• Title/Summary/Keyword: Thin-film electrodes

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The phase transition with electric field in chalcogenide thin films (칼코게나이드 박막의 전기적 펄스에 의한 상변화 연구)

  • Yang, Sung-Jun;Shin, Kyoung;Lee, Jae-Min;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05a
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    • pp.115-118
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    • 2004
  • The phase transition between amorphous and crystalline states in chalcogenide semiconductor films can controlled by electric pulses or pulsed laser beam; hence some chalcogenide semoconductor films can be applied to electrically write/erase nonvolatile memory devices, where the low conductive amorphous state and the high conductive crystalline stale are assigned to binary states. AST(AsSbTe) used to phase change material by applying electical pulses. Thickness of AST chalcogenide thin film have about 100nm. Electrodes are made of ITO and Al. $T_c$(Crystallization temperature) of AST system is lower than that of the GST(GeSbTe) system, so that the current pulse width of crystallization process can be decreased.

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A Study on the Embedded Capacitor for PCB (PCB용 임베디드 캐패시터에 관한 연구)

  • Hong, Soon-Kwan
    • Journal of the Institute of Electronics Engineers of Korea TE
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    • v.42 no.4
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    • pp.1-6
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    • 2005
  • Recently embedded passive technology which fabricate passive elements such as resistors and capacitors at the inner layer of PCB(Printed Circuit Board) is used to make high performance IT products. However, embedded capacitor has limit in full range circuit applications because of the low capacitance density. In this paper, a new embedded capacitor which has wrinkled electrodes and dielectric layer was proposed to overcome the limits. FEM(Finite Elements Method) technique was used to evaluate capacitance density of the wrinkled type embedded capacitor. Capacitance density of the wrinkled type embedded capacitor is larger than that of conventional planar type embedded capacitor by about 25.6%$\sim$39.6%. In case of thin film type embedded capacitor, proposed wrinkled structure has more enhanced effect on the capacitance density.

Gate Electrode Dependence of MFSFETs using $LiNbO_3$ Thin Film ($LiNbO_3$ 박막을 이용한 MFSFET의 게이트 전극 의존성)

  • 정순원;김용성;김채규;이남열;김광호
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.25-28
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    • 1999
  • Metal ferroelectric semiconductor Field Effect- Transistors(MFSFET) with various gate electrodes, that are aluminum, platinum and poly -Si, using LiNbO$_3$/Si(100) structures were fabricated and the properties of the FETs have been discussed. The drain current of the state of FET with Pt electrode was more than 3 orders of magnitude larger than the state current at the same gate voltage of 1.5 V, 7.rich means the memory operation of the MFSFET. A write voltage as low as about $\pm$4 V, which is applicable to low power integrated circuits, was used for polarization reversal. The retention properties of the FET using Al electrode were quite good up to about 10$^3$s and using Pt electrode remained almost the same value of its initial value over 2 days at room temperature.

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Capacitance Properties of $Poly-\gamma-Benzyl\;_L-Glutamate$ in Organic Ultra Thin Films ($Poly-\gamma-Benzyl\;_L-Glutamate$ 유기초박막의 정전용량특성)

  • Kim, Byung-Geun;Kim, Chang-Bok;Kim, Young-Keun;Choi, Young-Il;Lee, Kyung-Sup
    • Proceedings of the KIEE Conference
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    • 2002.11a
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    • pp.147-149
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    • 2002
  • Recently, the study on development of electrical and electronic device is done to set miniature, high degrees of integration and efficiency by using inorganic materials the study of Langmuir-Boldgett(LB) method that uses organic materials because of the limitation for the ultrasmall size. The structure of MIM(Metal-Insulator-Metal) device is Cr-Au/PBLG/ Al. the number of accumulated layers are 1, 3, 5, 7, 9. The I-V characteristic of the device is measured from 0[V] to 2[V] and the characteristic of current-time of the devices. We have investigated the capacitance because PBLG system have a accumulated layers the maximum value of measured current is increased as the number of accumulated layers are decreased. The capacitor properties of a thin film is better as the distance between electrodes is smaller. The results have shown the insulating materials and could control the conductivity by accumulated layers.

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In situ analysis of the dynamic characteristics of electro-chemically Polymerized Polypyrrole film using Quartz Crystal Analyzer (Q.C.A.). (Q.C.A. 에 의한 폴리피롤 전기중합막의 동특성 분석)

  • Chang, Sang-Mok;Kim, Jong-Min;Chang, Yong-Keun;Muramatsu, Hiroshi;Ataka, Tatsuaki
    • Journal of Sensor Science and Technology
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    • v.5 no.4
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    • pp.71-79
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    • 1996
  • The mechanism of electrochemical polymerization of polypyrrole was analyzed using Q.C.A. via measuring the resonant frequency and resonant resistance of AT-cut quartz crystal, whose electrodes were fabricated with indium tin oxide by sputtering method. The quantity of polymerized polypyrrole was able to be calculated from the resonant frequency and the viscoelasticity of polypyrrole film from resonant resistance. We found that the elastic film is formed at the first stage of the polymerization, but transformed to viscoelastic film later and that this transition repeated at some point. From these results, it was confirmed that the rheological characteristics of electrochemically polymerized polypyrrole thin film can be analyzed using Q.C.A.

