• Title/Summary/Keyword: TiN-M

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Photocatalysis of o-, m- and p-Xylene Using Element-Enhanced Visible-Light Driven Titanium Dioxide

  • Kim, Jong-Tae;Kim, Mo-Keun;Jo, Wan-Kuen
    • Journal of Environmental Science International
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    • v.17 no.11
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    • pp.1195-1201
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    • 2008
  • Enhancing with non-metallic elemental nitrogen(N) is one of several methods that have been proposed to modify the electronic properties of bulk titanium dioxide($TiO_2$), in order to make $TiO_2$ effective under visible-light irradiation. Accordingly, current study evaluated the feasibility of applying visible-light-induced $TiO_2$ enhanced with N element to cleanse aromatic compounds, focusing on xylene isomers at indoor air quality(IAQ) levels. The N-enhanced $TiO_2$ was prepared by applying two popular processes, and they were coated by applying two well-known methods. For three o-, m-, and p-xylene, the two coating methods exhibited different photocatalytic oxidation(PCO) efficiencies. Similarly, the two N-doping processes showed different PCO efficiencies. For all three stream flow rates(SFRs), the degradation efficiencies were similar between o-xylene and m,p-xylene. The degradation efficiencies of all target compounds increased as the SFR decreased. The degradation efficiencies determined via a PCO system with N-enhanced visible-light induced $TiO_2$ was somewhat lower than that with ultraviolet(UV)-light induced unmodified $TiO_2$, which was reported by previous studies. Nevertheless, it is noteworthy that PCO efficiencies increased up to 94% for o-xylene and 97% for the m,p-xylene under lower SFR(0.5 L $min^{-1}$). Consequently, it is suggested that with appropriate SFR conditions, the visible-light-assisted photocatalytic systems could also become important tools for improving IAQ.

Creep Properties of Plasma Carburized and CrN Coated Ti-6Al-4V Alloy (플라즈마 침탄 및 CrN 코팅된 Ti-6Al-4V 합금의 구조 및 Creep특성)

  • Wey Myeong-Yong;Park Yong-Gwon
    • Korean Journal of Materials Research
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    • v.14 no.8
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    • pp.558-564
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    • 2004
  • In order to improve the low hardness and low wear resistance of Ti-6Al-4V alloy, plasma carburization treatment and CrN film coating were carried out. Effects of the plasma carburization and CrN coating were analyzed and compared with the non-treated alloy by mechanical and creep tests. After plasma carburization and CrN coating treatments, the carburized layer was about 150 ${\mu}m$ in depth and CrN coated layer was about 7.5 ${\mu}m$ in thickness. Hardness value of about $H_{v}$ 402 of the non-treated alloy was improved to $H_{v}$ 1600 and 1390 by plasma carburization and CrN thin film coating, respectively. Stress exponent(n) was decreased from 9.10 in CrN coating specimen to 8.95 in carburized specimen. However, the activation energy(Q) was increased from 242 to 250 kJ/mol. It can be concluded that the static creep deformation for Ti-6Al-4V alloy is controlled by the dislocation climb over the ranges of the experimental conditions.

Corrosion Behavior of TiN Ion Plated Steel Plate(III)-Effects of Ni and Ti interlayer thickness- (TiN 이온 플레이팅한 강판의 내식성에 관한 연구(III)-Ni 및 Ti 하지코팅두께의 영향-)

  • 한전건;연윤모
    • Journal of Surface Science and Engineering
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    • v.26 no.2
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    • pp.55-62
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    • 1993
  • The effect of interlayer coating thickness of Ni and Ti on corrosion behavior was studied for TiN ion plat-ed steel plate. Interlayer coating was carried out in a single and bi-layer to a various thickness combination prior to final TiN coating. Corrosion behavior was evaluated by anodic polarization test in 1N H2SO4 as well as salt spray test. Ni interlayer coating was effectived in reducing corrosion current density of active region and Ti interlayer coating over Ni coating reduced the anodic corrosion current density by an order of 4 with increasing the thickness of Ti up to$ 3\mu\textrm{m}$. The improvement of corrosion resistance by Ni/Ti interlayer coating was attributed to the effective prevention of penetration of active corrosion agent resulting from the inherent corrosion resistance of Ni and Ti. Putting corrosion behavior was observed from salt spray test result for all specimens and corrosion resistance at salt atmosphere was enhanced with increasing Ni and Ti thickness, Cor-lay TiN coating was spalled out by the generation of corrosion products.

