• Bulletin of the Korean Chemical Society
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• v.31 no.9
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• pp.2675-2678
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• 2010

• Bulletin of the Korean Chemical Society
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• v.30 no.10
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• pp.2199-2200
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• 2009

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.64-65
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• 2003

Stereo-lithography using the two photon absorption(TPA) makes micro structures with great resolution. The technique is applied to correcting photomask, 3-D photonic crystal, 3-D optical storage, 3-D lithography and so on. In contrast to a conventional stereo-lithography with single-photon absorption which has a size problem caused by the geometrical diffraction limit, the stereo-lithography with TPA has no size limit. (omitted)

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.10a
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• pp.595-596
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• 2009

• Korean Journal of Optics and Photonics
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• v.17 no.1
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• pp.75-80
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• 2006

We studied feasibility of three-dimensional optical memory by utilizing femtosecond laser-induced changes of transmission in photopolymers and photoluminescence in Eu and Sm ion doped sodium borate glasses. We produced transmission change by two photon absorption and obtained sub-Um size spots in photopolymers using 780 nm modelocked Ti-sapphire laser pulses. We also changed valence state of Eu and Sm ions by multi-photon absorption and achieved $\~{\mu}m$ sized spot formation in Sm-doped glasses.

• Proceedings of the Optical Society of Korea Conference
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• 2007.07a
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• pp.329-330
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• 2007

Today some many types of 3D display are developed but that are not possibly multiviewer, multiview and full parallax. Our new research work uses the Quantum optic to develop 3D display. Quantum mechanically, we can think of the first photon making a virtual transition to the second state. If the second photon appears within the lifetime of that state, the absorption sequence to the third level can be completed. When the electron, located in the third state, shifts to the first state, that electron emits one visible photon. We controlled the two invisible lights to draw a pixel in volume.

• Nuclear Engineering and Technology
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• v.54 no.2
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• pp.666-673
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• 2022

The optimization of a transmission type bremsstrahlung conversion target was carried out with Monte Carlo code FLUKA for intense pulsed electron beams with electron energy of several hundred keV for maximum photon fluence. The photon emission intensity from electrons with energy ranging from 300 keV to 1 MeV on tungsten, tantalum and molybdenum targets was calculated with varied target thicknesses. The research revealed that higher target material element number and electron energy leads to increased photon fluence. For a certain target material, the target thickness with maximum photon emission fluence exhibits a linear relationship with the electron energy. With certain electron energy and target material, the thickness of the target plays a dominant role in increasing the transmission photon intensity, with small target thickness the photon flux is largely restricted by low energy loss of electrons for photon generation while thick targets may impose extra absorption for the generated photons. The spatial distribution of bremsstrahlung photon density was analyzed and the optimal target thicknesses for maximum bremsstrahlung photon fluence were derived versus electron energy on three target materials for a quick determination of optimal target design.

• Bulletin of the Korean Chemical Society
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• v.23 no.2
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• pp.189-194
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• 2002

Two-photon resonant third photon ionization of atomic bromine $(4p^5\;^2P_{3/2}\;and\;^2P_{1/2})$ has been studied using a photoelectron imaging spectroscopy in the wavelength region 250 - 278 nm. The technique has yielded simultaneously both relative branching ratios to the three levels of $Br^+(^3P_2,\;^3P_{0.1}\;and^1D_2)$ with $4p^4$ configuration and the angular distributions of outgoing photoelectrons. The product branching ratios reveal a strong propensity to populate particular levels in many cases. Several pathways have been documented for selective formation of $Br^+(^3P_2)$ and $Br^+(^3P_{0.1})$ ions. In general, the final ion level distributions are dominated by the preservation of the ion core configuration of a resonant excited state. Some deviations from this simple picture are discussed in terms of the configuration interaction of resonant states and the autoionization in the continuum. The photoelectron angular distributions are qualitatively similar for all transitions, with a positive $A_2$ anisotropy coefficient of 1.0-2.0 and negligible $A_4$ in most cases, which suggests that the angular distribution is mainly determined by the single-photon ionization process of a resonant excited state induced from the third photon absorption.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.1365-1368
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• 2004

A scheme to control the laser power and the exposure time was studied to fabricate precise microstructures using the nanostereolithography (nSL) process. Some recent works have shown that a three-dimensional (3D) microstructure can be fabricated by the photopolymerizing process which is induced by two-photon absorption (TPA) with a femtosecond pulse laser. TPA provides the ability to confine photochemical and physical reactions within the order of laser wavelength, so neardiffraction limit features can be produced. In the nSL process, voxels are continuously generated to form a layer and then another layer is stacked in the normal direction of a plane to construct a 3D structure. Thus, fabrication of a voxel with low aspect ratio and small diameter is one of the most important parameters for fabricating precise 3D microstructures. In this work, the mechanism of a voxel formation is studied and a scheme on the control of laser power and exposure for minimizing aspect ratio of a voxel is proposed.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2007.11a
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• pp.159-160
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• 2007