• Bulletin of the Korean Chemical Society
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• 제23권5호
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• pp.741-744
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• 2002

Single phase of multicomponent oxide ZrTiO4 film could be prepared through surface sol-gel route simply by coating the mixture of 100 mM zirconium butoxide and titanium butoxide on $Pt/Ti/SiO_2Si(100)$ substrate, following pyro lysis at $450^{\circ}C$, and annealing it at 770 $^{\circ}C.$ The dielectric constant of the film was reduced as the film thickness decreased due to of the interfacial effects caused by layer/electrode and a few voids inside the multilayer. However, the dielectric property was independent of applied dc bias sweeps voltage (-2 to +2 V).The dielectric constant of bulk film, 31.9, estimated using series-connected capacitor model was independent of film thickness and frequency in the measurement range, but theoretical interfacial thickness, ti, was dependent on the frequency. It reached a saturated ti value, $6.9{\AA}$, at high frequency by extraction of some capacitance component formed at low frequency range. The dielectric constant of bulk ZrTiO4 pellet-shaped material was 33.7 and very stable with frequency promising as good applicable devices.

• KIEE International Transactions on Electrophysics and Applications
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• 제2C권6호
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• pp.281-286
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• 2002

The temperature accelerated dielectric breakdown strength of on-wafer low-k dielectric polymer films with thicknesses ranging from 94 nm to 1141 nm is investigated by using the current-voltage characteristic measurements with MIS structures. The temperature dependence of dielectric strength is demonstrated to be Arrhenious for all thicknesses. However, the activation energy is found to be strongly thickness dependent. It follows an exponential relationship rather than being a single value, i.e., the activation energy increase significantly as film thickness increases for the thickness below 500 nm, but it is almost constant for the thickness above 500 nm. This relationship suggests that the change of the activation energy corresponding to different film thickness is closely related to the temperature dependence of the electron trapping/detrapping process in polymer thin films, and is determined by both the trapping rate and the detrapping rate. Thinner films need less energy to form a conduction path compared to thicker films. Hence, it leads to smaller activation energy in thinner films, and the activation energy increases with the increase in film thickness. However, a nearly constant value of the activation energy is achieved above a certain range of film thickness, indicating that the trapping rate and detrapping rate is almost equal and eventually the activation energy approaches the value of bulk material.

• Current Optics and Photonics
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• 제7권2호
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• pp.136-146
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• 2023

Based on calculations using the macroscopic Maxwell's equations with mesoscopic boundary conditions, light absorption by a layered metal-insulator-metal (MIM) metamaterial system embedded in three different environments is investigated. Increasing the top metal thickness shifts the broad absorption band to lower dielectric-constant regions and longer wavelengths, for either TM or TE waves. Boosting the dielectric-layer thickness redshifts the broadband absorption to regions of larger dielectric constant. In air, for the dielectric-constant range of 0.86-3.40, the absorption of the system exceeds 98% across 680-1,033 nm. In seawater with optimized dielectric constant, ≥94% light absorption over 400-1,200 nm can be achieved; particularly in the wavelength range of 480-960 nm and dielectric-constant range of 0.82-3.50, the absorption is greater than 98%. In an environment with even higher refractive index (1.74), ≥98% light absorption over 400-1,200 nm can be achieved, giving better performance. The influence of angle of incidence on light absorption of the MIM system is also analyzed, and the angle tolerance for ≥90% broadband absorption of a TM wave is up to 40° in an environment with large refractive index. While the incident-angle dependence of the absorption of a TE wave is nearly the same for different circumstances, the situation is different for a TM wave.

• 공학논문집
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• 제6권2호
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• pp.33-38
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• 2004

To investigate the reliability of the MTJs on the roughness of insulating tunnel barrier, we prepared two MTJs with the different uniformity of barrier thickness. Namely, the one has uniform insulating barrier thickness; the other has non-uniform insulating barrier thickness as compared to different thing. As to depositing amorphous layer CoZrNb under the pinning layer IrMn, we achieved MTJ with uniform barrier thickness. Toinvestigate the reliability of the MTJs dependent on the bottom electrode, time-dependent dielectric breakdown (TDDB) measurements were carried out under constant voltage stress. The Weibull fit of out data shows clearly that $t_{BD}$ scales with the thickness uniformity of MTJs tunnel barrier. Assuming a linear dependence of log($t_{BD}$) on stress voltages, we obtained the lifetime of $10^4$years at a operating voltage of 0.4 V at MTJs comprising CoNbZr layers. This study shows that the reliabilityof new MTJs structure was improved due to the ultra smooth barrier, because the surface roughness of the bottom electrode influenced the uniformity of tunnel barrier.

• 대한전기학회논문지
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• 제36권7호
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• pp.447-452
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• 1987

In this paper, the dependence of piezoelectric properties in the 0-3 composite system of piezoelectric-ceramics polymer materials on particle size of ceramics were investigated. Radial mode and thickness mode of composite were observed similar to single phase of piezoelectric ceramics. The measured values of dielectric constant and dissipation factor were dependent on particle size, which increased with the increasing particle size. the planar coupling factor, thickness coupling factor and thickness frequency constant with the particle size were almost constant, while planar frequency constant increased. The thickness coupling factor decreased with the increasing thickness of specimen. It is found that maximum voltage coeffidient was calculated on the specimen with particle size smallar than 46 ${\mu}m$.