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The Analysis on Wear Behavior of Cu-$TiB_2$ Composite For Contact Wire (전차선용 Cu-$TiB_2$ 복합재료의 마모거동에 관한 분석)

  • Kim Jung-Nam;Lee Tae-Woo;Kwon Sung-Tae;Kang Kae-Myung
    • Proceedings of the KSR Conference
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    • 2004.10a
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    • pp.704-709
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    • 2004
  • The wear behavior and the mechanical property of Cu-$TiB_2$ composites were examined. Cu-$TiB_2$ composites were fabricated by hot extrusion and cold drawing with $TiB_2$ contents(1$\∼$5vol.$\%$) and the size of $TiB_2$ particles(10$\mu$m and 20$\mu$m). The pin-an-disk wear test was carried out under dry sliding wear conditions which loads varied with from 20N to 100N. At the time, counterpart wear material used SM45C. The experimental results showed that the friction coefficient and wear rate decreased with increasing the $TiB_2$ contents and decreasing the size of $TiB_2$ particle. Also, the depth of plastically deformed zone decreased with increasing the $TiB_2$ contents and decreasing the size of $TiB_2$ particle.

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High-temperature Oxidation of the TiAlCrSiN Film (TiAlCrSiN 박막의 고온 산화 부식)

  • Lee, Dong-Bok;Kim, Min-Jeong;Abro, M.A.;Yadav, P.;Shi, Y.
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.107-107
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    • 2016
  • TiCrAlSiN films were developed in order to improve the high-temperature oxidation resistance, corrosion resistance, and mechanical properties of conventional TiN films that are widely used as hard films to protect and increase the lifetime and performance of cutting tools or die molds. In this study, a nano-multilayered TiAlCrSiN film was deposited by cathodic arc plasma deposition. It displayed relatively good oxidation resistance at $700-900^{\circ}C$, owing to the formation protective oxides of $Al_2O_3$, $Cr_2O_3$, and $SiO_2$, and semiprotective $TiO_2$. At $1000^{\circ}C$, the increased temperature led to the formation of the imperfect oxide scale that consisted primarily of the outer ($TiO_2$,$Al_2O_3$)-mixed scale and inner ($TiO_2$, $Al_2O_3$, $Cr_2O_3$)-mixed scale.

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Effects of TiN/Ti Multilayer Coating on the Ti-30Ta-xZr Alloy Surface (Ti-30Ta-xZr 합금의 표면에 TiN/Ti 다층막코팅효과)

  • Kim, Y.U.;Jeong, Y.H.;Cho, J.Y.;Choe, H.C.;Vang, M.S.
    • Journal of Surface Science and Engineering
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    • v.42 no.4
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    • pp.161-168
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    • 2009
  • Effects of TiN/Ti multilayer coating on the Ti-30Ta-xZr alloy surface were studied by using various experiments. The Ti-30Ta containing Zr (5, 10 and 15 wt%) were melted 10 times to improve chemical homogeneity by using a vacuum furnace. And then samples were homogenized for 24 hrs at $1000^{\circ}C$. The specimens were prepared for TiN/Ti coating by cutting and polishing. The prepared specimens were coated with TiN/Ti multilayers by using DC magnetron sputtering method. The analyses of coated surface and coated layer were carried out by field emission scanning electron microscope(FE-SEM), EDX, and X-ray diffractometer(XRD). From the microstructure and XRD analysis of Ti-30Ta-xZr alloys, The equiaxed structure was changed to needle-like structure with increasing Zr content. And $\alpha$-peak and elastic modulus increased as Zr content increased. The $\alpha$ and $\beta$ phase predominantly were found in the specimen containing high Zr content. According to the analysis of TiN/Ti coating layer, the surface defects and structures of Ti-30Ta-xZr were covered with TiN/Ti coating layer and surface roughness decreased.

