• 제목/요약/키워드: Thin filament

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Development of Eco-Friendly Ag Embedded Peroxo Titanium Complex Solution Based Thin Film and Electrical Behaviors of Res is tive Random Access Memory

  • Won Jin Kim;Jinho Lee;Ryun Na Kim;Donghee Lee;Woo-Byoung Kim
    • 한국재료학회지
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    • 제34권3호
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    • pp.152-162
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    • 2024
  • In this study, we introduce a novel TiN/Ag embedded TiO2/FTO resistive random-access memory (RRAM) device. This distinctive device was fabricated using an environmentally sustainable, solution-based thin film manufacturing process. Utilizing the peroxo titanium complex (PTC) method, we successfully incorporated Ag precursors into the device architecture, markedly enhancing its performance. This innovative approach effectively mitigates the random filament formation typically observed in RRAM devices, and leverages the seed effect to guide filament growth. As a result, the device demonstrates switching behavior at substantially reduced voltage and current levels, heralding a new era of low-power RRAM operation. The changes occurring within the insulator depending on Ag contents were confirmed by X-ray photoelectron spectroscopy (XPS) analysis. Additionally, we confirmed the correlation between Ag and oxygen vacancies (Vo). The current-voltage (I-V) curves obtained suggest that as the Ag content increases there is a change in the operating mechanism, from the space charge limited conduction (SCLC) model to ionic conduction mechanism. We propose a new filament model based on changes in filament configuration and the change in conduction mechanisms. Further, we propose a novel filament model that encapsulates this shift in conduction behavior. This model illustrates how introducing Ag alters the filament configuration within the device, leading to a more efficient and controlled resistive switching process.

Hot Filament CVD에 의해서 증착된 다이아몬드 박막의 표면형상에 미치는 기판온도의 영향 (Effects of Substrate Temperature on the Morphology of Diamond Thin Films Deposited by Hot Filament CVD)

  • 형준호;조해석
    • 한국결정학회지
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    • 제6권1호
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    • pp.14-26
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    • 1995
  • Hot Filament CVD법에 의해 증착된 다이아몬드 박막의 기판온도와 증착시간 변화에 따르는 표면형상 변화를 관찰함으로써 그 증착기구를 규명하고자 하였다. 기판온도가 낮을 경우에는 비정질 탄소 및 DLC(diamond like carbon)가 증착되고 기판온도가 증가함에 따라 사가형의 (100)명으로 구성된 입자를 가지는 다이아몬드 박막이 증착되었으며 매우 높은 기판온도에서는 (100)명과 (111)명으로 이루어진 결정외형을 가지는 입자들로 구성되는 다이아몬드 박막이 증착되었다. 다이아몬드 박막의 (100) 우선배향성은 증착시의 비교적 높은 과포화도에 기인하는 것으로 생각되며, 이러한 (100) 우선배향성을 가지는 박막은 결정면내에 twin을 함유하지 않으므로 단결정박막으로의 성장가능성이 크다. 기판온도가 증가해도 다이아몬드 박막의 입자크기는 증가하지 않았으며 시간에 따른 증가양상도 온도에 관계없이 비슷한 경향을 보였다. 그러나 필라멘트 온도가 일정할 때 다이아몬드 박막의 핵 밀도는 기판온도가 높을수록 증가하였으며 시간에 따른 증가폭도 기판온도가 높을수록 더 크게 나타났다.

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Hot-filament법에 의한 Diamond 박막증착 (Deposition of Diamond Thin Film Prepared by Hot-filament Chemical Vapor Deposition)

  • 윤석근;한상목;소명기
    • 한국세라믹학회지
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    • 제28권10호
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    • pp.777-784
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    • 1991
  • Diamond films have been growth by the hot-filament chemical vapor deposition (HFCVD) using CH4 and H2 gaseous mixture on the Si substrate. The experimental results indicated that the deposits were pure diamond and contained no amount of non-diamond phases such as amorphous carbon or graphite. The diamond films were deposited well at the conditions: the filament temperature of 210$0^{\circ}C$, the substrate temperature of 77$0^{\circ}C$, the CH4 concentration of 1.76%, the reactor pressure of 30 torr, and the deposition time of 7 hr. At this growth condition, the maximum deposition rate was 2 ${\mu}{\textrm}{m}$/hr. X-ray diffraction patterns and texture coefficient results showed that preferred orientation of the diamond films was {111} orientation under all experimental conditions.

