• 제목/요약/키워드: Titanium film

검색결과 384건 처리시간 0.025초

Surface Characteristics of Type II Anodized Ti-6Al-4V Alloy for Biomedical Applications

  • 이수원;정태곤;양재웅;정재영;박광민;정용훈
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2017년도 춘계학술대회 논문집
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    • pp.77-77
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    • 2017
  • Titanium and its alloys offer attractive properties in a variety of applications. These are widely used for the field of biomedical implants because of its good biocompatibility and high corrosion resistance. Titanium anodizing is often used in the metal finishing of products, especially those can be used in the medical devices with dense oxide surface. Based on SAE/AMS (Society of Automotive Engineers/Aerospace Material Specification) 2488D, it has the specification for industrial titanium anodizing that have three different types of titanium anodization as following: Type I is used as a coating for elevated temperature forming; Type II is used as an anti-galling coating without additional lubrication or as a pre-treatment for improving adherence of film lubricants; Type III is used as a treatment to produce a spectrum of surface colours on titanium. In this study, we have focused on Type II anodization for the medical (dental and orthopedic) application, the anodized surface was modified with gray color under alkaline electrolyte. The surface characteristics were analyzed with Focused Ion Beam (FIB), Scanning Electron Microscopy (SEM), surface roughness, Vickers hardness, three point bending test, biocompatibility, and corrosion (potentiodynamic) test. The Ti-6Al-4V alloy was used for specimen, the anodizing procedure was conducted in alkaline solution (NaOH based, pH>13). Applied voltage was range between 20 V to 40 V until the ampere to be zero. As results, the surface characteristics of anodic oxide layer were analyzed with SEM, the dissecting layer was fabricated with FIB method prior to analyze surface. The surface roughness was measured by arithmetic mean deviation of the roughness profile (Ra). The Vickers hardness was obtained with Vickers hardness tester, indentation was repeated for 5 times on each sample, and the three point bending property was verified by yield load values. In order to determine the corrosion resistance for the corrosion rate, the potentiodynamic test was performed for each specimen. The biological safety assessment was analyzed by cytotoxic and pyrogen test. Through FIB feature of anodic surfaces, the thickness of oxide layer was 1.1 um. The surface roughness, Vickers hardness, bending yield, and corrosion resistance of the anodized specimen were shown higher value than those of non-treated specimen. Also we could verify that there was no significant issues from cytotoxicity and pyrogen test.

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졸-겔법을 이용한 투과성 TiO2 분말 및 박막의 특성 연구 (Characterization of Transparent TiO2 Power and Thin Films through Sol-Gel Process)

  • 정미원;이지영;손현진
    • 한국세라믹학회지
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    • 제39권3호
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    • pp.252-258
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    • 2002
  • Titanium(IV) isopropoxide에 킬레이팅 리간드로 Acetylacetone(Acac), Ethyl-acetoacetate(Etac) 그리고, Ethanolamine을 첨가시켜 변형된 티타늄 알콕사이드를 합성한 후 졸-겔 방법으로 투과성 티타늄 산화물 박막을 제조하였다. 박막 제조 조건이 최적의 상태일 때는 티타니아 졸 용액의 농도가 3wt% 이하이고, 리간드로는 Acetyl acetone(Acac)를 선택하고, pH가 2.5로 조절하였을 때였다. 순수한 티타늄 산화물 박막보다는 리간드가 치환된 박막들의 굴절률이 더 높았고 가시광선 영역에서 80% 이상의 투과율을 나타냄을 알 수 있었다. 티타니아 졸 상태에서는 입자 크기가 나노 크기를 나타냈으며 분말로 소성 후 마이크론 크기로 증가함을 알 수 있었다. 티타늄 박막들은 400$^{\circ}$C에서 무정형에서 anatase로 상전이가 일어나고 700$^{\circ}C$에서는 rutile로 변화됨을 XRD로 관찰하였다. 박막의 결정형태와 모양 및 크기도 SEM과 XRD로 측정하였다. 또한 분말의 물성 및 구조를 SEM, XRD, TGA 그리고 DSC로 알아보았고, 박막의 광학적 특성에 대해서는 ellipsometer로 굴절률과 막두께를 측정하여 비교하여 보았다.

