• Title/Summary/Keyword: Ti thickness

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The Structural Properties of $Bi_4Ti_3O_{12}$ Ferroelectric Thin Films doped with Cerium (Cerium이 첨가된 $Bi_4Ti_3O_{12}$ 강유전체 박막의 구조적 특성)

  • Han, Sang-Wook;Nam, Sung-Pill;Lee, Sung-Gap;Bae, Seon-Gi;Lee, Young-Hie
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.236-237
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    • 2005
  • The structural properties of $(Bi,Ce)_4Ti_3O_{12}(BCT)$ thin films with post-annealing temperature were investigated. $(Bi,Ce)_4Ti_3O_{12}(BCT)$ thin films were deposited by RF sputtering method on Pt/Ti/$SiO_2$/Si substrates with optimum deposition condition. The $(Bi,Ce)_4Ti_3O_{12}(BCT)$ thin films was post-annealed at 600$^{\circ}C$, 650$^{\circ}C$, 700$^{\circ}C$, 750$^{\circ}C$, 800$^{\circ}C$ in furnace,respectively. Increasing the post-annealing temperature, the grain size, density and peak intensity of (117) and c-axis orientation were increased. The $(Bi,Ce)_4Ti_3O_{12}(BCT)$ thin films that annealed at 750$^{\circ}C$ exhibited well crystallized phase and had no vacancy and grain was uniform. but there are some secondary phases observed. At this time, the average thickness of $(Bi,Ce)_4Ti_3O_{12}(BCT)$ thin films was 2000 ${\AA}$.

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Development of Preparation Technology for TiO2 Nanotube Photocatalyst (광촉매 활용을 위한 TiO2 나노튜브 제조기술 개발)

  • Koo, Hyemin;Lee, Yongho;Pak, Daewon
    • Journal of Korean Society on Water Environment
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    • v.31 no.4
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    • pp.360-366
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    • 2015
  • In this study $TiO_2$ nanotube was grown on Ti by anodic oxidation to be used as a photocatalyst. The growth and formation of $TiO_2$ nanotube was monitored during anodization in ethylene glycol electrolyte by changing voltage and composition of electrolyte. Commercially available titanium plate (purity>99.8%, thickness:1mm) Applied voltage and concentration of $NH_4F$ and $H_2O$ were varied to find the optimum condition. Applied voltage is important to make $TiO_2$ nanotube and the electrolyte containing ethylene glycol, 0.2 wt% $NH_4F$ and 2 vol% $H_2O$ was confirmed to be the optimum conditions for the formation and growth of $TiO_2$ nanotubes.

Photocatalytic Decolorization of Dye usingUV/TiO2 and Fluidized Bed Reactor (UV/TiO2와 유동층 반응기를 이용한 안료의 광촉매 탈색)

  • Park Young-Seek
    • Journal of Environmental Science International
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    • v.13 no.10
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    • pp.921-928
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    • 2004
  • The photocatalytic decolorization of Rhodamine B (RhB) was studied using immobilized $TiO_2$ and fluidized bed reactor. Immobilized $TiO_2$(length: 1$\~$2 mm, width: 1$\~$3 mm, thickness: 0.5$\~$2 mm) onto silicone sealant was employed as the photocatalyst and a 30 W germicidal lamp was used as the light source and the reactor volume was 4.8 L. The effects of parameters such as the amounts of photocatalyst, initial concentration, initial pH, superficial velocity, $H_2O_2$ and anion additives. ($NO_3^{-},\;SO_4^{2-},\;Cl^{-},\;CO_3^{2-}$) The results showed that the optimum dosage of the immobilized $TiO_2$ were 87.0 g/L. Initial removal rate of RhB of the immobilized $TiO_2$ was 1.5 times higher than that of the powder $TiO_2$ because of the adsorption onto the surface of immobilized $TiO_2$ In the conditions of acidic pH, initial reaction rate was increased slowly and reaction time was shorted. The effect of anion type on the reaction rate was not much.

Gold Colored Coating of TiO2 thin film on Nickel-Silver by Sol-Gel Process (양백에 코팅된 비정질 TiO2 박막의 특성에 관한 연구)

  • Lim, Yongmu;Kim, Sangmoon;Shim, Moonsik;Jang, Heejin;Shin, Jongyoon;Hwang, Kyuseog
    • Journal of Korean Ophthalmic Optics Society
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    • v.4 no.1
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    • pp.51-56
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    • 1999
  • $TiO_2$ thin films were spin coated on commercial Nickel-Silver with 2%Ti-naphthanate toluene solution by sol-gel process. The thin films were heat-treated at $500^{\circ}C$ for 2min and then decorative-protective coating was obtained. The conditions for gold colored coating, and the morphology, microstructure and color of the coating surface were have been characterized by Optical microscope, Photospectrometer and XRD. The heating temperature of colored-$TiO_2$ coating was $500^{\circ}C$ and was preferable. The average thickness of 1 time coating was $0.24{\mu}m$ and the total thickness increased linearly as a function of the coating time. The color of amorphous colored-$TiO_2$ coating was changed from gold to dark redish gold with coating time. 'L' as lightness and 'b' were decreased to red, but 'a' was decreased to blue after increase with coating time.

