• 한국표면공학회지
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• 제37권1호
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• pp.1-4
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• 2004

MoS$_2$-Ti films were deposited on SKD-11 tool steel substrate by a D.C. magnetron sputtering system. The influence of deposition parameters on the adhesion of the films was investigated by the scratch test. Crosssection morphology was evaluated using FE-SEM. The plasma etching played an important role on the adhesion of the films. The appropriate etching conditions roughened the surface, resulting In the improved adhesion of the film. The adhesion of the film increased with the interlayer thickness up to 110 nm and then decreased slightly with further increasing of interlayer thickness. The adhesion was highest at a bias voltage of -50 V. Further increase of the bias voltage decreased the film adhesion.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.290-293
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• 1999

(Ba$_{0.5}$Sr$_{0.5}$)TiO$_3$ thin films were fabricated at different RTA temperatures and thicknesses by Sol-Gel method. Solution consisting of acetate powders and titanium isopropoxide in a mixture of acetic acid and ethylene glycol were spin coated onto Pt/Ti/SiO$_2$/Si substrates. The films were annealed in the temperature range of 650~80$0^{\circ}C$ for 3 minutes by rapid thermal annealing. These BST thin films were fully crystallized at 75$0^{\circ}C$ and showed a maximum dielectric constant value of $\varepsilon$$_{r}$=~468 and dielectric loss was ~0.025 at a thickness of approximately 4000$\AA$.EX>.>.

• 한국표면공학회지
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• 제15권3호
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• pp.138-145
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• 1982

The effects of the simultaneous variations of the ratio of feed gases(H2/N2 Flow ratio), feed gas flow rate (H2/N2, total-flow rate) and partial pressures of TiCl4 (PTiCl41) as well as deposition time and cobalt content of the substrate on the deposition rate of the TiN Coated Cemented Tungsten Carbide Tools were investigated. Deposition was carried out in the temperature range of 930$^{\circ}C$-1080$^{\circ}C$ and an activation energy of 46.5 Kcal/mole can be calculated. Transverse rupture strength was noticeably reduced by the TiN coating on the virgin surfa-ce of Cemented Tungsten Carbide, the extent of which was decreased according to the coa-ting thickness. Microhardness value observed on the work was in the range of 1700∼2000kg/mm, which were in well agreement with the value of bult TiN. The wear resistance of TiN layers was performed by turning test and it was observed that crater and flank resistance remarkably enhanced by TiN coating.

• 한국재료학회지
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• 제9권4호
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• pp.419-427
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• 1999

TiNi shape memory alloy was shape memory heat-treated and investigated its mechanical properties with the variation of prestrain. Also 6061 Al matrix composites with TiNi shape memory alloy fiber as reinforcement have been fabricated by Permanent Mold Casting to investigate the microstructures and interface properties. Yield stress of TiNi wire was the most high in the case of before heat-treatment and then decreased as increasing heat-treatment time. In each heat-treatment condition, the yield stress of TiNi wire was not changed with increasing the amount of prestrain. The interface bonding of TiNi/6061Al composite was fine. There was a 2$\mu\textrm{m}$ thickness of diffusion reaction layer at the interface. We could find out that this diffusion reaction layer was made by the mutual diffusion. The diffusion rate from Al base to TiNi wire was faster than that of reverse diffusion and the amount of the diffusion was also a little more than that of reverse.

• 전기학회논문지
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• 제58권12호
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• pp.2436-2440
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• 2009

In this work, TCO-less dye-sensitized solar cells (DSCs) using Ti-mesh layer is fabricated for high-efficient low-cost solar cell application. The Ti-mesh metal can replace TCO in the photo-electrode part of DSCs, thus the cell structure is composed of a glass/dye sensitized TiO2 particle/ Ti-mesh layer/electrolyte/Pt sputtered counter electrode/ glass. The Ti-mesh electrode with high conductivity can collect electrons from the $TiO_2$ layer and allows the ionic diffusion of $I^-/I_3^-$ through the mesh hole. Thin Ti-mesh ($\sim40{\mu}m$ in thickness) electrode material is processed using rapid prototype method. The efficiency of prepared TCO-less DSCs sample is about 1.45 % ((ff: 0.5, Voc: 0.52V, Jsc: 5.55 $mA/cm^2$).