PEMOCVD of Ti(C,N) Thin Films on D2 Steel and Si(100) Substrates at Low Growth Temperatures

  • Kim, Myung-Chan;Heo, Cheol-Ho;Boo, Jin-Hyo;Cho,Yong-Ki;Han, Jeon-Geon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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    • pp.211-211
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    • 1999
  • Titanium nitride (TiN) thin films have useful properties including high hardness, good electrical conductivity, high melting point, and chemical inertness. The applications have included wear-resistant hard coatings on machine tools and bearings, decorative coating making use of the golden color, thermal control coatings for widows, and erosion resistant coatings for spacecraft plasma probes. For all these applications as feature sizes shrink and aspect ratios grow, the issue of good step coverage becomes increasingly important. It is therefore essential to manufacture conformal coatings of TiN. The growth of TiN thin films by chemical vapor deposition (CVD) is of great interest for achieving conformal deposition. The most widely used precursor for TiN is TiCl4 and NH3. However, chlorine impurity in the as-grown films and relatively high deposition temperature (>$600^{\circ}C$) are considered major drawbacks from actual device fabrication. To overcome these problems, recently, MOCVD processes including plasma assisted have been suggested. In this study, therefore, we have doposited Ti(C, N) thin films on Si(100) and D2 steel substrates in the temperature range of 150-30$0^{\circ}C$ using tetrakis diethylamido titanium (TDEAT) and titanium isopropoxide (TIP) by pulsed DC plamsa enhanced metal-organic chemical vapor deposition (PEMOCVD) method. Polycrystalline Ti(C, N) thin films were successfully grown on either D2 steel or Si(100) surfaces at temperature as low as 15$0^{\circ}C$. Compositions of the as-grown films were determined with XPS and RBS. From XPS analysis, thin films of Ti(C, N) with low oxygen concentration were obtained. RBS data were also confirmed the changes of stoichiometry and microhardness of our films. Radical formation and ionization behaviors in plasma are analyzed by optical emission spectroscopy (OES) at various pulsed bias and gases conditions. H2 and He+H2 gases are used as carrier gases to compare plasma parameter and the effect of N2 and NH3 gases as reactive gas is also evaluated in reduction of C content of the films. In this study, we fond that He and H2 mixture gas is very effective in enhancing ionization of radicals, especially N resulting is high hardness. The higher hardness of film is obtained to be ca. 1700 HK 0.01 but it depends on gas species and bias voltage. The proper process is evident for H and N2 gas atmosphere and bias voltage of 600V. However, NH3 gas highly reduces formation of CN radical, thereby decreasing C content of Ti(C, N) thin films in a great deal. Compared to PVD TiN films, the Ti(C, N) film grown by PEMOCVD has very good conformability; the step coverage exceeds 85% with an aspect ratio of more than 3.

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실리카 베이스 무기 바인더 기반의 TiO2 코팅액의 제조 및 특성 평가 (Fabrication and characteristics of TiO2 coating solution with silica-based inorganic binder)