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Study on OTFT-Backplane for Electrophoretic Display Panel (전기영동 디스플레이 패널용 OTFT-하판 제작 연구)

  • Lee, Myung-Won;Ryu, Gi-Sung;Song, Chung-Kun
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.7
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    • pp.1-8
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    • 2008
  • We fabricated flexible electrophoretic display(EPD) driven by organic thin film transistors(OTFTs) on plastic substrate. We designed the W/L of OTFT to be 15, considering EPD's transient characteristics. The OTFTs employed bottom contact structure and used Al for gate electrode, the cross-linked polyvinylphenol for gate insulator, pentacene for active layer. The plastic substrate was coated by PVP barrier layer in order to remove the islands which were formed after pre-shrinkage process and caused the electrical short between bottom scan and top data metal lines. Pentacene active layer was confined within the gate electrodes so that the off current was controlled and reduced by gate electrodes. Especially, PVA/Acryl double layers were inserted between EPD panel and OTFT-backplane in order to protect OTFT-backplane from the damages created by lamination process of EPD panel on the backplane and also accommodate pixel electrodes through via holes. From the OTFT-backplane the mobility was $0.21cm^2/V.s$, Ion/Ioff current ratio $10^5$. The OTFT-EPD panel worked successfully and demonstrated to display some patterns.

Performance of Air Electrodes with a Surface-Polished Yttria-Stabilized Zircona Electrolyte for Thin-Film Solid Oxide Fuel Cells (박막 고체산화물 연료전지용 이트리아 안정화 지르코니아 전해질 연마표면상의 공기극 성능)

  • Lee, Yu-Gi
    • Korean Journal of Materials Research
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    • v.11 no.4
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    • pp.283-289
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    • 2001
  • Composite cathodes of 50/50 vol% LSM- YSZ (La$_{1-x}$Sr$_{x}$MnO$_3$-yttria stabilized zirconia) were deposited onto surface- Polished YSZ electrolytes by colloidal deposition technique. The cathode characteristics were then examined by scanning electron microscopy (SEM) and X-ray diffraction (XRD) and studied by ac impedance spectroscopy (IS). The typical impedance spectra measured for an air/LSM- YSZ/YSZ/Pt/air cell at $700^{\circ}C$ were composed of two depressed arcs. Addition of YSZ to the LSM electrode significantly enlarged the triple-phase boundaries (TPB) length inside the electrode, which led to a pronounced decrease in cathodic resistivity of LSM-YSZ composite electrodes. Polishing the electrolyte surface to eliminate the influences of surface impurities and to enlarge the TPB length can further reduce cathode resistivity. The cathodic resistivity of the LSM- YSZ electrodes was a strong function of operation temperature, composition and particle size of cathode materials, applied current, and electrolyte surface roughness.

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Effect of Hydrogen on leakage current characteristics of (Pb, La) (Zr, Ti )$O_3$(PLZT) thin film capacitors with Pt or Ir-based top electrodes (Pt 또는 Ir 계열의 상부전극을 갖는 (Pb, La) (Zr, Ti)$O_3$ (PLZT) 박막의 누설전류특성에 미치는 수소 열처리의 효과)

  • Yun, Sun-Gil
    • Korean Journal of Materials Research
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    • v.11 no.2
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    • pp.151-154
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    • 2001
  • The leakage current behaviors of PLZT capacitors with top electrodes of Pt, Ir, and $IrO_2$ are investigated before and after hydrogen forming gas anneal. The P-E hysteresis and fatigue properties of Pt/PLZT/Pt capacitors are almost recovered after recovery anneal in $O_2$ ambient. The leakage current mechanisms of PLZT capacitors with Pt and $IrO_2$ top electrodes are consistent with space-charge influenced injection model showing the strong time dependence irrespective of annealing conditions. On the other hand, the leakage current behavior of Ir/PLZT/Pt capacitor shows steady state independent of time because IrPb, conducting phase, formed at interface between Ir top and PLZT is a high conduction path. Teh leakage current mechanism of Ir/PLZT/Pt capacitor is consistent with Schottky barrier model.

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Low-Temperature Deposition of Ga-Doped ZnO Films for Transparent Electrodes by Pulsed DC Magnetron Sputtering

  • Cheon, Dongkeun;Ahn, Kyung-Jun;Lee, Woong
    • Korean Journal of Materials Research
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    • v.27 no.2
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    • pp.69-75
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    • 2017
  • To establish low-temperature process conditions, process-property correlation has been investigated for Ga-doped ZnO (GZO) thin films deposited by pulsed DC magnetron sputtering. Thickness of GZO films and deposition temperature were varied from 50 to 500 nm and from room temperature to $250^{\circ}C$, respectively. Electrical properties of the GZO films initially improved with increase of temperature to $150^{\circ}C$, but deteriorated subsequently with further increase of the temperature. At lower temperatures, the electrical properties improved with increasing thickness; however, at higher temperatures, increasing thickness resulted in deteriorated electrical properties. Such changes in electrical properties were correlated to the microstructural evolution, which is dependent on the deposition temperature and the film thickness. While the GZO films had c-axis preferred orientation due to preferred nucleation, structural disordering with increasing deposition temperature and film thickness promoted grain growth with a-axis orientation. Consequently, it was possible to obtain a good electrical property at relatively low deposition temperature with small thickness.

Genome Detection Using Hoechst 33258 Groove Binder (유기박막의 전기적 특성)

  • Song, Jin-Won;Choi, Yong-Sung;Moon, Jong-Dae;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.370-371
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    • 2006
  • Maxwell displacement current (MDC) measurement has been employed to study the dielectric property of Langmuir-films. MDC flowing across monolayers is analyzed using a rod-like molecular model. A linear relationship between the monolayer compression speed and the molecular area Am. Compression speed was about 30, 40, 50mm/min. Langmuir-Blodgett(LB)layers of Arachidic acid deposited by LB method were deposited onto slide glass as Y-type film. The structure of manufactured device is Au/Arachidic acid/Al, the number of accumulated layers are 9~21. Also, we then examined of the Metal-Insulator-Metal(MIM) device by means of I-V. The I-V characteristics of the device are measured from -3 to +3[V]. The insulation property of a thin film is better as the distance between electrodes is larger.

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