• E2M - 전기 전자와 첨단 소재
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• 제8권2호
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• pp.151-157
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• 1995

Frequency-dependent electrical properties of $C_{22}$-Quinolinium(TCNQ) LB films were investigated in a frequency range of 10[Hz]-13[MHz] along a perpendicular direction. The films were heat-treated to understand an electrodynamic response in a temperature range of 20-240[.deg. C]. Frequencydependent dielectric constants show that there are two characteristic dispersions; one is a dispersion occuring near 1[MHz] coming from the orientational polarization of the molecules and the other one is an interfacial polarization effect below 1[kHz] or so when the annealing temperature is above 80 [.deg. C]. The overall frequency-dependent dielectric constant is higher near 80[.deg. C]. It may be due to a softness of the alkyl chains. Several other methods were employed to identify the internal structure change of the films. DSC(differential scanning calorimetry) data of the $C_{22}$-Quinolinium(TCNQ) molecules shows that there is an endothermic process near 110[.deg. C] and a weak exothermic process near 180[.deg. C]. While the endothermic process is related to a disordering of the alkyl chains, the exothermic process seems to be due to a chemical structure change of the TCNQ molecules. Thickness measurement by ellipsometry shows that there is a thickness drop near 100[.deg. C], and the thickness above 120[.deg. C] becomes around 20[%] of the room-temperature value.lue.

• 한국세라믹학회지
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• 제43권3호
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• pp.156-161
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• 2006

Impedance spectroscopy was applied to the initial hydration of calcium phosphate bone cements in order to investigate the electrical/dielectric properties. Hydration or equivalently setting was monitored as a function of the amount of water and initial powder characteristics. Higher amounts of water produced more open microstructures, leading to higher conductivity and enhanced dielectric constant. The effects of the initial characteristics in the powder were investigated using bone cement powder prepared with and without granulation. Granulated powder exhibited a significant change in resistance and produced a higher dielectric constant than those of conventional powder. Through a simplified modeling, the effects of thickness in reaction products and pore sizes were estimated by the frequency-dependent impedance measurements. Furthermore, impedance spectroscopy was proven to be a highly reliable tool for evaluating the continuous change in pore structure occurring in calcium phosphate bone cements.

• 한국세라믹학회지
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• 제55권3호
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• pp.290-298
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• 2018

In order to investigate the effect of thickness on the dielectric and piezoelectric properties of (001) PMN-29PT single crystals, three different types of PMN-29PT samples were prepared using the solid-state single crystal growth (SSCG) method: high density crystal [99%], low density crystal [95%], and high density crystal doped with Mn [98.5%]. When their thickness decreased from 0.5 mm to 0.05 mm, their dielectric constant ($K_3{^T}$), piezoelectric constants ($d_{33}$ and $g_{33}$), and electromechanical coupling factor ($k_t$) decreased continuously. However, their dielectric loss (tan ${\delta}$) increased. The addition of Mn to PMN-PT induced an internal bias electric field ($E_I$), increased the coercive electric field ($E_C$), and prevented local depoling. Therefore, Mn-doped PMN-PT crystals show high stability as well as high performance, even in the form of very thin plates (< 0.2 mm), and thus are suitable for application to high frequency composites, medical ultrasound probes, non-destructive testing devices (NDT), and flexible devices.

• 전자공학회논문지A
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• 제29A권9호
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• pp.20-28
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• 1992

Dielectric thin film of N/O ($Si_{3]N_{4}/SiO_{2}$) for high density stacked dynamic-RAM cell was formed by LPCVD and oxidation(dry & pyrogenic oxidation methods) of the top 7nm $Si_{3]N_{4}$ film. The thickness, structure and composition of this film were measured by ellipsometer, high resolution TEM, AES and SIMS. The insulating characteristics(I-V characteristics) were investigated by HP 4145, and the characteristics of TDDB (Time Dependent Dielectric Breakdown) were evaluated by using CCST(Current Constant Stress Time) method. In this experiment, The optimum oxidation condition for preparation of good insulating and TDDB characteristics of N/O film was pyrogenic oxidation at 85$0^{\circ}C$ for 30 minutes. The leakage current was reduced from 400pA to 7.5pA when SiO$_{2}$ film with thickness of 2nm was formed on the top of $Si_{3]N_{4}$ film by the pyrogenic oxidation method.

• 한국재료학회지
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• 제11권4호
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• pp.305-311
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• 2001

PDP용 투명유전체 재료로 사용되는 $PbO-B_2O_3-SiO_2-Al_2O_3$계의 소성과정 중에서 투명전극 (ITO)과의 반응성 및 광학적, 열적, 전기적 특성을 조사하였다. 본 연구에서 유전체막.두께는 12$\mu\textrm{m}$으로, 온도는 550-58$0^{\circ}C$에서 소성한 후 여러 물성을 평가하였다 그 결과로, 유전체와 투명전극(ITO)의 반용에서, In 이온이 유전체층으로 확산이동하였으며, Sn 확산은 거의 발생하지 않았다. 선팽창계수, 유전상수, 유리전이온도,광 투과율은 유전체 조성의 PbO 양에 큰 영향을 받았다. PbO양 증가는 선팽창계수와 유전상수를 증가시킨 반면, 유리전이온도와 광 투과율온 저하시켰다. $Al_2O_3/B_2O_3$ 비가 증가함에 따라서는 선팽창계수는 감소, 유전상수는 증가, 광 투과율은 감소하였으며, 유리 전이점 변화는 거의 나타나지 않았다.