  • 강우규;김혜진;김진호;황광택;장건익
    • 한국결정성장학회지
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    • 제29권2호
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    • pp.71-76
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    • 2019
  • 자동화 시스템이 일반화되면서 제품 관리를 위한 라벨지(label)의 수요는 증가하고 있으며, 다양한 환경에서 사용할 수 있는 기능성 라벨지 개발이 빠르게 진행되고 있다. 인쇄회로기판의 경우 제작 과정에서 $300^{\circ}C$ 이상의 리플로우 솔더링 공정과 여러 차례의 세정 공정을 거치기 때문에 열적 화학적 안정성을 갖는 바코드 라벨지(barcode label)가 사용되고 있으나 황변(yellowing) 현상 발생으로 인한 인식률 저하의 문제가 발생하고 있다. 본 연구에서는 실리카 무기 바인더와 이산화티탄 백색안료를 사용한 복합 코팅층을 개발하고, 열적 화학적 안정성을 확보한 기능성 라벨지 연구를 진행하였다. 졸-겔 공정으로 제조한 실리카 무기 바인더는 기재(substrate)로 사용하는 폴리이미드 필름과 우수한 밀착성과 내마모성 특성을 갖는 것으로 확인하였다. 또한 이산화티탄 백색안료와 혼합하여 폴리이미드 필름에 백색의 코팅층을 제조할 수 있었으며, 복합 코팅층은 $400^{\circ}C$ 이상의 고온에서도 우수한 백색도와 광택도를 특성을 유지하는 것을 알 수 있었다. 또한 산성(pH 1.6)과 염기성(pH 13.6) 세정제를 통한 화학 처리 후에도 백색도와 광택도 변화가 일어나지 않는 우수한 화학적 안정성을 확인하였다.

유도결합 플라즈마를 이용한 TiN 박막의 식각 특성 연구 (The etch characteristic of TiN thin films by using inductively coupled plasma)

  • 박정수;김동표;엄두승;우종창;허경무;위재형;김창일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.74-74
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    • 2009
  • Titanium nitride has been used as hardmask for semiconductor process, capacitor of MIM type and diffusion barrier of DRAM, due to it's low resistivity, thermodynamic stability and diffusion coefficient. Characteristics of the TiN film are high intensity and chemical stability. The TiN film also has compatibility with high-k material. This study is an experimental test for better condition of TiN film etching process. The etch rate of TiN film was investigated about etching in $BCl_3/Ar/O_2$ plasma using the inductively coupled plasma (ICP) etching system. The base condition were 4 sccm $BCl_3$ /16 sccm Ar mixed gas and 500 W the RF power, -50 V the DC bias voltage, 10 mTorr the chamber pressure and $40\;^{\circ}C$ the substrate temperature. We added $O_2$ gas to give affect etch rate because $O_2$ reacts with photoresist easily. We had changed $O_2$ gas flow rate from 2 sccm to 8 sccm, the RF power from 500 W to 800 W, the DC bias voltage from -50 V to -200 V, the chamber pressure from 5 mTorr to 20 mTorr and the substrate temperature from $20\;^{\circ}C$ to $80\;^{\circ}C$.

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열산화법에 의한 티타늄 임플란트의 인산칼슘 결정의 형성 능력 증진 (Improvement of Calcium Phosphate Forming Ability of Titanium Implant by Thermal Oxidation Method)

  • 황규석;안준형;이선옥;윤연흠;강보안;오정선;김상복
    • 한국세라믹학회지
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    • 제39권5호
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    • pp.460-466
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    • 2002
  • 티타늄 임플란트의 표면을 열산화법을 이용하여 티타늄의 표면 위에 생체활성을 갖는 $TiO_2$ 박막을 생성시켜 다양한 의료분야의 응용 가능성을 검토하였다. 시판되고 있는 순수한 티타늄 디스크를 세척 공정을 거친 후, 공기와 아르곤 분위기에서 500, 550, 600, 650, 700${\circ}C$의 온도로 10분간 각각 열산화 처리를 실시하였다. 열처리된 시편의 인산칼슘 결정의 형성 능력을 시험하기 위하여 36.5${\circ}C$의 Eagle's minimum essential medium 용액에서 15일 동안 침적시험을 행하였다. 침적하기 전과 후의 시편의 표면 형상과 표면 조성을 Field Emission-Scanning Electron Microscopy(FE-SEM)와 Energy Dispersive X-ray Spectrometry(EDS)로 각각 분석하였다. In vitro 시험에서 미세한 $TiO_2$ 결정이 생성된 박막의 표면에는 탄소가 함유된 인산칼슘 결정이 생성됨을 확인하였다.

