• The Transactions of the Korean Institute of Electrical Engineers
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• v.45 no.1
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• pp.81-85
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• 1996

Microwave dielectric properties of 0.15(B $a_{x}$S $r_{0.05}$)O-0.15(S $m_{2}$(1-y)N $d_{2y}$) $O_{3}$-0.7Ti $o_{2}$(x=o.9~0.1[mol.], y=6[m/o]) ceramics were investigated with BaO compositional ratio. Sintered density and resistivity of specimens were independent on the BaO compositional ratio. In the specimen with x=0.975[mol.], dielectric constant, quality factor and temperature coefficient of resonant frequency had good values of 76.52, 3001(at 3[GHz]) and +0.71[ppm/.ceg. C], respectively. By comparing with the stoichiometric compositions of 78.14, 2938(at 3[GHz])+14.19[ppm/.ceg. C], dielectric constant and quality factor showed similar properties, but the temperature coefficient of resonant frequency was highly improved. (author). refs., figs., tabs.s.s.

• Proceedings of the KIEE Conference
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• 1995.11a
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• pp.472-474
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• 1995

A Sputter ion Plating(SIP) system with a r.f. coil electrode and the Facing Target Sputter(FTS) source was designed for high-quality thin film formation. The rf discharge was combined with DC facing target sputtering in order to enhance ionization degree of a sputtered atoms. The energy of ions incident on the substrate depended on the health potential of DC biased substrate. The mean impact ion energy increased with negative bias voltage and rf power. The adhesive force of the TiN film formed was in the range of 30$\sim$50N, and markedly influenced by substrate bias voltage.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.11a
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• pp.234-237
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• 2000

In this paper, the structural, dielectric and piezoelectric properties of the Pb[(S $b_{1}$2/N $b_{1}$2/)$_{0.035}$- $_Mn_{1}$3/N $b_{2}$3/)$_{0.065}$-(Z $r_{0.49}$, $Ti_{0.51}$)$_{0.90}$] $O_3$ ceramics were investigated with respect to the variation of the milling time. Grain size was decreased as the increase of milling time. As the milling time is increased, the particle size of the powder was decreased. Dielectric constant and electromechanical coupling factor (Qm)were slowly increased with the increase of milling time. The highest value of Qm was 1,497 at milling time 8 hour. Temperature coefficient of resonant frequency(TC $F_{r}$) was moved to positive side with the increase of milling time.e.e.e.e.e.e.

• Journal of the Semiconductor & Display Technology
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• v.16 no.2
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• pp.79-84
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• 2017

This paper outlines the Taguchi optimization methodology, which is applied to optimize cutting parameters in end milling when machining STS304 with TiAlN coated SKH59 tool under up and down end milling conditions. The end milling parameters evaluated are depth of cut, spindle speed and feed rate. An orthogonal array, signal-to-noise (S/N) ratio and analysis of variance (ANOVA) are employed to analyze the effect of these end milling parameters. The Taguchi design is an efficient and effective experimental method in which a response variable can be optimized, given various control and noise factors, using fewer resources than a factorial design. An orthogonal array of $L_9(33)$ was used. The most important input parameter for cutting force, however, is the feed rate, and depending on the cutter rotation direction. Finally, confirmation tests verified that the Taguchi design was successful in optimizing end milling parameters for cutting force.

• Nuclear Engineering and Technology
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• v.53 no.8
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• pp.2564-2569
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• 2021

The neutronic analysis of Helium Cooled Ceramic Reflector (HCCR) breeding blankets has been performed using the 3D Monte Carlo code MCNPX and ENDF nuclear data library. This study aims to reduce ⁶Li percentage in the breeder zones as much as possible ensuring tritium self-sufficiency. This work is devoted to investigating the effect of ⁶Li percentage on the HCCR breeding blanket's neutronic parameters, such as neutron flux and spectrum, Tritium Breeding Ratio (TBR), nuclear power density, and energy multiplication factor. In the ceramic breeders at the saturated thickness, increasing the enrichment of ⁶Li reduces its share in the tritium production. Therefore, ceramic breeders typically use lower enriched Li from 30% to 60%. The investigation of neutronic analysis in the suggested geometry shows that using 60% ⁶Li in Li₂TiO₃ can yield acceptable TBR and energy deposition results, which would be economically feasible.

• Proceedings of the KIEE Conference
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• 1994.11a
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• pp.228-230
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• 1994

A Spotter ion Plating(SIP) system with a r. f. coil electrode and the Facing Target Sputter(FTS) source was designed for high-quality thin film formation. The rf discharge was combined with DC facing target sputtering in order to enhance ionization degree of a sputtered atoms. The discharge voltage-discharge characteristics curves of a FTS source could be characterized by the fern of $I{\propto}V^n$ with n in the range of $8{\sim}12$. The energy of ions incident on the substrate depended on the sheath potential of DC biased substrate. The mean impact ion energy increased with negative bias voltage and rf power. The adhesive force of the TiN film formed was in the range of $30{\sim}50N$, and markedly influenced by substrate bias voltage.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.30 no.2
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• pp.181-187
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• 2004

Preparations of mesoporous materials using various templates and their applicability have been intensively investigated for many years. We studied on synthesizing mesoporous Ti02 with pores in which sensitive compounds having weak physico-chemical properties such as thermal or UV irradiation and low solubility in solvent are trapped. Prior to trapping OMC in the pores of mesoporous titania, OMC was nano-emulsified in O/W system using Lecithin. Thereafter the OMC was trapped in the pores of mesoporous titania using sol-gel method. Main focus of this work is to prepare OMC-trapped mesoporous titania and to trace the stability and solubility of nano-emulsified OMC in the pores of mesoporous titania, and compared with that of mesoporous silica. OMC-trapped mesoporous Inorganic-Organic hybrid titania showed higher factors in sun protecting and a skin penetration phenomenon was reduced.

