• Title/Summary/Keyword: Ti thickness

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Study on the Structure and Photoelectrochemical Properties of Anodized TiO2 Nanotube Films (양극산화법으로 제작한 TiO2 나노튜브 박막의 구조 및 광전기화학 특성 분석)

  • Lee, A Reum;Park, Sanghyun;Kim, Jae-Yup
    • Journal of Sensor Science and Technology
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    • v.27 no.4
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    • pp.264-268
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    • 2018
  • Vertically-aligned $TiO_2$ nanotube electrodes have attracted considerable attention for applications in solar cells, catalysts, and sensors, because of their ideal structure for electron transport and electrolyte diffusion. Here, we prepare vertically-aligned $TiO_2$ nanotube electrodes using a two-step anodization process. The prepared $TiO_2$ nanotube electrodes exhibit uniform pore structures with an inner diameter of ~80-90 nm and wall thickness of ~20-25 nm. In addition, they exhibit an anatase crystal phase after a high-temperature annealing. The annealed $TiO_2$ nanotube electrodes are applied in dye-sensitized solar cells (DSSCs) as photoanodes. The fabricated DSSC exhibits conversion efficiencies of 3.46 and 2.15% with liquid- and gel-type electrolytes, respectively.

Powder Chracteristics and Sintering Behavior of $SiO_2$ Coated $BaTiO_3$

  • Park, Jae-Sung;Han, Young-Ho
    • Proceedings of the Korean Powder Metallurgy Institute Conference
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    • 2006.09b
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    • pp.1097-1098
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    • 2006
  • The Powder characteristics and sintering behavior of $SiO_2$ coated $BaTiO_3$ were studied. Silica coated $BaTiO_3$ powders were prepared by sol-gel method. The particle size of the $BaTiO_3$ powders were $\sim35$ nm and the thickness of the $SiO_2$ coating layer was $\sim5$ nm. As the $SiO_2$ content increased, the $SiO_2$ layers improved the powder dispersion. The Zeta potential of $SiO_2$ coated $BaTiO_3$ was getting close to that of pure silica with a more negative charge, compared with that of the uncoated $BaTiO_3$. The onset temperature of shrinkage curves shifted to higher temperatures with increasing $SiO_2$ contents

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Study on the Tic Coating of Steel by C.V.D. Process (CVD법에 의한 강의 TiC 피복에 관하여)

  • 강국해;최진일;영동영
    • Journal of the Korean institute of surface engineering
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    • v.15 no.4
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    • pp.208-217
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    • 1982
  • To study the effect of TiC coating on weight change, microhardness, wear and heat - resistance of TiC layer, chemical vapour deposition on the various substrates has been carried out with the gaseous mixture of TiCl4, toluene, and H2 in the temperature range of 900 - 1000$^{\circ}C$. The results obtained are as follows ; (1) There is a limited value of carrier and reductant H2 gas flow rate, above which deteriorate effect on the TiC depoition arises (2) Increased thickness of TiC layer was resulted with increasing temperature and time. Better deposition was obtained with stainless steels and the best results were introduced by cobalt coating of substrates. (3) Wear resistance of the TiC coated specimen improved markedly. Heat resistivity of the coated steel showed excellent result, whereas the coated stainless Steels were infer-ior to the substrate.

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Studies on the Adhesion of W to TiN(II) (TiN에 대한 W의 부착특성에 관한 연구(II))

  • Lee, Jong-Mu;Gwon, Nan-Yeong;Lee, Jong-Gil
    • Korean Journal of Materials Research
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    • v.3 no.6
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    • pp.593-597
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    • 1993
  • Adhesion of CVD W to the TiN glue layer in the blanket W process which is a promising candidate for filing contact holes in subhalfmicron ULSIs has been investigated. The adhesion was enhanced with increasing the W film thickness due to the decrease of the TiN film stress. The adhesion strength was increased by the sputter etching of the TiN surface prior to the W deposition owing to the removal of contaminants and the increase of the surface roughness. The adhesion of the W film to the TiN glue layer property was also improved by Ar ion implantation of the TiN surface owing to the activation of the TiN surface.