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EA hot filament CVD system을 이용하여 금형공구강에 증착한 Ti(B,N)박막의 합성과 특성에 관하여 (The Characteristic and Formation of Ti(B,N) Films on Steel by EA Hot Filament CVD)

  • 윤중현;최용;최진일
    • 전기학회논문지
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    • 제61권4호
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    • pp.585-589
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    • 2012
  • The characteristics of interface layer and the effect of mole fraction of inlet gas mixture($B_2H_6/H_2/N_2/TiCl_4$) on the microstructure of Ti(B,N) films were studied by microwave plasma hot filament CVD process. Ti(B,N) films were deposited on a substrate(STD-61) to develop a high performance of resistance wear coating tool. Ti(B,N) films were obtained at a gas pressure of 1 torr, bias voltage of 300 V and substrate temperature of $480^{\circ}C$ in $B_2H_6/H_2/N_2/TiCl_4$gas system. It was found that TiN, $TiB_2$, TiB and hexagonal boron nitride(h-BN) phases exist in thin layer on the STD-61.

Studies on Melt Spinning of PET Hollow Fibers

  • O Tae-Hwan;Lee Mu-Seok;Kim Sang-Yong;Sim Hyeon-Ju
    • 한국섬유공학회:학술대회논문집
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    • 한국섬유공학회 1998년도 봄 학술발표회 논문집
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    • pp.111-115
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    • 1998
  • Fiber spinning is a continuous deformation process by which material is converted into a fiber. The melt spinning process was analyzed mainly by employing an asymptotic method of the so-called thin filament equations which formulates dynamics of spinning process by averaging over the cross-section of filament the set of fundamental equations. The method gives the approximate results for commonly used circular fiber spinning.(omitted)

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필라멘트 구조의 YBCO 박막의 자기이력 손실 (Hysteresis loss of YBCO thin film strip with filamentary structure)

  • 박현욱;나동현;김맹준;장용식;김지만;이형철;이용호
    • Progress in Superconductivity
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    • 제6권2호
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    • pp.99-103
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    • 2005
  • For ac applications a detailed understanding of the ac power losses associated with different conductor configurations is of crucial importance. YBCO thin films were divided into parallel filaments with widths of 1, 2, and 4 mm to reduce hysteresis losses. The measured hysteresis losses show a linear relationship between the strip width and hysteresis loss as anticipated. The influence of different inter-filament separations on the hysteresis loss is investigated.

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Hot Filament Chemical Vapor Deposition of Crystalline Boron Films

  • Soto, Gerardo
    • 한국세라믹학회지
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    • 제56권3호
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    • pp.269-276
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    • 2019
  • This article reports on the conditions required for the growth of crystalline boron films on silicon substrates by hot filament chemical vapor deposition method. The reactive gas was 3% diborane diluted in hydrogen. The films were characterized by optical, electronic, and atomic force microscopies; x-ray diffraction; and energy dispersive, electron energy loss, Raman, x-ray photoelectron, and Auger spectroscopies. The parameters that affect the morphologies of the films have been investigated. It was concluded that faceted crystals are produced at low B2H6 flows and working pressures below 200 mT. α-boron is produced between 530 and 600℃. Deposition outside this range produces thin films with a wide variety of morphologies. This result indicates that the films crystallize through a process called "abnormal or discontinuous grain growth." It is assumed that this is due to the anisotropic surfaces of boron allotropes.

Hydrogenation of ZnO:Al Thin Films Using Hot Filament

  • An, Il-Sin;Kim, Ok-Kyung;Lee, Chang-Hyo;Ahn, You-Shin
    • Journal of Korean Vacuum Science & Technology
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    • 제4권3호
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    • pp.86-90
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    • 2000
  • ZnO : Al films were prepared through the optimization process of aluminum content and substrate temperature in rf-magnetron sputtering. When hydrogenation was performed on these films using a hot filament method, all films showed improvement in conductivity although more conductive film showed less improvement. When the substrate temperature ($T_H$) was varied from $25^{\circ}C\;to\;300^{\circ}C$ during hydrogenation, the resistivity was reduced more at higher $T_H$ (more than 30% at $T_H=300^{\circ}C$) Thus, two methods were developed to suppress the dehydrogenation in ZnO : Al films : (1) capping with amorphous silicon thin film as a diffusion barrier, and (2) cooling during hydrogenation.

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