• 한국정밀공학회지
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• 제23권2호
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• pp.97-103
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• 2006

In this paper, effect of temperature in TiN-coating by arc ion plating on surface characteristics of a TiN coated high speed steel is investigated by experiments. Hardness, surface roughness, TiN-coating thickness and adsorption force are measured in order to evaluate the effects. For evaluation of the experimental data, one-way ANOVA method is used. It is concluded that the furnace temperature in the range $400^[\circ}C\~500^{\circ}C$ in AIP processing has a little influence on the TiN coating of the SKH51 steels.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2005년도 춘계학술대회 논문집
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• pp.401-406
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• 2005

In this paper, both effect of TiN-coating and effect of temperature in TiN-coating by arc ion plating on surface characteristics of TiN coated SKH51 steel are investigated by experiments. Hardness, surface roughness, TiN coating thickness and adsorption force are measured in order to evaluate the effects. For evaluation of the experimental data, the two-way ANOVA method is used. It is concluded that the furnace temperature in the rang of $400^{\circ}C\~500^{\circ}C$ in AIP processing has very little influence on the TiN coating of the SKH51 steels.

• Journal of Korean Vacuum Science & Technology
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• 제6권2호
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• pp.67-70
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• 2002

Multi-period low-emissivity (low-e) filters based on [TiO$_2$｜Ti｜Ag｜TiO$_2$] layer structure were designed and fabricated by a RF magnetron sputtering method. Optical, structural, chemical, and electrical properties were investigated with various analytical tools. Interface layers consisting of Ag, Ti, and O were observed next to Ag layers by Rutherford backscattering spectrometry (RBS) analysis. The results show that Ti layers of ~ 1.8 nm protect the Ag layers from oxidation better than those of ~ 1 nm and the optical spectra of the filter with thicker Ti layers are in agreement with the simulated one. The average transmittance of a low-e filter with thicker Ti layers is reduced and the sheet resistance is slightly increased due to the increased Ti thickness.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.400-403
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• 2004

The dielectric properties of $BaTiO_3/SrTiO_3$ multilayered thick films with printing times were investigated. $BaTiO_3/SrTiO_3$ thick films were deposited by Screen-printing method on alumina substrates. The obtained films were sintered at $1400^{\circ}C$ with bottom electrode(Pt) for 2hours. The structural and the dielectric properties were investigated for various printing times. The BST phase appeared in all of the $BaTiO_3/SrTiO_3$ mutilayered thick films. The $BaTiO_3/SrTiO_3$ multilayered thick film thickness, obtained by one printings, was $50{\mu}m$. The dielectric constant and dielectric loss of the $BaTiO_3/SrTiO_3$ multilayered thick film, obtained by five printings, were about 266, 0.8% at 1Mhz, respectively.

• 한국환경보건학회지
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• 제31권5호
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• pp.415-422
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• 2005

The photocatalytic decolorization of Reactive Red 2B(RR2B) was studied using immobilized photocatalyst/UV System. Two pairs of 20 W UV-B and UV-C lamps were employed as the light source. Immobilization of $TiO_2$ was carried out using sponge (as the photocatalyst body) and silicone sealant(as the binder). The effects of parameters such as the thickness, pore size of sponge photocatalyst and attached material on the reactor bottom were investigated. The results showed that the optimum thickness of sponge photocatalyst was 1 cm. Decolorization of reactor which had the bottom coated $TiO_2$ was higher than that of reactor attached aluminum plate. Decolorization of photocatalyst with large pore size(mean pore size, 3.8 mm) was higher than that of the small(mean pore size, 1.75 mm). Initial decolorization of RR2B could be descrived using the Langmuir-Hinshelwood(L-H) model and gave constant values of $0.55mg/l{\cdot}min(k)\;and\;2.65{\times}10^{-2}l/mg(K)$, respectively.