The Electrical properties of Al/TiN/Ti Contact at Submicron contact(2) (Al/TiN/Ti 전극의 Submicron contact에서의 전기적특성(2))

  • Lee, C.J.;Eum, M.J.;Ra, Y.C.;Kim, S.J.;Sung, M.Y.;Sung, Y.K.
    • Proceedings of the KIEE Conference
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    • 1995.07c
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    • pp.1069-1071
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    • 1995
  • The electrical properties of Al/TiN/Ti contact are investigated at submicron contacts. The contact resistance and contact leakage current are dependent on metallization, surface dopant concentration, semiconductor surface treatment and contact plug ion implantation. In this paper, the contact resistance and contact leakage current are studied according to surface dopant concentration, semiconductor surface treatment and contact plug ion implantation at 0.8 micron contact. The contact resistance and contact leakage current increases with increasing substrate ion concentration. HF cleaning represents high contact resistance but low contact leakage current while CDE cleaning represents low contact resistance but high contact leakage current. Contact plug ion implantation decreases contact resistance but increases contact leakage current. Specially, RTA represents good electrical properties.

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Effect of Plasma Treatment with O2, Ar, and N2 Gas on Porous TiO2 for Improving Energy Conversion Efficiency of DSSC (Dye Sensitized Solar Cell)

  • Gang, Go-Ru;Sim, Seop;Cha, Deok-Jun;Kim, Jin-Tae;Yun, Ju-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.202-202
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    • 2012
  • 염료감응태양전지(DSSC)의 광변환 효율을 향상시키기 위하여 진공챔버에서 450도 고온에서 O2, Ar, and N2 혼합가스를 주입하여 다양한 plasma로 TiO2 박막을 처리하면서 소성시켰다. TiO2 표면을 cleaning하고 활성화함으로서 염료의 결합력을 향상시키는 것 외에 TiO2 내부의 oxygen vacancy를 변화를 관찰하였다. 실험에 사용한 박막은 glass 위에 FTO 박막을 입히고, 다공성 TiO2 나노입자 박막을 코팅하여 제조하였다(porous TiO2 나노입자(${\sim}12{\mu}m$)/FTO(Fluorine doped Tin oxide; $1{\mu}m$)/glass). 완성된 광전극에 대해서 XRD, XPS, EIS, FE-SEM 등을 이용하여 분석하였다. 또한 이렇게 전처리된 광전극을 사용한 DSSC를 제작하였다. 그리고 Solar-simulator를 통해 그 효율을 측정하여 '플라즈마환경에서 소성된 광전극에 대한 DSSC의 광변환효율에 미치는 효과'을 고찰하였다.

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Effects of Deposition Parameters on TiN Film by Plasma Assisted Chemical Vapor Deposition(I) -Influence of Temperature on the TiN Deposition- (플라즈마 화학 증착법(PACVD)에 의한 TiN 증착시 증착변수가 미치는 영향(I) -증착온도를 중심으로-)

  • Shin, Y.S.;Ha, S.H.;Kim, M.I.
    • Journal of the Korean Society for Heat Treatment
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    • v.2 no.4
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    • pp.1-10
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    • 1989
  • To investigate the influence of temperature on the TiN film, it was deposited on the STC-3 steel and Si-wafer from $TiCl_4/N_2/H_2$ gas mixture by using the radio frequency plasma assisted chemical vapor deposition. The deposition was performed at temperature of $400^{\circ}C-500^{\circ}C$. The results showed that crystalline TiN film was deposited over $480^{\circ}C$, and all specimens showed the crystalline TiN X-ray diffraction peaks after vacuum heat treatment for 3 hrs, at $1000^{\circ}C$, $10^{-5}torr$. While the film thickness was increased above $480^{\circ}C$, it was decreased under $480^{\circ}C$ as temperature increased. And the contents of titanium were increased and it of chlorine were decreased as temperature increased. Because temperature increase was attributed to the increase in the density of TiN film, surface hardness of TiN film was increased with temperature.

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