RESPONSE OF OSTEOBLASI-LIKE CELLS ON TITANIUM SURFACE TREATMENT

  • Roh Hyun-Ki;Heo Seong-Joo;Chang Ik-Tae;Koak Jai-Young;Han Jong-Hyun;Kim Yong-Sik;Yim Soon-Ho
    • 대한치과보철학회지
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    • 제41권6호
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    • pp.699-713
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    • 2003
  • Statement of problem. Titanium is the most important material for biomedical and dental implants because of their high corrosion resistance and good biocompatibility. These beneficial properties are due to a protective passive oxide film that spontaneously forms on the surface. Purpose. The purpose of this study was to evaluate the responses of osteoblast-like cells on different surface treatments on Ti discs. Material and Methods. Group 1 represented the machined surface with no treatment. Group 2 surfaces were sandblasted with $50{\mu}m\;Al_2O_3$ under $5kgf/cm^2$ of pressure. Groups 3 and 4 were sandblasted under the same conditions. The samples were treated on a titanium oxide surface with reactive sputter depositioning and thermal oxidation at $600^{\circ}C$ (Group 3) and $800^{\circ}C$ (Group 4) for one hour in an oxygen environment. The chemical composition and microtopography were analyzed by XRD, XPS, SEM and optical interferometer. The stability of $TiO_2$ layer was studied by petentiodynamic curve. To evaluate cell response, osteoblast extracted from femoral bone marrow of young adult rat were cultured for cell attachment, proliferation and morphology on each titanium discs. Results and Conclusion. The results were as follows : 1. Surface roughness values were, from the lowest to the highest, machined group, $800^{\circ}C$ thermal oxidation group, $600^{\circ}C$ thermal oxidation group and blasted group. The Ra value of blasted group was significantly higher than that of $800^{\circ}C$ thermal oxidation group (P=0.003), which was not different from that of $600^{\circ}C$ thermal oxidation group (P<0.05). 2. The degree of cell attachment was highest in the $600^{\circ}C$ thermal oxidation group after four and eight hours (P<0.05), but after 24 hours, there was no difference among the groups (P>0.05). 3. The level of cell proliferation showed no difference among the groups after one day, three days, and seven days (P>0.05). 4. The morphology and arrangement of the cells varied with surface roughness of the discs.

수종 임플랜트 금속의 내식성에 관한 전기화학적 연구 (AN ELECTROCHEMICAL STUDY ON THE CORROSION RESISTANCE OF THE VARIOUS IMPLANT METALS)

  • 전진영;김영수
    • 대한치과보철학회지
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    • 제31권3호
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    • pp.423-446
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    • 1993
  • Titanium and its alloys are finding increasing use in medical devices and dental implants. The strong selling point of titanium is its resistance to the highly corrosive body fluids in which an implant must survive. This corrosion resistance is due to a tenacious passive oxide or film which exists on the metal's surface and renders it passive. Potentiodynamic polarization measurement is one of the most commonly used electro-chemical methods that have been applied to measure corrosion rates. And the potentiodynamic polarization test supplies detailed information such as open circuit, rupture, and passivation potential. Furthermore, it indicates the passive range and sensitivity to pitting corrosion. This study was designed to compare the corrosion resistance of the commonly used dental implant materials such as CP Ti, Ti-6A1-4V, Co-Cr-Mo alloy, and 316L stainless steel. And the effects of galvanic couples between titanium and the dental alloys were assessed for their useful-ness-as. materials for superstructure. The working electrode is the specimen , the reference electrode is a saturated calomel electrode (SCE), and the counter electrode is made of carbon. In $N_2-saturated$ 0.9% NaCl solutions, the potential scanning was performed starting from -800mV (SCE) and the scan rate was 1 mV/sec. At least three different polarization measurements were carried out for each material on separate specimen. The galvanic corrosion measurements were conducted in the zero-shunt ammeter with an implant supraconstruction surface ratio of 1:1. The contact current density was recorded over a 24-hour period. The results were as follows : 1. In potential-time curve, all specimens became increasingly more noble after immersion in the test solution and reached between -70mV and 50mV (SCE) respectively after 12 hours. 2. The Ti and Ti alloy in the saline solution were most resistant to corrosion. They showed the typical passive behavior which was exhibited over the entire experimental range. Therefore no breakdown potentials were observed. 3. Comparing the rupture potentials, Ti and Ti alloy had the high(:st value (because their break-down potentials were not observed in this study potential range ) followed by Co-Cr-Mo alloy and stainless steel (316L). So , the corrosion resistance of titanium was cecellent, Co-Cr-Mo alloy slightly inferior and stainless steel (316L) much less. 4. The contact current density sinks faster than any other galvanic couple in the case of Ti/gold alloy. 5. Ag-Pd alloy coupled with Ti yielded high current density in the early stage. Furthermore, Ti became anodic. 6. Ti/Ni-Cr alloy showed a relatively high galvanic current and a tendency to increase.

