanium powder by low pressure plasma spraying and was irradiated with a $CO_2$ laser to produce the wear resistant composite layer. From the experimental results of this study, it was possible to composite TiC particles on the surface layer by direct reaction between carbon existed in the cast iron matrix and titanium with thermal sprayed coating by remelting and alloying them using laser irradiation. The cooling rate of laser remelted cast iron substrate without titanium coating was about $1{\times}10^4$ K/s to $1{\times}10^5$ K/s in the order under the condition used in this study. The microstructure of alloyed layer consisted of three zones, that is, TiC particule crystallized zone (MHV $400{\sim}500$), the mixed zone of TiC particule+ledebulite (MHV $650{\sim}900$) and the ledebulite zone (MHV $500{\sim}700$). TiC particules were crystallized as a typical dendritic morphology. The secondary TiC dendrite arms were grown to the polygonized shape and were necking. And then the separated arms became cubic crystal of TiC at the slowly solidified zone. But in the rapidly solidified zone of fusion boundry, the fine granular TiC particules were grouped like grape.

• 공업화학
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• 제17권2호
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• pp.194-200
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• 2006

금속 산화막 공정에 응용하기 위하여 노즐형태 HCP (hollow cathode plasma) RT-MOCVD에 의해 티타늄 산화막을 증착하였다. TTNB (titanium n-butoxide)를 사용하였을 경우 막을 증착한 후 열처리하여야 하지만 titanium ethoxide에 의해 막을 증착하면 일반적으로 수반되는 열처리 공정을 생략하여도 티타늄 산화막이 직접적으로 형성되었다. RF-power 240 watt, 전극과 기판과의 거리가 3 cm, 반응시간 20 min, Ar와 $O_2$의 유량비 1 : 1에서 티타늄과 산소의 조성비가 1 : 2임을 확인할 수 있었다. 따라서 노즐형태 HCP RT-MOCVD에 의해 티타늄 산화막을 열처리 공정 없이 증착되었으며, 저온에서 다양한 금속 산화막 증착 공정에 응용할 수 있었다.

• 한국결정성장학회지
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• 제19권1호
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• pp.19-24
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• 2009

생체모방법을 이용하여 표면 처리된 titanium plates 표면에 아파타이트 형성에 관하여 조사하였다. 표면 처리방법으로는 우선, titanium plate 표면에 titanium oxide층을 형성시키기 위하여 열처리온도를 $400^{\circ}C$, $600^{\circ}C$, 그리고 $800^{\circ}C$에서 전기로에서 5시간 유지하였으며, 열처리된 titanium plates 1 M를 수산화나트늄 용액에 침전시켜 표면을 화학적으로 처리하였다. 생체모방법으로 titanium plates 표면에 아파타이트를 형성시키기 위하여 표면처리된 titanium plates 를 Kokubo's recipe에 의하여 제조된 생체유사액(SBF)에 침적시켰다. SBF 용액에 1주와 3주기간 동안 침적시킨 후, 표면처리를 달리한 titanium plates 표면에 형성된 코팅층을 서로 비교 분석하였다.