• Korean Journal of Metals and Materials
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• v.46 no.10
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• pp.691-699
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• 2008

Electrochemical characteristics of Ti-30Ta-xZr alloys coated with HA/TiN by using magnetron sputtering method were studied. The Ti-30Ta containing Zr(3, 7, 10 and 15wt%) were 10 times melted to improve chemical homogeneity by using a vacuum furnace and then homogenized for 24hrs at $1000^{\circ}C$. The specimens were cut and polished for corrosion test and coating, and then coated with HA/TiN, respectively, by using DC and RF-magnetron sputtering method. The analyses of coated surface and coated layer were carried out by using optical microscope(OM), field emission scanning electron microscope(FE-SEM) and X-ray diffractometer(XRD). The electrochemical characteristics were examined using potentiodynamic (-1,500 mV~ + 2,000 mV) and A.C. impedance spectroscopy(100 kHz ~ 10 mHz) in 0.9% NaCl solution at $36.5{\pm}1^{\circ}C$. The microstructure of homogenized Ti-30Ta-xZr alloys showed needle-like structure. In case of homogenized Ti-30Ta-xZr alloys, a-peak was increased with increasing Zr content. The thickness of TiN and HA coated layer showed 400 nm and 100 nm, respectively. The corrosion resistance of HA/TiN-coated Ti-30Ta-xZr alloys were higher than that of the non-coated Ti-30TaxZr alloys, whic hindicate better protective effect. The polarization resistance($R_p$) value of HA/TiN coated Ti-30Ta-xZr alloys showed $8.40{\times}10^5{\Omega}cm^2$ which was higher than that of non-coated Ti-30Ta-xZr alloys.

• Journal of the Korean institute of surface engineering
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• v.30 no.1
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• pp.33-43
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• 1997

The effects of process parameters substrate such as substrate current and substrate temperature on the corrosion resistance of ion plated TiN film were investigated. TiN fims were deposited on speed steel on which Ti or Ni hed been previously evaporated. Dense TiN films could be obtained under higher substrate current(1A) and substrate temperature($500^{\circ}C$), whereas TiN films deposited with lower substances current(0.5A) and substrate temperature($300^{\circ}C$) showed porous structure. The corrosion resistances of high speed steel was considerably increased when dense TiN films had been formed on it. The effect of Ti and Ni interlayer on the increase of the corrosion resistance was also significant with dense TiN films, while there was little effect of interlayer on the corrosion resistance when TiN films were porous. the effect of interlayer on the corrosion resistance was more outstanding with Ti then with Ni, because Ti reacts more easily with oxygen to form an oxide layer, and it also shows higher resistance against chlorine containing corrosion media.

• Korean Journal of Materials Research
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• v.11 no.3
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• pp.215-220
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• 2001

Amorphous Ti-Si-N films of approximately 200 and 650 thickness were reactively sputtered on Si wafers using a dc magnetron sputtering system at various $N_2$/Ar flow ratios. Their barrier properties between Cu (750 ) and Si were investigated by using sheet resistance measurements, XRD, SEM, RBS, and AES depth profiling focused on the effect of the nitrogen content in Ti-Si-N thin film on the Ti-Si-N barrier properties. As the nitrogen content increases, first the failure temperature tends to increase up to 46 % and then decrease. Barrier failure seems to occur by the diffusion of Cu into the Si substrate to form Cu$_3$Si, since no other X- ray diffraction intensity peak (for example, that for titanium silicide) than Cu and Cu$_3$Si Peaks appears up to 80$0^{\circ}C$. The optimal composition of Ti-Si-N in this study is $Ti_{29}$Si$_{25}$N$_{46}$. The failure temperatures of the $Ti_{29}$Si$_{25}$N$_{465}$ barrier layers 200 and 650 thick are 650 and $700^{\circ}C$, respectively.ely.

• Journal of the Korean Ceramic Society
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• v.34 no.5
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• pp.443-448
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• 1997

Titanium carbonitride (Ti(CxN1-x)) ceramics were prepared by hot pressing of the mixture of TiN and graphite. Hot pressing was performed in a graphite mold at 198$0^{\circ}C$ for 40 min under 44 MPa in N2 atmosphere. The effect of graphite addition on sinterability and the mechanical properties of titanium carbonitride were investigated. In this study, the solubility limit of graphite in Ti(CxN1-x) was slightly below 10 wt% based on the results of XRD analysis. Within the solubility limit, graphite dissolved completely into titanium nitride and formed the single phase Ti(CxN1-x) solid solution. Peak relative density of 99% and hardness of 16 GPa were observed for Ti(CxN1-x) ceramics with 7 wt% graphite while maximum flexural strength of 500 MPa and fracture toughness of 4.0 MPa.m1/2 were observed for Ti(CxN1-x) ceramics with 10 wt% graphite. The electrical resistivities of the ceramics with 7 wt% and 10 wt% graphite were observed 40 {{{{ mu OMEGA }}cm and 50 {{{{ mu OMEGA }}cm respectively.