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Fabrication of Zirconium Titanate Thin film from Layer-by-Layer Structure of Primitive Oxides prepared by PRTMOCVD (PRTMOCVD 법을 통한 단성분계 산화막의 적층형 구조로부터 Zirconium Titanate 박막의 제조)

  • Song, Byung-yun;Kwon, Yong Jung;Lee, Won Gyu
    • Korean Chemical Engineering Research
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    • v.45 no.4
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    • pp.378-383
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    • 2007
  • A novel fabrication method for the multi-component metal oxides such as zirconium titanate($Zr_xTi_{1-x}O_2$) has been suggested, which would yield the uniform film characteristics and control the film composition at relatively low process temperature. The method has the basic concept that firstly layer-by-layer structure is constructed with the primitive oxide layers, which are components of the desired multi-component oxides, and secondly the film is annealed at appropriate thermal conditions for the transformation to a single-phase multi-component oxides. In this study, PRTMOCVD(pulsed rapid thermal metalorganic chemical vapor deposition) possessing the superior thickness controllability was introduced to prepare $ZrO_2$ and $TiO_2$ thin film for zirconium titanate. Single-phase zirconium titanate thin films have been prepared successfully by the interdiffusion of oxide multilayers having several alternating layers of $ZrO_2$ and $TiO_2$. The Zr/Ti ratio of zirconium titanate could be controlled easily by altering the thickness of $ZrO_2$ and $TiO_2$ thin film.

Effect of Interlayer on TiN and CrN Thin Films of STS 420 Hybrid-Deposited by AlP and DC Magnetron Sputtering (AIP 와 스퍼터링으로 복합증착된 420 스테인리스강의 TiN과 CrN 박막에 미치는 중간층의 영향)

  • Choi, Woong-Sub;Kim, Hyun-Seung;Park, Burm-Su;Lee, Kyung-Ku;Lee, Doh-Jae;Lee, Kwang-Min
    • Korean Journal of Materials Research
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    • v.17 no.5
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    • pp.256-262
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    • 2007
  • Effects of interlayer and the combination of different coating methods on the mechanical and corrosion behaviors of TiN and CrN coated on 420 stainless steel have been studied. STS 420 specimen were tempered at $300^{\circ}C$ for 1 hr in vacuum furnace. The TiN and CrN thin film with 2 ${\mu}m$ thickness were coated by arc ion plating and DC magnetron sputtering following the formation of interlayer for pure titanium and chromium with 0.2 ${\mu}m$ thickness. The microstructure and surface analysis of the specimen were conducted by using SEM, XRD and roughness tester. Mechanical properties such as hardness and adhesion also were examined. XRD patterns of TiN thin films showed that preferred TiN (111) orientation was observed. The peaks of CrN (111) and $Cr_2N$ (300) were only observed in CrN thin films deposited by arc ion plating. Both TiN and CrN deposited by arc ion plating had the higher adhesion and hardness compared to those formed by magnetron sputtering. The specimen of TiN and CrN on which interlayer deposited by magnetron sputtering and thin film deposited by arc ion plating had the highest adhesion with 22.2 N and 19.2 N. respectively. TiN and CrN samples shown the most noble corrosion potentials when the interlayers were deposited by using magnetron sputtering and the metal nitrides were deposited by using arc ion plating. The most noble corrosion potentials of TiN and CrN were found to be approximately -170 and -70 mV, respectively.

An Electrical Properties of Antifuses based on $BaTiO_3/SiO_2$ films ($BaTiO_3/SiO_2$로 구성된 안티퓨즈의 전기적 특성)

  • Lee, Young-Min;Lee, Jae-Sung;Lee, Yong-Hyun
    • Journal of Sensor Science and Technology
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    • v.7 no.5
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    • pp.364-371
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    • 1998
  • A novel antifuse has been developed for field programmable gate arrays (FPGA's) as a voltage programmable link with Al/$BaTiO_3/SiO_2$/TiW-silicide. The proper program voltage can be obtained by adjusting the deposition thickness of $BaTiO_3$ film. When a negative voltage was applied at bottom TiW-silicide electrode of the antifuse, based on $BaTiO_3(120{\AA})$/$SiO_2(120{\AA})$, the program voltage was about l4.4V and on-resistances were ranged between 40 and $50{\Omega}$. The current-voltage characteristics of antifuses are consistent with a Frenkel-Poole conduction model. However, there are some deviations depending on bias polarity that are probably due to the difference in the interface properties between Al/$BaTiO_3$ and TiW-silicide/$SiO_2$.