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A Study on the Effects of Ti interlayer on the Properties of RF Sputtering SrTiO$_3$ Thin Films (RF Sputtering 으로 제작한 SrTiO$_3$ 박막 특성에 미치는 Ti 중간층의 영향)

  • Chung, Chun-Ock;Kim, Byung-In;Lee, Jung-Jai;Kim, Chang-Sik;Song, Chul
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.04a
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    • pp.8-11
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    • 1997
  • This study makes SrTiO$_{3}$ with nonpolarity among ferroelectrics by RF sputtering as dielectric layer, produces thin film of Si/SrTiO$_{3}$ and Si/Ti/SrTiO$_{3}$ of MOS structure using Ti as buffer layer, measures and examines the electrical features with optical refractive index, absorption rate, permittivity, photon energy and as a result, ferroelectrics oscillation occurrs by the interaction within a film by light temperature and the absorption of thin film with Ti as buffer layer is increased. It is found that the pea\ulcorner of permittivity value of Ti/SrTiO$_{3}$ thin film has low values and is appeared late and as dipole which is found in dielectric is shown, the experiment satisfies the theory In the nature of permittivity by photon energy, imaginary value is higher and current variation slope of thin film of thickness SrTiO$_{3}$ has lower values in reverse bias.

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Formation of a V-Added Ti Aluminide Multilayered Sheet by Self-Propagating High-Temperature Synthesis and Diffusion Annealing (고온자전합성과 확산 열처리를 이용한 V 이 첨가된 TiAl계 금속간화합물 복합판재의 제조)

  • Kim, Yeon-Wook
    • Korean Journal of Materials Research
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    • v.12 no.9
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    • pp.696-700
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    • 2002
  • The Ti-aluminide intermetallic compound was formed from high purity elemental Ti and Al foils by self-propagating, high-temperature synthesis(SHS) in hot press. formation of $TiAl_3$ at the interface between Ti and Al foils was controlled by temperature, pressure, heating rate, and so on. According to the thermal analysis, it is known in this study that the heating rate is the most important factor to form the intermetallic compound by this SHS reaction. The V layer addition between Al and Ti foils increased SHS reaction temperatures. The fully dense, well-boned inter-metallic composite($TiA1/Ti_3$Al) sheets of 700 m thickness were formed by heat treatment at $1000^{\circ}C$ for 10 hours after the SHS reaction of alternatively layered 10 Ti and 9 Al foils with the V coating layer. The phases and microstructures of intermetallic composite sheets were confirmed by EPMA and XRD.

Epoxy/BaTiO3 (SrTiO3) composite films and pastes for high dielectric constant and low tolerance embedded capacitors fabrication in organic substrates

  • Paik Kyung-Wook;Hyun Jin-Gul;Lee Sangyong;Jang Kyung-Woon
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2005.09a
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    • pp.201-212
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    • 2005
  • [ $Epoxy/BaTiO_3$ ] composite embedded capacitor films (ECFs) were newly designed fur high dielectric constant and low tolerance (less than ${\pm}15\%$) embedded capacitor fabrication for organic substrates. In terms of material formulation, ECFs are composed of specially formulated epoxy resin and latent curing agent, and in terms of coating process, a comma roll coating method is used for uniform film thickness in large area. Dielectric constant of $BaTiO_3\;&\;SrTiO_3$ composite ECF is measured with MIM capacitor at 100 kHz using LCR meter. Dielectric constant of $BaTiO_3$ ECF is bigger than that of $SrTiO_3$ ECF, and it is due to difference of permittivity of $BaTiO_3\;and\;SrTiO_3$ particles. Dielectric constant of $BaTiO_3\;&\;SrTiO_3$ ECF in high frequency range $(0.5\~10GHz)$ is measured using cavity resonance method. In order to estimate dielectric constant, the reflection coefficient is measured with a network analyzer. Dielectric constant is calculated by observing the frequencies of the resonant cavity modes. About both powders, calculated dielectric constants in this frequency range are about 3/4 of the dielectric constants at 1 MHz. This difference is due to the decrease of the dielectric constant of epoxy matrix. For $BaTiO_3$ ECF, there is the dielectric relaxation at $5\~9GHz$. It is due to changing of polarization mode of $BaTiO_3$ powder. In the case of $SrTiO_3$ ECF, there is no relaxation up to 10GHz. Alternative material for embedded capacitor fabrication is $epoxy/BaTiO_3$ composite embedded capacitor paste (ECP). It uses similar materials formulation like ECF and a screen printing method for film coating. The screen printing method has the advantage of forming capacitor partially in desired part. But the screen printing makes surface irregularity during mask peel-off, Surface flatness is significantly improved by adding some additives and by applying pressure during curing. As a result, dielectric layer with improved thickness uniformity is successfully demonstrated. Using $epoxy/BaTiO_3$ composite ECP, dielectric constant of 63 and specific capacitance of 5.1nF/cm2 were achieved.