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$TiO_2$ 전극과 Ru(II) 염료와의 흡착에 있어서 온도 및 pH의 영향 (Influence of Temperature and pH on Adsorption of Ru(II) Dye from Aqueous Solution onto $TiO_2$ Films)

  • 황경준;유승준;심왕근;이재욱
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 추계학술대회 초록집
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    • pp.60.2-60.2
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    • 2010
  • A $TiO_2$ films in dye-sensitized solar cells was fabricated using $TiO_2$ colloidal sol prepared from titanium iso-propoxide used as a starting material by applying the sol-gel method. It was characterized by particle size analyzer, XRD, FE-SEM, and BET analysis. The adsorption isotherms of dye molecule on $TiO_2$ films were obtained at three different temperatures (30, 45, $60^{\circ}C$) and at three different pH (3, 5, 7). The adsorption kinetics of dye molecule on $TiO_2$ films were obtained at three different temperatures (30, 45, $60^{\circ}C$. The adsorption experimental data were correlated with Langmuir isotherm model and pseudo-second-order model. Also the isosteric enthalpies of dye adsorption were calculated by the Clausius-Clapeyron equation. In addition, the adsorption energy distribution functions which describe heterogeneous characteristics of nanocrystalline $TiO_2$ film surface were calculated by using the generalized nonlinear regularization method. We found that efficient adsorption of N719 dye from aqueous solution onto $TiO_2$ films can be successfully achieved by dye adsorption conditions and morphology of $TiO_2$ films.

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Evaluation of dispersion degree of nanoparticles in TiO2/epoxy resin nanocomposites

  • Nam, Ki-Woo;Moon, Chang-Kwon
    • 한국해양공학회지
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    • 제28권4호
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    • pp.338-344
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    • 2014
  • The purpose of this study was to evaluate the dispersion degree of particles using a nanoindentation test for titanium oxide nanoparticles/epoxy resin nanocomposites. Thus, the effects of the particle size and weight fraction, dispersion agent, and position of the sample on the modulus and degree of particle dispersion in the nanocomposites were investigated. As a result, the dispersion degree of large particles was found to be better than that of smaller particles in composites. It could be found that the aggregation or agglomeration of small particles with large surface energy occurred more easily in nanocomposites because of the large specific surface area. The moduli of the upper side of the film-shaped sample obtained from a nanoindentation test were low scattering, while the values for the bottom side were high scattering. Thus, the dispersion situation of the nanoparticles on the upper side of film-shaped samples could be considered to be better than that for the bottom side. This could be concluded due to the non-uniform nanoparticle dispersion in the same sample. The modulus obtained from nanoindentation test increased slightly with the content of nanoparticles and increased with the indented depth for the same sample. The latter is presumably due to the increase in the accumulated particles facing the indenter with the indented depth. The nanoindentation test was found to be a useful method to evaluate the dispersion status of nanoparticles in nanocomposites.