• Journal of Powder Materials
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• v.16 no.2
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• pp.98-103
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• 2009

The ultrafine titanium carbonitride particles ($TiC_{0.7}N_{0.3}$) below 100nm in mean size were successfully synthesized by Mg-thermal reduction process. The nanostructured sub-stoichiometric titanium carbide ($TiC_{0.7}$) particles were produced by the magnesium reduction at 1123K of gaseous $TiC_{l4}+xC_2Cl_4$ and the heat treatments in vacuum were performed for five hours to remove residual magnesium and magnesium chloride mixed with $TiC_{0.7}$. And final $TiC_{0.7}N_{0.3}$ phase was obtained by nitrification under normal $N_2$ gas at 1373K for 2 hrs. The purity of produced $TiC_{0.7}N_{0.3}$ particles was above 99.3% and the oxygen contents below 0.2 wt%. We investigated in particular the effects of the temperatures in vacuum treatment on the particle refinement of final product.

• Journal of the Korean Ceramic Society
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• v.30 no.4
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• pp.332-338
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• 1993

TiN/Ti is the best buffer layer between PZT thin film and si substrate among the Ti, TiN, ZrN, TiN/Ti, ZrN/Ti. The amorphous PZT films deposited on TiN/Ti buffer layer directly transform into perovskite phase when rapid thermal annealed for 30sec above 55$0^{\circ}C$. As Rapid Thermal Annealing(RTA) temperature increased, the remanent polarization(Pr) and dielectric constant($\varepsilon$r) increased and then showed Pr=21 $\varepsilon$r=593 when rapid thermal annealed 80$0^{\circ}C$ for 30sec. On the contrary the leakage current increased with increasing RTA temperature due to the formation of void made by Pb evaporationand grain cohesion.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.2 s.179
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• pp.97-103
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• 2006

In this paper, effect of temperature in TiN-coating by arc ion plating on surface characteristics of a TiN coated high speed steel is investigated by experiments. Hardness, surface roughness, TiN-coating thickness and adsorption force are measured in order to evaluate the effects. For evaluation of the experimental data, one-way ANOVA method is used. It is concluded that the furnace temperature in the range $400^[\circ}C\~500^{\circ}C$ in AIP processing has a little influence on the TiN coating of the SKH51 steels.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.9 no.2
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• pp.40-46
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• 2010

The purpose of this study is to show the friction and wear characteristics on the vapor deposited coating layers on the SCM415 steel. In this research, frictional wear characteristic of coating materials such as TiAlN+WC/C Multilayer Coating was investigated under room temperature, normal air pressure and nothing lubricating condition. Therefore this study carried out research on the friction coefficient, micro hardness(Hv), roughness, EPMA on the vapor deposited coating layers on the SCM415 steel. As the wear experimental result, the coefficient of friction decreased according to experimental load increases.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.05a
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• pp.208-210
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• 2009

5성분계 Ti-Al-Si-C-N 코팅막은 하이브리드 코팅 시스템을 사용하여 실리콘 (Si) 웨이퍼와 SUS 304 기판위에 합성되었다. 본 연구에서는 Si 첨가에 의해 Ti-Al-Si-C-N 코팅막의 미세구조와 기계적 특성의 변화를 체계적으로 조사하였다. Si 함량이 증가됨에 따라 Ti-Al-Si-C-N 코팅막의 미세구조는 주상정에서 나노복합체를 가지는 미세구조로 변화하였다. 나노복합체의 고유한 특성에 의하여 미소경도는 약 56GPa로 증가하였고, Si가 증가함에 따라 평균 마찰계수도 크게 줄어들었다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.10a
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• pp.161-162
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• 2009

하이브리드 코팅장비를 이용해 WC-CO기판위에 Ti-Si-N박막을 증착 시켰다. 이 연구는 Ti-Si-N박막의 기계적 성질에 온도와 바이어스가 미치는 영향에 대해 실험을 하였다. 증착온도가 $300^{\circ}C$까진 Ti-Si-N박막의 미세경도와 탄성률은 증가했지만 증착온도가 $300{\sim}350^{\circ}C$에서는 탄성률은 감소하고 결정 성장으로 인해 미세경도는 감소하였다. 기판 바이어스는 박막과 미세구조에 압축 잔류 응력을 야기 시킨다. 그러나 기판바이어스가 -400V 이상에서는 re-sputtering에 의해 Si함량이 감소한다. Ti-Si-N 박막의 가장 우수한 기계적 성질은 $300^{\circ}C$, -100V에서 얻을 수 있었다.