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CHaracteristics of (Pb,La)T$TiO_3$ Thin Film by Deposition Condition of Pulsed Laser Ablation (레이저 어블레이션에 의한 (Pb,La)$TiO_3$박막의 제작조건에 따른 특성)

  • 박정흠;박용욱;마석범
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.12
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    • pp.1001-1007
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    • 2001
  • In this study, high dielectric materials, (Pb,La)Ti $O_3$ thin films were fabricated by PLD (Pulsed Laser Deposition) method and investigated in terms of structural and electrical characteristics in order to develope the dielectric materials for the use of new capacitor layers of Giga bit-level DRAM. The deposition conditions were examined in order to fabricate uniform thin films through systematic changes of oxygen pressures and substrate temperature. The uniform thickness and smooth morphology of (P $b_{0.72}$L $a_{0.28}$)Ti $O_3$ thin films were obtained at the conditions of substrate-target distance 5.5[cm], laser energy density 2.1[J/$\textrm{cm}^2$], oxygen pressure 200[mTorr] and substrate temperature 500[$^{\circ}C$]. After the (P $b_{0.72}$L $a_{0.28}$)Ti $O_3$ thin films were fabricated under the above conditions, they were post-annealed by RTA process in order to increase the dielectric constant. The film thickness of 1200 [$\AA$] had dielectric constant 821. Assuming that operating voltage is 2V, leakage current density of (P $b_{0.72}$L $a_{0.28}$)Ti $O_3$ thin films would result into 10$^{-7}$ [A/$\textrm{cm}^2$] and satisfied the specification of 256M DRAM planar capacitor, 4$\times$10$^{-7}$ [A/$\textrm{cm}^2$]m}^2$]

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Active Materials for Energy Conversion and Storage Applications of ALD

  • Sin, Hyeon-Jeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.75.2-75.2
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    • 2013
  • Atomic layer deposition (ALD), utilizing self-limiting surface reactions, could offer promising perspectives for future efficient energy conversion devices. The capabilities of ALD for surface/interface modification and construction of novel architectures with sub-nanometer precision and exceptional conformality over high aspect ratio make it more valuable than any other deposition methods in nanoscale science and technology. In the context, a variety of researches on fabrication of active materials for energy conversion applications by ALD are emerging. Among those materials, one-dimensional nanotubular titanium dioxide, providing not only high specific surface area but also efficient carrier transport pathway, is a class of the most intensively explored materials for energy conversion systems, such as photovoltaic cells and photo/electrochemical devices. The monodisperse, stoichiometric, anatase, TiO2 nanotubes with smooth surface morphology and controlled wall thickness were fabricated via low-temperature template-directed ALD followed by subsequent annealing. The ALD-grown, anatase, TiO2 nanotubes in alumina template show unusual crystal growth behavior which allows to form remarkably large grains along axial direction over certain wall thickness. We also fabricated dye-sensitized solar cells (DSCs) introducing our anatase TiO2 nanotubes as photoanodes, and studied the effect of blocking layer, TiO2 thin films formed by ALD, on overall device efficiency. The photon convertsion efficiency ~7% were measured for our TiO2 nanotubebased DSCs with blocking layers, which is ~1% higher than ones without blocking layer. We also performed open circuit voltage decay measurement to estimate recombination rate in our cells, which is 3 times longer than conventional nanoparticulate photoanodes. The high efficiency of our ALD-grown, anatase, TiO2 nanotube-based DSCs may be attributed to both enhanced charge transport property of our TiO2 nanotubes photoanode and the suppression of recombination at the interface between transparent conducting electrode and iodine electrolytes by blocking layer.

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Application to Piezoelectric and Triboelectric Generators of Spongy Structured BaTiO3 Prepared by Sputtering (Sputtering에 의해 제조된 해면 구조 BaTiO3의 압전 및 마찰전기 발전기에의 응용)

  • Seon-A Kim;Sang-Shik Park
    • Korean Journal of Materials Research
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    • v.34 no.1
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    • pp.34-43
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    • 2024
  • New piezoelectric and triboelectric materials for energy harvesting are being widely researched to reduce their processing cost and complexity and to improve their energy conversion efficiency. In this study, BaTiO3 films of various thickness were deposited on Ni foams by R.F. magnetron sputtering to study the piezoelectric and triboelectric properties of the porous spongy structure materials. Then piezoelectric nanogenerators (PENGs) were prepared with spongy structured BaTiO3 and PDMS composite. The output performance exhibited a positive dependence on the thickness of the BaTiO3 film, pushing load, and poling. The PENG output voltage and current were 4.4 V and 0.453 ㎂ at an applied stress of 120 N when poled with a 300 kV/cm electric field. The electrical properties of the fabricated PENG were stable even after 5,000 cycles of durability testing. The triboelectric nanogenerators (TENGs) were fabricated using spongy structured BaTiO3 and various polymer films as dielectrics and operated in a vertical contact separation mode. The maximum peak to peak voltage and current of the composite film-based triboelectric nanogenerator were 63.2 V and 6 ㎂, respectively. This study offers new insights into the design and fabrication of high output nanogenerators using spongy structured materials.