• Korean Journal of Optics and Photonics
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• v.15 no.4
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• pp.375-384
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• 2004

Switching phenomenon of a three-waveguide optical coupler was analyzed by using the coupled mode theory, and the coupling-length of the device was calculated by means of the FDM. CPW traveling-wave electrodes were designed by the CMM and SOR simulation techniques so as to satisfy the conditions of phase-velocity and impedance matching. Traveling-wave modulators were fabricated on a z-cut LiNbO$_3$ substrate. Ti was in-diffused in LiNbO$_3$ to make waveguides and Au electrodes were built on the waveguides by the electroplating technique. Insertion loss and switching voltage of the optical modulator were about 4 ㏈ and 15.6V. Network analyzer was used to obtain S parameters and corresponding RF response. From the measurement, parameters of the traveling-wave electrodes were extracted as such Z$_{c}$=39.2 $\Omega$, Neff=2.48, and a0=0.0665/cm((GHz) (1/2)). The measured optical response R(w) was compared with the theoretically estimated and both responses were shown to agree well. The measurement results revealed that the ㏈ bandwidth turned out to be about 13 GHz.

• Journal of the Korean Vacuum Society
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• v.20 no.6
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• pp.436-441
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• 2011

Metal coating with several nanometer thickness was applied on the carbon nanotubes (CNTs) in order to improve electron emission characteristics and emission reliability for the potential applications in the area of various electron sources and displays. CNTs were grown on the 2-nm thick Invar (52% Fe, 42% Ni, 6% Co alloy)-catalized Si substrate by using plasma-enhanced chemical vapor deposition at $450^{\circ}C$. In order to reduce the spatial density of densely packed CNTs, as-grown CNTs were partly etched back by $N_2$ plasma and subsequently coated with 5~150 nm thick Ti by a sputtering method. 5 nm thick Ti-coated CNTs produced four times higher emission current density at the electric field of 6 V/${\mu}m$ and much lower emission current fluctuation, compared with the as-grown CNTs. These improved emission properties are mainly due to not only the work function of Ti (4.3 eV) lower than that of pristine CNTs (5 eV), but also lower contact resistance and better adhesion between CNT emitters and substrate accomplished by Ti coating.

• Restorative Dentistry and Endodontics
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• v.35 no.2
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• pp.88-95
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• 2010

The purpose of this study was to compare the root canal shaping ability of 4 rotary NiTi instruments in simulated root canals. For the preparation of thirty two curved root canals, Mtwo instruments using "single length"technique, and Profile, ProTaper Universal, and K3 using crown-down technique (N = 8) were used. All canal samples were prepared by reaching an apical canal size of #30. Pre- and post-instrumentation digital images were recorded and an assessment of canal shape was determined using a computer image analysis program SigmaScan Pro (Systat Software Inc., San Jose, CA, USA). The changes of the dimension of inner walls of canals, (2) the changes of the dimension of outer walls of canals, and (3) the centering ratio were measured at 7 measuring points, and then data were statistically analyzed using one-way ANOVA and Duncan's test. The results were as below; 1. The root canal shaping ability of Profile was significantly faster than that of other rotary NiTi instruments (p < 0.05). 2. The deformation and fracture of all instruments used for this study were not experienced. 3. In the degree of changes of the dimension of inner walls of canals, Profile demonstrated the lowest changes of the dimension of inner walls of canals except at the measuring points of the 1 and 2 mm (p < 0.05). However, the ProTaper Universal showed the highest changes of the dimension of inner walls of canals at all measuring points (p < 0.05). 4. In the degree of changes of the dimension of outer walls of canals, Mtwo demonstrated the lowest changse of the dimension of outer walls of canals except at the measuring point of the 1 mm (p < 0.05). However, Profile exhibited the highest changes of the dimension of outer walls of canals at the measuring points of 3 and 4 mm and ProTaper Universal and K3 showed the largest changes of the dimension of outer walls of canals at the measuring points of 1, 2, 6, and 7 mm (p < 0.05). 5. In degree of centering ratio, Profile demonstrated the least centering ratio comparing with the centering ratio shown by other NiTi instruments at the measuring points of 1, 4, 5, and 6 mm. Results suggest that in the coronal part of canal preparation, active cutting files such as ProTaper Universal may efficiently flare the canal orifice and form a better taper, and in the apical part of the canal, files which have a better centering ability such as Profile may maintain the original canal curvature and reduce the shaping time.