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Synthesis of Au/TiO2 Core-Shell Nanoparticles by Using TTIP/TEOA Mixed Solution (TTIP/TEOA 혼합용액을 이용한 Au/TiO2 Core-Shell 구조 나노입자 합성)

  • Kwon, Hyun-Woo;Lim, Young-Min;Yu, Yeon-Tae
    • Korean Journal of Materials Research
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    • v.16 no.8
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    • pp.524-528
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    • 2006
  • On the synthesis of Au/$TiO_2$ core-shell structure nanoparticle, the effect of concentration of $Ti^{4+}$ and reaction temperature on the morphology and optical property of Au/$TiO_2$ core-shell nanoparticles is examined. A gold colloid was prepared by $HAuCl_4{\cdot}4H_2O\;and\;C_6H_5Na_3{\cdot}2H_2O$. Titanium stock solution was prepared by mixing solution of titanium(IV) isopropoxide (TTIP) and triethanolamine (TEOA). The concentrations of $Ti^{4+}$ stock solution were adjusted to $10.01{\sim}0.3$ mM, and then the gold colloid is added to the $Ti^{4+}$ stock solution. Au/$TiO_2$ core-shell structure nanoparticles could be prepared by the hydrolysis of the $Ti^{4+}$ stock solution at $80^{\circ}C$. The size of synthesized Au nanoparticles was 15 nm. The thickness of $TiO_2$ shell on the surface of gold particles was about 10 nm. The absorption peak of synthesized Au/$TiO_2$ core-shell nanoparticles shifted towards the red end of the spectrum by about 3 nm because of the formation of $TiO_2$ shell on the surface of gold particles. The good $TiO_2$ shell is produced when $Ti^{4+}$ concentration is varied between 0.01 and 0.05 mM, and reaction temperature is maintained at $80^{\circ}C$. The crystal structure of $TiO_2$ shell was amorphous.

Epitaxial Cobalt Silicide Formation using Co/Ti/(100) Si Structure (Co/Ti(100)Si 이중층을 이용한 에피텍셜 Co 실리사이드의 형성)

  • Kwon, Young-Jae;Lee, Chong-Mu;Bae, Dae-Lok;Kang, Ho-Kyu
    • Korean Journal of Materials Research
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    • v.8 no.6
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    • pp.484-492
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    • 1998
  • The formation mechanism of the epitaxial cobalt silicide from Co/Ti/OOO) Si structure has been investigated. The transition temperature of CoSi to CoSi, was found to increase with increasing the Ti interlayer thickness, which may be owing to the occupation of the tetrahedral sites by Ti atoms in the CoSi crystal structure as well as the blocking effect of the Ti interlayer on the diffusion of Co. Also, the Co- Ti-O ternary compound formed at the metal! Si interface at the begining of silicidation, which seems to play an important role in epitaxial growth of Co silicide. The final layer structures obtained after a rapid thermal annealing of the Cot Ti/( 100) Si bi-layer structure turned out to be Ti oxide/Co- Ti-Si/epi-$CoSi_2$/OOO)

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Characteristics of the Nitride Layers Formed on Ti and Ti-10wt.%Ta-10wt.%Nb Alloys by Plasma Nitriding (플라즈마 이온질화처리 된 Ti 및 Ti-10wt.%Ta-10wt.%Nb 합금의 표면에 형성된 질화층의 특성)

  • Kim, Dong-Hun;Lee, Doh-Jae;Lee, Kwang-Min;Kim, Min-Ki;Lee, Kyung-Ku;Park, Bum-Su
    • Journal of Korea Foundry Society
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    • v.28 no.3
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    • pp.124-128
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    • 2008
  • The nitride layer was formed on Ti and Ti-10 wt.%Ta-10 wt.%Nb alloy by a plasma nitriding method. Temperature was selected as the main experimental parameter for plasma nitriding. XRD, EDX, and hardness test were employed to analyze the evolution and material properties of the layer. The SEM observation of TiN nitride layer revealed that the thickness of nitride layer tended to increase with increasing temperature. ${\delta}-TiN$, ${\varepsilon}-Ti_{2}N$ and ${\alpha}-Ti$ phases were detected by XRD analysis and the preferred orientation of TiN nitride layer was obviously observed at (220) plane with increasing temperature. From XRD analysis after step polishing the nitride specimens treated at $850^{\circ}C$, as polishing from the surface, TiN and $Ti_{2}N$ phases decreased gradually. After polishing the surface by $4{\um}m$, a small amount of $Ti_{2}N$ and ${\alpha}-Ti$ phases were observed. The adhesive strength test result indicated that adhesive strength increased with increasing temperature.