• Transactions of the Korean hydrogen and new energy society
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• v.24 no.3
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• pp.193-199
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• 2013

In this work, thin film type Cu/ZnO nanostructure catalysts were fabricated by several synthetic routes in order to maximize the performance of the micro reforming system. For this work, various Cu/ZnO nanostructure catalysts could be synthesized by means of four approaches which are chemical vapor method, wet solution method and their hybrid method. The reforming performance of these as-synthetic catalysts was evaluated as compared to the conventional catalysts. Among the as-synthetic nanostructures, sphere type catalysts with specific surface of $18.6m^2/g$ showed the best performance of hydrogen production rate of 30ml/min at the feed rate of 0.2ml/min. This work will give the first insight on thin film type Cu/ZnO nanostructure catalyst for micro reforming system for hydrogen production of portable electronic systems.

• Korean Chemical Engineering Research
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• v.46 no.1
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• pp.50-55
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• 2008

Carbon Nanotube (CNT) films were deposited with varying deposition temperature by RF plasma CVD on Fe catalysts deposited onto $SiO_2$ films grown thermally on the silicon wafer using $C_2H_2$ and $H_2$ gases. The Fe catalysts on silicon oxide film were made by RF magnetron sputtering. The grounded grid mesh cover on the substrate holder was used for depositing CNT thin films with high purity. The surface morphologies and chemical structure of deposited CNT films were characterized using SEM, Raman, XPS and TEM. It was observed that deposited CNTs films were carbon fiber type having Bamboo-like multiwall structure and CNT film grown at $600^{\circ}C$ was more dense than that at $550^{\circ}C$, but become less dense at $650^{\circ}C$.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.21 no.3
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• pp.110-113
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• 2011

In this paper, we propose a new method for the fabrication of GaN microstructures formed only on the vertex of GaN pyramid by using of metal catalysts. GaN pyramidal structures were selectively grown on 3 ${\mu}m$ $SiO_2$ dot patterns followed by thin film deposition of Au and Cr only on the vertex area of the GaN pyramids with precisely controlled photolithography. After the metal deposition, the samples were loaded in the MOVPE reactor for the growth of GaN microstructures for 10 minutes. Temperature for the growth of the GaN microstructures was changed from $650^{\circ}C$ to $750^{\circ}C$. Rod type GaN microstructures were grown in the direction of vertical to the six {1-101} facets and the shape of the GaN microstructures was changed depend on the type of metal.